利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

53 条记录 (耗时 0.02 秒)

    SYSTEM AND METHOD FOR COLLECTING DOCUMENT
    23.
    发明申请
    SYSTEM AND METHOD FOR COLLECTING DOCUMENT 有权
    收集文件的系统和方法

    公开(公告)号：US20110320427A1

    公开(公告)日：2011-12-29

    申请号：US13165338

    申请日：2011-06-21

    申请人： Young Su KO ,  Seung Yeop HAN ,  Jung Woo SEO

    发明人： Young Su KO ,  Seung Yeop HAN ,  Jung Woo SEO

    IPC分类号： G06F17/30

    CPC分类号： G06F17/30864

    摘要： Provided is a system and method for collecting a document. The system may include an identification information receiver to receive, from a host of a site, identification information of a document of which an update may occur, a collection request transfer unit to transmit a collection request for the document based on the identification information, an update information collector to receive update information of the document from the host, and a search result provider to provide, to the host, a search result extracted from the update information of the document, in response to the search request being received from the host. The system for collecting the document may reduce load of a web site, and may improve accuracy of the document to be collected.

    摘要翻译： 提供了一种用于收集文档的系统和方法。 系统可以包括识别信息接收器，用于从站点的主机接收可能发生更新的文档的标识信息;收集请求传送单元，用于基于识别信息发送文档的收集请求; 更新信息收集器以从主机接收文档的更新信息，以及搜索结果提供者，用于响应于从主机接收的搜索请求向主机提供从文档的更新信息中提取的搜索结果。 用于收集文档的系统可以减少网站的负载，并且可以提高要收集的文档的准确性。

    Color filter and apparatus and method of manufacturing the same
    25.
    发明申请
    Color filter and apparatus and method of manufacturing the same 审中-公开
    滤色器及其制造方法

    公开(公告)号：US20100290143A1

    公开(公告)日：2010-11-18

    申请号：US12662478

    申请日：2010-04-20

    申请人： Jeong Gil Kim ,  Young Tae Cho ,  Suk Won Lee ,  Sin Kwon ,  Ki Hyun Kim ,  Jung Woo Seo

    发明人： Jeong Gil Kim ,  Young Tae Cho ,  Suk Won Lee ,  Sin Kwon ,  Ki Hyun Kim ,  Jung Woo Seo

    IPC分类号： G02B5/22 ,  B05D5/06 ,  B05C1/08 ,  G02B1/04

    CPC分类号： G02B5/201 ,  B05C1/0834 ,  G02B5/223

    摘要： Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed.

    摘要翻译： 本文公开了具有黑矩阵的滤色器及其制造方法。 该方法可以包括将有机膜施加到基底上，通过用具有突起和凹陷的模具对有机膜施加压力，在有机膜上形成图案，并通过向有机膜的图案施加墨来形成黑色矩阵 。 黑色矩阵的形成可以通过卷绕方法来实现。 通过在施加到基板上的有机膜上进行印刷和印刷，容易地形成黑色矩阵。 通过印刷和印刷，黑色矩阵可以具有纳米级的细线宽度。 此外，由于通过卷绕方法形成黑色矩阵，所以可以降低材料成本，并且可以以相对高的速度制造滤色器。

    Roll-to-roll patterning apparatus and patterning system having the same
    26.
    发明申请
    Roll-to-roll patterning apparatus and patterning system having the same 有权
    卷对卷图案装置和具有该图案的图案形成系统

    公开(公告)号：US20100282162A1

    公开(公告)日：2010-11-11

    申请号：US12662677

    申请日：2010-04-28

    申请人： Young Tae Cho ,  Sin Kwon ,  Ki Hyun Kim ,  Jung Woo Seo ,  Dong Min Kim ,  Jeong Gil Kim

    发明人： Young Tae Cho ,  Sin Kwon ,  Ki Hyun Kim ,  Jung Woo Seo ,  Dong Min Kim ,  Jeong Gil Kim

    IPC分类号： B05C9/08 ,  B05C1/08

    CPC分类号： B65H23/038 ,  B05C5/0241 ,  B05D1/40 ,  B05D3/067 ,  B65H2301/5114 ,  B65H2301/5126 ,  B65H2404/15212

    摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.

    摘要翻译： 本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。 图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。 卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。 图案辊可以包括具有第一图案的外周表面。 多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。 对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。 对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

    Nano-imprint lithography methods
    27.
    发明申请
    Nano-imprint lithography methods 有权
    纳米压印光刻方法

    公开(公告)号：US20100140220A1

    公开(公告)日：2010-06-10

    申请号：US12654023

    申请日：2009-12-08

    申请人： Young Tae Cho ,  Suk Won Lee ,  Sin Kwon ,  Jung Woo Seo ,  Jeong Gll Kim

    发明人： Young Tae Cho ,  Suk Won Lee ,  Sin Kwon ,  Jung Woo Seo ,  Jeong Gll Kim

    IPC分类号： C23F1/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.

    摘要翻译： 在使用面积小于基板的面积的模具的基板上形成图案减少图案的情况下，通过印刷树脂施加在蚀刻对象层的多个区域的至少第一区域上形成第一树脂图案 使用第一模具到蚀刻对象层。然后使用第一树脂图案作为蚀刻掩模蚀刻蚀刻对象层。 通过使用第二模具将施加到蚀刻对象层的树脂压印，在多个区域中的至少一个区域上形成第二树脂图案。 使用第二树脂图案作为蚀刻掩模再次蚀刻蚀刻对象层。

    Semiconductor device having raised cell landing pad and method of fabricating the same
    28.
    发明授权
    Semiconductor device having raised cell landing pad and method of fabricating the same 失效
    具有升高电池着陆垫的半导体器件及其制造方法

    公开(公告)号：US07511328B2

    公开(公告)日：2009-03-31

    申请号：US11268551

    申请日：2005-11-08

    申请人： Jung-Woo Seo ,  Tae-Hyuk Ahn ,  Jong-Seo Hong

    发明人： Jung-Woo Seo ,  Tae-Hyuk Ahn ,  Jong-Seo Hong

    IPC分类号： H01L27/108

    CPC分类号： H01L27/10855 ,  H01L21/76895

    摘要： A semiconductor device and method of manufacturing the same having pad extending parts, the semiconductor device includes an isolation layer that defines an active region and a gate electrode which traverses the active region. A source region is provided in the active region at one side of the gate electrode, and a drain region is provided in the active region at a second side of the gate electrode. A first interlayer insulating layer covers the semiconductor substrate. A source landing pad is electrically connected to the source region, and a drain landing pad is electrically connected to the drain region. A pad extending part is laminated on one or more of the source landing pad and the drain landing pad. The pad extending part has an upper surface located in a plane above a plane corresponding to the upper surfaces of the source landing pad and the drain landing pad.

    摘要翻译： 半导体器件及其制造方法具有焊盘延伸部分，该半导体器件包括限定有源区的隔离层和穿过有源区的栅电极。 源极区域设置在栅电极的一侧的有源区中，并且在栅电极的第二侧的有源区中设置有漏极区。 第一层间绝缘层覆盖半导体衬底。 源着陆焊盘电连接到源极区域，并且漏极接地焊盘电连接到漏极区域。 垫片延伸部分层压在源着陆垫和排水着陆垫的一个或多个上。 焊盘延伸部分具有位于与源着陆焊盘和排水接地焊盘的上表面对应的平面上方的平面中的上表面。

    METHOD OF MANUFACTURING A SEMICONDUCTOR MEMORY DEVICE
    30.
    发明申请
    METHOD OF MANUFACTURING A SEMICONDUCTOR MEMORY DEVICE 审中-公开
    制造半导体存储器件的方法

    公开(公告)号：US20080064206A1

    公开(公告)日：2008-03-13

    申请号：US11935168

    申请日：2007-11-05

    申请人： Jung-woo SEO ,  Tae-hyuk AHN ,  Jeong-sic JEON

    发明人： Jung-woo SEO ,  Tae-hyuk AHN ,  Jeong-sic JEON

    IPC分类号： H01L21/4763

    CPC分类号： H01L21/76895 ,  H01L21/76802 ,  H01L21/76831 ,  H01L27/10814 ,  H01L27/10855 ,  H01L27/10885 ,  H01L27/10888

    摘要： Manufacturing a semiconductor memory by first forming a first insulating layer covering a conductive pad. Next forming and pattering a bit line conductive layer and a second insulating layer to expose a part of the first insulating layer. A third insulating layer covering the exposed surfaces of the first insulating layer is formed. Exposing an upper surface of the bit line conductive layer pattern and an upper surface of the third insulating layer. Removing part of the third insulating layer and first insulating layer to expose the conductive pad. Forming a spacer on the side walls of the bit line conductive layer pattern and the first insulating layer. An insulating layer pattern and a second spacer layer are respectively formed on the bit line conductive layer pattern and on a side wall of the first spacer and a conductive plug, which is in contact with the conductive pad is formed.

    摘要翻译： 通过首先形成覆盖导电垫的第一绝缘层来制造半导体存储器。 接下来形成和图案位线导电层和第二绝缘层以暴露第一绝缘层的一部分。 形成覆盖第一绝缘层的暴露表面的第三绝缘层。 露出位线导电层图案的上表面和第三绝缘层的上表面。 去除第三绝缘层和第一绝缘层的一部分以暴露导电焊盘。 在位线导电层图案和第一绝缘层的侧壁上形成间隔物。 分别在位线导电层图案和第一间隔物的侧壁上形成绝缘层图案和第二间隔层，并且形成与导电焊盘接触的导电插塞。