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    Modification method of surface of base, composition, and polymer
    1.
    发明授权
    Modification method of surface of base, composition, and polymer 有权

    公开(公告)号：US11426761B2

    公开(公告)日：2022-08-30

    申请号：US17000727

    申请日：2020-08-24

    Applicant: JSR CORPORATION

    Inventor： Hiroyuki Komatsu ,  Miki Tamada ,  Hitoshi Osaki ,  Tomoki Nagai

    IPC: B05D3/00 ,  B05D1/00 ,  B05D3/10 ,  B05D3/02 ,  C09D125/08 ,  C09D125/06 ,  C09D133/12 ,  C23C16/455

    Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.

    Composition, polymer, and method of producing substrate
    4.
    发明授权
    Composition, polymer, and method of producing substrate 有权

    公开(公告)号：US11578230B2

    公开(公告)日：2023-02-14

    申请号：US17196006

    申请日：2021-03-09

    Applicant: JSR CORPORATION

    Inventor： Hiroyuki Komatsu ,  Miki Tamada ,  Ryo Kumegawa ,  Tatsuya Sakai

    IPC: B05D1/00 ,  C09D125/16 ,  C23C18/00 ,  C08F212/08 ,  C08F212/12 ,  C08L101/02 ,  C23C18/18 ,  B05D3/02 ,  H01L23/14 ,  B05D7/24

    Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.

    METHOD FOR PRODUCING FILM
    5.
    发明申请
    METHOD FOR PRODUCING FILM 有权

    公开(公告)号：US20230027151A1

    公开(公告)日：2023-01-26

    申请号：US17847228

    申请日：2022-06-23

    Applicant: JSR CORPORATION

    Inventor： Ryo KUMEGAWA ,  Sosuke Osawa ,  Miki Tamada ,  Ken Maruyama ,  Motohiro Shiratani

    IPC: B05D1/32 ,  C08J5/18

    Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

    Method for producing film
    6.
    发明授权
    Method for producing film 有权

    公开(公告)号：US11745216B2

    公开(公告)日：2023-09-05

    申请号：US17847228

    申请日：2022-06-23

    Applicant: JSR CORPORATION

    Inventor： Ryo Kumegawa ,  Sosuke Osawa ,  Miki Tamada ,  Ken Maruyama ,  Motohiro Shiratani

    IPC: B05D1/00 ,  B05D1/32 ,  C08J5/18 ,  C08F297/02

    CPC classification number: B05D1/327 ,  C08J5/18 ,  B05D2401/10 ,  C08F297/023

    Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

    Pattern-forming method and patterned substrate
    7.
    发明授权
    Pattern-forming method and patterned substrate 有权

    公开(公告)号：US11462405B2

    公开(公告)日：2022-10-04

    申请号：US16597947

    申请日：2019-10-10

    Applicant: JSR CORPORATION

    Inventor： Hiroyuki Komatsu ,  Miki Tamada ,  Hitoshi Osaki ,  Tomoki Nagai

    IPC: G03F7/075 ,  H01L21/033 ,  B81C1/00 ,  G03F7/26 ,  H01L21/308

    Abstract: A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.

    RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF
    8.
    发明申请
    RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF 审中-公开

    公开(公告)号：US20200333707A1

    公开(公告)日：2020-10-22

    申请号：US16853857

    申请日：2020-04-21

    Applicant: JSR CORPORATION

    Inventor： Miki Tamada ,  Sousuke Oosawa ,  Ken Maruyama

    IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

    Abstract: A resist pattern-forming method includes applying a radiation-sensitive composition directly or indirectly on a substrate to form a resist film. The resist film is exposed to an extreme ultraviolet ray or an electron beam. The resist film is developed after the exposing. The radiation-sensitive composition includes a first complex, a compound and a second complex. The first complex includes a metal atom and a first ligand coordinating to the metal atom. The compound gives a second ligand that differs from the first ligand. The second complex includes the metal atom and the second ligand coordinating to the metal atom.

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