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公开(公告)号：US08982332B2
公开(公告)日：2015-03-17
申请号：US13518727
申请日：2011-01-28
申请人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
发明人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
CPC分类号： G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
摘要： Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要翻译： 公开了使用光梳的距离测量装置。 为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上， 测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离 在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。
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22.发明授权公开(公告)号：US08621659B2
公开(公告)日：2013-12-31
申请号：US13462845
申请日：2012-05-03
申请人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Tetsuya Matsui , Tsuneo Nakagomi , Teruaki Tokutomi
发明人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Tetsuya Matsui , Tsuneo Nakagomi , Teruaki Tokutomi
摘要： In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15° to 45°) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15° to 30°).
摘要翻译： 在用于磁力显微镜的这种悬臂的制造方法中，在用于磁力显微镜的悬臂的尖端处的探针上形成磁性膜。 当在探针周围形成非磁性刚性保护膜时，该膜从磁力显微镜的悬臂的探针的前部以15°至45°的角度和从探头背面形成 用于磁力显微镜的悬臂在两个方向上各自以（15°至30°）的范围内的角度。
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公开(公告)号：US07884924B2
公开(公告)日：2011-02-08
申请号：US11935673
申请日：2007-11-06
申请人： Shohei Numata , Atsushi Baba , Tetsuya Matsui
发明人： Shohei Numata , Atsushi Baba , Tetsuya Matsui
IPC分类号： G01L1/24
CPC分类号： G01L5/0047 , G01L1/241
摘要： A residual stress measuring method capable of measuring residual stress of the surface of an object to be inspected rapidly in a non-destructive non-contact manner, as well as a residual stress measuring system having such characteristics and being high in portability, are provided. The residual stress measuring system comprises a heating laser for heating an inspection area of an object to be inspected, a laser interferometer for irradiating the inspection area interferometric with laser light and measuring a deformation quantity within an elastic deformation range upon stress relief by heating in accordance with a laser interferometric method, and a data processor for measuring residual stress from the deformation quantity within the elastic deformation range upon stress relief of the object to be inspected.
摘要翻译： 提供了能够以非破坏性的非接触方式快速地测量待检查物体的表面的残余应力的残余应力测量方法，以及具有这种特性并且携带性高的残余应力测量系统。 残余应力测量系统包括用于加热被检查物体的检查区域的加热激光器，用于用激光照射干涉检查区域的激光干涉仪，并且根据按照加热的应力消除来测量弹性变形范围内的变形量 采用激光干涉测量方法，以及数据处理器，用于根据待检测物体的应力释放来测量弹性变形范围内的变形量的残余应力。
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24.发明申请Chemical substance total management system, storage medium storing chemical susbstance management program and chemical substance total management method 有权化学物质总管理系统，储存化学物质管理程序和化学物质总管理方法的储存介质公开(公告)号：US20080040148A1
公开(公告)日：2008-02-14
申请号：US11898740
申请日：2007-09-14
CPC分类号： G06Q10/06 , G05B15/02 , G06Q10/00 , G06Q10/087
摘要： A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
摘要翻译： 化学物质总管理系统有助于减少商业实体中管理物质的释放和转移量。 该系统基于总列表链接信息检索与预定管理物质相关的释放和转移量记录，其中每个释放和转移目的地的管理物质的制图结果记录管理释放和转移量之间的相关性以及释放和传送量记录为 源生成制表结果记录。
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25.发明授权公开(公告)号：US07151262B1
公开(公告)日：2006-12-19
申请号：US10872449
申请日：2004-06-22
CPC分类号： G01T1/205
摘要： To provide a radioactive gas measurement apparatus that is simply constructed and can efficiently measure Xe-133 in a radioactive gas on-line under the condition that the radioactive gas is mixed with interference N-13, an apparatus is provided for measuring a radiation emitted from Xe-133, including an anticoincidence counter circuit 13 that conducts counting if it receives an output of a main detector 1 when it does not receive outputs of scintillation detectors 2 and 9, and a gate circuit 14, a plate-shaped semiconductor detector is used as the main detector 1, and a material not emitting a characteristic X ray in the range from 70 to 90 keV is used for a shielding structure. In particular, the thickness of the semiconductor detector 1 is set to fall within a range from 2 mm to 7 mm, thereby improving the analysis precision.
摘要翻译： 为了提供简单构造的放射性气体测量装置，并且可以在放射性气体与干扰N-13混合的条件下在线放射性气体中有效地测量Xe-133，提供了一种用于测量从 Xe-133，包括防错计数器电路13，如果在没有接收到闪烁检测器2和9的输出的情况下接收到主检测器1的输出，则接收计数;以及门电路14，使用板状半导体检测器 作为主检测器1，并且将不发射70至90keV范围内的特征X射线的材料用于屏蔽结构。 特别地，将半导体检测器1的厚度设定为2mm〜7mm的范围，提高分析精度。
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26.发明申请公开(公告)号：US20060278828A1
公开(公告)日：2006-12-14
申请号：US10872449
申请日：2004-06-22
IPC分类号： H01L27/14
CPC分类号： G01T1/205
摘要： To provide a radioactive gas measurement apparatus that is simply constructed and can efficiently measure Xe-133 in a radioactive gas on-line under the condition that the radioactive gas is mixed with interference N-13, an apparatus is provided for measuring a radiation emitted from Xe-133, including an anticoincidence counter circuit 13 that conducts counting if it receives an output of a main detector 1 when it does not receive outputs of scintillation detectors 2 and 9, and a gate circuit 14, a plate-shaped semiconductor detector is used as the main detector 1, and a material not emitting a characteristic X ray in the range from 70 to 90 keV is used for a shielding structure. In particular, the thickness of the semiconductor detector 1 is set to fall within a range from 2 mm to 7 mm, thereby improving the analysis precision.
摘要翻译： 为了提供简单构造的放射性气体测量装置，并且可以在放射性气体与干扰N-13混合的条件下在线放射性气体中有效地测量Xe-133，提供了一种用于测量从 Xe-133，包括防错计数器电路13，如果在没有接收到闪烁检测器2和9的输出的情况下接收到主检测器1的输出，则接收计数;以及门电路14，使用板状半导体检测器 作为主检测器1，并且将不发射70至90keV范围内的特征X射线的材料用于屏蔽结构。 特别地，将半导体检测器1的厚度设定为2mm〜7mm的范围，提高分析精度。
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公开(公告)号：US06639392B2
公开(公告)日：2003-10-28
申请号：US10084068
申请日：2002-02-28
IPC分类号： G01N2700
CPC分类号： G01T1/24
摘要： A highly sensitive charged particle measuring device capable of measuring low-level alpha rays comprises in a measurement chamber 7 provided with a sealable door 15, a test sample 2 and a semiconductor detector 1, a radiation measuring circuit 30 including a preamplifier 30c connected to the semiconductor detector 1, a linear amplifier 30d, and a pulse height analyzer 30e, a charged particle emission amount arithmetic unit 40 for performing the quantitative analysis of charged particles from its measurement, a display unit for displaying its analysis result, and further has an evacuation pipe line and a pure gas supply pipe line for performing supply and replacement of the pure gas in the measuring chamber 7.
摘要翻译： 能够测量低水平α射线的高灵敏度带电粒子测量装置包括设置有可密封门15的测量室7，测试样品2和半导体检测器1，辐射测量电路30，包括连接到 半导体检测器1，线性放大器30d和脉冲高度分析器30e，用于从其测量执行带电粒子的定量分析的带电粒子发射量运算单元40，用于显示其分析结果的显示单元，并且进一步具有撤离 管线和纯气体供给管线，用于在测量室7中进行纯气体的供给和更换。
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公开(公告)号：US5122752A
公开(公告)日：1992-06-16
申请号：US575422
申请日：1990-08-30
申请人： Masataka Koga , Tsuyoshi Nishitarumizu , Tetsuya Matsui , Kenji Yokose , Masaharu Sakagami , Takehiko Kitamori
发明人： Masataka Koga , Tsuyoshi Nishitarumizu , Tetsuya Matsui , Kenji Yokose , Masaharu Sakagami , Takehiko Kitamori
CPC分类号： G01N15/0656 , G01N27/628 , G01N33/18
摘要： A method of and an apparatus for analyzing a granular material contained in a sample of a medium such as water produced by an ultra-pure water producing apparatus includes the steps of adding energy to granular materials contained in a sample which is mixed with the medium, wherein the energy is set to be lower than the breakdown threshold of the medium and to be higher than the breakdown threshold of the granular materials, detecting ions which are generated with the breakdown of the granular materials by using a pair of positive and negative electrodes; and analyzing characteristics of the granular materials based on the ions.
摘要翻译： 一种用于分析由超纯水生产设备产生的诸如水的介质样品中所含的颗粒状物质的方法和装置，包括以下步骤：向包含在与介质混合的样品中的颗粒材料加入能量， 其中所述能量被设定为低于所述介质的击穿阈值并且高于所述粒状材料的击穿阈值，检测通过使用一对正极和负极的所述粒状材料的击穿而产生的离子; 并基于离子分析粒状材料的特性。
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29.发明授权Chemical substance total management system, storage medium storing chemical substance management program and chemical substance total management method 有权化学物质总管理系统，储存化学物质管理程序和化学物质总管理方法的储存介质公开(公告)号：US07272465B2
公开(公告)日：2007-09-18
申请号：US11230511
申请日：2005-09-21
IPC分类号： G06F7/00
CPC分类号： G06Q10/06 , G05B15/02 , G06Q10/00 , G06Q10/087
摘要： A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
摘要翻译： 化学物质总管理系统有助于减少商业实体中管理物质的释放和转移量。 系统根据总列表链接信息检索与预定管理物质相关的释放和转移量记录，其中每个释放和转移目的地的管理物质的制表结果记录管理释放和转移量之间的相关性，以及释放和传送量记录为 源生成制表结果记录。
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公开(公告)号：US07092960B2
公开(公告)日：2006-08-15
申请号：US09796066
申请日：2001-02-28
申请人： Satoshi Ohishi , Yoshiaki Ichikawa , Akira Sekine , Takako Oono , Tetsuya Matsui
发明人： Satoshi Ohishi , Yoshiaki Ichikawa , Akira Sekine , Takako Oono , Tetsuya Matsui
IPC分类号： G06F7/00
CPC分类号： G06Q10/06 , Y10S707/99944
摘要： A chemical substance total management system and a chemical substance total management method which can easily manage amounts and release destination of managing substances. The chemical substance total management system includes a material composition database of component composition information of material or product in a form of database, a managing substance database in a form of a list of substance requiring management, for identifying substances constituting the material or product on the basis of the material composition database and identifying substance required management on the basis of the managing substance database for managing chemical substance contained in the material handled by a business entity or product. The system further includes release coefficient database storing weight ratio data in each transfer and release destination per the identified management required substance in a form of database.
摘要翻译： 化学物质总管理体系和化学物质总管理方法，可以轻松管理物质的管理量和释放目的地。 化学物质总管理系统包括数据库形式的材料或产品的组成成分信息的材料组成数据库，需要管理的物质清单形式的管理物质数据库，用于识别构成材料或产品的物质 材料成分数据库的基础，并根据由商业实体或产品处理的材料中所含的管理化学物质的管理物质数据库，确定物质所需的管理。 该系统还包括释放系数数据库，以数据库的形式存储每个转移和释放目的地的每个所识别的管理所需物质的重量比数据。
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