Semiconductor device and method of manufacturing the same
    22.
    发明授权
    Semiconductor device and method of manufacturing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US09070783B2

    公开(公告)日:2015-06-30

    申请号:US12530797

    申请日:2008-02-27

    摘要: It is to enhance a current increasing effect by increasing a stress applied on a channel of a transistor. The invention is characterized by comprising: side wall insulating films 33 and 53 formed on a semiconductor substrate 11 with trenches 39 and 59 which are formed by removing dummy gates; gate electrodes 43 and 63 formed within the trenches 39 and 59 through a gate insulating film 41; first and second stress applying films 21 and 22 respectively formed along the side wall insulating films 33 and 53 over the semiconductor substrate 11; and source/drain regions 35, 36, 55, and 56 which are formed in the semiconductor substrate 11 on the both sides of the gate electrodes 43 and 63, in that the stress applying films 21 and 22 are formed before the first trench 39 and the second trench 59 are formed.

    摘要翻译: 通过增加施加在晶体管的沟道上的应力来增强电流增加的效果。 本发明的特征在于包括:形成在具有通过去除伪栅极形成的沟槽39和59的半导体衬底11上的侧壁绝缘膜33和53; 通过栅极绝缘膜41形成在沟槽39和59内的栅电极43和63; 分别沿着半导体基板11上的侧壁绝缘膜33和53形成的第一和第二应力施加膜21和22; 以及形成在栅电极43和63的两侧上的半导体衬底11中的源极/漏极区域35,36,55和56,其中应力施加膜21和22形成在第一沟槽39和 形成第二沟槽59。

    Solid-state image pickup element and image pickup apparatus
    23.
    发明授权
    Solid-state image pickup element and image pickup apparatus 有权
    固态图像拾取元件和图像拾取装置

    公开(公告)号:US08780247B2

    公开(公告)日:2014-07-15

    申请号:US13053427

    申请日:2011-03-22

    申请人: Shinya Yamakawa

    发明人: Shinya Yamakawa

    摘要: Disclosed herein is a solid-state image pickup element, including: a photoelectric conversion region; a transistor; an isolation region of a first conductivity type configured to isolate the photoelectric conversion region and the transistor from each other; a well region of the first conductivity type having the photoelectric conversion region, the transistor, and the isolation region of the first conductivity type formed therein; a contact portion configured to supply an electric potential used to fix the well region to a given electric potential; and an impurity region of the first conductivity type formed so as to extend in a depth direction from a surface of the isolation region of the first conductivity type in the isolation region of the first conductivity type between the contact portion and the photoelectric conversion region, and having a sufficiently higher impurity concentration than that of the isolation region of the first conductivity type.

    摘要翻译: 本文公开了一种固态摄像元件,包括:光电转换区域; 晶体管 第一导电类型的隔离区域,被配置为将光电转换区域和晶体管彼此隔离; 具有形成在其中的第一导电类型的光电转换区域,晶体管和隔离区域的第一导电类型的阱区域; 接触部分,被配置为提供用于将所述阱区域固定到给定电位的电位; 以及第一导电类型的杂质区域,形成为在接触部分和光电转换区域之间的第一导电类型的隔离区域中从第一导电类型的隔离区域的表面沿深度方向延伸,以及 具有比第一导电类型的隔离区的杂质浓度足够高的杂质浓度。

    Semiconductor device and method for production of semiconductor device
    24.
    发明授权
    Semiconductor device and method for production of semiconductor device 有权
    半导体装置及半导体装置的制造方法

    公开(公告)号:US08242558B2

    公开(公告)日:2012-08-14

    申请号:US12491652

    申请日:2009-06-25

    申请人: Shinya Yamakawa

    发明人: Shinya Yamakawa

    IPC分类号: H01L29/78

    摘要: Disclosed herein is a semiconductor device including: a gate electrode formed in a recess dug in the surface of a semiconductor substrate, with a gate insulating film interposed between the gate electrode and the semiconductor substrate; a source-drain diffusion layer formed on that surface of the semiconductor substrate which is adjacent to both sides of the gate electrode; and a stress applying layer which is formed deep from the surface of the semiconductor substrate in such a way as to cover the surface of the source-drain diffusion layer.

    摘要翻译: 本发明公开了一种半导体器件,包括:栅电极,其形成在半导体衬底的表面中的凹部中,栅极绝缘膜插入在栅电极和半导体衬底之间; 源极 - 漏极扩散层,形成在所述半导体衬底的与所述栅电极的两侧相邻的表面上; 以及从半导体衬底的表面形成为深度覆盖源极 - 漏极扩散层的表面的应力施加层。

    SOLID-STATE IMAGE PICKUP ELEMENT AND IMAGE PICKUP APPARATUS
    26.
    发明申请
    SOLID-STATE IMAGE PICKUP ELEMENT AND IMAGE PICKUP APPARATUS 有权
    固态图像拾取元件和图像拾取装置

    公开(公告)号:US20110234873A1

    公开(公告)日:2011-09-29

    申请号:US13053427

    申请日:2011-03-22

    申请人: Shinya Yamakawa

    发明人: Shinya Yamakawa

    IPC分类号: H04N5/335 H01L27/146

    摘要: Disclosed herein is a solid-state image pickup element, including: a photoelectric conversion region; a transistor; an isolation region of a first conductivity type configured to isolate the photoelectric conversion region and the transistor from each other; a well region of the first conductivity type having the photoelectric conversion region, the transistor, and the isolation region of the first conductivity type formed therein; a contact portion configured to supply an electric potential used to fix the well region to a given electric potential; and an impurity region of the first conductivity type formed so as to extend in a depth direction from a surface of the isolation region of the first conductivity type in the isolation region of the first conductivity type between the contact portion and the photoelectric conversion region, and having a sufficiently higher impurity concentration than that of the isolation region of the first conductivity type.

    摘要翻译: 本文公开了一种固态摄像元件,包括:光电转换区域; 晶体管 第一导电类型的隔离区域,被配置为将光电转换区域和晶体管彼此隔离; 具有形成在其中的第一导电类型的光电转换区域,晶体管和隔离区域的第一导电类型的阱区域; 接触部分,被配置为提供用于将所述阱区域固定到给定电位的电位; 以及第一导电类型的杂质区域,形成为在接触部分和光电转换区域之间的第一导电类型的隔离区域中从第一导电类型的隔离区域的表面沿深度方向延伸,以及 具有比第一导电类型的隔离区的杂质浓度足够高的杂质浓度。