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公开(公告)号：US06992834B2
公开(公告)日：2006-01-31
申请号：US11071523
申请日：2005-03-02
IPC分类号： G02B21/02
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966
摘要： Objective (1, 601), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101–L107, L110–L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101–L107, L110–L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101–L107, L110–L128), an outer aperture ray (5, 7) and a principal ray (9) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray (5, 7) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101–L107, L110–L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101–L107, L110–L128).
摘要翻译： 目的（1，601），特别是具有第一双折射透镜（L108，L109，L129，L130）和第二双折射透镜（L101-L107，L110-L128）的微光刻投影装置的投影物镜。 第一透镜（L108，L109，L129，L130）与所使用的透镜材料或材料取向与第二透镜（L101-L107，L110-L128）不同。 在通过第一透镜（L108，L109，L129，L130）和第二透镜（L101-L107，L110-L128）之后，外光线（5,7）和主光线（9）经受光路 两个相互正交的极化状态的差异。 这些光程差之差小于工作波长的25％。 在至少一个第一透镜（L129，L130）中，外光圈（5,7）的孔径角为所有第一透镜（L108，L109）中的所述孔径光线发生的最大孔径角的至少70％ ，L129，L130）和第二透镜（L101-L107，L110-L128）。 这种结构的结果是，第一透镜（L108，L109，L129，L130）的组合材料体积不超过第一透镜（L108，L109，L129，L130）和第二透镜 镜头（L101-L107，L110-L128）。
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公开(公告)号：US20050094268A1
公开(公告)日：2005-05-05
申请号：US10922380
申请日：2004-08-19
申请人： Damian Fiolka , Olaf Dittmann , Michael Totzeck , Nils Dieckmann , Jess Koehler , Toralf Gruner , Daniel Kraehmer
发明人： Damian Fiolka , Olaf Dittmann , Michael Totzeck , Nils Dieckmann , Jess Koehler , Toralf Gruner , Daniel Kraehmer
IPC分类号： G02B17/08 , G02B27/09 , G02B27/28 , G03F7/20 , G02F1/1335
CPC分类号： G03F7/70241 , G02B27/0994 , G02B27/286 , G03F7/70191 , G03F7/70966
摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.
摘要翻译： 光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。 在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟 。
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公开(公告)号：US08456616B2
公开(公告)日：2013-06-04
申请号：US12993540
申请日：2009-04-07
CPC分类号： G03F7/70308
摘要： An optical system, in particular a projection objective, for microlithography, has an optical axis and at least one optical correction arrangement, which has a first optical correction element and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.
摘要翻译： 用于微光刻的光学系统，特别是投影物镜具有光轴和至少一个光学校正装置，其具有第一光学校正元件和至少一个第二光学校正元件，其中第一校正元件设置有 第一非球面表面轮廓，并且其中所述第二校正元件设置有第二非球面轮廓，其中所述第一表面轮廓和所述第二表面轮廓至少近似为零，其中所述校正装置具有至少一个驱动器， 两个校正元素中的至少一个。 在这种情况下，两个校正元件中的至少一个可以围绕至少近似平行于光轴的旋转轴线旋转，并且至少一个驱动器是用于一个或两个校正元件旋转的旋转驱动器 旋转轴。
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24.发明授权公开(公告)号：US07903333B2
公开(公告)日：2011-03-08
申请号：US11739232
申请日：2007-04-24
申请人： Daniel Kraehmer , Ralf Mueller
发明人： Daniel Kraehmer , Ralf Mueller
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B5/3083 , G03F7/70566 , Y10S359/90 , Y10T29/49908
摘要： The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization, the method comprising joining a first component and a second component, wherein a non-plane surface of the first component being provided with a defined height profile is joined with a plane surface of the second component, whereby a mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.
摘要翻译： 本发明涉及一种制造偏振调制光学元件的方法，其中，对于通过元件的光并由于应力引起的双折射，元件引起正交偏振态之间的延迟分布，该方法包括将第一 组件和第二部件，其中设置有限定高度轮廓的第一部件的非平面表面与第二部件的平面连接，从而在这种形成的部件中产生引起应力引起的双折射的机械应力 偏振调制光学元件。
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25.发明申请公开(公告)号：US20100157435A1
公开(公告)日：2010-06-24
申请号：US12715473
申请日：2010-03-02
IPC分类号： G02B3/00
CPC分类号： G03F7/70341 , G03F7/7015
摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
摘要翻译： 公开了投影目标以及相关组件，系统和方法。 通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。 投影物镜可以包括沿着光轴的多个光学元件。 多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。 通常，投影物镜被配置为用于微光刻投影曝光机。
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26.发明授权Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus 有权用于描述，评估和改善微光刻投影曝光装置的光学偏振特性的方法公开(公告)号：US07728975B1
公开(公告)日：2010-06-01
申请号：US11358119
申请日：2006-02-22
IPC分类号： G01J4/00
CPC分类号： G01J4/04 , G03F7/70508 , G03F7/70566 , G03F7/706
摘要： In a method for describing, evaluating and improving optical polarization properties of a projection objective of a microlithographic projection exposure apparatus, the Jones or Stokes vectors are firstly determined at one or more points in the exit pupil of the projection objective. These are then described at least approximately as a linear superposition of predetermined vector modes with scalar superposition coefficients. The optical polarization properties can subsequently be evaluated on the basis of the superposition coefficients.
摘要翻译： 在用于描述，评估和改进微光刻投影曝光装置的投影物镜的光学偏振特性的方法中，首先在投影物镜的出射光瞳的一个或多个点处确定琼斯或斯托克斯矢量。 然后将这些描述至少近似为具有标量叠加系数的预定向量模式的线性叠加。 随后可以基于叠加系数来评估光学偏振特性。
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27.发明授权公开(公告)号：US07710640B2
公开(公告)日：2010-05-04
申请号：US12138851
申请日：2008-06-13
申请人： Susanne Beder , Daniel Kraehmer , Heiko Feldmann
发明人： Susanne Beder , Daniel Kraehmer , Heiko Feldmann
IPC分类号： G02B13/14
CPC分类号： G02B13/14 , G02B13/143 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70566 , G03F7/70966
摘要： A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. The projection objective can be designed to operate in an immersion mode, and it can produce at least one intermediate image. The projection objective can include an optical subsystem on the image-plane side which projects the intermediate image into the image plane with an image-plane-side projection ratio having an absolute value of at least 0.3.
摘要翻译： 一种用于微光刻投影曝光装置的投影物镜。 投影物镜可以将可以在物平面中的位置设置的掩模的图像投影到能够被设置在图像平面中的位置的感光涂层上。 投影物镜可以被设计为以浸没模式操作，并且可以产生至少一个中间图像。 投影物镜可以包括图像平面侧的光学子系统，其中间图像以绝对值至少为0.3的像平面侧投影比率投射到像平面中。
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28.发明申请公开(公告)号：US20090103184A1
公开(公告)日：2009-04-23
申请号：US12265090
申请日：2008-11-05
IPC分类号： G02B3/00
CPC分类号： G03F7/70341 , G03F7/7015
摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
摘要翻译： 公开了投影目标以及相关组件，系统和方法。 通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。 投影物镜可以包括沿着光轴的多个光学元件。 多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。 通常，投影物镜被配置为用于微光刻投影曝光机。
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29.发明申请公开(公告)号：US20090040496A1
公开(公告)日：2009-02-12
申请号：US12177715
申请日：2008-07-22
申请人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。
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公开(公告)号：US07463422B2
公开(公告)日：2008-12-09
申请号：US11657925
申请日：2007-01-25
申请人： Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/00
CPC分类号： G02B27/0012 , G02B1/02 , G02B17/08 , G03F7/70225 , G03F7/70966 , G03F7/70975
摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
摘要翻译： 描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。 首先，对于多个透镜的每个透镜，确定敏感度因子KLT / LH。 该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。 然后选择双折射氟化物晶体作为敏感度因子KLT / LH高于预定阈值的每个透镜的材料。 这些镜头被分配到第一组透镜。 对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。
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