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    Solid containing groups which are bound to the base structure via ureathane groups and which contain bonds that can be activated by actinic radiation, and the use thereof
    21.
    发明授权
    Solid containing groups which are bound to the base structure via ureathane groups and which contain bonds that can be activated by actinic radiation, and the use thereof 失效
    通过ureathane基团结合到碱基结构并含有可被光化辐射活化的键的固体含量基团及其用途

    公开(公告)号：US06825241B1

    公开(公告)日：2004-11-30

    申请号：US10089171

    申请日：2002-03-27

    Applicant: Rainer Blum ,  Reinhold Schwalm ,  Rainer Königer

    Inventor： Rainer Blum ,  Reinhold Schwalm ,  Rainer Königer

    IPC: C08F246

    CPC classification number: C08G18/672 ,  C08G18/3206 ,  C08G18/3253 ,  C08G18/4277 ,  C08G18/686 ,  C08G2150/20 ,  Y10T428/31551 ,  Y10T428/31935

    Abstract: Solids containing (i) on average per molecule at least two groups (a) having at least one bond which can be activated with actinic radiation whereby the groups (a) are structurally different from one another and are attached to the parent structure of the solid via urethane groups, or containing (ii) on average per molecule more than one group (a) having at least one bond which can be activated with actinic radiation, the groups being structurally different from one another or the same and being attached to the parent structure of the solid via urethane groups, and from 0.01 to 1 mol %, based on the bonds present which can be activated with actinic radiation, of at least one chemically bonded polymerization inhibitor (b), preparable by reacting the starting products in the melt; use of the solids as coating materials, adhesives or sealing compounds or for preparing them; coating materials, adhesives or sealing compounds preparable using the solids; and coatings, adhesive films or seals producible from the coating materials, adhesives or sealing compounds.

    Abstract translation: 含有（i）平均每分子至少两个（a）具有至少一个可以用光化辐射活化的键的基团（a），由此基团（a）在结构上彼此不同并且连接到固体的母体结构 通过氨基甲酸酯基团，或者每个分子平均包含多于一个具有至少一个可以用光化辐射活化的键的组（a），所述基团在结构上彼此不同或相同并附着于母体 至少一种化学键合的聚合抑制剂（b）可以通过氨基甲酸酯基团的固体的结构和0.01至1摩尔％（基于可用光化辐射活化的键），其可通过使熔融物中的起始产物反应 ; 使用固体作为涂料，粘合剂或密封剂或用于制备它们; 可使用固体制备的涂料，粘合剂或密封剂; 以及可从涂层材料，粘合剂或密封化合物生产的涂料，粘合剂膜或密封剂。

    Radiation-sensitive mixture containing acid-labile groups and production of relief patterns
    29.
    发明授权
    Radiation-sensitive mixture containing acid-labile groups and production of relief patterns 失效
    含有酸不稳定组的辐射敏感混合物和浮雕图案的生成

    公开(公告)号：US5318876A

    公开(公告)日：1994-06-07

    申请号：US862949

    申请日：1992-04-03

    Applicant: Reinhold Schwalm ,  Horst Binder ,  Dirk Funhoff

    Inventor： Reinhold Schwalm ,  Horst Binder ,  Dirk Funhoff

    IPC: C08K5/42 ,  C08K5/51 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03G1/73 ,  G03G5/56

    CPC classification number: G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

    Abstract: A radiation-sensitive mixture which contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more groups cleavable by an acid and in addition a group which forms a strong acid under the action of radiation, and additionally(c) an alkyl- or arylsulfonate of a hydroxyaromatic, is suitable for the production of relief patterns.

    Abstract translation: 一种辐射敏感性混合物，其包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）通过酸的作用使其在碱性显影剂中的溶解度增加的有机化合物，并含有一种 或更多的基团，并且另外在辐射作用下形成强酸的基团，另外（c）羟基芳族化合物的烷基或芳基磺酸盐适用于产生浮雕图案。

    Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds
    30.
    发明授权
    Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds 失效
    用含有碱性有机化合物的含水显影剂开发含有聚（对羟基苯乙烯）和锍盐的正性光致抗蚀剂的方法

    公开(公告)号：US5252436A

    公开(公告)日：1993-10-12

    申请号：US976004

    申请日：1992-11-13

    Applicant: Horst Binder ,  Reinhold Schwalm

    Inventor： Horst Binder ,  Reinhold Schwalm

    IPC: G03F7/32 ,  G03F7/30

    CPC classification number: G03F7/322

    Abstract: An aqueous developer suitable in particular for developing photoresists which contain a phenolic resin and an onium salt contains from 0.5 to 5 % by weight of a tetraalkylammonium hydroxide and from 5 to 25% by weight of at least one amine of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and each is hydrogen, alkyl, hydroxyalkyl or aminoalkyl, or two of R.sup.1 to R.sup.3 combine to form a N-containing ring, with at least one of R.sup.1 to R.sup.3 being hydroxyalkyl or aminoalkyl.

    Abstract translation: 特别适用于显影含有酚醛树脂和鎓盐的光致抗蚀剂的水性显影剂含有0.5-5重量％的四烷基氢氧化铵和5-25重量％的至少一种通式为“IMAGE”的胺， 其中R 1，R 2和R 3相同或不同并且各自为氢，烷基，羟基烷基或氨基烷基，或者R 1至R 3中的两个结合形成含N的环，其中至少一个R 1至R 3为羟烷基或氨基烷基。

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