摘要:
The present invention provides a display device which can prevent the deterioration of a transparent conductive film attributed to a cell reaction without pushing up a cost of a film forming device. The display device includes a first conductive layer which is formed of a transparent conductive film containing indium oxide as a main component, a conductive background layer which is formed on the first conductive layer, a second conductive layer which is formed of a film containing Al as a main component on the background layer, and a third conductive layer which is formed of the same material as the second conductive layer on the second conductive layer. On an interface between the second conductive layer and the third conductive layer, positions of grain boundaries are arranged discontinuously. Further, the background layer is a film which contains any one of Mo, Ti and Ta as a main component. Still further, the third conductive layer is used as a reflective electrode.
摘要:
The present invention prevents the diffusion of an aluminum element into a polysilicon layer in a heating step when an aluminum-based conductive layer is used in a source/drain electrode which is in contact with low-temperature polysilicon whereby the occurrence of defective display can be obviated. An aluminum-based conductive layer is used in a source/drain electrode and a barrier layer made of molybdenum or a molybdenum alloy layer is formed between the aluminum-based conductive layer and a polysilicon layer. Further, a molybdenum oxide nitride film formed by the rapid heat treatment (rapid heat annealing) in a nitrogen atmosphere is formed over a surface of the molybdenum or the molybdenum alloy which constitutes the barrier layer.
摘要:
A glass-impregnated, fiber-reinforced ceramic comprises a ceramic matrix having open voids, inorganic fibers embedded in the ceramic matrix in a regular or irregular orientation, and a glass matrix filling up the open voids in the ceramic matrix. The glass-impregnated, fiber-reinforced ceramic is manufactured by a manufacturing method comprising the steps of forming a fiber-reinforced ceramic comprising the ceramic matrix having open voids, and inorganic fibers embedded in the ceramic matrix, impregnating the fiber-reinforced ceramic with a glass precursor solution containing a glass precursor to stop up the open voids of the ceramic matrix with the glass precursor solution, and subjecting the fiber-reinforced ceramic impregnated with the solution to a heat treatment.
摘要:
A glass-impregnated, fiber-reinforced ceramic comprises a ceramic matrix having open voids, inorganic fibers embedded in the ceramic matrix in a regular or irregular orientation, and a glass matrix filling up the open voids in the ceramic matrix. The glass-impregnated, fiber-reinforced ceramic is manufactured by a manufacturing method comprising the steps of forming a fiber-reinforced ceramic comprising the ceramic matrix having open voids, and inorganic fibers embedded in the ceramic matrix, impregnating the fiber-reinforced ceramic with a glass precursor solution containing a glass precursor to stop up the open voids of the ceramic matrix with the glass precursor solution, and subjecting the fiber-reinforced ceramic impregnated with the solution to a heat treatment.
摘要:
In a liquid crystal display device it is desirable to test in the state of TFT substrates, without reducing the number of TFT substrates to be obtained from one mother TFT substrate, and without increasing the overall size of the TFT substrates. Test terminals are formed on the outside of terminals for driving the liquid crystal display device. The test terminals of the specific TFT substrate are formed in another TFT substrate just below the specific TFT substrate. The area in which the test lines are formed is a space in which a sealing material is formed, between the display area and an end of the lower TFT substrate. Thus, the size of the TFT substrates is not actually increased. A test line area is not separately formed and not discarded, so that the number of TFT substrates to be obtained from one mother TFT substrate is not reduced.
摘要:
A manufacturing method of a display device including a gate electrode film, a first electrode film, a second electrode film, and a conductive film connected to the first electrode film and formed of a conductive layer including a first conductive layer and a second conductive layer formed overlapping the first conductive layer. The method includes the steps of forming the first electrode film and the second electrode film, forming the conductive layer such that the conductive layer is connected to the first electrode film and the second electrode film, and forming the conductive film by removing regions other than predetermined regions of the conductive layer, wherein the conductive layer forming step includes the steps of forming the first conductive layer on the respective upper surfaces of the first electrode film and the second electrode film and forming the second conductive layer on the upper surface of the first conductive layer.
摘要:
A liquid crystal display device having a high definition screen in which a pixel electrode is formed in a region surrounded by a gate line and a drain line, and a trapezoidal protrusion having an upper surface and inclined surfaces is formed below the gate line. Since a TFT is formed over a trapezoidal protrusion and a channel portion is formed over the upper surface and the inclined surfaces of the trapezoidal protrusion, the width of the channel portion can be enlarged compared to that of a channel portion formed over a plane. The pixel electrode is in contact with a source electrode at the inclined surface of the trapezoidal protrusion. This configuration allows the TFT and a contact of the pixel electrode and a source electrode to be formed over part of the trapezoidal protrusion.
摘要:
Provided is a technology for preventing current leak of a charge holding capacitor which constitutes a pixel of a display device so as to prevent deterioration of display image quality of the display device. The display device includes a first contact hole connecting a first wiring layer and a second wiring layer which is formed over the first wiring layer, a second contact hole connecting the second wiring layer and a third wiring layer which is formed over the second wiring layer, and an electrode layer formed between the plurality of insulating films disposed between the second wiring layer and the third wiring layer, wherein at a position in a substrate surface direction, a distance between a electrode layer and the second contact hole is larger than a distance between the electrode layer and the first contact hole.
摘要:
In a liquid crystal display device it is desirable to test in the state of TFT substrates, without reducing the number of TFT substrates to be obtained from one mother TFT substrate, and without increasing the overall size of the TFT substrates. Test terminals are formed on the outside of terminals for driving the liquid crystal display device. The test terminals of the specific TFT substrate are formed in another TFT substrate just below the specific TFT substrate. The area in which the test lines are formed is a space in which a sealing material is formed, between the display area and an end of the lower TFT substrate. Thus, the size of the TFT substrates is not actually increased. A test line area is not separately formed and not discarded, so that the number of TFT substrates to be obtained from one mother TFT substrate is not reduced.
摘要:
Provided is a technology for preventing current leak of a charge holding capacitor which constitutes a pixel of a display device so as to prevent deterioration of display image quality of the display device. The display device includes a first contact hole connecting a first wiring layer and a second wiring layer which is formed over the first wiring layer, a second contact hole connecting the second wiring layer and a third wiring layer which is formed over the second wiring layer, and an electrode layer formed between the plurality of insulating films disposed between the second wiring layer and the third wiring layer, wherein at a position in a substrate surface direction, a distance between a electrode layer and the second contact hole is larger than a distance between the electrode layer and the first contact hole.