公开(公告)号：US20110240597A1

公开(公告)日：2011-10-06

申请号：US13161185

申请日：2011-06-15

申请人： Kenji TSUTSUMI ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

发明人： Kenji TSUTSUMI ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

IPC分类号： C23F1/02

CPC分类号： C23C26/00 ,  G03F1/80 ,  G03F7/707 ,  G03F7/70916 ,  H01L21/308 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68707

摘要： According to the present invention, during the photolithography processing of a substrate, exposure processing is performed immediately after removal of a coating film on the rear surface of the substrate, and a coating film is formed on the rear surface of the substrate immediately after the exposure processing. Thereafter, etching treatment and so on are performed, and a series of these treatment and processing steps are performed a predetermined number of times. The coating film has been formed on the rear surface of the substrate at the time for the etching treatment, so that even if the coating film gets minute scratches, the rear surface of the substrate itself is protected by the coating film and thus never scratched. Further, since the coating film on the rear surface of the substrate is removed immediately before the exposure processing, the rear surface of the substrate can be flat for the exposure processing.

摘要翻译： 根据本发明，在基板的光刻处理中，在除去基板背面的涂膜后立即进行曝光处理，在曝光后立即在基板的背面形成涂膜 处理。 此后，进行蚀刻处理等，并且进行一系列这些处理和处理步骤预定次数。 在蚀刻处理时，已经在基板的背面形成了涂膜，使得即使涂膜受到微小的划痕，基板本身的后表面也被涂膜保护，因此不会被刮伤。 此外，由于在曝光处理之前立即除去基板后表面上的涂膜，所以基板的后表面可以是平坦的，用于曝光处理。

公开(公告)号：US07959988B2

公开(公告)日：2011-06-14

申请号：US11944557

申请日：2007-11-23

申请人： Taro Yamamoto ,  Yasushi Takiguchi ,  Akihiro Fujimoto ,  Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

发明人： Taro Yamamoto ,  Yasushi Takiguchi ,  Akihiro Fujimoto ,  Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

IPC分类号： C23C14/28

CPC分类号： H01L21/6715 ,  H01L21/67178 ,  H01L21/67276

摘要： A coating film forming apparatus includes a process section including one or more coating units and one or more thermally processing units; a pre-coating cleaning unit configured to perform cleaning on a back surface and an edge portion of a substrate; and a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate. A control section is configured to realize a sequence of cleaning the substrate by the pre-coating cleaning unit, checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a state of particles on a back surface and an edge portion of the substrate is within an acceptable range, and permitting transfer of the substrate into the process section where the state of particles is within the acceptable range.

摘要翻译： 涂膜形成装置包括具有一个或多个涂布单元和一个或多个热处理单元的处理部分; 构造成在基板的背面和边缘部分上进行清洗的预涂层清洁单元; 以及配置为检查基板的背面和边缘部分的状态的预涂层检查单元。 控制部被配置为通过预涂清洁单元实现清洁基板的顺序，通过预涂单元检查基板，基于由此获得的检查结果判断颗粒的状态 在基板的后表面和边缘部分处于可接受的范围内，并且允许将基板转移到颗粒状态在可接受范围内的处理部分中。

公开(公告)号：US07926441B2

公开(公告)日：2011-04-19

申请号：US12016436

申请日：2008-01-18

申请人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

发明人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

IPC分类号： B05C15/00

CPC分类号： H01L21/67225 ,  H01L21/67051 ,  H01L21/6715 ,  Y10S414/136 ,  Y10S414/141

摘要： In the coating treatment apparatus, in a first treatment chamber, the front and rear surfaces of the substrate held by a transfer arm are inverted by a turning mechanism, and a coating solution is applied from a coating nozzle to the rear surface of the substrate. The substrate is transferred into a second treatment chamber, in which the coating solution on the rear surface is heated by a heating unit to cure, thereby forming a coating film on the rear surface of the substrate. The formation of the coating film by the coating treatment apparatus is performed before exposure processing, whereby the rear surface of the substrate can be flat for the exposure processing.

摘要翻译： 在涂布处理装置中，在第一处理室中，由转印臂保持的基板的前表面和后表面通过转动机构反转，并且涂布溶液从涂布喷嘴施加到基板的后表面。 将基板转移到第二处理室中，其中背面上的涂布溶液通过加热单元加热固化，从而在基板的后表面上形成涂膜。 在曝光处理之前，通过涂布处理装置形成涂膜，由此基板的后表面可以平坦地进行曝光处理。

公开(公告)号：US07618723B2

公开(公告)日：2009-11-17

申请号：US11765702

申请日：2007-06-20

申请人： Hiroshi Usui ,  Osamu Miyahara ,  Katsuaki Miyatani ,  Yoshinori Kon ,  Iori Yoshida

发明人： Hiroshi Usui ,  Osamu Miyahara ,  Katsuaki Miyatani ,  Yoshinori Kon ,  Iori Yoshida

IPC分类号： G11B5/66 ,  G11B5/64 ,  C03C6/06 ,  C03B9/14

CPC分类号： G11B5/8404 ,  B24B37/042 ,  G11B5/7315 ,  Y10T428/21

摘要： A method for producing a glass substrate for a magnetic disk by polishing a circular glass plate, which comprises a step of polishing the principal plane of the circular glass plate by using a slurry containing at least one water-soluble polymer selected from the group consisting of a water-soluble organic polymer having amino groups, a water-soluble organic polymer having amine salt groups and a water-soluble organic polymer having quaternary ammonium salt groups, and colloidal silica.

摘要翻译： 一种通过研磨圆形玻璃板来制造用于磁盘的玻璃基板的方法，其包括通过使用含有至少一种选自以下的水溶性聚合物的浆料来研磨圆形玻璃板的主平面的步骤： 具有氨基的水溶性有机聚合物，具有胺盐基团的水溶性有机聚合物和具有季铵盐基团的水溶性有机聚合物和胶体二氧化硅。

公开(公告)号：US20080176002A1

公开(公告)日：2008-07-24

申请号：US12015029

申请日：2008-01-16

申请人： Kenji TSUTSUMI ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

发明人： Kenji TSUTSUMI ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

IPC分类号： C23C26/00 ,  H01L21/306

CPC分类号： C23C26/00 ,  G03F1/80 ,  G03F7/707 ,  G03F7/70916 ,  H01L21/308 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68707

摘要： According to the present invention, during the photolithography processing of a substrate, exposure processing is performed immediately after removal of a coating film on the rear surface of the substrate, and a coating film is formed on the rear surface of the substrate immediately after the exposure processing. Thereafter, etching treatment and so on are performed, and a series of these treatment and processing steps are performed a predetermined number of times. The coating film has been formed on the rear surface of the substrate at the time for the etching treatment, so that even if the coating film gets minute scratches, the rear surface of the substrate itself is protected by the coating film and thus never scratched. Further, since the coating film on the rear surface of the substrate is removed immediately before the exposure processing, the rear surface of the substrate can be flat for the exposure processing.

摘要翻译： 根据本发明，在基板的光刻处理中，在除去基板背面的涂膜后立即进行曝光处理，在曝光后立即在基板的背面形成涂膜 处理。 此后，进行蚀刻处理等，并且进行一系列这些处理和处理步骤预定次数。 在蚀刻处理时，已经在基板的背面形成了涂膜，使得即使涂膜受到微小的划痕，基板本身的后表面也被涂膜保护，因此不会被刮伤。 此外，由于在曝光处理之前立即除去基板后表面上的涂膜，所以基板的后表面可以是平坦的，用于曝光处理。

公开(公告)号：US20080160781A1

公开(公告)日：2008-07-03

申请号：US11958839

申请日：2007-12-18

申请人： Hideharu KYOUDA ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

发明人： Hideharu KYOUDA ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

IPC分类号： H01L21/31

CPC分类号： H01L21/31144 ,  H01L21/67207

摘要： In the present invention, a plurality of rounds of patterning are performed on a substrate. In a patterning system, the substrate on which a first round of patterning has been performed is transferred to a planarizing film forming unit, where a planarizing film is formed above the substrate. The substrate is then transferred to the patterning system and subjected to a second round of patterning. The time from the completion of the forming processing of the planarizing film to the start of the second round of patterning is managed to be constant among the substrates. According to the present invention, in the pattern forming processing of performing a plurality of rounds of patterning, a pattern with a desired dimension can be stably formed above the substrate.

摘要翻译： 在本发明中，在基板上进行多次图案化。 在图案形成系统中，已经进行了第一轮图案化的基板被转印到平坦化膜形成单元，其中在基板上形成平坦化膜。 然后将衬底转移到图案化系统并进行第二轮图案化。 从平面化膜的成形处理完成到第二轮图案化开始的时间被控制为在基板之间是恒定的。 根据本发明，在进行多次图案化的图案形成处理中，可以稳定地在基板上方形成具有期望尺寸的图案。

公开(公告)号：US20070099129A1

公开(公告)日：2007-05-03

申请号：US10578611

申请日：2004-11-26

申请人： Junichi Kitano ,  Osamu Miyahara ,  Shinya Wakamizu

发明人： Junichi Kitano ,  Osamu Miyahara ,  Shinya Wakamizu

IPC分类号： G03C5/00

CPC分类号： G03F7/40

摘要： A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing solution or rinsing liquid before a drying process is performed on the wafer W, a chemical liquid (curing chemical liquid), which contains a resist curing aid contributory to curing of a resist film remaining on the wafer W, is supplied onto a surface of the wafer W. Then, ultraviolet rays are radiated onto a surface of the wafer to cure a resist film remaining on the wafer W by a synergistic effect of the resist curing aid and the ultraviolet rays thus radiated, so as to prevent pattern fall.

摘要翻译： 使用显影方法对设置在晶片W上的曝光抗蚀剂膜进行显影液的显影处理和通过漂洗液的漂洗处理。 在对晶片W进行干燥处理之前，晶片W上的抗蚀剂膜与显影液或漂洗液体湿润的状态下，含有抗蚀剂固化助剂的化学液（固化化学液） 保留在晶片W上的抗蚀剂膜被提供到晶片W的表面上。然后，通过抗蚀剂固化助剂的协同效应将紫外线辐射到晶片的表面上以固化残留在晶片W上的抗蚀剂膜 并且因此辐射紫外线，以防止图案下降。

公开(公告)号：US20060061901A1

公开(公告)日：2006-03-23

申请号：US11201386

申请日：2005-08-11

申请人： Osamu Miyahara ,  Masami Kaneko

发明人： Osamu Miyahara ,  Masami Kaneko

IPC分类号： G11B19/02

CPC分类号： G11B5/7315

摘要： A glass substrate for magnetic disks, which is a doughnut-type glass substrate having a cut hole at its center, wherein the inner peripheral edge surface at the cut hole is covered with a coating film formed by curing a silicone resin and providing a contact angle of at least 30°.

摘要翻译： 一种用于磁盘的玻璃基板，其是在其中心具有切割孔的环形玻璃基板，其中，切割孔处的内周边缘表面覆盖有通过固化硅树脂形成的涂膜，并提供接触角 至少30°。

公开(公告)号：US06482528B2

公开(公告)日：2002-11-19

申请号：US10119085

申请日：2002-04-10

申请人： Hiroyuki Anada ,  Kazuyuki Kitamura ,  Toshihiro Imoto ,  Osamu Miyahara

发明人： Hiroyuki Anada ,  Kazuyuki Kitamura ,  Toshihiro Imoto ,  Osamu Miyahara

IPC分类号： C22C1905

CPC分类号： C23C28/044 ,  C23C8/10 ,  C23C8/80 ,  C23C28/048 ,  Y10T428/12618 ,  Y10T428/12944

摘要： (1) A nickel-base alloy product having, on the surface thereof, an oxide film comprising at least two layers, namely a first layer mainly composed of Cr2O3 and having a chromium content of not less than 50% relative to the total amount of metal elements and a second layer occurring outside the first layer and mainly composed of MnCr2O4, wherein the grain size of Cr2O3 crystals in the first layer is 50 to 1,000 nm and the total oxide film thickness is 180 to 1,500 nm. (2) A method of producing the nickel-base alloy product as specified above under (1) which comprises subjecting a nickel-base alloy product to oxide film formation treatment by maintaining the same at a temperature of 650 to 1,200° C. in a hydrogen atmosphere or hydrogen-argon mixed atmosphere showing a dew point of −60° C. to +20° C. for 1 to 1,200 minutes. The product mentioned above (1) allows only a very low level of Ni release in a high-temperature water environment over a long period of time and is particularly suited for use as a nuclear reactor member.

摘要翻译： （1）一种镍基合金制品，其表面上具有包含至少两层的氧化物膜，即主要由Cr 2 O 3组成的第一层，铬含量不低于50％ 金属元素和第二层，其主要由MnCr 2 O 4构成，其中第一层中的Cr 2 O 3晶体的晶粒尺寸为50〜1000nm，氧化膜的总厚度为180〜1500nm。（2） （1）所述的镍基合金制品的制造方法，其特征在于，在氢气氛中，在氢气氛中，在氢气氛中，在650〜1200℃的温度下，使镍基合金制品进行氧化膜形成处理， 氩气混合气氛，露点为-60°C至+ 20°C，持续1〜1,200分钟。上述（1）所述的产品在高温水环境中仅允许非常低的Ni释放量 很长一段时间，尤其适合 用作核反应堆构件。

公开(公告)号：US08398320B2

公开(公告)日：2013-03-19

申请号：US13117483

申请日：2011-05-27

申请人： Yasuhiro Takaki ,  Osamu Miyahara ,  Keiichi Tanaka ,  Shinya Wakamizu ,  Takashi Terada

发明人： Yasuhiro Takaki ,  Osamu Miyahara ,  Keiichi Tanaka ,  Shinya Wakamizu ,  Takashi Terada

IPC分类号： G03B5/00 ,  G03C5/18

CPC分类号： H01L21/67051 ,  G03F7/3021

摘要： A non-transitory storage medium stores software for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon. The sequence includes throwing off a developing solution from the substrate after development; supplying a water-based cleaning liquid onto the substrate; supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate.

摘要翻译： 非瞬态存储介质在对其上布置的曝光图案进行显影处理之后，存储用于在基板上进行漂洗处理的软件。 该顺序包括在显影后从基底抛出显影液; 将水性清洗液供给到基板上; 将含表面活性剂的冲洗液供给到所述基板上，以用含表面活性剂的冲洗液代替残留在所述基板上的液体; 并旋转基板以使基板上含表面活性剂的冲洗液体膨胀并排出。