公开(公告)号：US20050023243A1

公开(公告)日：2005-02-03

申请号：US10632631

申请日：2003-07-31

申请人： Edward Lee ,  Aron Pentek ,  Wen-Chien Hsiao

发明人： Edward Lee ,  Aron Pentek ,  Wen-Chien Hsiao

IPC分类号： G11B5/187 ,  G11B5/31 ,  B44C1/22

CPC分类号： G11B5/1877 ,  G11B5/3163

摘要： A method for fabricating a magnetic head using a modified P1 cap process. A first pole is formed. A cap is formed above the first pole. A gap layer is formed above the cap. A second pole is formed above the gap layer. Exposed portions of the gap layer are removed. The cap and first pole are milled for creating a shoulder of the first pole tapered upwardly towards the cap. Another method for fabricating a magnetic head includes forming a first pole, forming a gap layer above the first pole, forming a second pole above the gap layer, forming a layer of photoresist above the second pole, patterning the photoresist such that the photoresist covers areas of the gap layer positioned towards the second pole, removing exposed portions of the gap layer, removing part of exposed portions of the first pole for forming steps in the first pole on opposite sides of the photoresist, removing the photoresist, and milling for creating a shoulder of the first pole tapering upwardly towards the cap.

摘要翻译： 一种使用改进的P1盖过程制造磁头的方法。 形成第一极。 在第一极上方形成帽。 在盖上方形成间隙层。 在间隙层上方形成第二极。 去除间隙层的露出部分。 铣头和第一杆被铣削以产生第一杆的肩部向上朝向帽部锥形。 制造磁头的另一方法包括形成第一极，在第一极上方形成间隙层，在间隙层上方形成第二极，在第二极上形成光致抗蚀剂层，使光致抗蚀剂覆盖区域 间隔层定位成朝向第二极，去除间隙层的暴露部分，去除第一极的暴露部分的一部分，以在光致抗蚀剂的相对侧上的第一极中形成台阶，去除光致抗蚀剂，并研磨以产生 第一杆的肩部朝向帽部向上逐渐变细。

公开(公告)号：US08028399B2

公开(公告)日：2011-10-04

申请号：US11957481

申请日：2007-12-16

申请人： Amanda Baer ,  Jeffrey S. Lille ,  Aron Pentek

发明人： Amanda Baer ,  Jeffrey S. Lille ,  Aron Pentek

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.

摘要翻译： 描述制造磁性写入极的写入元件和方法。 对于一种方法，在写入极的极尖和磁轭的位置的磁性层上形成垂直掩模结构。 垂直掩模结构可以通过用原子层沉积（ALD）工艺或类似工艺涂覆抗蚀剂的垂直表面而形成。 然后围绕垂直掩模结构执行去除处理以限定磁极尖端和写极的磁轭的一部分，并且去除垂直掩模结构。 极尖的下部被掩蔽，而极尖的上部和轭的一部分露出。 然后用磁性材料例如电镀工艺使磁极尖端的上部和磁轭的一部分膨胀。

公开(公告)号：US07563381B2

公开(公告)日：2009-07-21

申请号：US10836867

申请日：2004-04-30

申请人： Amanda Baer ,  Quang Le ,  Kim Lee ,  Aron Pentek ,  Douglas J. Werner ,  Sue S. Zhang

发明人： Amanda Baer ,  Quang Le ,  Kim Lee ,  Aron Pentek ,  Douglas J. Werner ,  Sue S. Zhang

IPC分类号： G11B5/187

CPC分类号： G11B5/1871 ,  G11B5/3116 ,  G11B5/3163 ,  Y10T29/49021 ,  Y10T29/49043

摘要： A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.

摘要翻译： 一种用于构造锥形写入极的方法，该方法包括使用双层硬掩模。

公开(公告)号：US20070146931A1

公开(公告)日：2007-06-28

申请号：US11317917

申请日：2005-12-22

申请人： Amanda Baer ,  Daniel Bedell ,  Quang Le ,  Aron Pentek

发明人： Amanda Baer ,  Daniel Bedell ,  Quang Le ,  Aron Pentek

IPC分类号： G11B5/147

CPC分类号： G11B5/3116 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3163

摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.

摘要翻译： 一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。 屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部 表面不延伸到与成形层相同的高度（在拖尾方向上）。 使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。 这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。

公开(公告)号：US07757380B2

公开(公告)日：2010-07-20

申请号：US11595654

申请日：2006-11-10

申请人： Amanda Baer ,  Hung-chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Aron Pentek

发明人： Amanda Baer ,  Hung-chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Aron Pentek

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterned prior to CMP. Patterned stop layers produce the highest yields.

摘要翻译： 公开了在制造缺口尾部屏蔽结构期间在晶片和晶片之间改善晶片产量的方法。 在平坦化和切口形成之前沉积Ta / Rh CMP停止层以确保用于尾部屏蔽结构的平坦表面。 这些停止层可以在CMP之前被毯式沉积或图案化。 图案化的停止层产生最高的产量。

公开(公告)号：US20090154015A1

公开(公告)日：2009-06-18

申请号：US11957481

申请日：2007-12-16

申请人： Amanda Baer ,  Jeffrey S. Lille ,  Aron Pentek

发明人： Amanda Baer ,  Jeffrey S. Lille ,  Aron Pentek

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.

摘要翻译： 描述制造磁性写入极的写入元件和方法。 对于一种方法，在写入极的极尖和磁轭的位置的磁性层上形成垂直掩模结构。 垂直掩模结构可以通过用原子层沉积（ALD）工艺或类似工艺涂覆抗蚀剂的垂直表面而形成。 然后围绕垂直掩模结构执行去除处理以限定磁极尖端和写极的磁轭的一部分，并且去除垂直掩模结构。 极尖的下部被掩蔽，而极尖的上部和轭的一部分露出。 然后用磁性材料例如电镀工艺使磁极尖端的上部和磁轭的一部分膨胀。

公开(公告)号：US20080113514A1

公开(公告)日：2008-05-15

申请号：US11595654

申请日：2006-11-10

申请人： Amanda Baer ,  Hung-chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Aron Pentek

发明人： Amanda Baer ,  Hung-chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Aron Pentek

IPC分类号： H01L21/311

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterened prior to CMP. Patterned stop layers produce the highest yields.

摘要翻译： 公开了在制造缺口尾部屏蔽结构期间在晶片和晶片之间改善晶片产量的方法。 在平坦化和切口形成之前沉积Ta / Rh CMP停止层以确保用于尾部屏蔽结构的平坦表面。 这些停止层可以在CMP之前被铺平或沉积。 图案化的停止层产生最高的产量。

公开(公告)号：US20050241140A1

公开(公告)日：2005-11-03

申请号：US10836867

申请日：2004-04-30

申请人： Amanda Baer ,  Quang Le ,  Kim Lee ,  Aron Pentek ,  Douglas Werner ,  Sue Zhang

发明人： Amanda Baer ,  Quang Le ,  Kim Lee ,  Aron Pentek ,  Douglas Werner ,  Sue Zhang

IPC分类号： G11B5/127 ,  G11B5/187

CPC分类号： G11B5/1871 ,  G11B5/3116 ,  G11B5/3163 ,  Y10T29/49021 ,  Y10T29/49043

摘要： A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.

摘要翻译： 一种用于构造锥形写入极的方法，该方法包括使用双层硬掩模。

公开(公告)号：US07515381B2

公开(公告)日：2009-04-07

申请号：US11317917

申请日：2005-12-22

申请人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

发明人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

IPC分类号： G11B5/147 ,  G11B5/187

CPC分类号： G11B5/3116 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3163

摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.

摘要翻译： 一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。 屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部 表面不延伸到与成形层相同的高度（在拖尾方向上）。 使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。 这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。

公开(公告)号：US08108985B2

公开(公告)日：2012-02-07

申请号：US11934687

申请日：2007-11-02

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括形成写极，然后沉积补充层。 掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。 然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。 然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。 缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。