公开(公告)号：US12147162B2

公开(公告)日：2024-11-19

申请号：US18124350

申请日：2023-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

IPC: G03F7/00 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US10890851B2

公开(公告)日：2021-01-12

申请号：US15828523

申请日：2017-12-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

IPC: G03F7/20 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US10712678B2

公开(公告)日：2020-07-14

申请号：US15046284

申请日：2016-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Andre Bernardus Jeunink ,  Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Frederik Dijksman ,  Carolus Johannes Catharina Schoormans ,  Adrianus Hendrik Koevoets ,  Catharinus De Schiffart ,  Sander Frederik Wuister

IPC: B29C43/58 ,  G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  G03F7/20 ,  B29C43/02 ,  B29C59/02 ,  B29C59/16

Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

公开(公告)号：US10654217B2

公开(公告)日：2020-05-19

申请号：US15865242

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US10481498B2

公开(公告)日：2019-11-19

申请号：US16061847

申请日：2016-12-15

Applicant: ASML Netherlands B.V.

Inventor： Johan Frederik Dijksman ,  Bastiaan Lambertus Wilhelmus Marinus van de Ven ,  Koen Gerhardus Winkels ,  Theodorus Wilhelmus Driessen ,  Georgiy O. Vaschenko ,  Peter Michael Baumgart ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Jan Okke Nieuwenkamp ,  Wim Ronald Kampinga ,  Jari Ruotsalainen

IPC: G03F7/20 ,  H05G2/00

Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.

公开(公告)号：US20150055106A1

公开(公告)日：2015-02-26

申请号：US14377586

申请日：2013-01-03

Applicant: ASML Netherlands B.V.

Inventor： Johan Frederik Dijksman ,  Johannes Hultermans ,  Antonius Theodorus Wilhelmus Kempen ,  Ramin Badie

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70916 ,  H05G2/005

Abstract: The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so that the fuel droplets re emitted downwardly whereby gravity assists in the establishment of the stream. The droplets are monitored using a visualization system and once the stream is determined to have the desired characteristics the stream generator is moved to a second position of steady state use in which the droplet stream is emitted in a horizontal direction.

Abstract translation: 本发明提供了一种便于启动燃料液滴流发生器的方法和装置。 在起动阶段期间，燃料液滴流发生器被定位成使得燃料液滴向下发射，由此重力有助于流的建立。 使用可视化系统监测液滴，并且一旦流被确定为具有期望的特性，则流发生器被移动到液晶流在水平方向上发射的稳态使用的第二位置。

公开(公告)号：US20140291879A1

公开(公告)日：2014-10-02

申请号：US14304662

申请日：2014-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela KRUIJT-STEGEMAN ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract translation: 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。