PATTERNING MATERIAL, PATTERNING METHOD, AND PATTERNING APPARATUS

    公开(公告)号:US20190009457A1

    公开(公告)日:2019-01-10

    申请号:US15753851

    申请日:2016-08-09

    Inventor: Koji WATANABE

    Abstract: Provided is a patterning material for three-dimensional stereolithography, with which it is possible to improve the curing speed and suppress a shrinkage of the three-dimensionally shaped article. The patterning material for three-dimensional stereolithography contains a diallyl phthalate prepolymer, a photocurable monomer and a photopolymerization initiator, and is liquid at room temperature. The patterning material is suitable for use in patterning performed by surface exposure. The proportion of the diallyl phthalate prepolymer is, for example, 5 to 40 mass % in the total amount of the diallyl phthalate prepolymer and the photocurable monomer.

    RESIST STRIPPER AND RESIST STRIPPING METHOD
    25.
    发明申请

    公开(公告)号:US20180143531A1

    公开(公告)日:2018-05-24

    申请号:US15818211

    申请日:2017-11-20

    Inventor: Yoshihiro MUKAI

    Abstract: An object of the present invention is to provide a resist stripper for stripping resist from a substrate with a metallic line and/or a metal oxide film, which has excellent stripping properties and shows reduced reattachment of stripped resist, and which is also excellent in antifoaming properties. The resist stripper contains: (A) an amine; (B) an organic solvent; and (C) 5.0 wt % or less of a sulfonic or carboxylic acid having a weight average molecular weight of 5,000 to 1,000,000 or a salt thereof, and the resist stripper is free of (D) water, or contains (D) 60 wt % or less of water.

    METHOD FOR MANUFACTURING NYLON 6
    27.
    发明申请
    METHOD FOR MANUFACTURING NYLON 6 审中-公开
    制造尼龙6的方法

    公开(公告)号:US20160002402A1

    公开(公告)日:2016-01-07

    申请号:US14769321

    申请日:2014-03-04

    Inventor: Tsutomu YASUI

    CPC classification number: C08G69/20 C08G69/18 C08L77/02 C08L79/00

    Abstract: Provided is a method for manufacturing nylon 6, said method being capable of producing a higher degree of crystallinity in a polymer at the end of a polymerization step performed on an anionically polymerizable caprolactam melt. The present invention is a method in which molten caprolactam in a reactor is anionically polymerized in the presence of a carbodiimide compound and both an anionic polymerization catalyst and an activator, neither of which is a carbodiimide compound, and a polymer is obtained from the reactor following the end of the polymerization step, yielding nylon 6 with a degree of crystallinity of at least 42% without raising the temperature of the interior of the reactor from the temperature thereof at the end of the polymerization step.

    Abstract translation: 本发明提供一种制备尼龙6的方法,所述方法能够在对阴离子聚合的己内酰胺熔体进行的聚合步骤结束时在聚合物中产生较高的结晶度。 本发明是一种方法,其中反应器中的熔融己内酰胺在碳二亚胺化合物和阴离子聚合催化剂和活化剂两者都是阴离子聚合的,二者都不是碳二亚胺化合物,聚合物是从反应器中获得的 在聚合步骤结束时,在聚合步骤结束时,不会使反应器内部的温度从其温度升高,得到结晶度至少为42%的尼龙6。

    ANTI-FUNGAL AGENT FOR PROCESSED CEREAL FOODS
    29.
    发明申请
    ANTI-FUNGAL AGENT FOR PROCESSED CEREAL FOODS 审中-公开
    抗真菌药物加工谷物食品

    公开(公告)号:US20140227419A1

    公开(公告)日:2014-08-14

    申请号:US14348619

    申请日:2012-10-02

    Abstract: The present invention provides an anti-fungal agent for processed cereal foods, and the anti-fungal agent contains chitinase. The present invention also provides an anti-fungal agent-containing processed cereal food, which contains the anti-fungal agent. The present invention further provides a method for producing an anti-fungal agent-containing processed cereal food. With the present invention, a safe and inexpensive anti-fungal agent for processed cereal foods is provided.

    Abstract translation: 本发明提供了加工谷物食品的抗真菌剂,抗真菌剂含有几丁质酶。 本发明还提供含有抗真菌剂的含有抗真菌剂的加工谷物食品。 本发明还提供了含有抗真菌剂的加工谷物食品的制造方法。 本发明提供一种安全廉价的加工谷物食品抗真菌剂。

    Photocurable resin composition and resin cured product

    公开(公告)号:US12084528B2

    公开(公告)日:2024-09-10

    申请号:US17291939

    申请日:2019-11-01

    CPC classification number: C08F2/48 C08F299/06

    Abstract: A photocurable resin composition includes: a first reactive compound that forms a glass phase through curing; a second reactive compound that is compatible with the first reactive compound and forms a rubber phase through curing; and a photopolymerization initiator. The first reactive compound includes at least a reactive monomer, and the second reactive compound includes at least a reactive oligomer. A polar term dP1 of Hansen Solubility Parameter of the first reactive compound and a polar term dP2 of Hansen Solubility Parameter of the second reactive compound differ by 1.8 or more.

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