公开(公告)号：US20190107781A1

公开(公告)日：2019-04-11

申请号：US16150879

申请日：2018-10-03

Applicant: Stichting VU ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/95

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US12117734B2

公开(公告)日：2024-10-15

申请号：US17638975

申请日：2020-07-31

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Alexander Prasetya Konijnenberg

IPC: G03F7/00 ,  G01N21/47

CPC classification number: G03F7/70633 ,  G01N21/4738

Abstract: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.

公开(公告)号：US11782351B2

公开(公告)日：2023-10-10

申请号：US17636830

申请日：2020-07-15

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70275 ,  G03F7/70625 ,  G03F7/70641

Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.

公开(公告)号：US11549806B2

公开(公告)日：2023-01-10

申请号：US17141698

申请日：2021-01-05

Applicant: ASML Netherlands B.V.

Inventor： Marinus Johannes Maria Van Dam ,  Arie Jeffrey Den Boef ,  Nitesh Pandey

IPC: G01B11/25 ,  G02F1/01 ,  G02F1/33

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

公开(公告)号：US11454887B2

公开(公告)日：2022-09-27

申请号：US16556709

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey

IPC: G03F7/00 ,  G03F7/20

Abstract: Disclosed is a method and associated inspection apparatus for measuring a characteristic of interest relating to a structure on a substrate. The inspection apparatus uses measurement radiation comprising a plurality of wavelengths. The method comprises performing a plurality of measurement acquisitions of said structure, each measurement acquisition being performed using measurement radiation comprising a different subset of the plurality of wavelengths, to obtain a plurality of multiplexed measurement signals. The plurality of multiplexed measurement signals are subsequently de-multiplexed into signal components according to each of said plurality of wavelengths, to obtain a plurality of de-multiplexed measurement signals which are separated according to wavelength.

公开(公告)号：US10983445B2

公开(公告)日：2021-04-20

申请号：US16268564

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh Pandey ,  Zili Zhou ,  Gerbrand Van Der Zouw ,  Arie Jeffrey Den Boef ,  Markus Gerardus Martinus Maria Van Kraaij ,  Armand Eugene Albert Koolen ,  Hugo Augustinus Joseph Cramer ,  Paul Christiaan Hinnen ,  Martinus Hubertus Maria Van Weert ,  Anagnostis Tsiatmas ,  Shu-jin Wang ,  Bastiaan Onne Fagginger Auer ,  Alok Verma

IPC: G03F7/20 ,  G01N21/21 ,  G01N21/88

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：US10895452B2

公开(公告)日：2021-01-19

申请号：US16558457

申请日：2019-09-03

Applicant: ASML Netherlands B.V.

Inventor： Marinus Johannes Maria Van Dam ,  Arie Jeffrey Den Boef ,  Nitesh Pandey

IPC: G01B11/00 ,  G01B11/25 ,  G02F1/01 ,  G02F1/33

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

公开(公告)号：US10795269B2

公开(公告)日：2020-10-06

申请号：US16170786

申请日：2018-10-25

Applicant: ASML Netherlands B.V.

Inventor： Zili Zhou ,  Gerbrand Van Der Zouw ,  Nitesh Pandey ,  Markus Gerardus Martinus Maria Van Kraaij ,  Martinus Hubertus Maria Van Weert ,  Anagnostis Tsiatmas ,  Sergey Tarabrin ,  Hilko Dirk Bos

IPC: G01J4/00 ,  G03F7/20

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.

公开(公告)号：US10670975B2

公开(公告)日：2020-06-02

申请号：US16061209

申请日：2016-11-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert John Socha ,  Arie Jeffrey Den Boef ,  Nitesh Pandey

IPC: G06F17/00 ,  G01N21/55 ,  G03F7/20 ,  G01N21/956 ,  G01B11/27 ,  G01N21/88

Abstract: A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.

公开(公告)号：US10656534B2

公开(公告)日：2020-05-19

申请号：US16428215

申请日：2019-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh Pandey ,  Jin Lian ,  Samee Ur-Rehman ,  Martin Jacobus Johan Jak

IPC: G01B11/02 ,  G03F7/20

Abstract: Methods and apparatuses for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method includes obtaining data from a first measurement process. The first measurement process including individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process includes illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.