公开(公告)号：US20180195174A1

公开(公告)日：2018-07-12

申请号：US15402993

申请日：2017-01-10

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4411 ,  C23C16/4586

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：USD793352S1

公开(公告)日：2017-08-01

申请号：US29570711

申请日：2016-07-11

Applicant: ASM IP Holding B.V.

Designer： Eric Hill

公开(公告)号：US20160362783A1

公开(公告)日：2016-12-15

申请号：US14738012

申请日：2015-06-12

Applicant: ASM IP HOLDING B.V.

Inventor： John Tolle ,  Eric Hill

IPC: C23C16/44 ,  C23C16/458 ,  H05B6/10 ,  C23C16/46

CPC classification number: C23C16/4405 ,  C23C14/021 ,  C23C14/50 ,  C23C16/0209 ,  C23C16/0218 ,  C23C16/458 ,  C23C16/4582 ,  C23C16/46 ,  H05B3/26 ,  H05B6/105

Abstract: A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.

Abstract translation: 提供了反应器系统和相关方法，其可以包括在晶片托盘中的加热元件。 加热元件可用于加热晶片托盘和位于反应室组件内的晶片托盘上的基片或晶片，并可用于引起晶片的天然氧化物的升华。

公开(公告)号：US20160051964A1

公开(公告)日：2016-02-25

申请号：US14465252

申请日：2014-08-21

Applicant: ASM IP Holding B.V.

Inventor： John Tolle ,  Eric Hill ,  Jereld Lee Winkler

IPC: B01J19/24 ,  C23C16/455 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32 ,  B01J19/00 ,  C23C16/50

CPC classification number: C23C16/46 ,  C23C16/452 ,  C23C16/50 ,  C23C16/52 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32816

Abstract: A system and method for providing intermediate reactive species to a reaction chamber are disclosed. The system includes an intermediate reactive species formation chamber fluidly coupled to the reaction chamber to provide intermediate reactive species to the reaction chamber. A pressure control device can be used to control an operating pressure of the intermediate reactive species formation chamber, and a heater can be used to heat the intermediate reactive species formation chamber to a desired temperature.

Abstract translation: 公开了一种用于向反应室提供中间反应物质的系统和方法。 该系统包括流体耦合到反应室的中间反应物质形成室，以向反应室提供中间反应物质。 可以使用压力控制装置来控制中间反应物质形成室的操作压力，并且可以使用加热器将中间反应物质形成室加热到所需温度。

公开(公告)号：US20150267301A1

公开(公告)日：2015-09-24

申请号：US14219839

申请日：2014-03-19

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  Shawn Thomas

IPC: C23C16/52

CPC classification number: C23C16/4412 ,  C23C16/45504 ,  C23C16/45508 ,  H01J37/32449 ,  H01J37/32834 ,  H01L21/67017 ,  H01L21/6719

Abstract: An improved exhaust system for a gas-phase reactor and a reactor and system including the exhaust system are disclosed. The exhaust system includes a channel fluidly coupled to an exhaust plenum. The improved exhaust system allows operation of a gas-phase reactor with desired flow characteristics while taking up relatively little space within a reaction chamber.

Abstract translation: 公开了一种用于气相反应器和包括排气系统的反应器和系统的改进的排气系统。 排气系统包括流体耦合到排气室的通道。 改进的排气系统允许具有所需流动特性的气相反应器的操作，同时在反应室内占据相对较小的空间。