公开(公告)号：US20110114476A1

公开(公告)日：2011-05-19

申请号：US12929396

申请日：2011-01-20

申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

IPC分类号： C23C14/34

CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

公开(公告)号：US20080067385A1

公开(公告)日：2008-03-20

申请号：US11980654

申请日：2007-10-31

申请人： Mitsuo Tokuda ,  Muneyuki Fukuda ,  Yasuhiro Mitsui ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Hideo Kashima ,  Kaoru Umemura

发明人： Mitsuo Tokuda ,  Muneyuki Fukuda ,  Yasuhiro Mitsui ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Hideo Kashima ,  Kaoru Umemura

IPC分类号： G21K5/08 ,  G01N23/225

CPC分类号： H04L29/06 ,  G01N23/225 ,  H01J37/256 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/202 ,  H01J2237/31745 ,  H04L67/16 ,  H04L69/329

摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

公开(公告)号：US07268356B2

公开(公告)日：2007-09-11

申请号：US10898592

申请日：2004-07-26

申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

IPC分类号： G21G5/00

CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。

公开(公告)号：US07205560B2

公开(公告)日：2007-04-17

申请号：US11127240

申请日：2005-05-12

申请人： Mitsuo Tokuda ,  Muneyuki Fukuda ,  Yasuhiro Mitsui ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Hideo Kashima ,  Kaoru Umemura

发明人： Mitsuo Tokuda ,  Muneyuki Fukuda ,  Yasuhiro Mitsui ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Hideo Kashima ,  Kaoru Umemura

IPC分类号： H01J37/256 ,  G21K7/00

CPC分类号： H04L29/06 ,  G01N23/225 ,  H01J37/256 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/202 ,  H01J2237/31745 ,  H04L67/16 ,  H04L69/329

摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

公开(公告)号：US20050006600A1

公开(公告)日：2005-01-13

申请号：US10898592

申请日：2004-07-26

申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

IPC分类号： B23K15/00 ,  G01N1/28 ,  G01N23/20 ,  G01Q20/02 ,  G01Q30/20 ,  G01Q70/00 ,  A61N5/00 ,  G01K1/08 ,  G21K5/10

CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。

公开(公告)号：US6077027A

公开(公告)日：2000-06-20

申请号：US289677

申请日：1999-04-12

申请人： Yoshio Kawamura ,  Hideo Kashima ,  Shigeo Moriyama

发明人： Yoshio Kawamura ,  Hideo Kashima ,  Shigeo Moriyama

IPC分类号： B65G49/07 ,  H01L21/677 ,  B25J17/00

CPC分类号： H01L21/67742 ,  Y10S414/139 ,  Y10T74/20329

摘要： In order to manufacture a semiconductor device of high performance a small-sized transfer arm mechanism, capable of retaining a predetermined transfer stroke, is put to practical use without any increase in the height of the arm mechanism. The transfer arm includes arcuate portions having center axes different from each other, and restraint generating means for generating restraints in directions where the individual center axes are attracted. This way, a plurality of arms are joined by joints having a structure for transmitting rolling motions to the arcuate portions contacting each other to thereby control the drive shaft of the arcuate portions rotationally and thereby move the arms. This transfer arm mechanism is used in various environments including semiconductor manufacturing, such as DRAMs.

摘要翻译： 为了制造高性能的半导体装置，能够保持预定的传送冲程的小型传送臂机构被实际使用，而不会增加臂机构的高度。 传送臂包括具有彼此不同的中心轴的弓形部分，以及用于在各个中心轴被吸引的方向上产生约束的约束产生装置。 这样，多个臂通过具有用于将滚动运动传递到彼此接触的弓形部分的结构的接头连接，从而旋转地控制弓形部分的驱动轴，从而移动臂。 该转移臂机构用于包括半导体制造在内的各种环境，例如DRAM。

公开(公告)号：US5971701A

公开(公告)日：1999-10-26

申请号：US795858

申请日：1997-02-06

申请人： Yoshio Kawamura ,  Hideo Kashima ,  Shigeo Moriyama

发明人： Yoshio Kawamura ,  Hideo Kashima ,  Shigeo Moriyama

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65G65/00

CPC分类号： H01L21/67742 ,  Y10S414/139 ,  Y10T74/20329

摘要： In order to manufacture a semiconductor device of high performance a small-sized transfer arm mechanism, capable of retaining a predetermined transfer stroke, is put to practical use without any increase in the height of the arm mechanism. The transfer arm includes arcuate portions having center axes different from each other, and restraint generating means for generating restraints in directions where the individual center axes are attracted. This way, a plurality of arms are joined by joints having a structure for transmitting rolling motions to the arcuate portions contacting each other to thereby control the drive shaft of the arcuate portions rotationally and thereby move the arms. This transfer arm mechanism is used in various environments including semiconductor manufacturing, such as DRAMs (dynamic random access memory).

摘要翻译： 为了制造高性能的半导体装置，能够保持预定的传送冲程的小型传送臂机构被实际使用，而不会增加臂机构的高度。 传送臂包括具有彼此不同的中心轴的弓形部分，以及用于在各个中心轴被吸引的方向上产生约束的约束产生装置。 这样，多个臂通过具有用于将滚动运动传递到彼此接触的弓形部分的结构的接头连接，从而旋转地控制弓形部分的驱动轴，从而移动臂。 该转移臂机构用于包括半导体制造在内的各种环境，例如DRAM（动态随机存取存储器）。

公开(公告)号：US08796651B2

公开(公告)日：2014-08-05

申请号：US12929396

申请日：2011-01-20

申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

IPC分类号： G21G5/00

CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。

公开(公告)号：US08586916B2

公开(公告)日：2013-11-19

申请号：US13189812

申请日：2011-07-25

申请人： Hideo Kashima ,  Yasuaki Takada ,  Izumi Waki

发明人： Hideo Kashima ,  Yasuaki Takada ,  Izumi Waki

IPC分类号： H01J49/26

CPC分类号： G01N1/2205 ,  G01N1/4022 ,  G01N2001/028 ,  G01N2001/4027

摘要： A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).

摘要翻译： 一种用于以高速率收集附着在行李上的颗粒物质而不接触物质并检查是否将危险的或具体的样品材料粘附在行李上的技术。 还提供了一种用于简化或自动化这种检查的方法。 附着物检查设备（1）的特征在于，该设备包括：收集部分（5），用于收集从检查对象（25）剥离的样品材料，然后通过吹扫压缩气体通过捕获过滤器（ 52）和用于分析由捕获过滤器（52）捕获的样品材料的检查部（2），其特征还在于，所述检查设备包括用于将行李传送到检查部（2）的部分（3） 以及用于将捕获过滤器（52）从捕获部分（5）运送到检查部分（2）的运送部分（4）。

公开(公告)号：US20090200458A1

公开(公告)日：2009-08-13

申请号：US11908516

申请日：2005-03-14

申请人： Hideo Kashima ,  Yasuaki Takada ,  Izumi Waki

发明人： Hideo Kashima ,  Yasuaki Takada ,  Izumi Waki

IPC分类号： B01D59/44 ,  G01N1/22 ,  H01J49/00

CPC分类号： G01N1/2205 ,  G01N1/4022 ,  G01N2001/028 ,  G01N2001/4027

摘要： A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).

摘要翻译： 一种用于以高速率收集附着在行李上的颗粒物质而不接触物质并检查是否将危险的或具体的样品材料粘附在行李上的技术。 还提供了一种用于简化或自动化这种检查的方法。 附着物检查设备（1）的特征在于，该设备包括：收集部分（5），用于收集从检查对象（25）剥离的样品材料，然后通过吹扫压缩气体通过捕获过滤器（ 52）和用于分析由捕获过滤器（52）捕获的样品材料的检查部（2），其特征还在于，所述检查设备包括用于将行李传送到检查部（2）的部分（3） 以及用于将捕获过滤器（52）从捕获部分（5）运送到检查部分（2）的运送部分（4）。