公开(公告)号：US5086545A

公开(公告)日：1992-02-11

申请号：US634729

申请日：1990-12-27

申请人： Takatoshi Suzuki

发明人： Takatoshi Suzuki

IPC分类号： B42F1/02 ,  B42F15/06

CPC分类号： B42F15/066 ,  B42F1/02 ,  Y10T24/20 ,  Y10T24/202 ,  Y10T24/3453

摘要： A paper clip has a U-shaped holder containing first group of hairs and second group of hairs in an obliquely inclined abutment relation in the confronting inner surfaces of the U-shaped holder.

公开(公告)号：US4522660A

公开(公告)日：1985-06-11

申请号：US501001

申请日：1983-06-03

申请人： Takatoshi Suzuki ,  Hideo Tachikawa ,  Shigeo Moriyama

发明人： Takatoshi Suzuki ,  Hideo Tachikawa ,  Shigeo Moriyama

IPC分类号： C01B21/072 ,  C23C8/36 ,  C23C14/58 ,  C23C26/00 ,  C21D1/48

CPC分类号： C23C14/5826 ,  C23C14/58 ,  C23C14/586 ,  C23C26/00 ,  C23C8/36

摘要： A process for ion nitriding of aluminum or an aluminum alloy and an apparatus therefor, wherein aluminum or an aluminum alloy as an article to be treated is disposed on a substrate holder provided in a sealed container. A predetermined metal having an intensive affinity for oxygen is also disposed in the vicinity of the article to be treated, and a glow discharge is operated between an electrode provided in the sealed container as an anode and the substrate holder as a cathode. The electrode may be directly provided at the sealed container itself or it may be independently provided therein. According to the process and apparatus of the present invention, it is possible to form on the surface of aluminum or an aluminum alloy an aluminum nitride layer having an intensive adhesion to a substrate thereof, high hardness and excellent wear resistance.

摘要翻译： 铝或铝合金的离子渗氮方法及其设备，其中将铝或铝合金作为待处理物品设置在设置在密封容器中的基板保持器上。 对待处理物品附近也设置有对氧气具有强烈亲合力的预定金属，并且在设置在作为阳极的密封容器中的电极和作为阴极的基板保持器之间进行辉光放电。 电极可以直接设置在密封容器本身处，或者可以独立地设置在其中。 根据本发明的方法和装置，可以在铝或铝合金的表面上形成对其基材具有强烈粘附性的氮化铝层，高硬度和优异的耐磨性。

公开(公告)号：US20130137293A1

公开(公告)日：2013-05-30

申请号：US13814986

申请日：2011-08-04

申请人： Kazunori Miura ,  Kouichi Ohyama ,  Takatoshi Suzuki

发明人： Kazunori Miura ,  Kouichi Ohyama ,  Takatoshi Suzuki

IPC分类号： H01R13/58

CPC分类号： H01R13/582 ,  H01R12/777 ,  H01R13/5205 ,  H01R13/5812

摘要： The present invention provides a connector for planar cables, which can reliably electrically connect a planar cable conductor and a mating terminal. The connector (1) for planar cables comprises: a planar cable (3) provided with a plurality of conductors; a connector housing (5) with an insertion port (31) where the planar cable (3) is inserted disposed on one side; and a fork-shaped mating terminal (7) that is inserted from the thickness direction of the planar cable (3) and electrically connected to a conductor. A slider (11) comprising resin that covers one surface in the conductor thickness direction is disposed on the planar cable (3); a housing (33) that restricts movement in the insertion direction towards the connector housing (5), houses the slider (11), and communicates with the insertion port (31) is disposed in the connector housing (5); and an end section on the other side from the connector housing (5) for the slider (11) protrudes towards the outside of the connector housing (5) from the housing (33), is inserted into the mating terminal (7), and electrically connects the planar cable (3) conductors and the mating terminal (7).

摘要翻译： 本发明提供一种用于平面电缆的连接器，其可以可靠地电连接平面电缆导体和匹配端子。 用于平面电缆的连接器（1）包括：设置有多个导体的平面电缆（3）; 连接器壳体（5），其具有插入端口（31），其中所述平面电缆（3）插入设置在一侧; 以及从平面电缆（3）的厚度方向插入并电连接到导体的叉状配合端子（7）。 包括在导体厚度方向覆盖一个表面的树脂的滑块（11）设置在平面电缆（3）上; 限制沿插入方向朝向连接器壳体（5）的移动的壳体（33）容纳滑块（11），并且与插入口（31）连通设置在连接器壳体（5）中; 并且从所述滑块（11）的所述连接器壳体（5）的另一侧的端部从所述壳体（33）朝向所述连接器壳体（5）的外部突出，插入到所述配合端子（7）中，并且 电连接平面电缆（3）导体和配对端子（7）。

公开(公告)号：US06344372B1

公开(公告)日：2002-02-05

申请号：US09521890

申请日：2000-03-09

申请人： Rieka Ohuchi ,  Takatoshi Suzuki

发明人： Rieka Ohuchi ,  Takatoshi Suzuki

IPC分类号： H01L2144

CPC分类号： H01L23/13 ,  H01L21/563 ,  H01L24/11 ,  H01L24/29 ,  H01L2224/1134 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/16225 ,  H01L2224/29007 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/83192 ,  H01L2924/00013 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/07802 ,  H01L2924/09701 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/15151 ,  H01L2924/351 ,  H01L2924/00014 ,  H01L2224/13099 ,  H01L2924/00

摘要： In a semiconductor device including a substrate which has a primary surface, a conduction wire formed on the primary surface, a semiconductor element which has a secondary surface, a projective electrode formed on the secondary surface, an insulative resin for adhesion which is applied between the primary surface and the secondary surface and which shrinks by hardening thereof, the substrate and the semiconductor element are adhered to each other by the hardening of the insulative resin with the projective electrode and the conduction wire corresponding with each other, so that an electrical connection between the projective electrode and the conduction wire is achieved and that a residual stress is generated in the insulative resin. The residual stress has a maximum value thereof around the projective electrode.

摘要翻译： 在包括具有主表面的基板的半导体器件中，形成在主表面上的导线，具有次表面的半导体元件，形成在次表面上的突出电极，用于粘附的绝缘树脂， 主表面和次表面，并且通过其硬化而收缩，基板和半导体元件通过绝缘树脂的硬化彼此粘合，其中突出电极和导线彼此对应，使得电连接 实现了投影电极和导线，并且在绝缘树脂中产生残余应力。 残余应力在投射电极周围具有最大值。

公开(公告)号：US06330524B1

公开(公告)日：2001-12-11

申请号：US09269190

申请日：1999-05-20

申请人： Takatoshi Suzuki ,  Tingwen Xing

发明人： Takatoshi Suzuki ,  Tingwen Xing

IPC分类号： G01B1102

CPC分类号： G02B13/0005

摘要： The present invention has the object to make an fØ lens constituting a scanning optical system such as a laser printer, etc., which is of a single lens configuration, and higher in resolution, thereby providing the f&thgr; lens provided with a lens performance so as to correspond to an A3 paper size or the like. The f&thgr; lens is designed by the aspherical formula as follows: Z =   ⁢ C x ⁢ X 2 1 + 1 - ( 1 + K ) ⁢ C x 2 ⁢ X 2 + ∑ n = 3 u ⁢ A n ⁢ &LeftBracketingBar; X n &RightBracketingBar; +   ⁢ C y ⁢ Y 2 ⁡ ( 1 + ∑ m = 2 w ⁢ B m ⁢ &LeftBracketingBar; X m &RightBracketingBar; ) 1 + 1 - [ 1 + K y ⁡ ( 1 + ∑ j = 1 v ⁢ G j ⁢ X 2 ⁢ j ) ] ⁡ [ C y 2 ⁢ Y 2 ⁡ ( 1 + ∑ m = 2 w ⁢ B m ⁢ &LeftBracketingBar; X m &RightBracketingBar; ) 2 ] -   ⁢ C x = 1 / R x C y = 1 / R y where Cx, K, An, Cy, Bm, Ky, and Gj are each an optional coefficient; and u, v, and w are each an integer. The f&thgr; lens is further designed by using an optional term containing an odd-numbered degree and an even-numbered degree for each of &Sgr;An|Xn|, &Sgr;Bm|Xm|, and &Sgr;GjX2j in the aspherical formula representing a shape of each of an incident surface or an outgoing surface of the f&thgr; lens.

摘要翻译： 本发明的目的是使构成诸如激光打印机等的扫描光学系统的fθ透镜是单透镜结构，并且分辨率更高，从而提供了具有透镜性能的透镜性能， 以对应于A3纸张尺寸等。 ftheta透镜由非球面公式设计如下：其中Cx，K，An，Cy，Bm，Ky和Gj各自为可选系数; andu，v和w均为整数。通过使用对于SIGMAAn | Xn |，SIGMABm | Xm |和SIGMAGjX2j中的每一个包含奇数等级和偶数度的可选项，进一步设计ftata透镜 表示该透镜的入射面或出射面各自的形状的非球面式。

公开(公告)号：US5840136A

公开(公告)日：1998-11-24

申请号：US811147

申请日：1997-03-04

申请人： Michio Maruki ,  Kouji Ohbayashi ,  Takatoshi Suzuki

发明人： Michio Maruki ,  Kouji Ohbayashi ,  Takatoshi Suzuki

IPC分类号： C21D6/00 ,  C21D1/09 ,  C21D1/18 ,  C21D1/19 ,  C21D1/20 ,  C21D1/34 ,  C21D1/38 ,  C21D1/42 ,  C21D5/00 ,  C21D9/02 ,  C21D9/00

CPC分类号： C21D1/19 ,  C21D1/09 ,  C21D9/02 ,  C21D1/20 ,  C21D2211/00 ,  C21D2211/002

摘要： A bainite forming process for treating a steel material reduces the time required for a complete thermal treatment as well as the cycle time for the thermal treatment device without necessitating any special means for handling the steel material. The steel material is heated to a temperature higher than the austenitic transformation point, and temporarily quenched to an intermediate point temperature higher than the martensitic transformation point. Then, the temperature of the steel material is again raised towards the range corresponding to bainitic transformation to form a bainitic structure. The reheating is discontinued before the temperature corresponding to the austenitic transformation point is reached, and the steel material is then quenched. In the heating steps, only the portion to be treated by the bainite forming process is locally irradiated with a high-density energy beam.

摘要翻译： 用于处理钢材的贝氏体形成方法减少了完全热处理所需的时间以及热处理装置的循环时间，而不需要用于处理钢材的任何特殊装置。 将钢材加热至高于奥氏体相变点的温度，并暂时淬火至高于马氏体相变点的中间点温度。 然后，将钢材的温度再次升高到与贝氏体转变相对应的范围，形成贝氏体组织。 在达到与奥氏体相变点相应的温度之前，再加热停止，然后钢材淬火。 在加热步骤中，只有通过贝氏体形成工艺处理的部分被高密度能量束局部照射。

公开(公告)号：US5372179A

公开(公告)日：1994-12-13

申请号：US145468

申请日：1993-10-22

申请人： Yuji Sakakibara ,  Takatoshi Suzuki ,  Hiroaki Hayashi ,  Yasuo Takada ,  Akihiko Suda ,  Yoshiro Hayashi ,  Kenji Kaida ,  Ryuuichi Masuda ,  Masahiro Taguchi

发明人： Yuji Sakakibara ,  Takatoshi Suzuki ,  Hiroaki Hayashi ,  Yasuo Takada ,  Akihiko Suda ,  Yoshiro Hayashi ,  Kenji Kaida ,  Ryuuichi Masuda ,  Masahiro Taguchi

IPC分类号： B22C9/18 ,  B22C3/00

CPC分类号： B22C9/18

摘要： A mold comprising a cavity for defining the shape of a casting and a mold body for forming said cavity, comprising: a mold body formed of an ordinary temperature setting resin or thermosetting resin and casting sand, said mold body having a surface layer portion on the surfaces thereof including depressions, said depressions in the surface layer portion being filled up with at least one porous powdered material selected from the group consisting of hydrous magnesium silicate clay mineral, activated carbon and activated alumina, thereby providing the mold body with smooth surfaces whereby said mold generates less amount of material such as gums which cause defective castings during casting since molten metal is restrained from intruding into the walls of said mold.

摘要翻译： 一种模具，包括用于限定铸件形状的空腔和用于形成所述空腔的模具体，包括：由常温树脂或热固性树脂和铸砂形成的模具本体，所述模具主体在其上具有表面层部分 其表面包括凹陷，表层部分中的所述凹陷填充有至少一种选自含水硅酸镁粘土矿物，活性炭和活性氧化铝的多孔粉末材料，从而为模体提供光滑表面，由此所述 模具产生较少量的材料，例如在铸造期间导致有缺陷的铸件的树胶，因为熔融金属被限制进入所述模具的壁。

公开(公告)号：US4767801A

公开(公告)日：1988-08-30

申请号：US29180

申请日：1987-03-23

申请人： Takatoshi Suzuki ,  Yasuo Takada ,  Yuji Sakakibara ,  Masahiro Sugiura ,  Hiroaki Hayashi ,  Osami Kamigaito

发明人： Takatoshi Suzuki ,  Yasuo Takada ,  Yuji Sakakibara ,  Masahiro Sugiura ,  Hiroaki Hayashi ,  Osami Kamigaito

IPC分类号： B22C1/02 ,  B22C1/20 ,  C08K3/34

CPC分类号： B22C1/02 ,  B22C1/20

摘要： Molding material composed of casting sand coated with a thermosetting resin and hydrous magnesium silicate clay mineral which may be impregnated with an acid and/or coated with a thermosetting resin, and a shell mold produced from the molding material. This material and mold minimize generation of smoke and irritating gases at the time of mold making and casting.

公开(公告)号：US4597808A

公开(公告)日：1986-07-01

申请号：US718788

申请日：1985-03-29

申请人： Hideo Tachikawa ,  Takatoshi Suzuki ,  Hironori Fujita ,  Tohru Arai

发明人： Hideo Tachikawa ,  Takatoshi Suzuki ,  Hironori Fujita ,  Tohru Arai

IPC分类号： C23C8/36 ,  C21D1/48

CPC分类号： C23C8/36

摘要： A process for ion nitriding aluminum or an aluminum alloy as an article to be treated, in which: the article is disposed in a sealed vessel; the oxygen gas in the vessel is removed; the surface of the article is heated to a prescribed nitriding temperature; the surface of the article is activated to facilitate the formation of an aluminum nitride layer by the subsequent nitriding treatment; and thereafter the article is subjected to ion nitriding, thereby forming an aluminum nitride layer having excellent wear resistance and high hardness. This ion nitriding treatment for aluminum material can be carried out even at temperatures lower than a solution treatment temperature of aluminum material.

摘要翻译： 一种用于将铝或铝合金作为待处理物品的离子氮化方法，其中：将物品置于密封容器中; 去除容器中的氧气; 将制品的表面加热到规定的氮化温度; 活性物质的表面通过随后的氮化处理促进形成氮化铝层; 然后将制品进行离子氮化，从而形成具有优异的耐磨性和高硬度的氮化铝层。 即使在低于铝材的固溶处理温度的温度下也可以进行铝材的离子渗氮处理。

公开(公告)号：US3933483A

公开(公告)日：1976-01-20

申请号：US541251

申请日：1975-01-15

申请人： Noboru Komatsu ,  Takatoshi Suzuki ,  Nobuyuki Yamamoto ,  Yukikazu Tsuzuki

发明人： Noboru Komatsu ,  Takatoshi Suzuki ,  Nobuyuki Yamamoto ,  Yukikazu Tsuzuki

IPC分类号： C22C19/03

CPC分类号： C22C19/03

摘要： An alloy of nickel-aluminum-molybdenum containing silicon in the ranges enclosed between points A (nickel--85% by weight, aluminum--5% by weight, molybdenum--10% by weight), B (nickel--75%, aluminum--15%, molybdenum--10%), C (nickel--65%, aluminum--15%, molybdenum--20%) and D (nickel--75%, aluminum--5%, molybdenum--20%) as shown in FIG. 1 and including silicon in the range of 0.1 to 3% by weight and preferably in a range of 0.5 to 2.5% by weight.

摘要翻译： A点（镍-85重量％，铝-5重量％，钼-10重量％），B（镍-75％，铝-15）之间的范围内的含有镍 - ％，钼-10％），C（镍65％，铝-15％，钼-20％）和D（镍75％，铝-5％，钼-20％）。 并且包括硅在0.1至3重量％的范围内，优选在0.5至2.5重量％的范围内。