Passive circuits for de-multiplexing display inputs
    21.
    发明授权
    Passive circuits for de-multiplexing display inputs 有权
    无源电路用于解复用显示输入

    公开(公告)号:US07777715B2

    公开(公告)日:2010-08-17

    申请号:US11479865

    申请日:2006-06-29

    Abstract: A display array which can reduce the row connections between the display and the driver circuit and methods of manufacturing and operating the same are disclosed. In one embodiment, a display device comprises an array of MEMS display elements and a plurality of voltage dividers coupled to the array and configured to provide row output voltages to drive the array, wherein each row is connected to at least two inputs joined by a voltage divider.

    Abstract translation: 公开了可以减少显示器和驱动电路之间的行连接的显示阵列及其制造和操作方法。 在一个实施例中,显示装置包括耦合到阵列的MEMS显示元件阵列和多个分压器,并被配置为提供行输出电压来驱动阵列,其中每一行连接到由电压连接的至少两个输入 分隔线

    MEMS DEVICE FABRICATED ON A PRE-PATTERNED SUBSTRATE
    22.
    发明申请
    MEMS DEVICE FABRICATED ON A PRE-PATTERNED SUBSTRATE 失效
    在预先形成的基板上制作的MEMS器件

    公开(公告)号:US20100129025A1

    公开(公告)日:2010-05-27

    申请号:US12694732

    申请日:2010-01-27

    Applicant: Clarence Chui

    Inventor: Clarence Chui

    CPC classification number: G02B26/001

    Abstract: A microelectromechanical systems device fabricated on a pre-patterned substrate having grooves formed therein. A lower electrode is deposited over the substrate and separated from an orthogonal upper electrode by a cavity. The upper electrode is configured to be movable to modulate light. A semi-reflective layer and a transparent material are formed over the movable upper electrode.

    Abstract translation: 一种在预先图案化的衬底上制造的微机电系统器件,其中形成有沟槽。 下电极沉积在衬底上并且通过空腔与正交的上电极分离。 上电极被配置为可移动以调制光。 在可动上电极上形成半反射层和透明材料。

    Systems and methods using interferometric optical modulators and diffusers
    23.
    发明授权
    Systems and methods using interferometric optical modulators and diffusers 有权
    使用干涉光学调制器和扩散器的系统和方法

    公开(公告)号:US07710636B2

    公开(公告)日:2010-05-04

    申请号:US11209143

    申请日:2005-08-22

    Applicant: Clarence Chui

    Inventor: Clarence Chui

    CPC classification number: G02B26/001 Y10T29/49002 Y10T29/49826

    Abstract: Various embodiments include interferometric optical modulators comprising a substrate layer having a thickness between about 0.1 mm to about 0.45 mm thick and a method for manufacturing the same. The interferometric modulator can be integrated together with a diffuser in a display device. The thin substrate permits use of a thicker substrate. The thinner substrate may increase resolution and reduce overall thickness of the inteferometric modulator. The thicker diffuser may provide increased diffusion and durability.

    Abstract translation: 各种实施方案包括干涉光学调制器,其包括厚度在约0.1mm至约0.45mm厚之间的基底层及其制造方法。 干涉式调制器可以与显示装置中的扩散器集成在一起。 薄衬底允许使用较厚的衬底。 更薄的衬底可以增加分辨率并降低整数调制器的总体厚度。 较厚的扩散器可以提供增加的扩散和耐久性。

    MEMS device fabricated on a pre-patterned substrate
    25.
    发明授权
    MEMS device fabricated on a pre-patterned substrate 失效
    在预先图案化的衬底上制造的MEMS器件

    公开(公告)号:US07664345B2

    公开(公告)日:2010-02-16

    申请号:US12104280

    申请日:2008-04-16

    Applicant: Clarence Chui

    Inventor: Clarence Chui

    CPC classification number: G02B26/001

    Abstract: A microelectromechanical systems device fabricated on a pre-patterned substrate having grooves formed therein. A lower electrode is deposited over the substrate and separated from an orthogonal upper electrode by a cavity. The upper electrode is configured to be movable to modulate light. A semi-reflective layer and a transparent material are formed over the movable upper electrode.

    Abstract translation: 一种在预先图案化的衬底上制造的微机电系统器件,其中形成有沟槽。 下电极沉积在衬底上并且通过空腔与正交的上电极分离。 上电极被配置为可移动以调制光。 在可动上电极上形成半反射层和透明材料。

    MEMS DEVICES HAVING OVERLYING SUPPORT STRUCTURES AND METHODS OF FABRICATING THE SAME
    27.
    发明申请
    MEMS DEVICES HAVING OVERLYING SUPPORT STRUCTURES AND METHODS OF FABRICATING THE SAME 有权
    具有过度支持结构的MEMS器件及其制造方法

    公开(公告)号:US20100019336A1

    公开(公告)日:2010-01-28

    申请号:US12510046

    申请日:2009-07-27

    Abstract: Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.

    Abstract translation: MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层,并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑,或由导电可移动层中的凹陷下方的柱支撑。 在某些实施例中,铆钉结构的部分延伸穿过可移动层并接触下面的层。 在其他实施例中,用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线,保护电引线免受损坏或其他干扰。

    System and method for providing residual stress test structures
    28.
    发明授权
    System and method for providing residual stress test structures 失效
    提供残余应力测试结构的系统和方法

    公开(公告)号:US07636151B2

    公开(公告)日:2009-12-22

    申请号:US11453633

    申请日:2006-06-15

    CPC classification number: G01L5/0047 G02B26/001

    Abstract: The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.

    Abstract translation: 本发明包括确定残余应力的系统和方法,例如在干涉式调制器中发现的。 在一个示例中,测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜,其中膜被构造为平行四边形,其中每侧的至少一部分附着到基底,以及形成在膜的一部分和基底的一部分之间的干涉腔, 并且其中膜被配置为基于膜的残余应力而变形并且调制指示膜变形量的光。

    METHOD OF FABRICATING INTERFEROMETRIC DEVICES USING LIFT-OFF PROCESSING TECHNIQUES
    29.
    发明申请
    METHOD OF FABRICATING INTERFEROMETRIC DEVICES USING LIFT-OFF PROCESSING TECHNIQUES 有权
    使用提升加工技术制造干涉装置的方法

    公开(公告)号:US20090262412A1

    公开(公告)日:2009-10-22

    申请号:US12494032

    申请日:2009-06-29

    CPC classification number: G02B26/001

    Abstract: Embodiments of the present disclosure include a method of fabricating interferometric devices using lift-off processing techniques. Use of lift-off processing in the fabrication of various layers of interferometric modulators, such as an optical stack or a flex layer, advantageously avoids individualized chemistries associated with the plurality of materials associated with each layer thereof. Moreover, use of lift-off processing allows much greater selection in both materials and facilities available for fabrication of interferometric modulators.

    Abstract translation: 本公开的实施例包括使用剥离处理技术制造干涉仪的方法。 在诸如光学堆叠或柔性层的各种干涉式调制器的制造中使用剥离处理有利地避免了与与其每层相关联的多种材料相关联的个体化化学物质。 此外,使用剥离处理可以在可用于制造干涉式调制器的材料和设备中进行更大的选择。

    Microelectromechanical device with thermal expansion balancing layer or stiffening layer
    30.
    发明申请
    Microelectromechanical device with thermal expansion balancing layer or stiffening layer 失效
    具有热膨胀平衡层或加强层的微机电装置

    公开(公告)号:US20090231666A1

    公开(公告)日:2009-09-17

    申请号:US12072090

    申请日:2008-02-22

    CPC classification number: B81B3/0072 B81B2201/042 G02B26/001 Y10T29/49002

    Abstract: An interferometric modulating device is provided with a thermal expansion balancing layer on a side of the movable flexible layer opposite the movable reflector such that when temperature changes the distance between the movable reflector and the optical stack does not change significantly, thereby leading to stable color. Additionally, an interferometric modulating device is provided with a stiffening layer between the movable flexible layer and the movable reflector and at least one hollow void exists on the surface where the movable reflector and the stiffening layer contact each other so that the movable reflector is more rigid to bending, thereby reducing the temperature sensitivity of the movable reflector.

    Abstract translation: 干涉式调制装置在可移动柔性层的与可移动反射器相对的一侧上设置有热膨胀平衡层,使得当温度变化时,可移动反射器和光学堆叠之间的距离不会显着变化,从而导致稳定的颜色。 此外,干涉式调制装置在可移动柔性层和可移动反射器之间设置有加强层,并且在可移动反射器和加强层彼此接触的表面上存在至少一个中空空隙,使得可移动反射器更刚性 以弯曲,从而降低可移动反射器的温度灵敏度。

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