Positive-working photosensitive composition
    21.
    发明授权
    Positive-working photosensitive composition 失效
    正性感光组合物

    公开(公告)号:US5683856A

    公开(公告)日:1997-11-04

    申请号:US634529

    申请日:1996-04-18

    IPC分类号: G03F7/004 G03C1/492

    CPC分类号: G03F7/0045

    摘要: A positive working photosensitive composition is disclosed, which comprises: (a) a resin which is insoluble in water but soluble in an alkaline aqueous solution; (b) a compound which generates an acid upon irradiation with active light or radiation; (c) a low molecular acid-decomposable dissolution-inhibitive compound having a molecular weight of 3,000 or less and containing a group decomposable with an acid, and which increases its solubility in an alkaline developer by the action of an acid; and (d) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. A further positive working photosensitive composition is disclosed, which comprises: (1) a compound which generates an acid upon irradiation with active light or radiation; (2) a resin having a group which undergoes decomposition by an acid whereby increasing its solubility in an alkaline developer; and (3) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. The positive-working photosensitive composition of the present invention can easily and properly inhibit acid diffusion and acid deactivation on the surface thereof with time between the exposure and the heat treatment, keep the dissolution inhibiting effect exerted by the dissolution-inhibitive compound and exhibit a good profile, a high sensitivity and a high resolving power.

    摘要翻译: 公开了一种正性感光性组合物,其包括:(a)不溶于水但可溶于碱性水溶液的树脂; (b)在用活性光或辐射照射时产生酸的化合物; (c)分子量为3000以下且含有可与酸分解的基团的低分子酸分解性溶解抑制性化合物,其通过酸的作用增加其在碱性显影剂中的溶解度; 和(d)含有碱性氮原子,重均分子量为2,000以上的树脂。 公开了另一种正性光敏组合物,其包括:(1)在用活性光或辐射照射时产生酸的化合物; (2)具有通过酸分解的基团的树脂,从而增加其在碱性显影剂中的溶解度; 和(3)含有碱性氮原子,重均分子量为2,000以上的树脂。 本发明的正性感光性组合物可以在曝光和热处理之间的时间内容易且适当地抑制其在表面上的酸扩散和酸失活,保持由溶解抑制性化合物发挥的溶解抑制作用, 轮廓,高灵敏度和高分辨力。

    Positive type photoresist composition
    22.
    发明授权
    Positive type photoresist composition 失效
    正型光致抗蚀剂组合物

    公开(公告)号:US5340688A

    公开(公告)日:1994-08-23

    申请号:US15578

    申请日:1993-02-10

    CPC分类号: G03F7/022

    摘要: Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.

    摘要翻译: 公开了一种新型的正型光致抗蚀剂组合物,其包含选自由下式(I)表示的多羟基化合物,(I),(I)表示的多羟基化合物的组分的1,2-萘醌二叠氮基-5-(和/或-4-)磺酸酯, II)或(III)和碱溶性树脂:其中式I的变量在说明书中定义; (II)其中式II的变量在说明书中定义; (III)其中式III的变量在本说明书中定义。

    Photosensitive composition
    23.
    发明授权
    Photosensitive composition 失效
    感光组合物

    公开(公告)号:US5294511A

    公开(公告)日:1994-03-15

    申请号:US998129

    申请日:1992-12-29

    CPC分类号: G03F7/0045

    摘要: A photosensitive composition containing a compound having a group represented by formula(I) or (II), said group, when irradiated with actinic radiation, forming a carboxylic acid or a sulfonic acid: ##STR1## wherein R.sub.1 represents hydrogen, an alkyl group, or an aryl group; andR.sub.2 to R.sub.6 may be the same or different and each represents hydrogen, a halogen, an alkoxyl group, an aryloxyl group, cyano group, or an alkyl group, provided that at least one of R.sub.2 to R.sub.6 represents an alkoxyl or aryloxyl group and two of R.sub.2 to R.sub.6 may link to form a ring.

    摘要翻译: 含有具有式(I)或(II)所示基团的化合物的光敏组合物,所述基团用光化辐射照射时形成羧酸或磺酸:(*化学结构*)(I)(*化学式 结构*)(II)其中R1表示氢,烷基或芳基; 并且R 2至R 6可以相同或不同,各自表示氢,卤素,烷氧基,芳氧基,氰基或烷基,条件是R 2至R 6中的至少一个表示烷氧基或芳氧基, R2到R6中的两个可以链接形成环。

    Siloxane polymers and positive working light-sensitive compositions
comprising the same
    24.
    发明授权
    Siloxane polymers and positive working light-sensitive compositions comprising the same 失效
    硅氧烷聚合物和包含其的正性工作光敏组合物

    公开(公告)号:US5278273A

    公开(公告)日:1994-01-11

    申请号:US3501

    申请日:1993-01-12

    摘要: A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or actylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.

    摘要翻译: 一种新型硅氧烷聚合物,其具有至少1摩尔%的衍生自式(I)或(II)的二烯化合物与烯烃或式(III),(IV)或(IV)的烯化合物的环状加热产物的结构单元, (Ⅴ):(*化学结构*)(I)(*化学结构*)(II)(*化学结构*)(III)(*化学结构*)(Ⅳ)(*化学结构*) 包含硅氧烷聚合物的正性工作感光组合物。

    Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
    28.
    发明授权
    Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 有权
    油墨组合物,喷墨记录方法,印刷材料,平版印刷版的制造方法和平版印刷版

    公开(公告)号:US07709550B2

    公开(公告)日:2010-05-04

    申请号:US11516650

    申请日:2006-09-07

    申请人: Toshiaki Aoai

    发明人: Toshiaki Aoai

    IPC分类号: C08F2/50 C08J3/28

    CPC分类号: C09D11/101 Y10T428/24802

    摘要: An ink composition is provided that includes a cationically polymerizable compound (a), a compound (b) that generates an acid when exposed to radiation, a colorant (c), and a salt of a weak acid having a pKa of 4 to 8 (d). There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.

    摘要翻译: 提供一种油墨组合物,其包含阳离子聚合性化合物(a),暴露于辐射时产生酸的化合物(b),着色剂(c)和pKa为4-8的弱酸盐( d)。 还提供了一种喷墨记录方法,其包括将油墨组合物排出到记录介质上的步骤,以及用放射线照射排出的油墨组合物以固化油墨组合物的步骤。

    Lithographic printing starting plate
    30.
    发明申请
    Lithographic printing starting plate 有权
    平版印刷起始板

    公开(公告)号:US20050064340A1

    公开(公告)日:2005-03-24

    申请号:US10945971

    申请日:2004-09-22

    申请人: Toshiaki Aoai

    发明人: Toshiaki Aoai

    摘要: A positive-working lithographic printing starting plate for an infrared laser is provided that includes a support having a hydrophilic surface and a heat-sensitive layer provided above the support. The heat-sensitive layer includes a water-insoluble and alkali-soluble resin, an infrared-absorbing dye, and a sulfonium salt represented by Formula below. The heat-sensitive layer increases its solubility in aqueous alkaline solution upon exposure to an infrared laser. (In the formula, R1 and R2 independently denote an optionally substituted alkyl group having 1 to 12 carbons, an optionally substituted cycloalkyl group having 3 to 8 carbons, an optionally substituted aralkyl group having 7 to 12 carbons, or an optionally substituted aryl group having 6 to 15 carbons, R1 and R2 may bond to each other to form a cyclic structure; Ar denotes an optionally substituted aromatic hydrocarbon group having 6 to 15 carbons and having at least one OH group at the ortho- and/or para-position; and X− denotes an anion of an organic acid.)

    摘要翻译: 提供了一种用于红外激光的正性平版印刷起始板,其包括具有亲水表面的支撑体和设置在支撑体上方的热敏层。 热敏层包括水不溶性和碱溶性树脂,红外线吸收染料和由下式表示的锍盐。 热敏层在暴露于红外激光器时增加其在碱性水溶液中的溶解度。 (式中,R 1和R 2分别表示碳数1〜12的任选取代的烷基,碳原子数3〜8的任意取代的环烷基,碳数为7〜12的任意取代的芳烷基,或具有取代基的芳基, 6至15个碳原子,R 1和R 2可以彼此键合形成环状结构; Ar表示任选被取代的碳原子数为6〜15的芳族烃基,在邻位和/或对位具有至少一个OH基; X'表示有机酸的阴离子。)