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    Post-ion implant cleaning for silicon on insulator substrate preparation
    22.
    发明授权
    Post-ion implant cleaning for silicon on insulator substrate preparation 失效
    用于硅绝缘体衬底制备的离子后植入物清洁

    公开(公告)号：US07432177B2

    公开(公告)日：2008-10-07

    申请号：US11154211

    申请日：2005-06-15

    申请人： James S. Papanu ,  Han-Wen Chen ,  Brian J. Brown ,  Steven Verhaverbeke

    发明人： James S. Papanu ,  Han-Wen Chen ,  Brian J. Brown ,  Steven Verhaverbeke

    IPC分类号： H01L21/04

    CPC分类号： H01L21/02057 ,  Y10S438/906 ,  Y10S438/907 ,  Y10S438/908 ,  Y10S438/928

    摘要： A combination of a dry oxidizing, wet etching, and wet cleaning processes are used to remove particle defects from a wafer after ion implantation, as part of a wafer bonding process to fabricate a SOI wafer. The particle defects on the topside and the backside of the wafer are oxidized, in a dry strip chamber, with an energized gas. In a wet clean chamber, the backside of the wafer is treated with an etchant solution to remove completely or partially a thermal silicon oxide layer, followed by exposure of the topside and the backside to a cleaning solution. The cleaning solution contains ammonium hydroxide, hydrogen peroxide, DI water, and optionally a chelating agent, and a surfactant. The wet clean chamber is integrated with the dry strip chamber and contained in a single wafer processing system.

    摘要翻译： 干法氧化，湿蚀刻和湿法清洗工艺的组合被用于在离子注入之后从晶片去除颗粒缺陷，作为制造SOI晶片的晶片接合工艺的一部分。 晶片顶面和背面的颗粒缺陷在干燥条带室中被激发的气体氧化。 在湿式清洁室中，用蚀刻剂溶液处理晶片的背面以完全或部分地去除热氧化硅层，随后将顶侧和背面暴露于清洁溶液中。 清洗液含有氢氧化铵，过氧化氢，去离子水，任选的螯合剂和表面活性剂。 湿式清洁室与干燥条带室一体化，并包含在单个晶片处理系统中。

    Stent
    24.
    发明授权
    Stent 有权
    支架

    公开(公告)号：US07326243B2

    公开(公告)日：2008-02-05

    申请号：US11367990

    申请日：2006-03-03

    申请人： Graig L. Kveen ,  Timothy G. J. Ehr ,  Brian J. Brown

    发明人： Graig L. Kveen ,  Timothy G. J. Ehr ,  Brian J. Brown

    IPC分类号： A61F2/06

    CPC分类号： A61F2/915 ,  A61F2/91 ,  A61F2002/91533 ,  A61F2002/91541 ,  A61F2002/91583

    摘要： A radially expandable stent comprising a plurality of spaced band-like elements and intersecting links is disclosed. The band-like elements have a generally serpentine configuration to provide continuous waves of generally sinusoidal character to each band-like element. The waves are characterized by a plurality of peaks and troughs taking a generally longitudinal direction along the cylinder such that the waves in the band-like elements open as the stent is expanded from a first diameter to a second diameter. The intersecting links are substantially U-shaped and terminate in first and second shanks. The first shank of a link emanates from a region between a peak and trough on a band-like element and the second shank of the link emanates from a region between a peak and trough on an adjacent band-like element.

    摘要翻译： 公开了一种包括多个间隔开的带状元件和相交连接件的可径向扩张的支架。 带状元件具有大致蛇形结构，以向每个带状元件提供大致正弦曲线的连续波。 波的特征在于沿着圆柱体大致纵向方向的多个峰和谷，使得当支架从第一直径扩展到第二直径时，带状元件中的波浪打开。 交叉连接件基本上为U形并终止在第一和第二柄部中。 链节的第一柄从带状元件上的峰和谷之间的区域发出，并且链节的第二柄从相邻带状元件上的峰和谷之间的区域发出。

    Longitudinally flexible expandable stent
    25.
    发明授权
    Longitudinally flexible expandable stent 失效
    纵向柔性可扩张支架

    公开(公告)号：US06981986B1

    公开(公告)日：2006-01-03

    申请号：US09666866

    申请日：2000-09-20

    申请人： Brian J. Brown ,  Michael L. Davis

    发明人： Brian J. Brown ,  Michael L. Davis

    IPC分类号： A61F2/06

    CPC分类号： A61F2/91 ,  A61F2/915 ,  A61F2002/91525 ,  A61F2002/91533 ,  A61F2002/91558 ,  A61F2230/0054

    摘要： A stent in a non-expanded state includes a first expansion column and a second expansion column. The first expansion column comprises a plurality of expansion strut pairs. Each expansion strut pair includes a first expansion strut and a second expansion strut joined by a joining strut. The second expansion column comprises a plurality of expansion strut pairs. Each expansion strut pair includes a first expansion strut and a second expansion strut joined by a joining strut. The first and second expansion columns are connected via a first connecting strut column. The first connecting strut column comprises a plurality of first connecting struts. The first expansion strut of the first expansion strut pair in the first expansion column has a longitudinal axis offset from a longitudinal axis of the first expansion strut of the second expansion strut pair in the second expansion column.

    摘要翻译： 非膨胀状态的支架包括第一膨胀柱和第二膨胀柱。 第一膨胀塔包括多个膨胀支柱对。 每个膨胀支柱对包括第一膨胀支柱和由连接支柱连接的第二膨胀支柱。 第二扩展柱包括多个膨胀支柱对。 每个膨胀支柱对包括第一膨胀支柱和由连接支柱连接的第二膨胀支柱。 第一和第二扩展柱通过第一连接支柱连接。 第一连接支柱包括多个第一连接支柱。 第一膨胀柱中的第一膨胀支柱对的第一膨胀支柱具有从第二膨胀柱中的第二膨胀支柱对的第一膨胀支柱的纵向轴线偏离的纵向轴线。

    Stent delivery means with balloon retraction means
    26.
    发明授权
    Stent delivery means with balloon retraction means 有权
    支架输送方式为气囊回缩装置

    公开(公告)号：US06702843B1

    公开(公告)日：2004-03-09

    申请号：US09547771

    申请日：2000-04-12

    申请人： Brian J. Brown ,  Anthony C. Vrba

    发明人： Brian J. Brown ,  Anthony C. Vrba

    IPC分类号： A61F206

    CPC分类号： A61F2/958 ,  A61F2/95 ,  A61F2/966 ,  A61M25/0119 ,  A61M25/1011 ,  A61M2025/1081

    摘要： The present invention provides an improved medical device delivery catheter. The medical device delivery system comprises a catheter having a medical device receiving portion adapted to receive a medical device near the distal end of the catheter and a medical device such as a stent concentrically arranged around the catheter within the medical device receiving portion. The medical device delivery system further comprises a movable medical balloon disposed about the medical device. In use, the balloon may be inflated to dilate a lesion, retracted to deploy the medical device and subsequently reinflated to seat the medical device.

    摘要翻译： 本发明提供了一种改进的医疗装置输送导管。 医疗装置传送系统包括具有适于接收导管远端附近的医疗装置的医疗装置接收部分的导管和诸如在医疗装置接收部分内围绕导管同心布置的支架的医疗装置。 医疗装置输送系统还包括围绕医疗装置设置的可动医疗气囊。 在使用中，气囊可以被充气以扩张病变，缩回以部署医疗装置，随后再次充气以对医疗装置进行安置。

    Scrubber operation
    27.
    发明授权
    Scrubber operation 有权
    洗衣机操作

    公开(公告)号：US06558471B2

    公开(公告)日：2003-05-06

    申请号：US09771087

    申请日：2001-01-26

    申请人： Brian J. Brown ,  Yufei Chen ,  David G. Andeen ,  Madhavi Chandrachood

    发明人： Brian J. Brown ,  Yufei Chen ,  David G. Andeen ,  Madhavi Chandrachood

    IPC分类号： B08B100

    CPC分类号： H01L21/67046 ,  B08B1/04 ,  B08B3/02

    摘要： Methods and apparatuses are provided that remove a scrubber brush from contact with a wafer surface prior to slowing down the scrubber brush's rotational rate. The scrubbing method may include rotating a scrubber brush at a non-reduced rate, while the scrubber brush is in contact with the wafer and removing the scrubber brush from contact with the wafer while rotating the scrubber brush at the non-reduced rate. The scrubbing apparatus has a controller programmed to perform the scrubbing method.

    摘要翻译： 提供了方法和装置，其在减缓洗涤器刷的旋转速率之前，将洗涤器刷与晶片表面接触。 洗涤方法可以包括以非降低的速率旋转洗涤器刷子，同时洗涤器刷子与晶片接触并且在以非减小的速率旋转洗涤器刷子的同时，使洗涤器刷子与晶片接触。 洗涤装置具有被编程为执行洗涤方法的控制器。

    Megasonic resonator for disk cleaning and method for use thereof
    28.
    发明授权
    Megasonic resonator for disk cleaning and method for use thereof 失效
    用于磁盘清洗的超声波谐振器及其使用方法

    公开(公告)号：US06460551B1

    公开(公告)日：2002-10-08

    申请号：US09430345

    申请日：1999-10-29

    申请人： Boris Fishkin ,  Alexander Lerner ,  Jianshe Tang ,  Brian J. Brown

    发明人： Boris Fishkin ,  Alexander Lerner ,  Jianshe Tang ,  Brian J. Brown

    IPC分类号： B08B312

    CPC分类号： H01L21/67057 ,  B08B3/12 ,  G10K11/28 ,  Y10S134/902

    摘要： A Megasonic cleaning apparatus having at least one reflector (e.g., a parabolic or paraboloid reflector) positioned to collect otherwise wasted cleaning energy and redirect that energy to one or a plurality of positions on a wafer's edge is provided. A first embodiment comprises a complex parabolic reflector which has a width greater than that of the wafer and a preferred length approximately equal to the diameter of the wafer, and which is shaped to provide focal points which vary along the length of the parabolic reflector, such that energy striking the reflector at different points along the reflector's length is directed to a plurality of different points along the wafer's edge. A second embodiment comprises a simple parabolic reflector having a width greater than that of the wafer and a preferred length less than the diameter of the wafer, and which is provided to focus at a cord along the wafer's surface, effectively focusing cleaning energy on two points along the wafer's edge at any given time. Yet another embodiment of the invention comprises a paraboloid reflector having a width greater than that of the wafer and a preferred length which is substantially less than the diameter of the wafer and which is shaped to focus all collected energy to a single point on the wafer's edge. Multiple such reflectors may be positioned in the cleaning tank to optimize energy usage and wafer cleaning.

    摘要翻译： 提供了一种具有至少一个反射器（例如，抛物面或抛物面反射器）的超声波清洗装置，其被定位成收集另外浪费的清洁能量并将该能量重定向到晶片边缘上的一个或多个位置。 第一实施例包括复杂的抛物面反射器，其宽度大于晶片的宽度，并且优选的长度近似等于晶片的直径，并且其被成形为提供沿着抛物面反射器的长度变化的焦点， 沿着反射器长度的不同点撞击反射器的能量被引导到沿着晶片边缘的多个不同点。 第二实施例包括具有大于晶片宽度的宽度的简单抛物面反射器，并且具有小于晶片直径的优选长度，并且其设置成沿着晶片表面聚焦在绳索处，有效地将清洁能量聚焦在两点上 在任何给定的时间沿晶圆的边缘。 本发明的另一个实施例包括具有大于晶片宽度的宽度的抛物面反射器，其优选长度基本上小于晶片的直径，并且其被成形为将所有收集的能量聚焦到晶片边缘上的单个点 。 可以将多个这样的反射器定位在清洁槽中以优化能量使用和晶片清洁。

    Continuous cleaning megasonic tank with reduced duty cycle transducers
    29.
    发明授权
    Continuous cleaning megasonic tank with reduced duty cycle transducers 失效
    连续清洗超声波储罐，减少占空比传感器

    公开(公告)号：US06412499B1

    公开(公告)日：2002-07-02

    申请号：US09656294

    申请日：2000-09-06

    申请人： Jianshe Tang ,  Brian J. Brown ,  Boris Fishkin

    发明人： Jianshe Tang ,  Brian J. Brown ,  Boris Fishkin

    IPC分类号： B08B312

    CPC分类号： H01L21/67057 ,  B08B3/12 ,  Y10S134/902

    摘要： A sonic tank for cleaning substrates is provided. The tank has two or more upwardly angled walls. Arrays of one or more transducers are positioned along at least two of the two or more angled walls. The transducer arrays are alternately energized maintaining nearly 100% substrate surface cleaning at any given time, and 50% duty cycle (or less) for each transducer array. The substrate supports are positioned such that nearly every point along the substrate's surface is contacted by energy from at least one transducer, and transducer opposing walls are positioned to avoid interfering reflections therefrom.

    摘要翻译： 提供用于清洁基材的声波槽。 坦克有两个或更多个向上成角度的墙壁。 一个或多个换能器的阵列沿两个或多个成角度的壁中的至少两个定位。 换能器阵列交替通电，在任何给定时间保持接近100％的基板表面清洁，每个换能器阵列的占空比（或更小）为50％。 定位基板支架，使得沿着基板表面的几乎每个点都与来自至少一个换能器的能量接触，并且换能器相对的壁被定位以避免其干涉反射。