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    Apparatus and methods for removing immersion liquid from substrates using temperature gradient
    21.
    发明申请
    Apparatus and methods for removing immersion liquid from substrates using temperature gradient 审中-公开
    使用温度梯度从底物中去除浸渍液体的设备和方法

    公开(公告)号：US20080212050A1

    公开(公告)日：2008-09-04

    申请号：US12068077

    申请日：2008-02-01

    申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani ,  Derek Coon ,  Soichi Owa

    发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani ,  Derek Coon ,  Soichi Owa

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70875 ,  G03F7/70341

    摘要： Apparatus and methods assist in the removal of immersion liquid from a surface of a substrate. In particular, the apparatus/method removes immersion liquid from a surface of a substrate that has been subjected to immersion lithographic exposure. A temperature control unit controls a temperature of the substrate to create a temperature gradient across at least a portion of the surface of the substrate such that a first portion of the surface of the substrate has a first temperature that is higher than a second temperature of a second portion of the surface of the substrate. The temperature gradient induces the immersion liquid remaining on the substrate to move from the higher temperature portion(s) toward the lower temperature portion(s).

    摘要翻译： 装置和方法有助于从衬底的表面去除浸没液体。 特别地，该装置/方法从浸没式光刻曝光的基板表面去除浸没液。 温度控制单元控制衬底的温度以在衬底的表面的至少一部分上产生温度梯度，使得衬底的表面的第一部分具有高于第一温度的第一温度 衬底表面的第二部分。 温度梯度引起残留在基板上的浸渍液体从较高温度部分向下温度部分移动。

    Immersion lithography fluid control system using an electric or magnetic field generator
    23.
    发明授权
    Immersion lithography fluid control system using an electric or magnetic field generator 有权
    使用电场或磁场发生器的浸没光刻流体控制系统

    公开(公告)号：US08102501B2

    公开(公告)日：2012-01-24

    申请号：US11878547

    申请日：2007-07-25

    申请人： Derek Coon ,  Andrew J Hazelton

    发明人： Derek Coon ,  Andrew J Hazelton

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

    摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the immersion liquid is subjected to the magnetic or electric field generated by the field generator.

    摘要翻译： 浸没式光刻设备包括光学构件，在光学构件和与光学构件相对设置的表面之间限定的间隙，向间隙提供浸没液体的流体供应装置和产生磁场的场发生器， 电场使得浸没液体受到场发生器产生的磁场或电场的影响。

    Liquid cooled mirror for use in extreme ultraviolet lithography
    25.
    发明授权
    Liquid cooled mirror for use in extreme ultraviolet lithography 有权
    用于极紫外光刻的液体冷却镜

    公开(公告)号：US07591561B2

    公开(公告)日：2009-09-22

    申请号：US11382342

    申请日：2006-05-09

    申请人： Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

    发明人： Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

    IPC分类号： G02B5/08

    CPC分类号： G02B5/10 ,  G02B7/1815 ,  G03F7/70783 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K2201/065

    摘要： Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.

    摘要翻译： 公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。 根据本发明的一个方面，内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。 镜子还包括向微通道供应流体的端口。 流体经受层流并吸收与吸收的光相关的热量。

    Immersion lithography fluid control system
    26.
    发明申请
    Immersion lithography fluid control system 有权
    浸没光刻液控制系统

    公开(公告)号：US20090075211A1

    公开(公告)日：2009-03-19

    申请号：US12292251

    申请日：2008-11-14

    申请人： Derek Coon ,  Andrew J. Hazelton

    发明人： Derek Coon ,  Andrew J. Hazelton

    IPC分类号： G03F7/20 ,  G03B27/52 ,  G03B27/32

    CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

    摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet depends on a contact angle between the immersion liquid and the surface.

    摘要翻译： 浸没式光刻设备包括光学构件，限定在光学构件和与填充有浸没液体的光学构件相对设置的表面之间的间隙，以及包括气体出口的流体控制装置，通过该气体出口供应气体以防止浸没 液体进入暴露区域外部的环绕区域。 从气体出口供给的气体的流速取决于浸没液体和表面之间的接触角。

    Offset Partial Ring Seal in Immersion Lithographic System
    27.
    发明申请
    Offset Partial Ring Seal in Immersion Lithographic System 失效
    浸入式光刻系统中偏移部分环密封

    公开(公告)号：US20080094590A1

    公开(公告)日：2008-04-24

    申请号：US11794814

    申请日：2005-05-18

    申请人： Derek Coon

    发明人： Derek Coon

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70808 ,  G03F7/70341

    摘要： A substrate processing apparatus includes a device for partially sealing a gap between a final optical element (22) of a projection lens (14) and an immersion nozzle (20). In one embodiment, the apparatus includes a table configured to support a substrate (16); a patterning element defining a pattern (12); a projection system configured to project the pattern onto the substrate (16), the projection system having a last optical element (22); a gap between the substrate and the last optical element; an immersion element configured to maintain immersion fluid in the gap; and a first seal (102) positioned between the projection system and the immersion element. The first seal (104) is configured to substantially prevent immersion fluid from exiting the space between the projection system and the immersion element.

    摘要翻译： 基板处理装置包括用于部分地密封投影透镜（14）的最终光学元件（22）与浸没喷嘴（20）之间的间隙的装置。 在一个实施例中，该装置包括配置成支撑衬底（16）的工作台; 限定图案（12）的图案形成元件; 投影系统，被配置为将所述图案投影到所述基板（16）上，所述投影系统具有最后的光学元件（22）; 衬底和最后一个光学元件之间的间隙; 浸没元件，被配置为将浸没流体保持在间隙中; 以及位于投影系统和浸没元件之间的第一密封件（102）。 第一密封件（104）构造成基本上防止浸没流体离开投影系统和浸没元件之间的空间。

    Immersion lithography fluid control system
    29.
    发明申请
    Immersion lithography fluid control system 审中-公开
    浸没光刻液控制系统

    公开(公告)号：US20070115453A1

    公开(公告)日：2007-05-24

    申请号：US11653835

    申请日：2007-01-17

    申请人： Derek Coon ,  Andrew Hazelton

    发明人： Derek Coon ,  Andrew Hazelton

    IPC分类号： G03B27/32

    CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

    摘要： A pattern formation method includes the steps of forming a resist film on a substrate, performing pattern exposure by selectively irradiating the resist film with exposing light with a liquid provided on the resist film, and forming a resist pattern by developing the resist film after the pattern exposure. An electric field or a magnetic is applied to the liquid in the step of performing pattern exposure.

    摘要翻译： 图案形成方法包括以下步骤：在基板上形成抗蚀剂膜，通过用设置在抗蚀剂膜上的液体曝光来选择性地照射抗蚀剂膜，进行图案曝光，以及通过在图案之后显影抗蚀剂膜形成抗蚀剂图案 曝光。 在进行图案曝光的步骤中，对液体施加电场或磁场。

    Fluid barrier with transparent areas for immersion lithography
    30.
    发明申请
    Fluid barrier with transparent areas for immersion lithography 审中-公开
    流体屏障，透明区域用于浸没光刻

    公开(公告)号：US20050153424A1

    公开(公告)日：2005-07-14

    申请号：US10754793

    申请日：2004-01-08

    申请人： Derek Coon

    发明人： Derek Coon

    IPC分类号： C12M1/34 ,  G03B27/00 ,  G03F7/20

    CPC分类号： G03F7/70808 ,  G03F7/70341

    摘要： A fluid supply system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid source (372) and a fluid barrier (256). The fluid source (372) directs an immersion fluid (248) into the gap (246). The fluid barrier (256) is positioned near the gap (246). Further, the fluid barrier (256) includes a transparent area (598) that is substantially transparent. With this design, a measurement system (22) can direct a light beam (270) through the fluid barrier (256) to monitor the position of the device (30).

    摘要翻译： 用于控制光学组件（16）和设备（30）之间的间隙（246）中的环境的流体供应系统（26）包括流体源（372）和流体屏障（256）。 流体源（372）将浸没流体（248）引导到间隙（246）中。 流体屏障（256）位于间隙附近（246）。 此外，流体屏障（256）包括基本透明的透明区域（598）。 通过这种设计，测量系统（22）可以引导光束（270）穿过流体屏障（256）来监测设备（30）的位置。