公开(公告)号：US20140055788A1

公开(公告)日：2014-02-27

申请号：US14011663

申请日：2013-08-27

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Maria DEN BOEF ,  Arno Jan Bleeker ,  Youri Johannes Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Paul Frank Luehrmann ,  Henricus Petrus Maria Pellemans ,  Maurits Van Der Schaar ,  Cedric Desire Grouwstra ,  Markus Gerardus Martinus Van Kraaij

IPC: G03F7/20

CPC classification number: G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

公开(公告)号：US10591283B2

公开(公告)日：2020-03-17

申请号：US16168355

申请日：2018-10-23

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

IPC: G01B11/24 ,  G03F7/20

Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.

公开(公告)号：US09933250B2

公开(公告)日：2018-04-03

申请号：US14536979

申请日：2014-11-10

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

IPC: G01B11/24 ,  G03F7/20

CPC classification number: G01B11/24 ,  G03F7/70191 ,  G03F7/70633 ,  G03F7/7085

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes a detector configured to generate measurement signals that correspond to respective ones of the positions of the radiated spot and a processor configured to output, based on the measurement signals, a single value that is representative of the property of the substrate.

公开(公告)号：US09921489B2

公开(公告)日：2018-03-20

申请号：US14867594

申请日：2015-09-28

Applicant: ASML Netherlands B.V.

Inventor： Amandev Singh ,  Henricus Petrus Maria Pellemans

IPC: G01B9/00 ,  G03F7/20 ,  G03F9/00 ,  G02B21/24

CPC classification number: G03F7/70641 ,  G02B21/245 ,  G03F7/70616 ,  G03F9/7026

Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500′). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.

公开(公告)号：US09753379B2

公开(公告)日：2017-09-05

申请号：US14794013

申请日：2015-07-08

Applicant: ASML Netherlands B.V.

Inventor： Amandev Singh ,  Henricus Petrus Maria Pellemans ,  Patrick Warnaar

IPC: G03B27/52 ,  G03B27/32 ,  G03F7/20 ,  G01J3/28 ,  G01J3/45 ,  G01N21/47

CPC classification number: G03F7/70491 ,  G01J3/2823 ,  G01J3/45 ,  G01N21/4788 ,  G01N2201/06113 ,  G03F7/70625 ,  G03F7/70633

Abstract: Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.

公开(公告)号：US08921814B2

公开(公告)日：2014-12-30

申请号：US13902285

申请日：2013-05-24

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Johannes Matheus Marie De Wit ,  Ralph Josef Johannes Gerardus Anna M Smeets ,  Gerbrand Van Der Zouw

IPC: G21K5/04 ,  H01J65/04 ,  G01N21/956 ,  G03F7/20 ,  H01J61/54 ,  H05H1/24 ,  H05G2/00 ,  H05B41/38 ,  H01J61/02

CPC classification number: H05H1/24 ,  G01N21/956 ,  G01N2201/061 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70483 ,  G03F7/70616 ,  G03F7/70641 ,  H01J61/02 ,  H01J61/54 ,  H01J61/545 ,  H01J65/04 ,  H05B41/38 ,  H05G2/003 ,  H05G2/008

Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

Abstract translation: 激光驱动光源包括激光和聚焦光学元件。 这些产生聚焦在容纳气体（例如Xe）的容器内的等离子体形成区域上的辐射束。 收集光学器件收集由激光辐射维持的等离子体发射的光子以形成输出辐射束。 等离子体具有细长形式（L> d），并且收集光学器件被配置成收集从等离子体沿纵向出现的光子。 与收集从等离子体横向辐射的辐射的源相比，等离子体的亮度增加。 使用光源的计量装置可以由于亮度的增加而获得更高的精度和/或吞吐量。 可以提供背反射器。 可以使用微波辐射代替激光辐射以形成等离子体。