公开(公告)号：US07354787B2

公开(公告)日：2008-04-08

申请号：US11096840

申请日：2005-03-30

Applicant: John L. Dunec ,  Eric Peeters ,  Armin R. Volkel ,  Michel A. Rosa ,  Dirk DeBruyker ,  Thomas Hantschel

Inventor： John L. Dunec ,  Eric Peeters ,  Armin R. Volkel ,  Michel A. Rosa ,  Dirk DeBruyker ,  Thomas Hantschel

IPC: H01L21/00

CPC classification number: B81B3/0008 ,  B81B3/0021 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0118 ,  B81B2203/058 ,  G02B26/0841 ,  H02N1/002

Abstract: A MEMS system including a fixed electrode and a suspended moveable electrode that is controllable over a wide range of motion. In traditional systems where an fixed electrode is positioned under the moveable electrode, the range of motion is limited because the support structure supporting the moveable electrode becomes unstable when the moveable electrode moves too close to the fixed electrode. By repositioning the fixed electrode from being directly underneath the moving electrode, a much wider range of controllable motion is achievable. Wide ranges of controllable motion are particularly important in optical switching applications.

Abstract translation: 一种MEMS系统，包括可在宽范围的运动中控制的固定电极和悬挂的可移动电极。 在固定电极位于可动电极下方的传统系统中，由于支撑可移动电极的支撑结构在可移动电极移动得太靠近固定电极时，运动范围受到限制。 通过将固定电极重新定位在移动电极的正下方，可以实现更宽范围的可控运动。 宽范围的可控运动在光交换应用中尤其重要。

公开(公告)号：US07274842B2

公开(公告)日：2007-09-25

申请号：US11094411

申请日：2005-03-31

Applicant: Peter M Gulvin ,  Jun Ma ,  Pinyen Lin

Inventor： Peter M Gulvin ,  Jun Ma ,  Pinyen Lin

IPC: G02B6/26

CPC classification number: B81B3/0024 ,  B81B2201/045

Abstract: An actuator system that includes two beams that are formed into a diamond pattern. A crossbar is positioned at a midsection to connect the two beams. When power is applied to the two beams, the diamond pattern is driven vertically. An actuator system may also include a substrate and a first layer above a second layer on the substrate. The first and second layers include upper and lower beams joined together at one end of the layers. A method of forming an actuator system includes forming a first layer above a second layer on a substrate, joining the first and second layers together at one end of the layers, and forming upper and lower beams. The upper and lower beams may be different in width, length and thickness to control a vertical movement of the actuator system.

Abstract translation: 一种致动器系统，包括形成为菱形图案的两个梁。 横梁位于中部以连接两个梁。 当向两个光束施加电力时，垂直驱动金刚石图案。 致动器系统还可以包括衬底和衬底上的第二层上方的第一层。 第一层和第二层包括在层的一端处连接在一起的上梁和下梁。 形成致动器系统的方法包括在衬底上形成第二层以上的第一层，在层的一端将第一层和第二层结合在一起，并形成上梁和下梁。 上梁和下梁的宽度，长度和厚度可以不同，以控制致动器系统的垂直运动。

公开(公告)号：US20070128831A1

公开(公告)日：2007-06-07

申请号：US10572554

申请日：2004-09-12

Applicant: Naomasa Oka ,  Hiroshi Harada ,  Jun Ogihara ,  Hiroshi Fukshima ,  Hiroshi Noge ,  Yuji Suzuki ,  Kiyohiko Kawano ,  Takaaki Yoshihara ,  Masahiko Suzumura

Inventor： Naomasa Oka ,  Hiroshi Harada ,  Jun Ogihara ,  Hiroshi Fukshima ,  Hiroshi Noge ,  Yuji Suzuki ,  Kiyohiko Kawano ,  Takaaki Yoshihara ,  Masahiko Suzumura

IPC: H01L21/30

CPC classification number: G02B26/0816 ,  B81B3/0086 ,  B81B2201/033 ,  B81B2201/045 ,  B81C1/00484 ,  B81C2201/0109 ,  B81C2201/019 ,  G02B6/3516 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/355 ,  G02B6/357 ,  G02B6/3584 ,  H02N1/008

Abstract: A process for fabricating a micro-electro-mechanical system (MEMS) composed of fixed components fixedly supported on a lower substrate and movable components movably supported on the lower substrate. The process utilizes an upper substrate separate from the lower substrate. The upper substrate is selectively etched in its top layer to form therein a plurality of posts which project commonly from a bottom layer of the upper substrate. The posts include the fixed components to be fixed to the lower substrate and the movable components which are resiliently supported only to one or more of the fixed components to be movable relative to the fixed components. The lower substrate is formed in its top surface with at least one recess. The upper substrate is then bonded to the top of the lower substrate upside down in such a manner as to place the fixed components directly on the lower substrate and to place the movable components upwardly of the recess. Finally, the bottom layer of the upper substrate is removed to release the movable components from the bottom layer for floating the movable components above the recess and allowing them to move relative to the lower substrate, while keeping the fixed components fixed to the top of the lower substrate.

Abstract translation: 一种用于制造由固定地支撑在下基板上的固定部件和可移动地支撑在下基板上的可移动部件的微机电系统（MEMS）的制造方法。 该方法利用与下基板分开的上基板。 在其顶层中选择性地蚀刻上基板，以在其中形成多个从上基板的底层共同突出的柱。 支柱包括要固定到下基板的固定部件和仅弹性地支撑到一个或多个固定部件以相对于固定部件可移动的可动部件。 下基板在其顶表面上形成有至少一个凹部。 然后将上基板以这样的方式上下连接到下基板的顶部，以将固定部件直接放置在下基板上并将可移动部件放置在凹部的上方。 最后，去除上基板的底层以从底层释放可移动部件，用于使可移动部件浮动在凹部上方并允许​​它们相对于下基板移动，同时保持固定部件固定在 下基板。

公开(公告)号：US20070091415A1

公开(公告)日：2007-04-26

申请号：US11480512

申请日：2006-07-05

Applicant: Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

IPC: G02B26/00

CPC classification number: B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

Abstract: A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

Abstract translation: 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

公开(公告)号：US20070041080A1

公开(公告)日：2007-02-22

申请号：US11589075

申请日：2006-10-30

Applicant: Yoshihiro Mizuno ,  Satoshi Ueda ,  Osamu Tsuboi ,  Ippei Sawaki ,  Hisao Okuda ,  Norinao Kouma ,  Hiromitsu Soneda ,  Fumio Yamagishi

Inventor： Yoshihiro Mizuno ,  Satoshi Ueda ,  Osamu Tsuboi ,  Ippei Sawaki ,  Hisao Okuda ,  Norinao Kouma ,  Hiromitsu Soneda ,  Fumio Yamagishi

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B2201/045 ,  B81B2203/0136 ,  B81C1/00182 ,  B81C2203/0109 ,  Y10S359/904

Abstract: A micro mirror unit includes a moving part carrying a mirror portion, a frame and torsion bars connecting the moving part to the frame. The moving part, the frame and the torsion bars are formed integral from a material substrate. The frame includes a portion thicker than the moving part.

Abstract translation: 微镜单元包括承载镜部分的移动部分，框架和将移动部件连接到框架的扭杆。 移动部件，框架和扭杆从材料基板形成为一体。 框架包括比移动部分更厚的部分。

公开(公告)号：US20060285255A1

公开(公告)日：2006-12-21

申请号：US11400407

申请日：2006-04-10

Applicant: Takashi Kawakubo ,  Toshihiko Nagano ,  Kazuhide Abe ,  Michihiko Nishigaki

Inventor： Takashi Kawakubo ,  Toshihiko Nagano ,  Kazuhide Abe ,  Michihiko Nishigaki

IPC: G11B21/24

CPC classification number: B81B3/0021 ,  B81B2201/014 ,  B81B2201/045 ,  G02B26/0858 ,  H01G5/18 ,  H01G5/40 ,  H01H2057/006

Abstract: A micro-mechanical device includes a first piezoelectric actuator including a piezoelectric film, and lower and upper electrodes interleaving the piezoelectric film, and extending from a first fixing part on a substrate to a first operating end, and a second piezoelectric actuator connected to the first piezoelectric actuator via a connecting part at the first operating end of the first piezoelectric actuator, and extending from the connecting part to a second operating end, the second piezoelectric actuator being shorter than the first piezoelectric actuator.

公开(公告)号：US20060228069A1

公开(公告)日：2006-10-12

申请号：US11094411

申请日：2005-03-31

Applicant: Peter Gulvin ,  Jun Ma ,  Pinyen Lin

Inventor： Peter Gulvin ,  Jun Ma ,  Pinyen Lin

IPC: G02B6/26

CPC classification number: B81B3/0024 ,  B81B2201/045

Abstract: An actuator system that includes two beams that are formed into a diamond pattern. A crossbar is positioned at a midsection to connect the two beams. When power is applied to the two beams, the diamond pattern is driven vertically. An actuator system may also include a substrate and a first layer above a second layer on the substrate. The first and second layers include upper and lower beams joined together at one end of the layers. A method of forming an actuator system includes forming a first layer above a second layer on a substrate, joining the first and second layers together at one end of the layers, and forming upper and lower beams. The upper and lower beams may be different in width, length and thickness to control a vertical movement of the actuator system.

Abstract translation: 一种致动器系统，包括形成为菱形图案的两个梁。 横梁位于中部以连接两个梁。 当向两个光束施加电力时，垂直驱动金刚石图案。 致动器系统还可以包括衬底和衬底上的第二层上方的第一层。 第一层和第二层包括在层的一端处连接在一起的上梁和下梁。 形成致动器系统的方法包括在衬底上形成第二层以上的第一层，在层的一端将第一层和第二层结合在一起，并形成上梁和下梁。 上梁和下梁的宽度，长度和厚度可以不同，以控制致动器系统的垂直运动。

公开(公告)号：US07116462B2

公开(公告)日：2006-10-03

申请号：US10468873

申请日：2002-12-16

Applicant: Koichi Ikeda

Inventor： Koichi Ikeda

IPC: G02B26/00

CPC classification number: B81C1/0015 ,  B81B2201/045 ,  B81B2203/04 ,  B81C2201/0109 ,  B81C2201/0173 ,  B81C2203/0109 ,  G02B26/0841

Abstract: An electrostatic drive type MEMS device and a manufacturing method thereof are provided, in which flattening the surface of a driving side electrode, improving performance, and furthering the improvements of the degree of freedom of designing in the manufacturing process are implemented. In addition, a GLV device using this MEMS device is provided, and further a laser display using this GLV device is also provided. The electrostatic drive type MEMS device includes a substrate side electrode and a beam having a driving side electrode driven by electrostatic attraction force or electrostatic repulsion force that acts between the substrate side electrode and driving side electrode, in which the substrate side electrode is formed of an impurities-doped conductive semiconductor region in a semiconductor substrate.

Abstract translation: 提供一种静电驱动型MEMS器件及其制造方法，其中，使驱动侧电极的表面变平，提高性能，进一步提高制造工艺中的设计自由度的提高。 此外，提供了使用该MEMS器件的GLV器件，并且还提供使用该GLV器件的激光器显示器。 静电驱动型MEMS器件包括基板侧电极和具有由基板侧电极和驱动侧电极之间作用的静电吸引力或静电排斥力驱动的驱动侧电极的光束，其中基板侧电极由 半导体衬底中的杂质掺杂导电半导体区域。

公开(公告)号：US07053519B2

公开(公告)日：2006-05-30

申请号：US10112369

申请日：2002-03-29

Applicant: Michael J. Sinclair

Inventor： Michael J. Sinclair

IPC: H02N1/00

CPC classification number: B81B3/0054 ,  B81B2201/032 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2201/047

Abstract: An electrostatic bimorph actuator includes a cantilevered flexible bimorph arm that is secured and insulated at one end to a planar substrate. In an electrostatically activated state the bimorph arm is generally parallel to the planar substrate. In a relaxed state, residual stress in the bimorph arm causes its free end to extend out-of-plane from the planar substrate. The actuator includes a substrate electrode that is secured to and insulated from the substrate and positioned under and in alignment with the bimorph arm. An electrical potential difference applied between the bimorph arm and the substrate electrode imparts electrostatic attraction between the bimorph arm and the substrate electrode to activate the actuator. As an exemplary application in which such actuators could be used, a microelectrical mechanical optical display system is described.

公开(公告)号：US07041224B2

公开(公告)日：2006-05-09

申请号：US10104109

申请日：2002-03-22

Applicant: Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi ,  Andrew G. Huibers ,  Peter Heureux

Inventor： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi ,  Andrew G. Huibers ,  Peter Heureux

IPC: B81C1/00

CPC classification number: B81C1/00 ,  B81B2201/045 ,  B81C1/00476 ,  B81C1/00531 ,  B81C1/00595 ,  B81C99/0025 ,  B81C2201/0138 ,  B82Y30/00 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/32135

Abstract: The etching of a material in a vapor phase etchant is disclosed where a vapor phase etchant is provided to an etching chamber at a total gas pressure of 10 Torr or more, preferably 20 Torr or even 200 Torr or more. The vapor phase etchant can be gaseous acid etchant, a noble gas halide or an interhalogen. The sample/workpiece that is etched can be, for example, a semiconductor device or MEMS device, etc. The material that is etched/removed by the vapor phase etchant is preferably silicon and the vapor phase etchant is preferably provided along with one or more diluents. Another feature of the etching system includes the ability to accurately determine the end point of the etch step, such as by creating an impedance at the exit of the etching chamber (or downstream thereof) so that when the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. A first plasma or wet chemical etch (or both) can be performed prior to the vapor phase etch.