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公开(公告)号：US12189314B2
公开(公告)日：2025-01-07
申请号：US18035008
申请日：2021-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus Goorden , Simon Gijsbert Josephus Mathijssen , Leendert Jan Karssemeijer , Manouk Rijpstra , Ralph Brinkhof , Kaustuve Bhattacharyya
Abstract: A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.
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公开(公告)号：US11762305B2
公开(公告)日：2023-09-19
申请号：US17782570
申请日：2020-11-16
Applicant: ASML Netherlands B.V.
Inventor： Sergei Sokolov , Filippo Alpeggiani , Sebastianus Adrianus Goorden , Simon Reinald Huisman
IPC: G03F9/00
CPC classification number: G03F9/7088 , G03F9/7065 , G03F9/7092
Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.
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公开(公告)号：US11650513B2
公开(公告)日：2023-05-16
申请号：US17280711
申请日：2019-09-05
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden
IPC: G03F9/00
CPC classification number: G03F9/7088 , G03F9/7046 , G03F9/7049 , G03F9/7065 , G03F9/7076
Abstract: An apparatus for measuring a position of a mark on a substrate, the apparatus comprising: an illumination system configured to condition at least one radiation beam to form a plurality of illumination spots spatially distributed in series such that during scanning of the substrate the plurality of illumination spots are incident on the mark sequentially, and a projection system configured to project radiation diffracted by the mark from the substrate, the diffracted radiation being produced by diffraction of the plurality of illumination spots by the mark; wherein the projection system is further configured to modulate the diffracted radiation and project the modulated radiation onto a detecting system configured to produce signals corresponding to each of the plurality of illumination spots, the signals being combined to determine the position of the mark.
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公开(公告)号：US10599047B2
公开(公告)日：2020-03-24
申请号：US15988677
申请日：2018-05-24
Applicant: ASML Netherlands B.V.
Inventor： Janneke Ravensbergen , Nitesh Pandey , Zili Zhou , Armand Eugene Albert Koolen , Sebastianus Adrianus Goorden , Bastiaan Onne Fagginger Auer , Simon Gijsbert Josephus Mathijssen
IPC: G03F7/20 , G01N21/95 , G01N21/956 , G01N21/47 , G01B11/27
Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.
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公开(公告)号：US10317808B2
公开(公告)日：2019-06-11
申请号：US16069678
申请日：2017-01-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Reinald Huisman , Alessandro Polo , Duygu Akbulut , Sebastianus Adrianus Goorden , Arie Jeffrey Den Boef
Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.
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Patent Agency Ranking
公开(公告)号：US12025925B2
公开(公告)日：2024-07-02
申请号：US17773384
申请日：2020-10-19
Applicant: ASML Netherlands B.V.
Inventor： Filippo Alpeggiani , Henricus Petrus Maria Pellemans , Sebastianus Adrianus Goorden , Simon Reinald Huisman
CPC classification number: G03F9/7046 , G03F7/70091 , G03F7/70133 , G03F7/70516
Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.
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公开(公告)号：US11906906B2
公开(公告)日：2024-02-20
申请号：US17565422
申请日：2021-12-29
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
CPC classification number: G03F7/70625 , G03F7/70633 , G03F7/70641
Abstract: Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
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公开(公告)号：US11360399B2
公开(公告)日：2022-06-14
申请号：US17277353
申请日：2019-08-27
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Simon Gijsbert Josephus Mathijssen , Henricus Petrus Maria Pellemans
IPC: G03F7/20
Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.
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公开(公告)号：US11181835B2
公开(公告)日：2021-11-23
申请号：US16613551
申请日：2018-04-13
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Sebastianus Adrianus Goorden , Johannes Antonius Gerardus Akkermans , Simon Reinald Huisman , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
Abstract: Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.
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公开(公告)号：US11086240B2
公开(公告)日：2021-08-10
申请号：US16470905
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus Goorden , Nitesh Pandey , Duygu Akbulut , Alessandro Polo , Simon Reinaid Huisman
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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