Preparation of finely particulate silicon oxides
    11.
    发明授权
    Preparation of finely particulate silicon oxides 失效
    精细颗粒硅氧烷的制备

    公开(公告)号:US3649189A

    公开(公告)日:1972-03-14

    申请号:US3649189D

    申请日:1970-03-12

    Applicant: LONZA AG

    Abstract: Finely particulate silicon oxides are produced from coarse particulate silicon dioxide using a liquid stabilized plasma burner. Hydrocarbons are used as the stabilizing liquid, and the coarse particulate silicon dioxide is reduced by the hydrocarbon plasma jet leaving the plasma burner, and a part of the hydrocarbon which is evaporated and decomposed in the arc zone is withdrawn together with the liquid hydrocarbon stabilizing medium, which is recycled, separated from the liquid, and used as carrier gas for feeding the coarse particulate silicon dioxide. Finely particulate silicon monoxide is initially formed, and may be recovered as such, or oxidized at the anode of the plasma burner to silicon dioxide.

    Abstract translation: 使用液体稳定的等离子体燃烧器,由粗颗粒二氧化硅制备微粒状氧化硅。 碳氢化合物用作稳定液体,通过离开等离子燃烧器的烃等离子体射流减少粗颗粒二氧化硅,并将在电弧区蒸发和分解的一部分烃与液体烃稳定介质一起排出 ,其被再循环,与液体分离,并且用作用于输送粗颗粒二氧化硅的载气。 最初形成细颗粒一氧化硅,并且可以原样回收,或在等离子体燃烧器的阳极处氧化成二氧化硅。

    System for treatment of substrates by a plurality of fluid reactants
    12.
    发明授权
    System for treatment of substrates by a plurality of fluid reactants 失效
    用多种流体反应物处理底物的系统

    公开(公告)号:US3560166A

    公开(公告)日:1971-02-02

    申请号:US3560166D

    申请日:1968-02-05

    Inventor: WALLES WILHELM E

    CPC classification number: B01J15/00

    Abstract: A SYSTEM AND APPARATUS FOR EFFECTING THE CONTINUOUS CHEMICAL TREATMENT OF SUBSTRATES BY LAYERS OF TWO CHEMICAL REACTANTS HAVING DIFFERENT DENSITIES, ONE LIGHTER THAN AIR AND ONE HEAVIER THAN AIR IS DESCRIBED. THE SUBSTRATES ARE LED INTO A VERTICAL CONTAINER HAVING TWO SECTIONS, ONE SECTION HAVING ONE REACTANT, THEN INTO A LAYER OF AIR SEPARATING THE REACTANTS AND THEN INTO THE SECOND SECTION HAVING THE OTHER REACTANT. THE LAYERS OF REACTANTS ARE ESTABLISHED BY VERTICAL WALLS OF A PREDETERMINED HEIGHT AND EXCESS REACTANTS ARE REMOVED BY MEANS OF INTERIOR OR EXTERIOR CHANNELS IN THE SYSTEM.

    Reactor for producing polycrystalline silicon using the monosilane process
    17.
    发明授权
    Reactor for producing polycrystalline silicon using the monosilane process 有权
    使用单硅烷工艺生产多晶硅的反应器

    公开(公告)号:US08858894B2

    公开(公告)日:2014-10-14

    申请号:US13144715

    申请日:2009-10-09

    CPC classification number: B01J15/00 B01J19/24 B01J2219/00078 C01B33/035

    Abstract: A reactor that produces polycrystalline silicon using a monosilane process includes a reactor base plate having a multiplicity of nozzles formed therein through which a silicon-containing gas flows, a plurality of filament rods mounted on the reactor base plate, and a gas outlet opening located at a selected distance from the nozzles to feed used monosilane to an enrichment and/or treatment stage, wherein the gas outlet opening is formed at a free end of an inner tube, the inner tube is conducted through the reactor base plate, and the inner tube has an outer wall and an inner wall and thus forms an intermediate space in which at least one cooling water circuit is conducted.

    Abstract translation: 使用单硅烷工艺制造多晶硅的反应器包括反应器基板,其具有形成在其中的多个喷嘴,含硅气体通过该喷嘴形成,安装在反应器基板上的多个细丝棒和位于反应器基板上的气体出口 从喷嘴选择的距离,将使用的甲硅烷进料到富集和/或处理阶段,其中气体出口开口形成在内管的自由端,内管通过反应器底板,内管 具有外壁和内壁,从而形成至少一个冷却水回路的中间空间。

    Gas generator
    19.
    发明授权
    Gas generator 有权
    气体发生器

    公开(公告)号:US08616128B2

    公开(公告)日:2013-12-31

    申请号:US13267410

    申请日:2011-10-06

    CPC classification number: B01J7/00 B01J15/00

    Abstract: A gas generator assembly and method of operation. A plurality of stacks of laterally adjacent and laterally and axially supported gas generant wafers are contained within a housing. An igniter material is placed between the wafer stacks and an initiator. Upon ignition of the igniter material by the initiator, the wafer stacks are ignited and combust, generating a gas which, when reaching sufficient pressure within the housing in excess of ambient exterior pressures, opens a closed exhaust gas port and is released into a gas discharge structure where the gas passes through a heat sink material, cooling the gas before it exits the gas discharge structure for an intended use.

    Abstract translation: 一种气体发生器组件及其操作方法。 横向相邻和侧向和轴向支撑的气体发生剂晶片的多个堆叠被包含在壳体内。 将点火器材料放置在晶片堆叠和引发器之间。 当点火器材料被引发器点燃时,晶片堆叠被点燃并燃烧,产生一种气体,当达到超过外部外部压力的壳体内的足够压力时,打开一个封闭的废气端口并释放到气体放电 气体通过散热材料的结构,在气体离开气体排出结构之前将其用于预期用途。

    Method for Producing High-Purity Granular Silicon
    20.
    发明申请
    Method for Producing High-Purity Granular Silicon 审中-公开
    生产高纯度粒状硅的方法

    公开(公告)号:US20130337186A1

    公开(公告)日:2013-12-19

    申请号:US13969563

    申请日:2013-08-17

    Applicant: Xi Chu

    Inventor: Xi Chu

    Abstract: The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a heating unit; an external exhaust gas processing unit connected between a preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit and a dynamics generating unit. The reaction is through decomposition of silicon-containing gas in densely stacked high purity granular silicon layer reaction bed in relative motion, and to use remaining heat of exhaust gas for reheating. The present invention achieves a large scale, efficient, energy saving, continuous, low cost production of high purity silicon granules.

    Abstract translation: 本发明提供一种制备高纯度硅颗粒的反应器和方法。 反应器包括反应室; 反应室配有固体进料口,辅助进气口,原料气进口和废气出口。 反应室还配有内部气体分配器; 加热单元 连接在预热单元和气体入口之间的外部废气处理单元。 反应室还配备有表面整理单元,加热单元和动力学生成单元。 反应是通过相对运动的密集层叠的高纯度粒状硅层反应床中的含硅气体的分解,并且使用废气的剩余热量进行再加热。 本发明实现了高纯度硅颗粒的大规模,高效,节能,连续,低成本的生产。

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