公开(公告)号：US11270883B2

公开(公告)日：2022-03-08

申请号：US17018169

申请日：2020-09-11

Applicant: JSR CORPORATION

Inventor： Hiroyuki Komatsu ,  Motohiro Shiratani

IPC: H01L21/311 ,  H01L21/027 ,  H01L21/02 ,  H01L21/321 ,  C08F8/00

Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.

公开(公告)号：US20220259741A1

公开(公告)日：2022-08-18

申请号：US17735151

申请日：2022-05-03

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Motohiro Shiratani

IPC: C23C18/06 ,  C09D185/02 ,  C09D185/04 ,  C09D5/20 ,  C23C18/12 ,  C23G1/02

Abstract: A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including —B(OR)2; a group including —PO(OR)2; and a group including —P(OR)2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the group (X) at an end of a main chain thereof or at an end of a side chain thereof.

公开(公告)号：US11319388B2

公开(公告)日：2022-05-03

申请号：US17013716

申请日：2020-09-07

Applicant: JSR CORPORATION

Inventor： Ken Maruyama ,  Yoshiki Nonoyama ,  Takuo Sone ,  Motohiro Shiratani

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C08F220/18 ,  C08K5/357 ,  C08K5/375 ,  C08L33/10 ,  G03F7/038

Abstract: A radiation-sensitive resin composition contains: a polymer having a first structural unit represented by formula (1), and a second structural unit represented by formula (2) and having an acid-labile group. A first acid, to be generated from the first acid generating agent, disassociates the acid labile group in the polymer upon heating under a condition involving a temperature of no less than 80° C. and no greater than 140° C. for a time period of 1 minute, and the second acid, to be generated from the second acid generating agent, does not substantially disassociate the acid-labile group under the condition. The polymer is synthesized by RAFT, ATRP, or NMP, and a RAFT agent is at least one selected from the group consisting of a mercaptocarboxylic acid ester, a disulfide, a dithioester, a xanthate, a dithiocarbamate, and a trithiocarbonate.

公开(公告)号：US10725376B2

公开(公告)日：2020-07-28

申请号：US15460477

申请日：2017-03-16

Applicant: JSR CORPORATION

Inventor： Hisashi Nakagawa ,  Takehiko Naruoka ,  Motohiro Shiratani

IPC: G03F7/30 ,  G03F7/004 ,  G03F7/32 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20

Abstract: A pattern-forming method includes applying a radiation-sensitive composition comprising a complex on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The complex includes: a metal-containing component that is a transition metal compound having a hydrolyzable group, a hydrolysis product of the transition metal compound having a hydrolyzable group, a hydrolytic condensation product of the transition metal compound having a hydrolyzable group, or a combination thereof; and an organic compound represented by formula (1). In the formula (1), R1 represents an organic group having a valency of n, n being an integer of 1 to 4. In a case where n is 1, X represents —COOH. In a case where n is 2 to 4, X represents —OH, —COOH, —NCO, —NHRa, —COORA or —CO—C(RL)2—CO—RA. R1X)n  (1)

公开(公告)号：US20200041902A9

公开(公告)日：2020-02-06

申请号：US15988436

申请日：2018-05-24

Applicant: JSR CORPORATION

Inventor： Tomoki NAGAI ,  Takehiko Naruoka ,  Ken Maruyama ,  Motohiro Shiratani ,  Hisashi Nakagawa

IPC: G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3. [AxMR1y]  (1)

公开(公告)号：US11745216B2

公开(公告)日：2023-09-05

申请号：US17847228

申请日：2022-06-23

Applicant: JSR CORPORATION

Inventor： Ryo Kumegawa ,  Sosuke Osawa ,  Miki Tamada ,  Ken Maruyama ,  Motohiro Shiratani

IPC: B05D1/00 ,  B05D1/32 ,  C08J5/18 ,  C08F297/02

CPC classification number: B05D1/327 ,  C08J5/18 ,  B05D2401/10 ,  C08F297/023

Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

公开(公告)号：US11204552B2

公开(公告)日：2021-12-21

申请号：US15988436

申请日：2018-05-24

Applicant: JSR CORPORATION

Inventor： Tomoki Nagai ,  Takehiko Naruoka ,  Ken Maruyama ,  Motohiro Shiratani ,  Hisashi Nakagawa

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  G03F7/38 ,  C07C303/32 ,  C07C309/06 ,  C07C309/12 ,  C07C309/19 ,  C07C309/24 ,  C07C381/12 ,  G03F7/20

Abstract: A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3. [AxMR1y]  (1)

公开(公告)号：US20200040209A1

公开(公告)日：2020-02-06

申请号：US16528707

申请日：2019-08-01

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Motohiro Shiratani ,  Miki Tamada

IPC: C09D125/14 ,  G03F7/11 ,  C08F212/08 ,  C08F220/14 ,  C09D133/14

Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.

公开(公告)号：US20180267406A1

公开(公告)日：2018-09-20

申请号：US15988436

申请日：2018-05-24

Applicant: JSR CORPORATION

Inventor： Tomoki NAGAI ,  Takehiko Naruoka ,  Ken Maruyama ,  Motohiro Shiratani ,  Hisashi Nakagawa

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2059

Abstract: A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3. [AxMR1y]  (1)

公开(公告)号：US12065534B2

公开(公告)日：2024-08-20

申请号：US17541317

申请日：2021-12-03

Applicant: JSR CORPORATION

Inventor： Hiroyuki Komatsu ,  Motohiro Shiratani ,  Tatsuya Sakai

IPC: C08G61/02 ,  B05D3/02 ,  C09D165/00

CPC classification number: C08G61/02 ,  B05D3/0254 ,  C09D165/00

Abstract: A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.