Cold cathode electron source element with conductive particles embedded
in a base
    231.
    发明授权
    Cold cathode electron source element with conductive particles embedded in a base 失效
    导电颗粒嵌入基底的冷阴极电子源元件

    公开(公告)号:US5760536A

    公开(公告)日:1998-06-02

    申请号:US347133

    申请日:1994-11-23

    Abstract: A cold cathode electron source element having a cold cathode on a substrate. The cold cathode has dispersed in a cold cathode base particles of a conductive material having a lower work function than the base and a particle size which is sufficiently smaller than the thickness of the cold cathode. The element can be driven with a low voltage to induce high emission current in a stable manner. The cold cathode is easily processable. The element can have an increased surface area.

    Abstract translation: 在基板上具有冷阴极的冷阴极电子源元件。 冷阴极已经分散在具有比碱低的功函数的导电材料的冷阴极基体颗粒中,并且其粒径足够小于冷阴极的厚度。 元件可以用低电压驱动,以稳定的方式感应高发射电流。 冷阴极易于加工。 元件可以具有增加的表面积。

    Enhanced electron emitter
    232.
    发明授权
    Enhanced electron emitter 失效
    增强型电子发射体

    公开(公告)号:US5753997A

    公开(公告)日:1998-05-19

    申请号:US618484

    申请日:1996-03-19

    Inventor: James E. Jaskie

    CPC classification number: H01J1/3042 H01J2201/30457

    Abstract: An electron emitter formed with a layer of diamond-like carbon having a diamond bond structure with an electrically active defect at an emission site. The electrically active defect acts like a very thin electron emitter with a very low work function and improved current characteristics, including an improved saturation current.

    Abstract translation: 一种电子发射体,其形成有具有在发射部位具有电活性缺陷的金刚石键结构的类金刚石碳层。 电活性缺陷像非常薄的电子发射器一样具有非常低的功函数和改善的电流特性,包括改进的饱和电流。

    Plasma enhanced chemical transport process for forming diamond films
    233.
    发明授权
    Plasma enhanced chemical transport process for forming diamond films 失效
    用于形成金刚石膜的等离子体增强化学传输工艺

    公开(公告)号:US5747118A

    公开(公告)日:1998-05-05

    申请号:US510483

    申请日:1995-08-02

    Abstract: A chemical transport process which is enhanced by a plasma formed in a substantially oxygen free hydrogen environment for formation of microcrystalline diamond films at a relatively low deposition temperature and a rate of about 1 .mu.m/hr. The process, performed at 80 to 180 Torr and a current density of about 1 amp/cm.sup.2 of substrate, can be scaled to deposit films on large areas. The invention further comprises doped diamond films produced by the process, said product having a well-faceted microcrystalline structure with x-ray diffraction pattern and Raman spectra indicative of a predominately diamond structure. The doped diamond films can function as n-type and p-type semiconductors.

    Abstract translation: 一种化学传输过程,其通过在基本上无氧的氢气环境中形成的等离子体增强,用于在相对较低的沉积温度和约1m / hr的速率下形成微晶金刚石膜。 可以缩放在80至180托下进行的工艺和约1安培/厘米2的基板电流密度,从而在大面积上沉积薄膜。 本发明还包括通过该方法制备的掺杂金刚石薄膜,所述产品具有良好的具有X射线衍射图的微观结晶结构和表示主要是金刚石结构的拉曼光谱。 掺杂的金刚石膜可用作n型和p型半导体。

    Diamond thin film electron emitter
    234.
    发明授权
    Diamond thin film electron emitter 失效
    金刚石薄膜电子发射体

    公开(公告)号:US5698328A

    公开(公告)日:1997-12-16

    申请号:US426223

    申请日:1995-04-21

    Abstract: Doped and undoped polycrystalline and noncrystalline diamond films produced by plasma enhanced chemical transport emit electrons into a vacuum in response to an applied electrical field. The field required to create emission is less than 20 V/.mu.m for doped polycrystalline films, can be in the range of 5 to 8 volts/.mu.m for undoped nanocrystalline films and may be 3 volts/.mu.m or less for doped nanocrystalline films. These materials exhibit emission properties which are continuous across the whole surface of the film.

    Abstract translation: 通过等离子体增强的化学传输产生的掺杂和未掺杂的多晶和非结晶金刚石膜将电子响应于施加的电场发射到真空中。 对于掺杂的多晶膜,产生发射所需的场小于20V /μm,对于未掺杂的纳米晶体膜,其可以在5至8伏特/微米的范围内,并且对于掺杂的纳米晶体膜可以为3伏/微米或更小 。 这些材料具有在膜的整个表面上连续的发射特性。

    Enhanced electron emitter
    237.
    发明授权
    Enhanced electron emitter 失效
    增强型电子发射体

    公开(公告)号:US5619092A

    公开(公告)日:1997-04-08

    申请号:US11595

    申请日:1993-02-01

    Inventor: James E. Jaskie

    CPC classification number: H01J1/3042 H01J2201/30457

    Abstract: An electron emitter formed with a layer of diamond-like carbon having a diamond bond structure with an electrically active defect at an emission site. The electrically active defect acts like a very thin electron emitter with a very low work function and improved current characteristics, including in improved saturation current.

    Abstract translation: 一种电子发射体,其形成有具有在发射部位具有电活性缺陷的金刚石键结构的类金刚石碳层。 电活性缺陷起着非常薄的电子发射体的作用,具有非常低的功函数和改善的电流特性,包括改进的饱和电流。

    Diode structure flat panel display
    238.
    发明授权
    Diode structure flat panel display 失效
    二极管结构平板显示

    公开(公告)号:US5612712A

    公开(公告)日:1997-03-18

    申请号:US479270

    申请日:1995-06-07

    Abstract: A matrix-addressed diode flat panel display of field emission type is described, utilizing a diode (two terminal) pixel structure. The flat panel display comprises a cathode assembly having a plurality of cathodes, each cathode including a layer of cathode conductive material and a layer of a low effective work-function material deposited over the cathode conductive material and an anode assembly having a plurality of anodes, each anode including a layer of anode conductive material and a layer of cathodoluminescent material deposited over the anode conductive material, the anode assembly located proximate the cathode assembly to thereby receive charged particle emissions from the cathode assembly, the cathodoluminescent material emitting light in response to the charged particle emissions. The flat panel display further comprises means for selectively varying field emission between the plurality of corresponding light-emitting anodes and field-emission cathodes to thereby effect an addressable grey-scale operation of the flat panel display.

    Abstract translation: 利用二极管(二端)像素结构描述场发射型矩阵寻址二极管平板显示器。 平板显示器包括具有多个阴极的阴极组件,每个阴极包括阴极导电材料层和沉积在阴极导电材料上的低有效功函数材料层和具有多个阳极的阳极组件, 每个阳极包括阳极导电材料层和沉积在阳极导电材料上的阴极发光材料层,阳极组件位于阴极组件附近,从而接收来自阴极组件的带电粒子发射,阴极发光材料响应于 带电粒子排放。 平板显示器还包括用于选择性地改变多个对应的发光阳极和场发射阴极之间的场发射的装置,从而实现平板显示器的可寻址的灰度级操作。

    Integrated microelectronic device
    239.
    发明授权
    Integrated microelectronic device 失效
    集成微电子器件

    公开(公告)号:US5569973A

    公开(公告)日:1996-10-29

    申请号:US470605

    申请日:1995-06-06

    CPC classification number: H01J9/025 H01J21/105 H01J2201/30457 H01L2924/0002

    Abstract: The present invention relates generally to a new integrated Microelectronic Device and a method for making the same. Microelectronic Devices require several unique three dimensional structures: a sharp field emission tip, accurate alignment of the tip inside a control grid structure in a vacuum environment, and an anode to collect electrons emitted by the tip. Also disclosed is a new structure and a process for forming diodes, triodes, tetrodes, pentodes and other similar structures. The final structure made can also be connected to other similar devices or to other electronic devices.

    Abstract translation: 本发明一般涉及一种新的集成微电子器件及其制造方法。 微电子器件需要几个独特的三维结构:尖锐的场发射尖端,真空环境中的控制栅格结构内的尖端的精确对准以及收集由尖端发射的电子的阳极。 还公开了形成二极管,三极管,四极管,五极管和其他类似结构的新结构和工艺。 所制造的最终结构也可以连接到其他类似的装置或其他电子装置。

    Use of charged-particle tracks in fabricating gated electron-emitting
devices
    240.
    发明授权
    Use of charged-particle tracks in fabricating gated electron-emitting devices 失效
    在制造门控电子发射器件中使用带电粒子轨迹

    公开(公告)号:US5564959A

    公开(公告)日:1996-10-15

    申请号:US269229

    申请日:1994-06-29

    Abstract: Gated electron emitters are fabricated by processes in which charged particles are passed through a track layer (24, 48, or 144) to form charged-particle tracks (26.sub.1, 50.sub.1, or 146.sub.1). The track layer is etched along the tracks to create open spaces (28.sub.1, 52.sub.1, or 148.sub.1). Electron-emissive elements (30 or 142D) can then be formed at locations respectively centered on the open spaces after which a patterned gate layer (34B, 40B, or 158C) is provided. Alternatively, the open spaces in the track layer can be employed to etch corresponding apertures (54.sub.1) through an underlying non-insulating layer (46) which typically serves as the gate layer. An etch is performed through the apertures to form dielectric open spaces (56.sub.1, 96.sub.1, or 114.sub.1) in an insulating layer (24) that lies below the non-insulating layer. Electron-emissive elements (30B, 30/88D.sub.1, 98/102.sub.1, or 118.sub.1) can subsequently be provided, typically in the dielectric open spaces.

    Abstract translation: 门电子发射器通过其中带电粒子通过轨道层(24,48或144)以形成带电粒子轨道(261,501或1461)的工艺制造。 轨道层沿着轨道被蚀刻以创建开放空间(281,521或1481)。 然后可以在分开以开放空间为中心的位置处形成电子发射元件(30或142D),之后设置图案化栅极层(34B,40B或158C)。 或者,轨道层中的开放空间可用于通过通常用作栅极层的下面的非绝缘层(46)蚀刻相应的孔(541)。 通过孔进行蚀刻,以在位于非绝缘层下方的绝缘层(24)中形成介电开放空间(561,961或1141)。 随后可以提供电子发射元件(30B,30 / 88D1,98 / 1011或1181),通常在电介质开放空间中。

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