摘要:
In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15° to 45°) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15° to 30°).
摘要:
In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15° to 45°) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15° to 30°).
摘要:
An internal defect inspection method where an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, the ultrasonic wave reflected by the sample is detected by an imaging type common-path interferometer as an interference signal, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal. An internal defect inspection apparatus including an ultrasonic wave transmitter, an imaging type common-path interferometer and an ultrasonic wave signal detecting device is also provided.
摘要:
Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要:
Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要:
It is intended to provide an internal defect inspection method and an apparatus for implementing the method by which an ultrasonic wave is excited in a sample without contact with the sample and accordingly without damaging the sample, and an ultrasonic wave from any internal defect of the sample is detected without being affected by the sample surface, in a non-contact state and with high sensitivity.By the internal defect inspection method, an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, an ultrasonic wave reflected by the sample is detected as an interference signal with an imaging type common-path interferometer, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal.
摘要:
The eddy current testing apparatus includes a probe having an eddy current testing sensor including a pair of eddy current testing coils. The apparatus also includes an eddy current testing flaw detector inputting detection signals from the eddy current testing sensor. The diameter of a magnetic core used in each of the pair of eddy current testing coils is within the range of 0.1 mm to 0.5 mm.
摘要:
A residual stress measuring method capable of measuring residual stress of the surface of an object to be inspected rapidly in a non-destructive non-contact manner, as well as a residual stress measuring system having such characteristics and being high in portability, are provided. The residual stress measuring system comprises a heating laser for heating an inspection area of an object to be inspected, a laser interferometer for irradiating the inspection area interferometric with laser light and measuring a deformation quantity within an elastic deformation range upon stress relief by heating in accordance with a laser interferometric method, and a data processor for measuring residual stress from the deformation quantity within the elastic deformation range upon stress relief of the object to be inspected.
摘要:
A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
摘要:
A highly sensitive charged particle measuring device capable of measuring low-level alpha rays comprises in a measurement chamber 7 provided with a sealable door 15, a test sample 2 and a semiconductor detector 1, a radiation measuring circuit 30 including a preamplifier 30c connected to the semiconductor detector 1, a linear amplifier 30d, and a pulse height analyzer 30e, a charged particle emission amount arithmetic unit 40 for performing the quantitative analysis of charged particles from its measurement, a display unit for displaying its analysis result, and further has an evacuation pipe line and a pure gas supply pipe line for performing supply and replacement of the pure gas in the measuring chamber 7.