Scanning systems
    191.
    发明授权
    Scanning systems 有权
    扫描系统

    公开(公告)号:US09429530B2

    公开(公告)日:2016-08-30

    申请号:US14142286

    申请日:2013-12-27

    CPC classification number: G01N23/201 G01V5/0041

    Abstract: The present application discloses methods and systems for scanning an object. The scanning system provides a first detector region having a thickness of at least 2 mm and a second detector region having a thickness of at least 5 mm. The second detector region is arranged to receive radiation that has passed through the first detector region. The method includes irradiating the object with radiation having having a peak energy of at least 1 MeV, and detecting the first profile radiation after it has interacted with or passed through the object in order to provide information relating to the object.

    Abstract translation: 本申请公开了用于扫描对象的方法和系统。 扫描系统提供厚度至少为2mm的第一检测器区域和厚度至少为5mm的第二检测器区域。 第二检测器区域被布置成接收已经通过第一检测器区域的辐射。 该方法包括用具有至少1MeV的峰值能量的辐射照射物体,以及在与物体相互作用或通过物体之后检测第一轮廓辐射,以提供与物体有关的信息。

    X-RAY SCATTEROMETRY APPARATUS
    192.
    发明申请
    X-RAY SCATTEROMETRY APPARATUS 有权
    X射线扫描仪

    公开(公告)号:US20150369759A1

    公开(公告)日:2015-12-24

    申请号:US14735162

    申请日:2015-06-10

    CPC classification number: G01N23/201 G01N2223/6116

    Abstract: Apparatus, including a sample-support that retains a sample in a plane having an axis, the plane defining first and second regions separated by the plane. A source-mount in the first region rotates about the axis, and an X-ray source on the source-mount directs first and second incident beams of X-rays to impinge on the sample at first and second angles along beam axes that are orthogonal to the axis. A detector-mount in the second region moves in a plane orthogonal to the axis and an X-ray detector on the detector-mount receives first and second diffracted beams of X-rays transmitted through the sample in response to the first and second incident beams, and outputs first and second signals, respectively, in response to the received first and second diffracted beams. A processor analyzes the first and the second signals so as to determine a profile of a surface of the sample.

    Abstract translation: 一种装置,包括将样品保持在具有轴的平面中的样品支撑体,所述平面限定由平面分隔的第一和第二区域。 第一区域中的源极安装围绕轴线旋转,源极安装座上的X射线源引导X射线的第一和第二入射光束沿着正交的束轴以第一和第二角度以第一和第二角度撞击在样品上 到轴。 第二区域中的检测器安装件在与轴线正交的平面中移动,并且检测器安装座上的X射线检测器响应于第一和第二入射光束接收通过样品传输的第一和第二衍射光束的X射线 并且响应于接收到的第一和第二衍射光束分别输出第一和第二信号。 处理器分析第一和第二信号,以便确定样品表面的轮廓。

    Scatterometry-Based Imaging and Critical Dimension Metrology
    193.
    发明申请
    Scatterometry-Based Imaging and Critical Dimension Metrology 有权
    基于Scatterometry的成像和关键尺寸计量学

    公开(公告)号:US20150300965A1

    公开(公告)日:2015-10-22

    申请号:US14690442

    申请日:2015-04-19

    CPC classification number: G01N23/201 G01N2223/611 G01N2223/645 H01L22/12

    Abstract: Methods and systems for performing measurements of semiconductor structures and materials based on scatterometry measurement data are presented. Scatterometry measurement data is used to generate an image of a material property of a measured structure based on the measured intensities of the detected diffraction orders. In some examples, a value of a parameter of interest is determined directly from the map of the material property of the measurement target. In some other examples, the image is compared to structural characteristics estimated by a geometric, model-based parametric inversion of the same measurement data. Discrepancies are used to update the geometric model of the measured structure and improve measurement performance. This enables a metrology system to converge on an accurate parametric measurement model when there are significant deviations between the actual shape of a manufactured structure subject to model-based measurement and the modeled shape of the structure.

    Abstract translation: 介绍了基于散射测量数据进行半导体结构和材料测量的方法和系统。 散射测量测量数据用于基于检测到的衍射级的测量强度来生成测量结构的材料特性的图像。 在一些示例中,直接从测量对象的材料属性的映射确定感兴趣的参数的值。 在一些其他示例中,将图像与通过相同测量数据的几何,基于模型的参数反演估计的结构特征进行比较。 差异用于更新测量结构的几何模型,并提高测量性能。 当使基于模型的测量的制造结构的实际形状与结构的建模形状之间存在显着的偏差时,这使测量系统能够收敛于精确的参数测量模型。

    APPARATUS AND METHODS FOR LOW TEMPERATURE SMALL ANGLE X-RAY SCATTERING
    194.
    发明申请
    APPARATUS AND METHODS FOR LOW TEMPERATURE SMALL ANGLE X-RAY SCATTERING 有权
    低温小角度X射线散射的装置和方法

    公开(公告)号:US20150233804A1

    公开(公告)日:2015-08-20

    申请号:US14405253

    申请日:2013-06-04

    CPC classification number: G01N1/42 G01N23/201 G01N2223/3103

    Abstract: Apparatus and methods for performing small angle X-ray scattering (SAXS) at low (cryogenic) temperatures for determining the structure of and changes in the structure of proteins, DNA, RNA, and other biological molecules and biomolecular assemblies and structures. A cryogenic, small angle X-ray scattering (SAXS) application sample holder, includes a sample cell including a base portion and at least two parallel walls disposed on the base, wherein the sample cell has a liquid volume capacity defined by the walls and the base portion of 0.001 to 10 microliters. A method for performing cryogenic SAXS on a sample includes the steps of providing a sample biomolecule solution containing an aqueous buffer, a biomolecule, and a cryoprotectant agent, wherein the cryoprotectant agent comprises up to 60% (w/w) of the biomolecule solution, and other known components as necessary to solubilize and stabilize the biomolecule, in a sample holder of claim 1 or 18, cryogenically cooling the sample solution in the sample holder at a rate equal to or greater than 100 K/sec without ice formation, and examining the cooled sample using small angle X-ray scattering by passing a beam of X-rays through the sample.

    Abstract translation: 用于在低(低温)温度下进行小角度X射线散射(SAXS)的装置和方法,用于确定蛋白质,DNA,RNA和其他生物分子和生物分子组装和结构的结构和结构的变化。 一种低温,小角度X射线散射(SAXS)应用样品架,包括一个样品池,该样品池包括一个基底部分和至少两个设置在基底上的平行壁,其中样品池具有由壁和 基底部分为0.001至10微升。 在样品上进行低温SAXS的方法包括提供含有水性缓冲液,生物分子和冷冻保护剂的样品生物分子溶液的步骤,其中冷冻保护剂包含高达60%(w / w)的生物分子溶液, 和其它已知的成分,以溶解和稳定生物分子,如权利要求1或18所述的样品保持器,以等于或大于100K /秒的速率在样品保持器内低温冷却而不形成冰,并检查 通过使X射线束穿过样品,使用小角度X射线散射的冷却样品。

    Determining a material property based on scattered radiation
    195.
    发明授权
    Determining a material property based on scattered radiation 有权
    确定基于散射辐射的材料性质

    公开(公告)号:US09086366B2

    公开(公告)日:2015-07-21

    申请号:US13766239

    申请日:2013-02-13

    Abstract: Radiation is directed at an object, and radiation scattered by the object is sensed. An angular distribution of scatter in the sensed scattered radiation relative to a path of the radiation directed at the object is determined, and the angular distribution is evaluated. One or more atomic numbers, or effective atomic numbers, of materials composing the object is determined based on evaluating the angular distribution.

    Abstract translation: 辐射指向物体,并且感测被物体散射的辐射。 确定感测的散射辐射相对于朝向物体的辐射的路径的角度分布,并且评估角度分布。 基于评估角分布来确定构成对象的材料的一个或多个原子数或有效原子序数。

    MEASUREMENT APPARATUS AND MEASUREMENT METHOD
    196.
    发明申请
    MEASUREMENT APPARATUS AND MEASUREMENT METHOD 审中-公开
    测量装置和测量方法

    公开(公告)号:US20150012239A1

    公开(公告)日:2015-01-08

    申请号:US14021127

    申请日:2013-09-09

    CPC classification number: G01N9/24 G01N23/201 H01L22/12

    Abstract: In accordance with an embodiment, a measurement apparatus includes a stage to hold a substrate, an electromagnetic wave applying unit, a detector, and first and second calculation units. The electromagnetic wave applying unit generates electromagnetic waves and applies it to the substrate. The detector detects the electromagnetic waves scattered or reflected by the substrate and measure the intensity of the electromagnetic waves. The first calculation unit processes a signal from the detector to create a first reflectance profile, fit the first reflectance profile to a second reflectance profile prepared by a simulation, thereby calculating thickness and density of an analytic model which is set so that the periodic structure and the membranous structure are regarded as a single mixed layer. The second calculation unit calculates, from a sectional shape of the periodic structure and the calculated thickness and density, the density of the second material after a volume change.

    Abstract translation: 根据实施例,测量装置包括保持基板的台,电磁波施加单元,检测器以及第一和第二计算单元。 电磁波施加单元产生电磁波并将其施加到基板。 检测器检测由基板散射或反射的电磁波,并测量电磁波的强度。 第一计算单元处理来自检测器的信号以产生第一反射率分布,将第一反射率分布拟合到通过模拟准备的第二反射率分布,从而计算分析模型的厚度和密度,其被设置为使得周期性结构和 膜结构被认为是单一的混合层。 第二计算单元根据周期性结构的截面形状和计算出的厚度和密度,计算体积变化后的第二材料的密度。

    METHOD OF EVALUATING NEUTRON SCATTERING LENGTH DENSITY
    197.
    发明申请
    METHOD OF EVALUATING NEUTRON SCATTERING LENGTH DENSITY 有权
    评估中子散射​​长度密度的方法

    公开(公告)号:US20140341354A1

    公开(公告)日:2014-11-20

    申请号:US14268454

    申请日:2014-05-02

    Inventor: Ryo MASHITA

    CPC classification number: G01N23/202 G01N23/201

    Abstract: The present invention provides a method of evaluating the neutron scattering length density, capable of accurately determining the neutron scattering length density. The present invention relates to a method of evaluating the neutron scattering length density of scatterers in a material, including determining the neutron scattering length density based on a scattering intensity curve obtained by neutron scattering measurement, with use of a scattering intensity curve obtained by X-ray scattering measurement.

    Abstract translation: 本发明提供了一种能够准确地确定中子散射长度密度的中子散射长度密度的评估方法。 本发明涉及一种评估材料中散射体的中子散射长度密度的方法,其包括通过使用由X射线衍射仪获得的散射强度曲线,基于通过中子散射测量获得的散射强度曲线确定中子散射长度密度, 射线散射测量。

    X-ray analyzing system for x-ray scattering analysis
    198.
    发明申请
    X-ray analyzing system for x-ray scattering analysis 有权
    用于X射线散射分析的X射线分析系统

    公开(公告)号:US20140270079A1

    公开(公告)日:2014-09-18

    申请号:US14198611

    申请日:2014-03-06

    Abstract: An X-ray analyzing system for x-ray scattering analysis having an x-ray source for generating a beam of x-rays propagating along a transmission axis (3), at least one hybrid slit (5b) with an aperture which defines the shape of the cross section of the beam, a sample on which the beam shaped by the hybrid slit (5b) is directed and an X-ray detector for detecting x-rays originating from the sample. The hybrid slit (5b) has at least three hybrid slit elements (7), each hybrid slit element (7) having a single crystal substrate (8) bonded to a base (9) with a taper angle α≠0. The single crystal substrates (8) of the hybrid slit elements (7) limit the aperture and the hybrid slit elements (7) are staggered with an offset along the transmission axis (3). The X-ray analyzing system has improved resolution and signal to noise ratio.

    Abstract translation: 一种用于x射线散射分析的X射线分析系统,具有用于产生沿着透射轴(3)传播的x射线束的x射线源,至少一个具有限定形状的孔的混合狭缝(5b) 的横截面,其上由混合狭缝(5b)成形的光束被引导到其上的样品和用于检测源自样品的X射线的X射线检测器。 混合狭缝(5b)具有至少三个混合狭缝元件(7),每个混合狭缝元件(7)具有以锥角α≠0接合到基座(9)的单晶基板(8)。 混合狭缝元件(7)的单晶基板(8)限制孔径,并且混合狭缝元件(7)沿着透射轴线(3)偏移地交错。 X射线分析系统具有改善的分辨率和信噪比。

    METHOD AND APPARATUS FOR SURFACE MAPPING USING IN-PLANE GRAZING INCIDENCE DIFFRACTION
    199.
    发明申请
    METHOD AND APPARATUS FOR SURFACE MAPPING USING IN-PLANE GRAZING INCIDENCE DIFFRACTION 有权
    使用平面衍射发生衍射的表面贴图的方法和装置

    公开(公告)号:US20140192959A1

    公开(公告)日:2014-07-10

    申请号:US13735509

    申请日:2013-01-07

    Inventor: Jonathan Giencke

    Abstract: An apparatus for examining the surface of a crystalline sample uses in-plane grazing incidence diffraction with a position-sensitive detector. The x-ray source illuminates an extended region of the sample and, for crystal sections having the appropriate lattice orientation, an elongated diffraction signal is produced. The relative position of the sample and the x-ray beam may then be changed to illuminate different regions of the sample so that the diffraction signal corresponds to these other regions. By scanning across the entire sample, a spatial profile of the sample surface may be generated. The system may be used to locate crystal boundaries, defects, or the presence of attenuating materials on the sample surface.

    Abstract translation: 用于检查结晶样品的表面的装置使用位置敏感检测器进行平面内掠入射衍射。 x射线源照射样品的延伸区域,并且对于具有适当晶格取向的晶体部分,产生细长的衍射信号。 然后可以改变样品和x射线束的相对位置以照射样品的不同区域,使得衍射信号对应于这些其它区域。 通过扫描整个样品,可以产生样品表面的空间分布。 该系统可用于在样品表面上定位晶体边界,缺陷或衰减材料的存在。

    Scanning Systems
    200.
    发明申请
    Scanning Systems 有权
    扫描系统

    公开(公告)号:US20140185771A1

    公开(公告)日:2014-07-03

    申请号:US14142286

    申请日:2013-12-27

    CPC classification number: G01N23/201 G01V5/0041

    Abstract: The present application discloses methods and systems for scanning an object. The scanning system provides a first detector region having a thickness of at least 2 mm and a second detector region having a thickness of at least 5 mm. The second detector region is arranged to receive radiation that has passed through the first detector region. The method includes irradiating the object with radiation having having a peak energy of at least 1 MeV, and detecting the first profile radiation after it has interacted with or passed through the object in order to provide information relating to the object.

    Abstract translation: 本申请公开了用于扫描对象的方法和系统。 扫描系统提供厚度至少为2mm的第一检测器区域和厚度至少为5mm的第二检测器区域。 第二检测器区域被布置成接收已经通过第一检测器区域的辐射。 该方法包括用具有至少1MeV的峰值能量的辐射照射物体,以及在与物体相互作用或通过物体之后检测第一轮廓辐射,以提供与物体有关的信息。

Patent Agency Ranking