公开(公告)号：US08030219B1

公开(公告)日：2011-10-04

申请号：US11348751

申请日：2006-02-07

申请人： Fred M. Kimock ,  Steven J. Finke ,  Richard L. C. Wu

发明人： Fred M. Kimock ,  Steven J. Finke ,  Richard L. C. Wu

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01G4/1209 ,  C23C16/0227 ,  C23C16/0272 ,  C23C16/401 ,  C23C16/513 ,  H01G4/085 ,  H01G4/1272 ,  H01G4/33 ,  H01L28/40

摘要： A coated substrate product is described comprising a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. According to the method, the substrate is processed by plasma cleaning the surface and then depositing a dielectric coating by a suitable plasma process. The coating may contain one or more layers. The substrate may be a rigid material or a thin film or foil. The coated products of this invention have superior dielectric material properties and utility as substrates for the manufacture of rolled or parallel plate capacitors with high energy densities.

摘要翻译： 描述了涂覆的基底产品，其包括基底和包含碳，氢，硅和氧的电介质涂层材料。 根据该方法，通过等离子体清洁表面，然后通过合适的等离子体工艺沉积介电涂层来处理衬底。 涂层可以包含一层或多层。 衬底可以是刚性材料或薄膜或箔。 本发明的涂覆产品具有优良的介电材料性能和用作制造具有高能量密度的轧制或平行板式电容器的基板。

公开(公告)号：US20100327699A1

公开(公告)日：2010-12-30

申请号：US12865905

申请日：2008-02-05

申请人： Muhammed Hassanali ,  Carl Salupo ,  Steve Keverline ,  Fred M. Kimock

发明人： Muhammed Hassanali ,  Carl Salupo ,  Steve Keverline ,  Fred M. Kimock

IPC分类号： H01L41/053 ,  C08L79/08 ,  B05D5/12

CPC分类号： C04B41/52 ,  C04B41/009 ,  C04B41/90 ,  C04B2111/00844 ,  H01L41/0533 ,  H01L41/23 ,  H01L41/338 ,  C04B41/51 ,  C04B41/4574 ,  C04B41/488 ,  C04B35/00 ,  C04B35/491

摘要： Various embodiments of the present invention relate to an encapsulated ceramic element coated with polymer material applied precisely to the element edges that are exposed during dicing. Methods of applying the polymer, as well as specific polymers that are particularly useful are disclosed. For example, the polymer material may be applied using precise application methods such as ink-jet printing to direct-write the material precisely where specifically desired. Another method described in the use of photolithographic methods. Additionally, the inventors have identified polyimide as a particularly useful polymer material in connection with certain aspects.

摘要翻译： 本发明的各种实施方案涉及涂覆有聚合物材料的封装陶瓷元件，其精确地应用于在切割期间暴露的元件边缘。 公开了施加聚合物的方法以及特别有用的特定聚合物。 例如，聚合物材料可以使用诸如喷墨印刷之类的精确施加方法来将材料精确地直接写入特定期望的材料。 使用光刻法描述的另一种方法。 此外，本发明人已经将聚酰亚胺鉴定为与某些方面有关的特别有用的聚合物材料。

公开(公告)号：US20100277852A1

公开(公告)日：2010-11-04

申请号：US12776504

申请日：2010-05-10

申请人： Fred M. Kimock ,  Steven J. Finke ,  Richard L.C. Wu

发明人： Fred M. Kimock ,  Steven J. Finke ,  Richard L.C. Wu

IPC分类号： H01G4/06 ,  C09D1/00 ,  B32B15/04

CPC分类号： H01G4/1209 ,  C23C16/0227 ,  C23C16/0272 ,  C23C16/401 ,  C23C16/513 ,  H01G4/085 ,  H01G4/1272 ,  H01G4/33 ,  H01L28/40

摘要： A coated substrate product is described comprising a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. According to the method, the substrate is processed by plasma cleaning the surface and then depositing a dielectric coating by a suitable plasma process. The coating may contain one or more layers. The substrate may be a rigid material or a thin film or foil. The coated products of this invention have superior dielectric material properties and utility as substrates for the manufacture of rolled or parallel plate capacitors with high energy densities.

摘要翻译： 描述了涂覆的基底产品，其包括基底和包含碳，氢，硅和氧的电介质涂层材料。 根据该方法，通过等离子体清洁表面，然后通过合适的等离子体工艺沉积介电涂层来处理衬底。 涂层可以包含一层或多层。 衬底可以是刚性材料或薄膜或箔。 本发明的涂覆产品具有优良的介电材料性能和用作制造具有高能量密度的轧制或平行板式电容器的基板。

公开(公告)号：US5186973A

公开(公告)日：1993-02-16

申请号：US582439

申请日：1990-09-13

申请人： Diwakar Garg ,  Wilman Tsai ,  Fred M. Kimock ,  Robert L. Iampietro ,  Paul N. Dyer

发明人： Diwakar Garg ,  Wilman Tsai ,  Fred M. Kimock ,  Robert L. Iampietro ,  Paul N. Dyer

IPC分类号： C23C16/27

CPC分类号： C23C16/279 ,  C23C16/271 ,  Y10T428/30

摘要： A method for depositing a thick, adherent and coherent polycrystalline diamond (PCD) film onto a metallic substrate using a deposition rate of no greater than 0.4 .mu.m per hour. The resulting PCD Film has a smooth surface finish, enhanced crystal orientation in comparision to industrial grade diamond powder particularly in the (220) and (400) directions, and excellent electrical and thermal properties. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCD films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.

摘要翻译： 使用不大于0.4微米/小时的沉积速率将厚的粘附和粘附多晶金刚石（PCD）膜沉积到金属基底上的方法。 所得到的PCD膜具有光滑的表面光洁度，与工业级金刚石粉末相比具有更好的晶体取向，特别是（220）和（400）方向，以及优异的电气和热性能。 该方法使得能够沉积具有至少12微米厚度的PCD膜用于在电子工业中广泛使用的平面以及弯曲基板上的应用。 已经发现本发明的厚PCD膜对于从射频（RF）和微波（MW）装置散热是理想的。

公开(公告)号：US5019208A

公开(公告)日：1991-05-28

申请号：US498077

申请日：1990-03-23

申请人： Eugene J. Karwacki, Jr. ,  Fred M. Kimock

发明人： Eugene J. Karwacki, Jr. ,  Fred M. Kimock

IPC分类号： G01N1/32

CPC分类号： G01N1/32

摘要： A method for profiling the chemical structure and elemental composition as a function of distance below the exterior surface of a thermoplastic article, and more particularly, to a method for determining the depth of permeation of a modifier into the interior of a thermoplastic article which has been treated with the modifier. The method utilizes a pulsed ultraviolet energy source having a fluence level and pulse duration sufficient to ablate material from the article's exterior surface to a series of successive predetermined distances below the exterior surface to expose successive interior surfaces while causing essentially no physical or chemical damage to each respecting interior surface exposed by ablation. The elemental and chemical compositions of each successive interior surface are analyzed by a surface sensitive spectrographic technique and the spectrographic results are compared to determine the depth of modifier permeation within the thermoplastic article.

摘要翻译： 一种用于将化学结构和元素组成作为热塑性制品的外表面下方距离的函数的方法，更具体地，涉及一种用于确定改性剂渗透到热塑性制品内部的方法 用改性剂处理。 该方法利用脉冲紫外能量源，其具有足够的能量密度和脉冲持续时间，以将材料从制品的外表面消融到外表面下方的一系列连续的预定距离，以暴露连续的内表面，同时基本上不对每个物体造成物理或化学损伤 通过烧蚀暴露的内表面。 通过表面敏感光谱技术分析每个连续内表面的元素和化学组成，并比较光谱结果以确定热塑性制品中改性剂渗透的深度。

公开(公告)号：US4855594A

公开(公告)日：1989-08-08

申请号：US163507

申请日：1988-03-02

申请人： Fred M. Kimock ,  John H. Phillips

发明人： Fred M. Kimock ,  John H. Phillips

IPC分类号： B01D59/44 ,  H01J49/16

CPC分类号： H01J49/164 ,  B01D59/44 ,  H01J49/0422 ,  H01J49/24

摘要： A system and method for detecting trace levels of a sample gas in a mass spectrometer having a vacuum chamber with a vacuum pump, an ionizer, extracting and imaging lens and a detector. A high pressure sample gas pulse is introduced into the vacuum chamber through a small orifice to produce a high density of sample gas in a region near the orifice. The density of the sample gas pulse is sufficient to substantially sweep residual background gas from the path of the pulse. A portion of the sample gas pulse is ionized and ions are extracted and imaged.

摘要翻译： 一种用于在具有真空室的真空室的质谱仪中检测样品气体的痕量水平的系统和方法，所述真空室具有真空泵，离子发生器，提取和成像透镜以及检测器。 高压采样气体脉冲通过小孔引入真空室，以在孔口附近的区域产生高密度的样品气体。 样品气体脉冲的密度足以基本上从脉冲路径扫描残留的背景气体。 样品气体脉冲的一部分被离子化，离子被提取和成像。