摘要:
A positive working photosensitive composition is disclosed, which comprises: (a) a resin which is insoluble in water but soluble in an alkaline aqueous solution; (b) a compound which generates an acid upon irradiation with active light or radiation; (c) a low molecular acid-decomposable dissolution-inhibitive compound having a molecular weight of 3,000 or less and containing a group decomposable with an acid, and which increases its solubility in an alkaline developer by the action of an acid; and (d) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. A further positive working photosensitive composition is disclosed, which comprises: (1) a compound which generates an acid upon irradiation with active light or radiation; (2) a resin having a group which undergoes decomposition by an acid whereby increasing its solubility in an alkaline developer; and (3) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. The positive-working photosensitive composition of the present invention can easily and properly inhibit acid diffusion and acid deactivation on the surface thereof with time between the exposure and the heat treatment, keep the dissolution inhibiting effect exerted by the dissolution-inhibitive compound and exhibit a good profile, a high sensitivity and a high resolving power.
摘要:
Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.
摘要:
A photosensitive composition containing a compound having a group represented by formula(I) or (II), said group, when irradiated with actinic radiation, forming a carboxylic acid or a sulfonic acid: ##STR1## wherein R.sub.1 represents hydrogen, an alkyl group, or an aryl group; andR.sub.2 to R.sub.6 may be the same or different and each represents hydrogen, a halogen, an alkoxyl group, an aryloxyl group, cyano group, or an alkyl group, provided that at least one of R.sub.2 to R.sub.6 represents an alkoxyl or aryloxyl group and two of R.sub.2 to R.sub.6 may link to form a ring.
摘要:
A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or actylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.
摘要:
A photosolubilizable composition contains both a compound capable of producing an acid by irradiation with actinic rays and a compound which has at least one silyl ether or silyl ester group capable of being decomposed by an acid; optionally, a compound having at least one silyl ether group has at least one hydrophilic group, providing for increased solubility in a developing solution under the action of an acid, thus enhancing the photosensitivity and the development latitude of the composition.
摘要:
A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
摘要:
A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
摘要:
An ink composition is provided that includes a cationically polymerizable compound (a), a compound (b) that generates an acid when exposed to radiation, a colorant (c), and a salt of a weak acid having a pKa of 4 to 8 (d). There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.
摘要:
A hydrophilic member comprising a substrate and a hydrophilic coating film provided on the substrate, wherein the hydrophilic coating film is produced by coating a substrate with an aqueous solution containing (a) a hydrophilic polymer, (b) an alkoxide of a metal selected from the group consisting of Si, Ti, Zr, and Al, and (c) a metal complex catalyst, and heat-drying the solution applied.
摘要:
A positive-working lithographic printing starting plate for an infrared laser is provided that includes a support having a hydrophilic surface and a heat-sensitive layer provided above the support. The heat-sensitive layer includes a water-insoluble and alkali-soluble resin, an infrared-absorbing dye, and a sulfonium salt represented by Formula below. The heat-sensitive layer increases its solubility in aqueous alkaline solution upon exposure to an infrared laser. (In the formula, R1 and R2 independently denote an optionally substituted alkyl group having 1 to 12 carbons, an optionally substituted cycloalkyl group having 3 to 8 carbons, an optionally substituted aralkyl group having 7 to 12 carbons, or an optionally substituted aryl group having 6 to 15 carbons, R1 and R2 may bond to each other to form a cyclic structure; Ar denotes an optionally substituted aromatic hydrocarbon group having 6 to 15 carbons and having at least one OH group at the ortho- and/or para-position; and X− denotes an anion of an organic acid.)