公开(公告)号：US20160225477A1

公开(公告)日：2016-08-04

申请号：US14917623

申请日：2014-09-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Peturs Rutgerus BARTRAIJ ,  Ramon Pascal VAN GORKOM ,  Lucas Johannes Peter AMENT ,  Pieter Willem Herman DE JAGER ,  Gosse Charles DE VRIES ,  Rilpho Ludovicus DONKER ,  Wouter Joep ENGELEN ,  Olav Waldemar Vladimir FRIJNS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Andelko KATALENIC ,  Erik Roelof LOOPSTRA ,  Han-Kwang NIENHUYS ,  Andrey Alexandrovich NIKIPELOV ,  Michael Jozef Mathijs RENKENS ,  Franciscus Johannes Joseph JANSSEN ,  Borgert KRUIZINGA

IPC: G21K1/06 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。

公开(公告)号：US20160147161A1

公开(公告)日：2016-05-26

申请号：US14900110

申请日：2014-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Olav Waldemar Vladimir FRIJNS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Rilpho Ludovicus DONKER ,  Han-Kwang NIENHUYS ,  Borgert KRUIZINGA ,  Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Vladimir LITVINENKO

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

Abstract translation: 图案化平版印刷基板的方法，其包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备。 该方法还包括通过使用基于反馈的控制回路来相对地调节自由电子激光器的调节和调整自由电子激光器的操作来减少递送到光刻基片的EUV辐射的功率波动，以及将可变衰减应用于具有 由自由电子激光器输出，以便进一步控制传送到光刻设备的EUV辐射的功率。

公开(公告)号：US20150331338A1

公开(公告)日：2015-11-19

申请号：US14651567

申请日：2013-11-26

Applicant: ASML Netherlands B.V.

Inventor： Erik Johan ARLEMARK ,  Andrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Carlo Cornelis Maria LUIJTEN ,  Han-Kwang NIENHUYS

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70908

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450′) disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

Abstract translation: 公开了一种用于将EUV辐射束投射到基板（400）的目标部分上的装置的基板支撑件。 衬底支撑件包括构造成保持衬底的衬底台，用于支撑衬底台的支撑块（420）和设置在衬底台周围的盖板（450'）。 盖板的顶表面和安装在基板上的基板的顶表面基本上处于相同的水平。 至少一个传感器单元（430）位于基板支撑件上，其顶表面也处于与盖板和基板相同的高度。 还公开了包括这种基板支撑件的EUV光刻设备。