公开(公告)号：US20200333707A1

公开(公告)日：2020-10-22

申请号：US16853857

申请日：2020-04-21

Applicant: JSR CORPORATION

Inventor： Miki Tamada ,  Sousuke Oosawa ,  Ken Maruyama

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

Abstract: A resist pattern-forming method includes applying a radiation-sensitive composition directly or indirectly on a substrate to form a resist film. The resist film is exposed to an extreme ultraviolet ray or an electron beam. The resist film is developed after the exposing. The radiation-sensitive composition includes a first complex, a compound and a second complex. The first complex includes a metal atom and a first ligand coordinating to the metal atom. The compound gives a second ligand that differs from the first ligand. The second complex includes the metal atom and the second ligand coordinating to the metal atom.

公开(公告)号：US20180267406A1

公开(公告)日：2018-09-20

申请号：US15988436

申请日：2018-05-24

Applicant: JSR CORPORATION

Inventor： Tomoki NAGAI ,  Takehiko Naruoka ,  Ken Maruyama ,  Motohiro Shiratani ,  Hisashi Nakagawa

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2059

Abstract: A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3. [AxMR1y]  (1)

公开(公告)号：US20170160637A9

公开(公告)日：2017-06-08

申请号：US14978672

申请日：2015-12-22

Applicant: JSR Corporation

Inventor： Takahiro Hayama ,  Kazunori Kusabiraki ,  Yukio Nishimura ,  Ken Maruyama ,  Kiyoshi Tanaka

IPC: G03F7/11 ,  G03F7/20

CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/24 ,  C08F220/30 ,  C08F228/02 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.

公开(公告)号：US09304393B2

公开(公告)日：2016-04-05

申请号：US13929357

申请日：2013-06-27

Applicant: JSR CORPORATION

Inventor： Kazuo Nakahara ,  Ken Maruyama

IPC: G03F7/004 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/19 ,  C07C22/02 ,  C07C381/12 ,  C07D307/77 ,  C08K5/07 ,  C07C22/08 ,  C07C25/18 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20

CPC classification number: G03F7/004 ,  C07C22/02 ,  C07C22/08 ,  C07C25/18 ,  C07C309/19 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/16 ,  C07C2602/42 ,  C07D307/77 ,  C08K5/07 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  C08L101/02

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R1 and R4 each independently represent a hydrogen atom, or the like. R2 and R3 each independently represent a hydrogen atom or the like. X1 and X2 each independently represent a hydrogen atom, or the like, or X1 and X2 taken together represent —S—, —O—, —SO2—, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X1, X2 and A is substituted by —Y—SO3−M+. Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. M+ represents a monovalent onium cation. In the case where —Y—SO3−M+ is present in a plurality of number, a plurality of Ys are each identical or different and a plurality of M+s are each identical or different.

Abstract translation: 辐射敏感性树脂组合物包括由式（1）表示的化合物和包含具有酸不稳定基团的结构单元的聚合物。 R 1和R 4各自独立地表示氢原子等。 R2和R3各自独立地表示氢原子等。 X1和X2各自独立地表示氢原子等，或者X1和X2一起表示-S-，-O-，-SO 2 - 等。 A表示乙二基，其中X1，X2和A中包含的至少一个氢原子被-Y-SO3-M +取代。 Y表示碳原子数1〜10的烷二基等。 M +表示单价鎓阳离子。 在-Y-SO3-M +存在多个数的情况下，多个Y分别相同或不同，多个M + s分别相同或不同。

公开(公告)号：US09023584B2

公开(公告)日：2015-05-05

申请号：US13901621

申请日：2013-05-24

Applicant: JSR Corporation

Inventor： Ken Maruyama

IPC: G03F7/004 ,  G03F7/027 ,  C07C309/00 ,  C07C315/00 ,  C07C303/00 ,  C07C309/27 ,  C07C381/12 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/004 ,  C07C309/27 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/114 ,  Y10S430/128

Abstract: A radiation-sensitive composition includes a compound represented by a formula (1), and a polymer having a structural unit that includes an acid-labile group. In the formula (1), R1 represents a group having a polar group; n is an integer of 1 to 4, wherein, in a case where R1 is present in a plurality of number, the plurality of R1s are identical or different, and optionally at least two R1s taken together represent a cyclic structure; A represents an alicyclic hydrocarbon group having a valency of (n+1); and M+ represents a monovalent onium cation.

Abstract translation: 辐射敏感性组合物包括由式（1）表示的化合物和具有包含酸不稳定基团的结构单元的聚合物。 式（1）中，R 1表示具有极性基团的基团。 n为1〜4的整数，其中，R1为多个的情况下，多个R 1相同或不同，并且任选地，至少两个R 1一起表示环状结构。 A表示具有（n + 1）价的脂环族烃基; M +表示单价鎓阳离子。