公开(公告)号：US20090130298A1

公开(公告)日：2009-05-21

申请号：US11943453

申请日：2007-11-20

申请人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

发明人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

IPC分类号： B05D5/12

CPC分类号： G03F7/2018 ,  H05K3/0079 ,  H05K3/108 ,  H05K3/184 ,  H05K2203/013 ,  H05K2203/0577 ,  H05K2203/0588

摘要： High aspect ratio structures can be obtained by print-patterning masking features in feature stacks such that each feature has a lateral edge which is aligned in a plane roughly perpendicular to the plane of the substrate on which the features are formed. Due to the differential lateral spreading between features formed on a substrate and formed atop other features, the print head is indexed less than the radius of a droplet to a position where a droplet ejected by the print head forms an upper feature atop a lower feature such that the lateral edges of the upper and lower features are aligned in the plane roughly perpendicular to the plane of the substrate. Feature stacks of two or more features may provide a vertical (or re-entrant) sidewall mask for formation of high aspect ratio structures, by e.g., electroplating, etc.

摘要翻译： 可以通过在特征堆叠中打印图案化掩模特征来获得高纵横比结构，使得每个特征具有在大致垂直于其上形成有特征的基底的平面的平面中对准的横向边缘。 由于形成在基板上并形成在其它特征上的特征之间的差异横向扩展，打印头被折射小于液滴的半径到由打印头喷射的液滴在下部特征顶部形成上部特征的位置，例如 上和下特征的侧边缘在大致垂直于基板的平面的平面中对准。 两个或更多个特征的特征堆叠可以提供用于形成高纵横比结构的垂直（或重入）侧壁掩模，例如通过电镀等。

公开(公告)号：US07524015B2

公开(公告)日：2009-04-28

申请号：US11642146

申请日：2006-12-20

申请人： Uma Srinivasan ,  Stephen David White ,  Eric J. Shrader ,  Steven E. Ready ,  Scott Jong Ho Limb

发明人： Uma Srinivasan ,  Stephen David White ,  Eric J. Shrader ,  Steven E. Ready ,  Scott Jong Ho Limb

IPC分类号： B41J29/393

CPC分类号： H05K3/125 ,  H05K1/0266 ,  H05K2203/013 ,  H05K2203/162

摘要： A method of jet-printing smooth micro-scale features is presented. The desired feature prior to being printed is masked by various decimation filters and the decimation is performed at various pitches. The subsequently printed image is then scanned and analyzed to determine the roughness of the lines. The optimum decimation pitch is determined by the feature that exhibits the least amount of droplet spreading and has the lowest edge roughness. The optimum decimation pitch may also be calculated from the material properties and the dynamics of fluids.

摘要翻译： 提出了一种喷墨打印平滑微尺度特征的方法。 在打印之前的期望特征被各种抽取滤波器遮蔽，并且以各种间距进行抽取。 然后扫描并分析随后打印的图像以确定线的粗糙度。 最佳抽取间距由表现出最小量的液滴扩散并具有最低边缘粗糙度的特征决定。 也可以根据流体的材料性质和动力学来计算最佳抽取间距。

公开(公告)号：US20060176730A1

公开(公告)日：2006-08-10

申请号：US11054479

申请日：2005-02-09

申请人： Yuen Chan ,  Ryan Freese ,  Antonio Pelella ,  Uma Srinivasan ,  Arthur Tuminaro ,  Jatinder Wadhwa

发明人： Yuen Chan ,  Ryan Freese ,  Antonio Pelella ,  Uma Srinivasan ,  Arthur Tuminaro ,  Jatinder Wadhwa

IPC分类号： G11C11/00

CPC分类号： G11C7/18 ,  G11C7/12 ,  G11C11/417

摘要： A domino SRAM array restore pulse generation system launches the word decode line by the same local clock as the restore pulse, thus eliminating any race issues with the word line select. This system allows the global bit select (or column select) to have fast activation by releasing the reset signal (with the earliest arriving array clock, ckl), while guaranteeing almost perfect tracking with the bit decode system. This allows for the widest possible write window; earliest release of the pre-charge in the global column select, and resetting only after the bit decode system is deactivated.

摘要翻译： 多米诺SRAM阵列恢复脉冲发生系统通过与恢复脉冲相同的本地时钟启动字解码线，从而消除了字线选择的任何种族问题。 该系统允许全局位选择（或列选择）通过释放复位信号（具有最早到达的阵列时钟ckl）来快速激活，同时保证与位解码系统几乎完美的跟踪。 这允许最广泛的写入窗口; 全局列中最早发布预充电选择，仅在位解码系统被禁用后进行复位。

公开(公告)号：US08551556B2

公开(公告)日：2013-10-08

申请号：US11943453

申请日：2007-11-20

申请人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

发明人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

IPC分类号： B05D5/12 ,  B05D5/06 ,  B05D5/00

CPC分类号： G03F7/2018 ,  H05K3/0079 ,  H05K3/108 ,  H05K3/184 ,  H05K2203/013 ,  H05K2203/0577 ,  H05K2203/0588

摘要： High aspect ratio structures can be obtained by print-patterning masking features in feature stacks such that each feature has a lateral edge which is aligned in a plane roughly perpendicular to the plane of the substrate on which the features are formed. Due to the differential lateral spreading between features formed on a substrate and formed atop other features, the print head is indexed less than the radius of a droplet to a position where a droplet ejected by the print head forms an upper feature atop a lower feature such that the lateral edges of the upper and lower features are aligned in the plane roughly perpendicular to the plane of the substrate. Feature stacks of two or more features may provide a vertical (or re-entrant) sidewall mask for formation of high aspect ratio structures, by e.g., electroplating, etc.

摘要翻译： 可以通过在特征堆叠中打印图案化掩模特征来获得高纵横比结构，使得每个特征具有在大致垂直于其上形成有特征的基底的平面的平面中对准的横向边缘。 由于形成在基板上并形成在其它特征上的特征之间的差异横向扩展，打印头被折射小于液滴的半径到由打印头喷射的液滴在下部特征顶部形成上部特征的位置，例如 上和下特征的侧边缘在大致垂直于基板的平面的平面中对准。 两个或更多个特征的特征堆叠可以提供用于形成高纵横比结构的垂直（或重入）侧壁掩模，例如通过电镀等。

公开(公告)号：US20120169820A1

公开(公告)日：2012-07-05

申请号：US13419351

申请日：2012-03-13

申请人： Scott Limb ,  Uma Srinivasan

发明人： Scott Limb ,  Uma Srinivasan

IPC分类号： B41J2/00

CPC分类号： H01L21/0331

摘要： A patterned layer over a wafer is produced by depositing a print-patterned mask structure. Energized particles of a target material are deposited over the wafer and the print-patterned mask such that particles of said target material incident on the mask structure enter the mask structure body and minimally accumulate, if at all, on the surface of the mask structure, and otherwise the particles of target material accumulate as a generally uniform layer over the wafer. The print-patterned mask structure, including particles of target material therein, is removed leaving the generally uniform layer of target material as a patterned layer over the wafer.

摘要翻译： 通过沉积印刷图案化的掩模结构来生产晶片上的图案层。 目标材料的通电颗粒沉积在晶片和印刷图案化掩模上，使得入射到掩模结构上的所述靶材料的颗粒进入掩模结构体并且最小程度地累积在掩模结构的表面上， 否则靶材料的颗粒在晶片上聚集成大致均匀的层。 去除其中包括目标材料颗粒的印刷图案掩模结构，留下大致均匀的靶材料层作为晶片上的图案化层。

公开(公告)号：US08136901B2

公开(公告)日：2012-03-20

申请号：US12913825

申请日：2010-10-28

申请人： Uma Srinivasan ,  Stephen David White

发明人： Uma Srinivasan ,  Stephen David White

IPC分类号： B41J29/38 ,  B41J29/393 ,  G06K9/36 ,  G06F17/17

CPC分类号： B41J29/38 ,  G06T3/4023 ,  H05K3/1241

摘要： In the case of printing at high addressability, where the cell size is smaller than the spot size, an image can be decimated in a manner that will limit the large accumulation of printed material. The proper decimation of the image will depend on the spot size, the physics of drop coalescence and the addressability during printing. A simple method of using concentric decimation is disclosed herein to enable this process.

摘要翻译： 在高可寻址性的情况下，其中单元尺寸小于点尺寸，可以以限制印刷材料的大量积累的方式对图像进行抽取。 图像的正确抽取将取决于斑点大小，下落聚结的物理学和打印期间的寻址能力。 本文公开了一种使用同心抽取的简单方法来实现该过程。

公开(公告)号：US07633629B2

公开(公告)日：2009-12-15

申请号：US11702321

申请日：2007-02-05

申请人： Peter Kiesel ,  Oliver Schmidt ,  Michael Bassler ,  Uma Srinivasan

发明人： Peter Kiesel ,  Oliver Schmidt ,  Michael Bassler ,  Uma Srinivasan

IPC分类号： G01B9/02

CPC分类号： G01J3/26 ,  G01N21/45 ,  G01N2021/451 ,  G02B26/001

摘要： A tunable optical cavity can be tuned by relative movement between two reflection surfaces, such as by deforming elastomer spacers connected between mirrors or other light-reflective components that include the reflection surfaces. The optical cavity structure includes an analyte region in its light-transmissive region, and presence of analyte in the analyte region affects output light when the optical cavity is tuned to a set of positions. Electrodes that cause deformation of the spacers can also be used to capacitively sense the distance between them. Control circuitry that provides tuning signals can cause continuous movement across a range of positions, allowing continuous photosensing of analyte-affected output light by a detector.

摘要翻译： 可调光学腔可以通过两个反射表面之间的相对运动进行调节，例如通过变形连接在反射镜之间的弹性体隔离物或包括反射表面的其它光反射部件。 光腔结构包括其透光区域中的分析物区域，并且当光学腔被调谐到一组位置时，分析物区域中的分析物的存在影响输出光。 导致间隔物变形的电极也可用于电容地感测它们之间的距离。 提供调谐信号的控制电路可以在一定范围的位置上引起连续的运动，从而允许由检测器对被分析物影响的输出光进行连续光敏。

公开(公告)号：US20090123873A1

公开(公告)日：2009-05-14

申请号：US11938195

申请日：2007-11-09

申请人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

发明人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

IPC分类号： G03F7/26 ,  H05K1/02

CPC分类号： H05K3/0082 ,  H05K3/0023 ,  H05K3/28 ,  H05K3/42 ,  H05K2201/09545 ,  H05K2203/013 ,  H05K2203/0191 ,  H05K2203/0551 ,  H05K2203/0783

摘要： A method for masking regions of photoresist in the manufacture of a soldermask for printed circuit boards is disclosed. Following application of photoresist over patterned traces on a substrate, a sheet-like thin film is applied over the photosensitive material. The thin film may adhere to the photosensitive material by way of the adhesive state of the photosensitive material or by way of an adhesive applied to the photosensitive material or the thin film or carried by the thin film. Digital mask printing may proceed on the surface of the thin film. The photosensitive material may then be exposed through the printed photomask, the thin film (with photomask) removed, and the photosensitive material developed.

摘要翻译： 公开了一种在制造用于印刷电路板的焊接掩模时掩蔽光致抗蚀剂区域的方法。 在基板上的图案化迹线上施加光致抗蚀剂之后，将片状薄膜施加在感光材料上。 薄膜可以通过感光材料的粘合状态或通过施加到感光材料或薄膜上的粘合剂或由薄膜承载的粘合剂粘附到感光材料上。 数字掩模印刷可以在薄膜的表面上进行。 然后可以通过印刷的光掩模曝光感光材料，除去薄膜（带有光掩模），并且感光材料显影。

公开(公告)号：US20080244544A1

公开(公告)日：2008-10-02

申请号：US11729724

申请日：2007-03-29

申请人： Naveen Neelakantam ,  Craig Zilles ,  Uma Srinivasan ,  Suresh Srinivas ,  Ravi Rajwar ,  Konrad Lai

发明人： Naveen Neelakantam ,  Craig Zilles ,  Uma Srinivasan ,  Suresh Srinivas ,  Ravi Rajwar ,  Konrad Lai

IPC分类号： G06F9/45

CPC分类号： G06F8/443

摘要： Hardware checkpoints may be used to mark software-based speculation regions. An instruction may be provided at the beginning of a speculation region and at the end of the speculation region. If an exception occurs during the speculation region, a hardware rollback may be occurred. The hardware rollback rolls back to the instruction at the beginning of the speculation region. The hardware may take a checkpoint by taking a register snapshot and treating future memory updates as tentative. When the instruction marking the end of the speculation is reached, all the tentative memory updates are committed and the previously taken register snapshot is discarded.

摘要翻译： 硬件检查点可用于标记基于软件的推测区域。 可以在投机区域的开始处和投机区域的末尾提供指令。 如果在推测区域发生异常，则可能会发生硬件回滚。 硬件回滚回滚到投机区域开头的指令。 硬件可以通过注册快照并将未来的内存更新视为暂时性来检查点。 当达到臆测结束的指示时，所有暂时的内存更新被提交，并且先前注册的注册快照被丢弃。

公开(公告)号：US20080241712A1

公开(公告)日：2008-10-02

申请号：US11731689

申请日：2007-03-30

申请人： Scott Jong Ho Limb ,  Eric J. Shrader ,  Uma Srinivasan

发明人： Scott Jong Ho Limb ,  Eric J. Shrader ,  Uma Srinivasan

IPC分类号： G03F1/00

CPC分类号： G03F7/2018 ,  H05K3/0023 ,  H05K3/0082 ,  H05K3/28 ,  H05K2203/0551

摘要： The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.

摘要翻译： 目前描述的实施例使用打印过程，例如。 蜡印刷技术，用于对例如印刷电路的掩模层（例如焊接掩模层）进行图案化。 可以维持开发焊接掩模和曝光工艺中的所有其他常规工艺。 根据目前描述的实施例，每个印刷电路将具有匹配均匀和非均匀跳动的独特图案。 在一种形式中，图案由具有特定间隙的蜡单滴组成，以使得该过程对于当前行业实践是透明的。 此外，单滴可以用于大小区域而没有任何显影时间差。 在至少一种形式中，间隙中的蜡图案和焊接掩模在显影期间被去除。