METHOD AND SYSTEM FOR DETERMINING ULTRAVIOLET FLUENCE RECEIVED BY A FLUID
    23.
    发明申请
    METHOD AND SYSTEM FOR DETERMINING ULTRAVIOLET FLUENCE RECEIVED BY A FLUID 有权
    用于确定流体接收的超紫外线流体的方法和系统

    公开(公告)号:US20160258811A1

    公开(公告)日:2016-09-08

    申请号:US15036962

    申请日:2014-11-12

    Abstract: There is described a method of determining the UV fluence received by a fluid. The method comprises the steps of: (a) irradiating the fluid at an unknown UV fluence; (b) measuring the fluorescence of a test sample of the fluid after irradiation in Step (a) to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) determining the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence. There is also described a system for determining the UV fluence received by a fluid being treated in UV fluid treatment system comprising at least one UV source. The system comprises: (a) a radiation-transparent vessel for receiving a test sample of the fluid after irradiation of the fluid at an unknown UV fluence; (b) a fluorometer for measuring the fluorescence of the test sample received in the radiation-transparent vessel to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) a controller configured to determine the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence.

    Abstract translation: 描述了确定流体接收的UV注量的方法。 该方法包括以下步骤:(a)以未知的UV注量照射流体; (b)在步骤(a)中测量照射后的流体的测试样品的荧光,以产生与测试样品中包含的物质的规定的荧光组合物的浓度成比例的测试信号; 并且(c)通过将测试信号与作为所施加的UV注量的函数的与流体中规定的荧光成分的浓度成比例的控制信号的校准曲线进行比较来确定未知UV注量的值。 还描述了一种用于确定由包含至少一个UV源的UV流体处理系统中被处理的流体接收的UV注量的系统。 该系统包括:(a)辐射透明容器,用于在未知的紫外线注量流量的流体照射后接收流体的测试样品; (b)荧光计,用于测量接受在辐射透明容器中的测试样品的荧光,以产生与测试样品中包含的物质的规定荧光组合物的浓度成比例的测试信号; 以及(c)控制器,被配置为通过将测试信号与作为所施加的UV注量的函数的流体中规定的荧光成分的浓度成比例的控制信号的校准曲线进行比较来确定未知的UV注量的值。

    FLUID FLOW MODIFIER AND FLUID TREATMENT SYSTEM INCORPORATING SAME
    24.
    发明申请
    FLUID FLOW MODIFIER AND FLUID TREATMENT SYSTEM INCORPORATING SAME 审中-公开
    流体改性剂和流体处理系统

    公开(公告)号:US20140373955A1

    公开(公告)日:2014-12-25

    申请号:US14373487

    申请日:2013-01-21

    Inventor: Jim Fraser

    CPC classification number: F15D1/025 C02F1/325 C02F2201/328 F15D1/001 F15D1/04

    Abstract: A fluid flow modifier device comprising: an inlet portion for receiving a flow of fluid; an outlet portion for outputting the flow of fluid; and a flow modifier portion disposed between the inlet portion and the outlet portion, the flow modifier portion comprising an outer portion comprising a closed cross-section to the flow of fluid and an inner porous portion configured such that at least a portion of the flow received in the inlet portion must pass through the inner porous portion to reach the fluid outlet. The fluid flow modifier device is ideally used to transition fluid flow between an fluid supply line and a fluid treatment zone—for example, a pressure water supply line and an ultraviolet radiation treatment device (e.g., drinking water treatment device).

    Abstract translation: 一种流体流动调节装置,包括:用于接收流体流的入口部分; 用于输出流体流的出口部分; 以及设置在所述入口部分和所述出口部分之间的流动调节器部分,所述流动调节器部分包括外部部分,所述外部部分包括流体流动的封闭横截面和内部多孔部分,所述内部多孔部分被配置为使得所述流体的至少一部分被接收 在入口部分必须通过内部多孔部分以到达流体出口。 流体流动调节装置理想地用于过渡流体供应管线和流体处理区域之间的流体流动,例如压力供水管线和紫外线辐射处理装置(例如,饮用水处理装置)。

    Sectoral ring brush
    25.
    发明申请
    Sectoral ring brush 审中-公开
    部门环刷

    公开(公告)号:US20040216254A1

    公开(公告)日:2004-11-04

    申请号:US10428156

    申请日:2003-05-02

    Inventor: Peter Ueberall

    Abstract: A sectoral ring brush with inside trimming for keeping clear and/or cleaning cylindrical bodies, preferably quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for the disinfection of waste water, characterized in that the sectoral ring brush consists of sectoral elements whose trimming can be integrated prior to the installation in a housing, with the sectoral element being fastened individually or in a connected fashion, e.g. by connecting bridges on the circumference, in a ring-shaped housing.

    Abstract translation: 具有内部修整的扇形环刷,用于保持清洁和/或清洁圆柱形体,优选在UV消毒单元中的石英包层管,特别是用于消毒废水的UV消毒闸门中,其特征在于扇形环刷由扇形元件组成, 修整可以在安装在外壳中之前集成,其中扇形元件单独地或以连接方式固定,例如 通过在圆周上连接桥,在环形壳体中。

    Radiation source module
    26.
    发明申请
    Radiation source module 失效
    辐射源模块

    公开(公告)号:US20040211926A1

    公开(公告)日:2004-10-28

    申请号:US10846592

    申请日:2004-05-17

    CPC classification number: C02F1/325 A61L2/10 C02F2201/3227

    Abstract: The present invention provides a radiation source module for use in a fluid treatment system. In one embodiment, the module comprises: a substantially elongate first support member having a longitudinal first axis; and a first pair of radiation source assemblies extending from the first support member, each radiation source assembly comprising a radiation source; wherein the first pair of radiation source assemblies is oriented such that a second axis extending through a center point of each radiation source assembly is disposed at an angle with respect to the first axis. In another embodiment, the module comprises a substantially elongate first support member having a longitudinal first axis; and a first column of radiation source assemblies extending from the first support member, and a second column of radiation source assemblies extending from the first support member, each radiation source assembly comprising a radiation source;the first column of radiation source assemblies and the second column of radiation source assemblies disposed adjacent one another.

    Abstract translation: 本发明提供一种用于流体处理系统的辐射源模块。 在一个实施例中,模块包括:具有纵向第一轴线的基本细长的第一支撑构件; 以及从所述第一支撑构件延伸的第一对辐射源组件,每个辐射源组件包括辐射源; 其中所述第一对辐射源组件被定向成使得穿过每个辐射源组件的中心点的第二轴线相对于所述第一轴线成一定角度设置。 在另一个实施例中,模块包括具有纵向第一轴线的基本细长的第一支撑构件; 以及从第一支撑构件延伸的第一列辐射源组件和从第一支撑构件延伸的第二列辐射源组件,每个辐射源组件包括辐射源;第一列辐射源组件和第二列 的相邻的辐射源组件。

    Fluid treatment system and radiation sources module for use therein
    27.
    发明申请
    Fluid treatment system and radiation sources module for use therein 有权
    流体处理系统和辐射源模块

    公开(公告)号:US20040069954A1

    公开(公告)日:2004-04-15

    申请号:US10464849

    申请日:2003-06-19

    Abstract: A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal disposed on a first elongate surface of the module, the first elongate surface comprising a first longitudinal axis transverse to the source longitudinal axis, the seal operable to provide a substantially fluid tight seal between the first surface and a second surface which is adjacent to the first surface. A fluid treatment system employ the radiation source module is also described.

    Abstract translation: 辐射源模块,包括支撑构件,连接到所述支撑构件的辐射源组件,所述辐射源组件包括至少一个细长辐射源,所述辐射源组件具有源纵向轴线和模块到表面密封件,所述辐射源组件设置在第一细长表面上 所述模块,所述第一细长表面包括横向于所述源纵向轴线的第一纵向轴线,所述密封件可操作以在所述第一表面与邻近所述第一表面的第二表面之间提供基本上流体密封的密封。 还描述了采用辐射源模块的流体处理系统。

    Cleaning formulation and method of cleaning a surface
    28.
    发明申请
    Cleaning formulation and method of cleaning a surface 有权
    清洁配方和清洁表面的方法

    公开(公告)号:US20040048769A1

    公开(公告)日:2004-03-11

    申请号:US10659309

    申请日:2003-09-11

    CPC classification number: C11D3/364 C11D3/042 C11D3/1266 C11D3/323 C11D17/003

    Abstract: A cleaning formulation comprising a cleaning agent, a particulate clay material and an aqueous carrier. The formulation has a pH less than about 4.0 and is characterized by at least a 90% reduction in viscosity at 25null C. at a shear rate of up to about 0.10 snull1. The cleaning formulation is thixotropic and has a highly desirable combination of acid stability, temperature stability, electrolyte stability and ultraviolet radiation stability.

    Abstract translation: 一种清洁制剂,其包含清洁剂,颗粒状粘土材料和水性载体。 该制剂具有小于约4.0的pH,并且其特征在于在高达约0.10s -1的剪切速率下在25℃下至少降低90%的粘度。 清洗配方是触变性的,具有很好的酸稳定性,温度稳定性,电解液稳定性和紫外线辐射稳定性的组合。

    UV radiation source assembly
    29.
    发明授权

    公开(公告)号:US12183569B2

    公开(公告)日:2024-12-31

    申请号:US18392168

    申请日:2023-12-21

    Abstract: A radiation source assembly comprises a source base, a UV transparent sleeve, and a UV lamp. The source base comprises a sealed electrical connection interface and an opposing sealed sleeve interface. The sealed electrical connection interface comprises a electrical contacts and the sealed sleeve interface comprise a radial sealing element, an outer collar, and a compression ring. The UV transparent sleeve is engaged with the sleeve interface such that the radial sealing element of the sealed sleeve interface is disposed between the UV transparent sleeve and the outer collar of the source base, and the compression ring is positioned over the UV transparent sleeve and engaged with the source base to compress the radial sealing element onto the UV transparent sleeve and the outer collar. The UV lamp is disposed within the UV transparent sleeve and electrically coupled to the electrical contacts of the electrical connection interface.

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