Abstract:
Finely particulate silicon oxides are produced from coarse particulate silicon dioxide using a liquid stabilized plasma burner. Hydrocarbons are used as the stabilizing liquid, and the coarse particulate silicon dioxide is reduced by the hydrocarbon plasma jet leaving the plasma burner, and a part of the hydrocarbon which is evaporated and decomposed in the arc zone is withdrawn together with the liquid hydrocarbon stabilizing medium, which is recycled, separated from the liquid, and used as carrier gas for feeding the coarse particulate silicon dioxide. Finely particulate silicon monoxide is initially formed, and may be recovered as such, or oxidized at the anode of the plasma burner to silicon dioxide.
Abstract:
A SYSTEM AND APPARATUS FOR EFFECTING THE CONTINUOUS CHEMICAL TREATMENT OF SUBSTRATES BY LAYERS OF TWO CHEMICAL REACTANTS HAVING DIFFERENT DENSITIES, ONE LIGHTER THAN AIR AND ONE HEAVIER THAN AIR IS DESCRIBED. THE SUBSTRATES ARE LED INTO A VERTICAL CONTAINER HAVING TWO SECTIONS, ONE SECTION HAVING ONE REACTANT, THEN INTO A LAYER OF AIR SEPARATING THE REACTANTS AND THEN INTO THE SECOND SECTION HAVING THE OTHER REACTANT. THE LAYERS OF REACTANTS ARE ESTABLISHED BY VERTICAL WALLS OF A PREDETERMINED HEIGHT AND EXCESS REACTANTS ARE REMOVED BY MEANS OF INTERIOR OR EXTERIOR CHANNELS IN THE SYSTEM.
Abstract:
A reactor that produces polycrystalline silicon using a monosilane process includes a reactor base plate having a multiplicity of nozzles formed therein through which a silicon-containing gas flows, a plurality of filament rods mounted on the reactor base plate, and a gas outlet opening located at a selected distance from the nozzles to feed used monosilane to an enrichment and/or treatment stage, wherein the gas outlet opening is formed at a free end of an inner tube, the inner tube is conducted through the reactor base plate, and the inner tube has an outer wall and an inner wall and thus forms an intermediate space in which at least one cooling water circuit is conducted.
Abstract:
A module for a solid/heat-transfer gas reactor, including a plurality of diffusers each including a top portion supporting the solid reagent, and a portion for diffusing reactive/heat-transfer gas, situated under the top portion.
Abstract:
A gas generator assembly and method of operation. A plurality of stacks of laterally adjacent and laterally and axially supported gas generant wafers are contained within a housing. An igniter material is placed between the wafer stacks and an initiator. Upon ignition of the igniter material by the initiator, the wafer stacks are ignited and combust, generating a gas which, when reaching sufficient pressure within the housing in excess of ambient exterior pressures, opens a closed exhaust gas port and is released into a gas discharge structure where the gas passes through a heat sink material, cooling the gas before it exits the gas discharge structure for an intended use.
Abstract:
The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a heating unit; an external exhaust gas processing unit connected between a preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit and a dynamics generating unit. The reaction is through decomposition of silicon-containing gas in densely stacked high purity granular silicon layer reaction bed in relative motion, and to use remaining heat of exhaust gas for reheating. The present invention achieves a large scale, efficient, energy saving, continuous, low cost production of high purity silicon granules.