公开(公告)号：US11056309B2

公开(公告)日：2021-07-06

申请号：US16348800

申请日：2017-11-27

申请人： mi2-factory GmbH

发明人： Florian Krippendorf ,  Constantin Csato

IPC分类号： H01J37/05 ,  C23C14/18 ,  C23C14/48 ,  H01J37/147 ,  H01J37/20 ,  H01J37/317 ,  H01L21/04 ,  H01L29/32 ,  H01L21/265

摘要： A method comprising the irradiation of a wafer by an ion beam that passes through an implantation filter, the ion beam being electrostatically deviated in a first direction and a second direction in order to move the ion beam over the wafer, and the implantation filter being moved in the second direction to match the movement of the ion beam.

公开(公告)号：US11043353B2

公开(公告)日：2021-06-22

申请号：US16827156

申请日：2020-03-23

申请人： JEOL Ltd.

发明人： Kazuya Omoto

IPC分类号： H01J37/05

摘要： An energy filter has a plurality of sector magnets which are configured symmetrically with respect to a symmetry plane, and forms a real image on the symmetry plane. The energy filter include: an entrance aperture provided with a slit having a longitudinal direction in a direction perpendicular to an energy dispersion direction; and a hexapole and a quadrupole disposed on the symmetry plane.

公开(公告)号：US11024484B2

公开(公告)日：2021-06-01

申请号：US16635725

申请日：2018-08-01

申请人： Gatan, Inc.

发明人： Edward Michael James ,  Ray Dudley Twesten

IPC分类号： H01J37/26 ,  H01J37/22 ,  H01J37/24 ,  H01J37/05 ,  H01J37/244

摘要： A system and method are disclosed for acquiring Electron Energy Loss Spectrometry (EELS) spectra in a transmission electron microscope. The inventive system and method maximize spectrum acquisition rate and duty cycle by exposing a first portion of an image sensor to a first spectrum while a previously exposed potion of the sensor is read out of the sensor during some or all of the exposure time.

公开(公告)号：US20210159047A1

公开(公告)日：2021-05-27

申请号：US17097199

申请日：2020-11-13

申请人： RaySearch Laboratories AB

发明人： Martin JANSON

IPC分类号： H01J37/304 ,  H01J37/05

摘要： It is provided a method for obtaining an energy spectrum of a focused ion beam when a Bragg peak chamber is used to measure an integrated depth dose, IDD. The method comprises the steps of: simulating doses of a set of nominally mono energetic focused ion beams; determining a lateral extension of a Bragg peak chamber to evaluate; calculating a set of theoretic component IDD curves, CIDDs, by laterally integrating the dose of the simulated set of the nominally mono energetic focused ion beams, over the lateral extension of the Bragg peak chamber; storing calculated CIDDs; obtaining a measured IDD of a focused ion beam with a nominal energy using the Bragg peak chamber; and performing a fit of a linear combination of CIDDs to the measured IDD, to determine an energy spectrum for the focused ion beam with the nominal beam energy.

公开(公告)号：US10923308B1

公开(公告)日：2021-02-16

申请号：US16677164

申请日：2019-11-07

申请人： FEI Company

发明人： Yuchen Deng ,  Peter Christiaan Tiemeijer ,  Holger Kohr ,  Jaydeep Sanjay Belapure

IPC分类号： H01J37/05 ,  H01J37/26 ,  H01J37/244

摘要： Various methods and systems are provided for generating an energy resolved chroma image of a sample. Upon irradiated by a charged particle beam, scattered charged particles from the sample are directed to form a first image before entering a spectrometer. The scattered charged particles are then dispersed based on their energy when passing through the spectrometer. The dispersed particles form a second image on a detector. The scattered particles at each location of the first image is spread along a corresponding energy spread vector in the second image.

公开(公告)号：US20210035774A1

公开(公告)日：2021-02-04

申请号：US16911518

申请日：2020-06-25

申请人： NISSIN ION EQUIPMENT CO., LTD.

发明人： Yutaka Inouchi

IPC分类号： H01J37/244 ,  H01J37/05 ,  H01J37/10

摘要： A beam profile determination method and ion implantation apparatus implanting the same is provided. The method includes measuring a beam profile of an ion beam in a direction orthogonal to a scanning direction of a substrate and a traveling direction of the ion beam; computing, based on the measured beam profile, a uniformity of a dose distribution of a part of the ion beam with which a surface of the substrate is irradiated when the substrate is scanned; and comparing the computed uniformity of the dose distribution with a first reference value to determine an adequacy of the beam profile of the ion beam.

公开(公告)号：US20210020399A1

公开(公告)日：2021-01-21

申请号：US16542731

申请日：2019-08-16

申请人： APPLIED Materials, Inc.

发明人： Alexandre Likhanskii ,  Shengwu Chang ,  Frank Sinclair ,  Antonella Cucchetti ,  Eric D Hermanson ,  Christopher Campbell

IPC分类号： H01J37/12 ,  H01J37/317 ,  H01J37/05

摘要： Provided herein are approaches for increasing operational range of an electrostatic lens. An electrostatic lens of an ion implantation system may receive an ion beam from an ion source, the electrostatic lens including a first plurality of conductive beam optics disposed along one side of an ion beam line and a second plurality of conductive beam optics disposed along a second side of the ion beam line. The ion implantation system may further include a power supply in communication with the electrostatic lens, the power supply operable to supply a voltage and a current to at least one of the first and second plurality of conductive beam optics, wherein the voltage and the current deflects the ion beam at a beam deflection angle, and wherein the ion beam is accelerated and then decelerated within the electrostatic lens.

公开(公告)号：US10861669B2

公开(公告)日：2020-12-08

申请号：US16665826

申请日：2019-10-28

申请人： Peter F. Vandermeulen

发明人： Peter F. Vandermeulen

IPC分类号： H01J37/14 ,  H01J37/05 ,  H01J37/08 ,  H01J37/147 ,  H01J37/317 ,  H01L31/20 ,  H01L31/18 ,  H05H1/46 ,  H01J37/32

摘要： An ion beam treatment or implantation system includes an ion source emitting a plurality of parallel ion beams having a given spacing. A first lens magnet having a non-uniform magnetic field receives the plurality of ion beams from the ion source and focuses the plurality of ion beams toward a common point. The system may optionally include a second lens magnet having a non-uniform magnetic field receiving the ion beams focused by the first lens magnet and redirecting the ion beams such that they have a parallel arrangement having a closer spacing than said given spacing in a direction toward a target substrate.

公开(公告)号：US10811215B2

公开(公告)日：2020-10-20

申请号：US16416447

申请日：2019-05-20

申请人： Carl Zeiss MultiSEM GmbH

发明人： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

IPC分类号： H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

摘要： A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

公开(公告)号：US20200321190A1

公开(公告)日：2020-10-08

申请号：US16956858

申请日：2018-12-13

申请人： Battelle Memorial Institute

发明人： Yehia M. Ibrahim ,  Richard D. Smith

IPC分类号： H01J37/317 ,  H01J37/08 ,  H01J37/21 ,  H01J37/05 ,  H01J49/06

摘要： Apparatus include a plurality of electrode arrangements spaced apart from each other opposite an ion propagation axis and defining an ion transfer channel that extends along the ion propagation axis that tapers between an input end that is situated to receive ions and an output end that is situated to couple the received ions to an input end of an ion guide. Methods include positioning a plurality of electrode arrangements at oblique angles opposite an ion propagation axis so as to form a ion transfer channel that tapers between an input end and an output end, and coupling the output end of the ion transfer channel to an input end of an ion optical element so as to direct ions in the ion transfer channel into the ion optical element. Related systems are also disclosed.