公开(公告)号：US20190252228A1

公开(公告)日：2019-08-15

申请号：US16394344

申请日：2019-04-25

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Mitsutoshi Ochiai ,  Takaaki Nakano

IPC: H01L21/677 ,  H01L21/67

Abstract: A load port provided adjacent to a wafer transport chamber for taking in and out a wafer W between the wafer transport chamber and a FOUP, includes a plate-shaped part that constitutes a part of a wall of the wafer transport chamber, and has an opening for opening the wafer transport chamber; a door part for opening and closing the opening; a mounting table that is configured to mount a wafer storage container so as to oppose a lid part for opening and closing an internal space to the door part, and to move to and from the plate-shaped part; and an elastic part that is provided on the mounting table side of the plate-shaped part along the peripheral edge of the opening, wherein the elastic part elastically contacts the periphery of the lid part in the wafer storage container by moving the mounting table toward the plate-shaped part.

公开(公告)号：US20190145641A1

公开(公告)日：2019-05-16

申请号：US16244490

申请日：2019-01-10

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Yasushi Taniyama ,  Mitsutoshi Ochiai ,  Mitsuo Natsume ,  Atsushi Suzuki

IPC: F24F9/00 ,  H01L21/677 ,  H01L21/67

Abstract: There is provided a method for manufacturing semiconductor. The method includes providing a semiconductor manufacturing apparatus and providing an EFEM. The EFEM includes a shield gas curtain apparatus 6 that forms a gas curtain capable of shielding an opening 23 when an internal space 5S of a purge container 5, in which the humidity is reduced to a predetermined value by means of a bottom purge apparatus 25 provided in a load port 2, is brought into communication with an internal space 3S of a wafer transport chamber 3, the gas curtain being formed of a shield curtain gas blown immediately downward from a location near the opening 23 of the load port 2 and being closer to the wafer transport chamber 3 than the opening 23 at a higher height than an upper edge of the opening 23.

公开(公告)号：US20180362910A1

公开(公告)日：2018-12-20

申请号：US15736902

申请日：2016-06-15

Applicant: Entegris, Inc, ,  Tokyo Electron Limited ,  Sinfonia Technology Co., Ltd.

Inventor： Gregory Bores ,  Hisashi Gomi ,  Shigenori Ozaki ,  Akitake Tamura ,  Toshimitsu Fuji ,  Haruki Takeuchi

IPC: C12M1/00 ,  C12M3/00

Abstract: A laboratory system has a plurality of bottom opening sample transport pods for carrying one or more cassettes with cell culture vessels therein may have an aseptic interior environment and may cooperate with cell culture growing/processing stations having load ports allowing transfer of the cassettes with cell culture vessels into the stations while maintaining the aseptic integrity of the interior of the pods and the cassette and cell culture vessels. Internal environmental monitoring and control, purging, and tracking as well as automated robotic operation may be provided.

公开(公告)号：US20180308731A1

公开(公告)日：2018-10-25

申请号：US15738027

申请日：2016-06-08

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Haruki TAKEUCHI

IPC: H01L21/673 ,  H01L21/677 ,  A61L2/20

CPC classification number: H01L21/67373 ,  A61L2/20 ,  H01L21/67376 ,  H01L21/67379 ,  H01L21/677 ,  H01L21/67772

Abstract: Reliability in the restriction of the movement of a container is improved.A content moving device 1 includes: a table portion 20 on which a container 50 is placed; and a restricting mechanism 30. A flange 55 of the container 50 is shaped to provide a recessed portion 56a. A restricting mechanism 30 includes: a collar portion 31; a first restricting portion 32 configured to be located in the recessed portion 56a; a second restricting portion 33a provided above the first restricting portion 32 and inward of the collar portion 31; and a second moving mechanism. The second moving mechanism is configured to move the second restricting portion 33a along an extending direction B between a first position, in which the second restricting portion 33a is opposed to the flange 55 of the container 50 in an up-down direction A, and a second position, in which the second restricting portion 33a is opposed to the recessed portion 56a in the up-down direction A without being opposed to the flange 55 in the up-down direction A.

公开(公告)号：US09882460B2

公开(公告)日：2018-01-30

申请号：US15463247

申请日：2017-03-20

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Hiroshi Nakagawa ,  Takayoshi Fujii ,  Takashi Fukunaga ,  Yasuhiro Sakai ,  Takashi Onoue

IPC: H02K33/18

CPC classification number: H02K33/18 ,  H02K33/16 ,  H02K41/035

Abstract: The linear actuator includes an inner core (2), and an outer core (3) provided outside the inner core in a radial direction while being supported by a pair of flat springs (41 and 42). Permanent magnets (23 and 24) are formed at one of the inner core and the outer core, and magnetic pole portions (31a and 32a) are formed at the other of the inner core and the outer core to face the permanent magnet with predetermined gaps formed therebetween. Spacers (71 and 72) are respectively provided between the inner core and the flat springs, abutting portions are respectively configured by abutting facing surfaces of the spacers and the inner core and facing surfaces of the spacers and the flat springs adjacent to the spacers in the axial direction, and at least an engagement portion including a recess and a protrusion are arranged at the abutting portions.

公开(公告)号：US20170054325A1

公开(公告)日：2017-02-23

申请号：US15237119

申请日：2016-08-15

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Yuji Yamanaka ,  Mamoru Kosaki ,  Hideaki Moriya

IPC: H02J50/10 ,  H05K7/20 ,  H01L21/683

CPC classification number: H02J50/10 ,  H01L21/677 ,  H01L21/6838 ,  H05K7/2039

Abstract: A non-contact power supply device is used in a processing apparatus including a moving unit movable inside a closed container. The device supplies electric power to the moving unit from outside the closed container. The power supply device includes a feed unit and a heat dissipater. The feed unit includes a feed line and a power supply transformer. The feed line has a feed region arranged inside the closed container along the moving direction of the moving unit. The transformer is arranged inside the closed container so as to be opposed to the feed region in a non-contact manner and is provided so as to move together with the moving unit. The heat dissipater includes a portion on one end side connected to the feed region so as to be capable of conducting heat thereto, and a portion on the other end side extending outside the closed container, so that heat generated in the feed region is partially dissipated outside the closed container.

Abstract translation: 非接触供电装置用于包括在密闭容器内可移动的移动单元的处理设备。 该设备从密封容器外部向移动单元供电。 供电装置包括进料单元和散热器。 进料单元包括进料管线和电源变压器。 进料管线具有沿着移动单元的移动方向布置在密闭容器内的进料区域。 变压器配置在密闭容器的内部，以不接触的方式与进给区域相对并设置成与移动单元一起移动。 散热器包括在一端侧连接到供给区域的部分，以便能够向其供热，另一端侧的部分延伸到密闭容器外部，使得在进料区域中产生的热量部分消散 在密闭容器外。

公开(公告)号：US20150137724A1

公开(公告)日：2015-05-21

申请号：US14550433

申请日：2014-11-21

Applicant: IHI AEROSPACE CO., LTD. ,  SINFONIA TECHNOLOGY CO., LTD.

Inventor： Hitoshi OYORI ,  Yoshito OHTA ,  Keisuke ONISHI

IPC: H02P5/00

CPC classification number: H02P5/00 ,  G05B11/32 ,  G05B11/36 ,  G05B11/38 ,  G05B2219/40208 ,  G05B2219/42317

Abstract: Multipliers 21a and 21b output values, which are obtained by multiplying a total drive command value Es by first and second gains G1 and G2, respectively, as first and second drive command values E1 and E2. Controllers 23a and 23b control first and second actuators (motors) 5 and 7, respectively, on the basis of the first and second drive command values. The detection values of the drive amounts of the actuators are denoted by Ef1 and Ef2, respectively, and the detection value of the drive amount of a driven body is denoted by Ef. A gain calculator 27 calculates the gains G1 and G2 on the basis of Ef1, Ef and Ef2. An upper limit value of Ef, which denotes the drive amount of the driven body, is denoted by Lmax. When Ef1, Ef2 or Ef approaches zero, the first gain G1 is brought close to (Ef1−Lmax/2)/(Ef−Lmax).

Abstract translation: 乘法器21a和21b的输出值分别通过将总驱动指令值Es乘以第一和第二增益G1和G2作为第一和第二驱动指令值E1和E2获得。 控制器23a和23b分别基于第一和第二驱动指令值来控制第一和第二致动器（马达）5和7。 致动器的驱动量的检测值分别由Ef1和Ef2表示，驱动体的驱动量的检测值用Ef表示。 增益计算器27基于Ef1，Ef和Ef2来计算增益G1和G2。 表示被驱动体的驱动量的Ef的上限值由Lmax表示。 当Ef1，Ef2或Ef接近零时，第一增益G1接近（Ef1-Lmax / 2）/（Ef-Lmax）。

公开(公告)号：US20150024671A1

公开(公告)日：2015-01-22

申请号：US14269360

申请日：2014-05-05

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Yasushi Taniyama ,  Mitsutoshi Ochiai ,  Mitsuo Natsume ,  Atsushi Suzuki

IPC: F24F9/00

CPC classification number: F24F9/00 ,  F24F3/161 ,  H01L21/67017 ,  H01L21/67772

Abstract: There is provided an EFEM that includes a shield gas curtain apparatus 6 that forms a gas curtain capable of shielding an opening 23 when an internal space 5S of a purge container 5, in which the humidity is reduced to a predetermined value by means of a bottom purge apparatus 25 provided in a load port 2, is brought into communication with an internal space 3S of a wafer transport chamber 3, the gas curtain being formed of a shield curtain gas blown immediately downward from a location near the opening 23 of the load port 2 and being closer to the wafer transport chamber 3 than the opening 23 at a higher height than an upper edge of the opening 23. The EFEM thus configured can prevent and suppress a rapid increase in the humidity in the purge container, in which the humidity in the interior space is reduced by performing the bottom purging, occurring immediately after a lid of the purge container is opened, so that quality degradation due to the moisture adhered on a wafer can be avoided.

Abstract translation: 提供了一种EFEM，其包括屏蔽气幕装置6，其形成能够屏蔽开口23的气幕，当清洗容器5的内部空间5S通过底部将湿度降低到预定值时 设置在负载端口2中的净化装置25与晶片运送室3的内部空间3S连通，气幕由从负载端口的开口23附近的位置立即向下吹出的屏蔽帘式气体形成 并且比开口23更高的高度比开口23更靠近晶片输送室3.如此构造的EFEM可以防止和抑制净化容器中的湿度的快速增加，其中湿度 通过执行底部清洗，在清洗容器的盖子打开之后立即发生的内部空间被减少，使得由于水分附着在晶片上而导致的质量劣化可以是avoi ded。

公开(公告)号：US12172305B2

公开(公告)日：2024-12-24

申请号：US18102042

申请日：2023-01-26

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Hiroki Wakabayashi ,  Yasumichi Mieno ,  Takeshi Yabe ,  Manabu Funato

IPC: B25J9/04 ,  B25J9/12 ,  B25J11/00

Abstract: An arm unit of a transfer robot includes an R-axis motor configured to relatively rotate a second arm with respect to a first arm. The R-axis motor is fixed to the first arm so as to protrude to below an arm axis holding portion of the first arm with an output shaft thereof facing upward. The output shaft is configured to penetrate the first arm from below. The output shaft is fixed to the second arm by a shaft fixing portion.

公开(公告)号：US12087606B2

公开(公告)日：2024-09-10

申请号：US17894328

申请日：2022-08-24

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Masahiro Osawa ,  Toshihiro Kawai

IPC: H01L21/673

CPC classification number: H01L21/67396 ,  H01L21/67389

Abstract: An EFEM includes a housing having a substantially closed substrate transfer space in the housing and a control part configured to perform a control of supplying an inert gas into at least the housing. The control part includes an inert gas total supply amount setting part configured to set a total supply amount of the inert gas to be supplied into the housing; a door open/purge determination part configured to determine whether a container door of a substrate storage container is in an open state and whether a purge device is performing a purge process; and an in-housing inert gas supply amount calculation part configured to calculate a supply amount of the inert gas to be supplied into the housing. The supply amount of the inert gas to be supplied into the housing is determined according to an inert gas supply amount command value determined based on a calculation result.