公开(公告)号：US5874820A

公开(公告)日：1999-02-23

申请号：US416558

申请日：1995-04-04

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： G03F7/22 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709 ,  Y10T74/20201

摘要： A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

摘要翻译： 适于在光刻机中支撑掩模版的引导阶段机构包括在基座上沿X-Y方向移动的台。 围绕舞台的是一个矩形的窗框导轨，它通过与固定在底座上的磁道配合的窗框导轨上的电机线圈在两个固定导轨上沿X轴方向驱动。 通过位于与窗框引导件上的磁迹配合的台上的电动机线圈，该平台在Y轴方向上在窗框引导件的内部被驱动。 来自窗框引导件和台架的驱动马达的力通过载物台的重心传递，从而消除不必要的惯性矩。 此外，由驱动马达引起的反作用力与投影透镜和光刻机的对准部分隔离。 这种隔离是通过为舞台独立于其窗框引导件的支撑提供机械支撑来实现的。 窗框引导件是由于连接窗框引导构件的铰链弯曲而能够轻微偏转（旋转）运动的铰链结构。

公开(公告)号：US5552888A

公开(公告)日：1996-09-03

申请号：US349733

申请日：1994-12-02

申请人： Michael R. Sogard ,  Martin E. Lee

发明人： Michael R. Sogard ,  Martin E. Lee

IPC分类号： G01B11/00 ,  G01B9/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G01B9/0207 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02052 ,  G03F7/70691 ,  G03F7/70858 ,  G03F9/70

摘要： An interferometer used to measure distance to an object is provided with a laser sheath. The sheath encloses a substantial part of the measurement beam's path to provide a controlled environment which reduces environmental influences on the measured distance. The sheath is of variable length and responsive to a follower so as to maintain a sheath end nearest the object at a small distance from the object. An environmental controller controls the environment within the sheath. The environment within the sheath can be a vacuum or a suitable gas or gas mixture. A corrector can be used to compensate the interferometer's measured-distance signal for detected environmental characteristics to produce a corrected signal which indicates distance between the interferometer and the reflective surface. The apparatus and methods can be used to measure and control stage position in a projection-type wafer exposure system which is affected by variations in its atmospheric environment.

摘要翻译： 用于测量到物体的距离的干涉仪设置有激光护套。 护套包含测量光束路径的大部分，以提供受控的环境，从而减少对测量距离的环境影响。 护套具有不同的长度并且响应于从动件，以便在与物体距离较小的距离处保持最靠近物体的鞘端。 环境控制器控制护套内的环境。 护套内的环境可以是真空或合适的气体或气体混合物。 可以使用校正器来补偿干涉仪的测量距离信号以便检测到的环境特性，以产生指示干涉仪和反射表面之间的距离的校正信号。 该装置和方法可用于测量和控制受大气环境变化影响的投影型晶片曝光系统中的平台位置。

公开(公告)号：US20110043781A1

公开(公告)日：2011-02-24

申请号：US12926159

申请日：2010-10-28

申请人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

发明人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

IPC分类号： G03B27/54 ,  G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70891

摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

摘要翻译： 投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

公开(公告)号：US06646719B2

公开(公告)日：2003-11-11

申请号：US09773289

申请日：2001-01-31

申请人： Martin E. Lee ,  Bausan Yuan ,  Yutaka Hayashi

发明人： Martin E. Lee ,  Bausan Yuan ,  Yutaka Hayashi

IPC分类号： G03B2758

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833

摘要： A support assembly (12) for an exposure apparatus (10) is provided herein. The support assembly (12) supports the components of the exposure apparatus (10) above a mounting base (32). The exposure apparatus (10) includes noisy components (42) and quiet components (44). The support assembly (12) includes an outer frame (34) and an inner frame (36). As provided herein, the outer frame (34) supports some of the components of the exposure apparatus (10) and the inner frame (36) supports some of the components of the exposure apparatus (10). Preferably, the outer frame (34) is used to support the quiet components (44) while the inner frame (36) is used to support the noisy components (42). Uniquely, a portion of the inner frame (36) is positioned within a portion of the outer frame (34). As a result of this design, both frames (34) (36) can effectively be mounted at the same mounting locations 37 of the mounting base (32). Further, the overall space taken up by the frames (34) (36) is minimized.

公开(公告)号：US06281654B1

公开(公告)日：2001-08-28

申请号：US09310925

申请日：1999-05-13

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： H01L2168

CPC分类号： G03F7/70716 ,  G03F7/709 ,  H01L21/68 ,  H01L21/682 ,  Y10T74/20207

摘要： A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween. The linear positioning forces of the actuator drive means are mounted and controlled so that the vector sum of the moments of force at the center of gravity of the object stage due to the positioning forces of the drive means is substantially equal to zero. The actuator mounting means can include at least two thin flexible members mounted in series with the primary direction of flex of the members being orthogonal to one another.

摘要翻译： 公开了一种用于在微光刻系统中对准晶片的无引导阶段，并且公开了一种隔离外部振动以及由来自物体台的反作用力引起的振动的反应框架。 在无引导阶段，公开了用于在至少两个方向上移动的物体台，并且两个独立且可独立移动的从动件移动并跟随物体台，并且配合的线性力致动器安装在物体台上，并且用于将物体台定位在 第一和第二个方向。 反应框架安装在独立于物体台的基座的基础结构上，使得物体台被独立于反应框架支撑在空间中。 公开了至少一个随动件，其具有一对臂，所述一对臂可分别在一对平行平面内移动，其中物体台的重心位于它们之间。 致动器驱动装置的线性定位力被安装和控制，使得由于驱动装置的定位力而在物台的重心处的力矩的矢量和基本上等于零。 致动器安装装置可以包括至少两个薄的柔性构件，其与构件彼此正交的主要弯曲方向串联安装。

公开(公告)号：US06246202B1

公开(公告)日：2001-06-12

申请号：US09192153

申请日：1998-11-12

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： H01L21027

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709 ,  Y10T74/20201

摘要： A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

摘要翻译： 适于在光刻机中支撑掩模版的引导阶段机构包括在基座上沿X-Y方向移动的台。 围绕舞台的是一个矩形的窗框导轨，它通过与固定在底座上的磁道配合的窗框导轨上的电机线圈在两个固定导轨上沿X轴方向驱动。 通过位于与窗框引导件上的磁迹配合的台上的电动机线圈，该平台在Y轴方向上在窗框引导件的内部被驱动。 来自窗框引导件和台架的驱动马达的力通过载物台的重心传递，从而消除不必要的惯性矩。 此外，由驱动马达引起的反作用力与投影透镜和光刻机的对准部分隔离。 这种隔离是通过为舞台独立于其窗框引导件的支撑提供机械支撑来实现的。 窗框引导件是由于连接窗框引导构件的铰链弯曲而能够轻微偏转（旋转）运动的铰链结构。

公开(公告)号：US06175404B1

公开(公告)日：2001-01-16

申请号：US09320703

申请日：1999-05-27

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： G03B2762

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709 ,  Y10T74/20201

摘要： An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a movable mask stage to hold the mask and a movable object stage to hold the object. The apparatus also includes a reaction frame that is dynamically isolated from the exposure device. A reaction force caused by movement of the mask stage and the object stage when the mask stage and the object stage are moved by a drive is transferred substantially to the reaction frame.

摘要翻译： 曝光装置包括设置在掩模和物体之间的曝光装置。 曝光设备将掩模的图案暴露在对象上。 该装置还包括一个可移动的掩模台以保持该掩模和一个可移动的物体台来保持物体。 该装置还包括与曝光装置动态隔离的反应框架。 当掩模台和物体台被驱动器移动时由掩模台和物体台的移动引起的反作用力基本上被转移到反作用框架。

公开(公告)号：US6150787A

公开(公告)日：2000-11-21

申请号：US318622

申请日：1999-05-26

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： G03F7/22 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709 ,  Y10T74/20201

摘要： A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

摘要翻译： 适于在光刻机中支撑掩模版的引导阶段机构包括在基座上沿X-Y方向移动的台。 围绕舞台的是一个矩形的窗框导轨，它通过与固定在底座上的磁道配合的窗框导轨上的电机线圈在两个固定导轨上沿X轴方向驱动。 通过位于与窗框引导件上的磁迹配合的台上的电动机线圈，该平台在Y轴方向上在窗框引导件的内部被驱动。 来自窗框引导件和台架的驱动马达的力通过载物台的重心传递，从而消除不必要的惯性矩。 此外，由驱动马达引起的反作用力与投影透镜和光刻机的对准部分隔离。 这种隔离是通过为舞台独立于其窗框引导件的支撑提供机械支撑来实现的。 窗框引导件是由于连接窗框引导构件的铰链弯曲而能够轻微偏转（旋转）运动的铰链结构。

公开(公告)号：US6087797A

公开(公告)日：2000-07-11

申请号：US317847

申请日：1999-05-25

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： G03F7/22 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709 ,  Y10T74/20201

摘要： A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

摘要翻译： 适于在光刻机中支撑掩模版的引导阶段机构包括在基座上沿X-Y方向移动的台。 围绕舞台的是一个矩形的窗框导轨，它通过与固定在底座上的磁道配合的窗框导轨上的电机线圈在两个固定导轨上沿X轴方向驱动。 通过位于与窗框引导件上的磁迹配合的台上的电动机线圈，该平台在Y轴方向上在窗框引导件的内部被驱动。 来自窗框引导件和台架的驱动马达的力通过载物台的重心传递，从而消除不必要的惯性矩。 此外，由驱动马达引起的反作用力与投影透镜和光刻机的对准部分隔离。 这种隔离是通过为舞台独立于其窗框引导件的支撑提供机械支撑来实现的。 窗框引导件是由于连接窗框引导构件的铰链弯曲而能够轻微偏转（旋转）运动的铰链结构。

公开(公告)号：US5982128A

公开(公告)日：1999-11-09

申请号：US18593

申请日：1998-02-04

申请人： Martin E. Lee

发明人： Martin E. Lee

IPC分类号： G12B5/00 ,  F16F15/02 ,  G03F7/20 ,  G03F7/24 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  B64C17/06

CPC分类号： G03F7/70716 ,  G03F7/709 ,  H01L21/68 ,  H01L21/682 ,  Y10T74/20207

摘要： A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween. The linear positioning forces of the actuator drive means are mounted and controlled so that the vector sum of the moments of force at the center of gravity of the object stage due to the positioning forces of the drive means is substantially equal to zero. The actuator mounting means can include at least two thin flexible members mounted in series with the primary direction of flex of the members being orthogonal to one another.

摘要翻译： 公开了一种用于在微光刻系统中对准晶片的无引导阶段，并且公开了一种隔离外部振动以及由来自物体台的反作用力引起的振动的反应框架。 在无引导阶段，公开了用于在至少两个方向上移动的物体台，并且两个独立且可独立移动的从动件移动并跟随物体台，并且配合的线性力致动器安装在物体台上，并且用于将物体台定位在 第一和第二个方向。 反应框架安装在独立于物体台的基座的基础结构上，使得物体台被独立于反应框架支撑在空间中。 公开了至少一个随动件，其具有一对臂，所述一对臂可分别在一对平行平面内移动，其中物体台的重心位于它们之间。 致动器驱动装置的线性定位力被安装和控制，使得由于驱动装置的定位力而在物台的重心处的力矩的矢量和基本上等于零。 致动器安装装置可以包括至少两个薄的柔性构件，其与构件彼此正交的主要弯曲方向串联安装。