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27 条记录 (耗时 0.053 秒)

    Method of Manufacturing a Microarray
    23.
    发明申请
    Method of Manufacturing a Microarray 失效
    制造微阵列的方法

    公开(公告)号：US20080076128A1

    公开(公告)日：2008-03-27

    申请号：US11748175

    申请日：2007-05-14

    申请人： Jung-hwan HAH ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

    发明人： Jung-hwan HAH ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

    IPC分类号： C12Q1/68

    CPC分类号： B01J19/0046 ,  B01J2219/00382 ,  B01J2219/00432 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00659 ,  B01J2219/00711 ,  B01J2219/00722 ,  B82Y30/00 ,  C40B50/18

    摘要： A method of manufacturing a microarray includes providing a substrate having a surface that is immobilized with a functional group protected with an acid-labile protecting group and capable of coupling with an oligomer probe, providing a photoacid generator onto the substrate, disposing on the substrate an imprint template comprising a convex region and a plurality of concave regions surrounding the convex region so that the convex region contacts with or is adjacent to an upper surface of the substrate to define a plurality of reaction zones by the upper surface of the substrate and the convex region and the concave regions of the imprint template, exposing one or more of the reaction zones to light so that an acid is generated by the photoacid generator in the one or more exposed reaction zones and a functional group in the one or more exposed reaction zones is deprotected by the acid, and providing an oligomer probe onto the substrate so that the oligomer probe couples with the deprotected functional group.

    摘要翻译： 一种制造微阵列的方法包括提供具有固定有被酸不稳定保护基团保护的官能团并且能够与低聚物探针耦合的表面的基底，在基底上提供光致酸产生剂，在基底上设置 压印模板，其包括凸区域和围绕所述凸区域的多个凹区域，使得所述凸区域与所述衬底的上表面接触或邻近所述衬底的上表面，以通过所述衬底的上表面和所述凸起部分限定多个反应区域 区域和压印模板的凹区域，使一个或多个反应区域曝光，使得在一个或多个暴露的反应区域中的光酸产生剂产生酸，并且在一个或多个暴露的反应区域中的官能团 通过酸脱保护，并在基底上提供低聚物探针，使得寡聚物探针与沉淀物结合 无效的功能组。

    Oligomer Probe Array with Improved Signal-to-Noise Ratio and Detection Sensitivity and Method of Manufacturing the Same
    24.
    发明申请
    Oligomer Probe Array with Improved Signal-to-Noise Ratio and Detection Sensitivity and Method of Manufacturing the Same 审中-公开
    具有改进的信噪比和检测灵敏度的低聚物探针阵列及其制造方法

    公开(公告)号：US20080038712A1

    公开(公告)日：2008-02-14

    申请号：US11686492

    申请日：2007-03-15

    申请人： Jung-hwan Hah ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

    发明人： Jung-hwan Hah ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

    IPC分类号： G01N33/53

    CPC分类号： B01J19/0046 ,  B01J2219/00317 ,  B01J2219/00605 ,  B01J2219/00662 ,  B01J2219/00722

    摘要： An oligomer probe array with improved signal-to-noise ratio and desired detection sensitivity ever when a reduced design rule is employed includes a substrate, a plurality of probe cell active regions formed on or in the substrate, each of the plurality of probe cell active regions having a three-dimensional surface and being coupled, with at least one oligomer probe with its own sequence, and a probe cell isolation region defining the probe cell active regions and having no functional groups for coupling with the oligomer probes on a surface.

    摘要翻译： 当采用减少的设计规则时，具有改进的信噪比和期望的检测灵敏度的低聚物探针阵列包括：衬底，形成在衬底上或衬底中的多个探针单元有源区，多个探针单元中的每个探针单元活性 具有三维表面并与其自身序列的至少一个低聚物探针偶联的区域和限定探针细胞活性区并且不具有用于与表面上的低聚物探针偶联的官能团的探针细胞隔离区。

    Method of forming fine pattern using block copolymer
    26.
    发明授权
    Method of forming fine pattern using block copolymer 有权
    使用嵌段共聚物形成精细图案的方法

    公开(公告)号：US08263323B2

    公开(公告)日：2012-09-11

    申请号：US12591427

    申请日：2009-11-19

    申请人： Dong Ki Yoon ,  Shi-yong Yi ,  Seok-hwan Oh ,  Kyoung-seon Kim ,  Sang Ouk Kim ,  Seung-hak Park

    发明人： Dong Ki Yoon ,  Shi-yong Yi ,  Seok-hwan Oh ,  Kyoung-seon Kim ,  Sang Ouk Kim ,  Seung-hak Park

    IPC分类号： G03F7/26

    CPC分类号： G03F7/0002 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/405 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/32139

    摘要： A method of forming a fine pattern includes forming an organic guide layer on a substrate, forming a photoresist pattern on the organic guide layer, the photoresist pattern including a plurality of openings exposing portions of the organic guide layer, forming a material layer on the exposed portions of the organic guide layer and on the photoresist pattern, the material layer including block copolymers, and rearranging the material layer through phase separation of the block copolymers into a fine pattern layer, such that the fine pattern layer includes a plurality of first blocks and a plurality of second blocks arranged in an alternating pattern, the plurality of first blocks and the plurality of the second blocks having different repeating units of the block copolymers.

    摘要翻译： 形成精细图案的方法包括在基板上形成有机引导层，在有机引导层上形成光致抗蚀剂图案，光致抗蚀剂图案包括暴露部分有机引导层的多个开口，在暴露的 有机引导层的部分和光致抗蚀剂图案上的材料层包括嵌段共聚物，并且通过将嵌段共聚物相分离成精细图案层来重排材料层，使得精细图案层包括多个第一嵌段和 以交替图案排列的多个第二块，多个第一块和多个第二块具有不同的嵌段共聚物的重复单元。

    Method of forming fine pattern using block copolymer
    27.
    发明申请
    Method of forming fine pattern using block copolymer 有权
    使用嵌段共聚物形成精细图案的方法

    公开(公告)号：US20100167214A1

    公开(公告)日：2010-07-01

    申请号：US12591427

    申请日：2009-11-19

    申请人： Dong Ki Yoon ,  Shi-yong Yi ,  Seok-hwan Oh ,  Kyoung-seon Kim ,  Sang Ouk Kim ,  Seung-hak Park

    发明人： Dong Ki Yoon ,  Shi-yong Yi ,  Seok-hwan Oh ,  Kyoung-seon Kim ,  Sang Ouk Kim ,  Seung-hak Park

    IPC分类号： G03F7/20

    CPC分类号： G03F7/0002 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/405 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/32139

    摘要： A method of forming a fine pattern includes forming an organic guide layer on a substrate, forming a photoresist pattern on the organic guide layer, the photoresist pattern including a plurality of openings exposing portions of the organic guide layer, forming a material layer on the exposed portions of the organic guide layer and on the photoresist pattern, the material layer including block copolymers, and rearranging the material layer through phase separation of the block copolymers into a fine pattern layer, such that the fine pattern layer includes a plurality of first blocks and a plurality of second blocks arranged in an alternating pattern, the plurality of first blocks and the plurality of the second blocks having different repeating units of the block copolymers.

    摘要翻译： 形成精细图案的方法包括在基板上形成有机引导层，在有机引导层上形成光致抗蚀剂图案，光致抗蚀剂图案包括暴露部分有机引导层的多个开口，在暴露的 有机引导层的部分和光致抗蚀剂图案上的材料层包括嵌段共聚物，并且通过将嵌段共聚物相分离成精细图案层来重排材料层，使得精细图案层包括多个第一嵌段和 以交替图案排列的多个第二块，多个第一块和多个第二块具有不同的嵌段共聚物的重复单元。