Raman signal-enhancing structures for Raman spectroscopy and methods for performing Raman spectroscopy
    201.
    发明申请
    Raman signal-enhancing structures for Raman spectroscopy and methods for performing Raman spectroscopy 有权
    用于拉曼光谱的拉曼信号增强结构和用于进行拉曼光谱的方法

    公开(公告)号:US20080180662A1

    公开(公告)日:2008-07-31

    申请号:US11701045

    申请日:2007-01-31

    CPC classification number: G01J3/44 G01N21/658

    Abstract: Raman systems include a radiation source, a radiation detector configured to detect Raman scattered radiation, and a Raman signal-enhancing structure. The Raman signal-enhancing structure includes a first layer of Raman signal-enhancing material, a substantially monomolecular layer of molecules disposed on at least a portion of the first layer of Raman signal-enhancing material, and a second layer of Raman signal-enhancing material disposed on at least a portion of the substantially monomolecular layer of molecules. The second layer of Raman signal-enhancing material is disposed on a side of the layer of molecules opposite the first layer of Raman signal-enhancing material. Methods of performing Raman spectroscopy include providing such a Raman signal-enhancing structure, providing an analyte on the Raman signal-enhancing structure, irradiating the analyte and the structure, and detecting Raman scattered radiation.

    Abstract translation: 拉曼系统包括辐射源,被配置为检测拉曼散射辐射的辐射检测器和拉曼信号增强结构。 拉曼信号增强结构包括第一层拉曼信号增强材料,设置在第一层拉曼信号增强材料的至少一部分上的基本上单分子层的分子,以及第二层拉曼信号增强材料 设置在分子的基本单分子层的至少一部分上。 第二层拉曼信号增强材料设置在与第一层拉曼信号增强材料相对的分子层的一侧。 执行拉曼光谱的方法包括提供这样的拉曼信号增强结构,在拉曼信号增强结构上提供分析物,照射分析物和结构,以及检测拉曼散射辐射。

    Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS)
    202.
    发明授权
    Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS) 有权
    用于纳米增强拉曼光谱(NERS)的纳米结构,系统和方法

    公开(公告)号:US07388661B2

    公开(公告)日:2008-06-17

    申请号:US11584446

    申请日:2006-10-20

    CPC classification number: G01J3/44 B82Y15/00 G01N21/658

    Abstract: NERS-active structures for use in Raman spectroscopy include protrusions extending from a surface of a substrate. A Raman signal-enhancing material is disposed on at least one surface of a first protrusion and at least one surface of a second protrusion. The Raman signal-enhancing material disposed on the first protrusion projects laterally in a direction generally towards the second protrusion, and the Raman signal-enhancing material disposed on the second protrusion projects laterally in a direction generally towards the first protrusion. At least a portion of the Raman signal-enhancing projecting from the first protrusion and at least a portion of the Raman signal-enhancing material projecting from the second protrusion may be separated by a distance of less than about 10 nanometers. Raman spectroscopy systems include such NERS-active structures, and methods for performing Raman spectroscopy include irradiating an analyte proximate such a NERS-active structure and detecting Raman-scattered radiation scattered by the analyte.

    Abstract translation: 用于拉曼光谱的NERS-活性结构包括从基底表面延伸的突起。 拉曼信号增强材料设置在第一突起的至少一个表面和第二突起的至少一个表面上。 设置在第一突起上的拉曼信号增强材料在大致朝向第二突起的方向上横向突出,并且设置在第二突起上的拉曼信号增强材料在大致朝向第一突起的方向上横向突出。 从第一突起突出的拉曼增强信号的至少一部分和从第二突起突出的拉曼增强材料的至少一部分可以分开小于约10纳米的距离。 拉曼光谱系统包括这样的NERS-活性结构,并且用于进行拉曼光谱的方法包括照射靠近这样的NERS-活性结构的分析物并检测被分析物散射的拉曼散射辐射。

    NANOSCALE STRUCTURES, SYSTEMS, AND METHODS FOR USE IN NANO-ENHANCED RAMAN SPECTROSCOPY (NERS)
    203.
    发明申请
    NANOSCALE STRUCTURES, SYSTEMS, AND METHODS FOR USE IN NANO-ENHANCED RAMAN SPECTROSCOPY (NERS) 有权
    在纳米增强拉曼光谱(NERS)中使用的纳米结构,系统和方法

    公开(公告)号:US20080094621A1

    公开(公告)日:2008-04-24

    申请号:US11584446

    申请日:2006-10-20

    CPC classification number: G01J3/44 B82Y15/00 G01N21/658

    Abstract: NERS-active structures for use in Raman spectroscopy include protrusions extending from a surface of a substrate. A Raman signal-enhancing material is disposed on at least one surface of a first protrusion and at least one surface of a second protrusion. The Raman signal-enhancing material disposed on the first protrusion projects laterally in a direction generally towards the second protrusion, and the Raman signal-enhancing material disposed on the second protrusion projects laterally in a direction generally towards the first protrusion. At least a portion of the Raman signal-enhancing projecting from the first protrusion and at least a portion of the Raman signal-enhancing material projecting from the second protrusion may be separated by a distance of less than about 10 nanometers. Raman spectroscopy systems include such NERS-active structures, and methods for performing Raman spectroscopy include irradiating an analyte proximate such a NERS-active structure and detecting Raman-scattered radiation scattered by the analyte.

    Abstract translation: 用于拉曼光谱的NERS-活性结构包括从基底表面延伸的突起。 拉曼信号增强材料设置在第一突起的至少一个表面和第二突起的至少一个表面上。 设置在第一突起上的拉曼信号增强材料在大致朝向第二突起的方向上横向突出,并且设置在第二突起上的拉曼信号增强材料在大致朝向第一突起的方向上横向突出。 从第一突起突出的拉曼增强信号的至少一部分和从第二突起突出的拉曼增强材料的至少一部分可以分开小于约10纳米的距离。 拉曼光谱系统包括这样的NERS-活性结构,并且用于进行拉曼光谱的方法包括照射靠近这样的NERS-活性结构的分析物并检测被分析物散射的拉曼散射辐射。

    Alignment for contact lithography
    204.
    发明申请
    Alignment for contact lithography 审中-公开
    接触光刻对准

    公开(公告)号:US20080090160A1

    公开(公告)日:2008-04-17

    申请号:US11580639

    申请日:2006-10-13

    Abstract: A contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and a sensor disposed on the patterning tool for sensing a magnetic pattern disposed on the substrate to determine alignment between the patterning tool and the substrate. A method of aligning a patterning tool of a contact lithography system with a substrate includes detecting a pattern of magnetic material on the substrate with a sensor on the patterning tool to determine alignment of the patterning tool with respect to the substrate.

    Abstract translation: 接触光刻系统包括具有用于转移到衬底的图案的图案形成工具; 以及设置在所述图案形成工具上的传感器,用于感测设置在所述衬底上的磁性图案,以确定所述图案形成工具和所述衬底之间的对 将接触式光刻系统的图案形成工具对准衬底的方法包括在图案形成工具上用传感器检测衬底上的磁性材料的图案,以确定图案形成工具相对于衬底的对准。

    SERS-active structures having nanoscale dimensions
    205.
    发明授权
    SERS-active structures having nanoscale dimensions 有权
    具有纳米级尺寸的SERS活性结构

    公开(公告)号:US07321422B2

    公开(公告)日:2008-01-22

    申请号:US10942482

    申请日:2004-09-16

    CPC classification number: G01N21/658

    Abstract: SERS-active structures including features having nanoscale dimensions are disclosed, including methods for forming such SERS-active structures and methods for forming a plurality of such SERS-active structures. Methods for performing SERS using SERS-active structures also are disclosed.

    Abstract translation: 公开了包括具有纳米级尺寸的特征的SERS活性结构,包括形成这种SERS-活性结构的方法和形成多个这样的SERS-活性结构的方法。 还公开了使用SERS活性结构来执行SERS的方法。

    Raman signal-enhancing structures and devices
    206.
    发明申请
    Raman signal-enhancing structures and devices 有权
    拉曼信号增强结构和器件

    公开(公告)号:US20070252982A1

    公开(公告)日:2007-11-01

    申请号:US11413910

    申请日:2006-04-28

    CPC classification number: G01N21/658 G01J3/44

    Abstract: Raman systems include a radiation source, a radiation detector, and a Raman device or signal-enhancing structure. Raman devices include a tunable resonant cavity and a Raman signal-enhancing structure coupled to the cavity. The cavity includes a first reflective member, a second reflective member, and an electro-optic material disposed between the reflective members. The electro-optic material exhibits a refractive index that varies in response to an applied electrical field. Raman signal-enhancing structures include a substantially planar layer of Raman signal-enhancing material having a major surface, a support structure extending from the major surface, and a substantially planar member comprising a Raman signal-enhancing material disposed on an end of the support structure opposite the layer of Raman signal-enhancing material. The support structure separates at least a portion of the planar member from the layer of Raman signal-enhancing material by a selected distance of less than about fifty nanometers.

    Abstract translation: 拉曼系统包括辐射源,辐射检测器和拉曼器件或信号增强结构。 拉曼器件包括耦合到空腔的可调谐谐振腔和拉曼信号增强结构。 空腔包括第一反射构件,第二反射构件和设置在反射构件之间的电光材料。 电光材料表现出响应于所施加的电场而变化的折射率。 拉曼信号增强结构包括具有主表面的基本平坦的拉曼信号增强材料层,从主表面延伸的支撑结构和包括设置在支撑结构的端部上的拉曼信号增强材料的基本上平面的构件 与拉曼信号增强材料层相对。 支撑结构将平面构件的至少一部分与拉曼信号增强材料层分开小于约五十纳米的选定距离。

    Multi-tiered network for gathering detected condition information
    208.
    发明申请
    Multi-tiered network for gathering detected condition information 有权
    用于收集检测到的条件信息的多层网络

    公开(公告)号:US20070103305A1

    公开(公告)日:2007-05-10

    申请号:US11269237

    申请日:2005-11-08

    CPC classification number: G06K7/0008 H04L67/12

    Abstract: A multi-tiered network for gathering detected condition information includes a first tier having first tier nodes and a second tier having a second tier node. The second tier node is operable to receive detected condition information from at least one of the first tier nodes in a substantially autonomous manner. In addition, the second tier node is operable to at least one of store, process, and transmit the detected condition information. The network also includes a third tier having a third tier node configured to receive the detected condition information and to at least one of store and process the detected condition information.

    Abstract translation: 用于收集检测到的条件信息的多层网络包括具有第一层节点的第一层和具有第二层节点的第二层。 第二层节点可操作以基本上自主的方式从至少一个第一层节点接收检测到的条件信息。 此外,第二层节点可操作以存储,处理和发送检测到的条件信息中的至少一个。 网络还包括第三层,其具有被配置为接收检测到的条件信息的第三层节点以及存储和处理检测到的条件信息中的至少一个。

    Contact lithography apparatus, system and method
    209.
    发明申请
    Contact lithography apparatus, system and method 审中-公开
    接触光刻设备,系统和方法

    公开(公告)号:US20070035717A1

    公开(公告)日:2007-02-15

    申请号:US11580621

    申请日:2006-10-13

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00 G03F7/7035

    Abstract: A contact lithography system includes a patterning tool bearing a pattern; a substrate chuck for chucking a substrate to receive the pattern from the patterning tool; where the system deflects a portion of either the patterning tool or the substrate to bring the patterning tool and a portion of the substrate into contact; and a stepper for repositioning either or both of the patterning tool and substrate to align the pattern with an additional portion of the substrate to also receive the pattern. A method of performing contact lithography comprising: deflecting a portion of either a patterning tool or a substrate to bring the patterning tool and a portion of the substrate into contact; and repositioning either or both of the patterning tool and substrate to align a pattern on the patterning tool with an additional portion of the substrate to also receive the pattern.

    Abstract translation: 接触光刻系统包括具有图案的图案形成工具; 用于夹持基板以从图案形成工具接收图案的基板卡盘; 其中所述系统使所述图案化工具或所述衬底的一部分偏转以使所述图案形成工具和所述衬底的一部分接触; 以及步进器,用于重新定位图案形成工具和衬底中的一个或两个,以使图案与衬底的附加部分对准以也接收图案。 一种执行接触光刻的方法,包括:使图案形成工具或衬底的一部分偏转以使所述图案化工具和所述衬底的一部分接触; 以及重新定位所述图案形成工具和衬底中的一个或两个,以将所述图案形成工具上的图案与所述衬底的附加部分对准以也接收所述图案。

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