公开(公告)号：US5838433A

公开(公告)日：1998-11-17

申请号：US636511

申请日：1996-04-19

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01N21/956 ,  G01N21/00

CPC分类号： G03F1/84 ,  G01N21/95623

摘要： The present invention discloses a mask defect inspection apparatus for optically detecting a defect on a mask having a circuit pattern, which comprises an illumination system for illuminating the mask with inspection light; a first light receiving optical system for receiving the inspection light reflected by the mask; a second light receiving optical system for receiving the inspection light transmitted by the mask; a first spatial filter for shielding the inspection light passing through a central region including the optical axis of the first light receiving optical system in an optical Fourier transform plane for the circuit pattern in the first light receiving optical system; a second spatial filter for shielding the inspection light passing through a central region including the optical axis of the second light receiving optical system in an optical Fourier transform plane for the circuit pattern in the second light receiving optical system; a first detector for photoelectrically converting the inspection light having passed through the first spatial filter; a second detector for photoelectrically converting the inspection light having passed through the second spatial filter; and a gain adjusting circuit for adjusting a gain of a first output signal from the first detector to output a third output signal and adjusting a gain of a second output signal from the second detector to output a fourth output signal, wherein the defect is detected based on either a relative intensity difference or intensity ratio between the third output signal and the fourth output signal gain-adjusted by the gain adjusting circuit.

摘要翻译： 本发明公开了一种用于光学检测具有电路图案的掩模上的缺陷的掩模缺陷检查装置，其包括用检查光照亮掩模的照明系统; 用于接收由掩模反射的检查光的第一光接收光学系统; 用于接收由掩模传输的检查光的第二光接收光学系统; 第一空间滤波器，用于屏蔽在第一光接收光学系统中的电路图案的光学傅里叶变换平面中通过包括第一光接收光学系统的光轴的中心区域的检查光; 第二空间滤波器，用于屏蔽在第二光接收光学系统中的电路图案的光学傅里叶变换平面中通过包括第二光接收光学系统的光轴的中心区域的检查光; 用于光电转换已经通过第一空间滤光器的检查光的第一检测器; 第二检测器，用于对已通过第二空间滤光器的检查光进行光电转换; 以及增益调整电路，用于调整来自所述第一检测器的第一输出信号的增益以输出第三输出信号，并且调节来自所述第二检测器的第二输出信号的增益以输出第四输出信号，其中，基于所检测的所述缺陷 在第三输出信号和由增益调整电路调节的增益的第四输出信号之间的相对强度差或强度比上。

公开(公告)号：US5736735A

公开(公告)日：1998-04-07

申请号：US715638

申请日：1996-09-18

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01N21/94 ,  G02B26/10 ,  G02F1/01

CPC分类号： G02B26/10 ,  G01N21/94

摘要： An optical scanning device includes a light deflection unit for deflecting a light beam emitted by a light source to be incident on an object to be irradiated, a polarization state adjusting unit for adjusting the polarization state of the light beam, so that the light beam to be incident on the object to be irradiated has a predetermined polarization state with respect to the object to be irradiated, and a rotary driving unit for rotating the light deflection unit and the polarization state adjusting unit together so that the light beam deflected by the light deflection unit scans the object to be irradiated.

摘要翻译： 光学扫描装置包括：光偏转单元，用于使由入射到待照射物体上的光源发射的光束偏转;偏振状态调整单元，用于调节光束的偏振状态，使得光束到 入射到被照射物体上的相对于被照射物体具有预定的偏振状态，以及用于将光偏转单元和偏振状态调整单元一起旋转的旋转驱动单元，使得由光偏转偏转的光束 单位扫描要照射的物体。

公开(公告)号：US5471066A

公开(公告)日：1995-11-28

申请号：US294990

申请日：1994-08-24

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01N21/956 ,  G01R31/34 ,  G01N21/88

CPC分类号： G01R31/34 ,  G01N21/95623

摘要： A simple signal processing system is utilized to detect defects on the surface of a substrate formed with a circuit pattern at high speed. Light flux from a light source illuminates an inspection point P on the wafer. The light flux from the inspection point P passes a Fourier transform lens and forms a Fourier transform spectrum of the circuit pattern on the inspection point P in the rear focal plane. From the Fourier transform spectrum, a Fourier transform spectrum including no defect information is eliminated by a spatial filter and thereafter the light flux is received by a photoelectric converting device. While the wafer is rotated by a turn table and shifted in a y direction, the spatial filter is rotated in synchronism with rotation of the wafer.

摘要翻译： 利用简单的信号处理系统，以高速检测形成有电路图案的基板表面的缺陷。 来自光源的光通量照射晶片上的检查点P. 来自检查点P的光通过傅立叶变换透镜，并在后焦平面上的检查点P上形成电路图案的傅里叶变换光谱。 从傅里叶变换光谱中，通过空间滤波器消除不包括缺陷信息的傅立叶变换光谱，之后由光电转换装置接收光束。 当晶片通过转台旋转并沿y方向移位时，空间滤波器与晶片的旋转同步地旋转。

公开(公告)号：US5442189A

公开(公告)日：1995-08-15

申请号：US124461

申请日：1993-09-22

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01B11/24 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  H01L21/66

CPC分类号： G01N21/95623

摘要： An apparatus for inspecting defects and foreign substances on an object to be inspected comprises: an illumination optical system for illuminating a spot of illuminated area on a semiconductor wafer; a lens for executing Fourier transform of the patterns of said illuminated area; a spatial filter for blocking the components of the resultant Fourier transform images corresponding to the patterns having no defects; a lens for executing inverse Fourier transform of the light which is transmitted through the spatial filter to form images of the defect(s); and a photo detector array for receiving the images of the defect(s).

摘要翻译： 一种用于检查被检测物体上的缺陷和异物的装置包括：照明光学系统，用于照射半导体晶片上的照明区域的点; 用于执行所述照明区域的图案的傅里叶变换的透镜; 空间滤波器，用于阻止对应于没有缺陷的图案的所得到的傅里叶变换图像的分量; 用于对通过空间滤波器传输的光进行傅里叶逆变换以形成缺陷的图像的透镜; 以及用于接收缺陷的图像的光电检测器阵列。

公开(公告)号：US5363187A

公开(公告)日：1994-11-08

申请号：US76697

申请日：1993-06-15

申请人： Tsuneyuki Hagiwara ,  Fuminori Hayano

发明人： Tsuneyuki Hagiwara ,  Fuminori Hayano

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94 ,  G01N2021/4711 ,  G01N21/4788

摘要： A foreign particle detecting apparatus comprises a light source for radiating coherent light onto an object to be detected on a surface of which a circuit pattern is formed, a focusing device for focusing the light emitted from the light source onto the object to be detected at a predetermined angular aperture, a device for moving the incident light focused at the predetermined angular aperture relative to the object to be detected, and a detector for receiving scattered light produced upon incidence of the focused light onto the object to be detected, and which detects foreign matter on the object to be detected on the basis of an output signal from the detector. Foreign matter is discriminated from the circuit pattern on the basis of the output signal from the detector means. The detector comprises at least two light-receiving elements, separated by a spatial angle substantially equal to or slightly larger than the angular aperture of the incident light, for individually outputting signals.

摘要翻译： 异物检测装置包括用于在形成有电路图案的表面上将相干光辐射到待检测物体上的光源，用于将从光源发射的光聚焦到待检测物体的聚焦装置， 预定的角度孔，用于使聚焦在预定角度孔的入射光相对于待检测物体移动的装置，以及用于接收在聚焦光入射到被检测物上时产生的散射光的检测器，并且检测外部 在基于来自检测器的输出信号的待检测物体上的物质。 基于来自检测器装置的输出信号，异物与电路图案区分开。 检测器包括至少两个光接收元件，其被基本上等于或稍大于入射光的角孔径的空间角度分开，用于单独地输出信号。

公开(公告)号：US5149982A

公开(公告)日：1992-09-22

申请号：US825811

申请日：1992-01-21

申请人： Tsuneyuki Hagiwara ,  Fuminori Hayano

发明人： Tsuneyuki Hagiwara ,  Fuminori Hayano

IPC分类号： G01N21/94

CPC分类号： G01N21/94

摘要： In a foreign particle inspection apparatus for detecting foreign particles present on a transparent object, a light beam is applied obliquely to one surface of the object, and the object and the light beam are moved relatively to scan an area of the surface. A photoelectric converter has a light receiving surface disposed to oppose the surface of the object and at least one end of the object. The converter receives scattered light from the foreign particles incident on the light receiving surface and outputs an electrical signal. A light intercepting member is disposed to intercept light propagated in the object from the scanning area toward the end of the object, that would otherwise be transmitted through the end of the object and travel externally of the object to the light receiving surface.

摘要翻译： 在用于检测存在于透明物体上的异物的异物检测装置中，将光束倾斜地施加到物体的一个表面，并且使物体和光束相对移动以扫描表面的区域。 光电转换器具有设置成与物体的表面和物体的至少一端相对设置的光接收表面。 转换器接收来自入射在光接收表面上的异物的散射光并输出电信号。 遮光构件被设置成将从物体的扫描区域传播的光线朝向物体的端部截取，否则其将通过物体的端部传播并且将物体向外移动到光接收表面。

公开(公告)号：US08305553B2

公开(公告)日：2012-11-06

申请号：US11660209

申请日：2005-08-17

申请人： Katsushi Nakano ,  Tsuneyuki Hagiwara

发明人： Katsushi Nakano ,  Tsuneyuki Hagiwara

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/7085 ,  G03F7/70341

摘要： Provided is an exposure apparatus that is able to prevent liquid from remaining on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in the vicinity of a first area (S1), which includes the first pattern (61), and a second pattern (80) is formed in the second area (S2) so that the liquid (LQ) that has remained so as to span the first area (S1) and the second area (S2) retreats from the first area (S1) and collects in the second area (S2).

摘要翻译： 提供能够防止液体残留在测量部件上的曝光装置。 曝光装置包括测量系统（60），该测量系统具有形成在衬底台的上表面上的第一图案（61）和在第一区域附近的上表面上指定的第二区域（S2） ），其包括第一图案（61），并且在第二区域（S2）中形成第二图案（80），使得保持以跨越第一区域（S1）的液体（LQ）和第二图案 区域（S2）从第一区域（S1）退回并收集在第二区域（S2）中。

公开(公告)号：US07965387B2

公开(公告)日：2011-06-21

申请号：US11658034

申请日：2005-07-21

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01N21/00

CPC分类号： G03F7/70358 ,  G03F7/70666 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7069 ,  G03F9/7088

摘要： A main controller moves a reticle stage in a scanning direction, illuminates an area on a reticle including a mark area in which predetermined marks are formed with illumination light, forms an aerial image of at least one mark existing in the mark area via a projection optical system, and measures the aerial image using an aerial image measuring unit. The main controller repeatedly performs such aerial image measurement while moving the reticle stage in the scanning direction. Then, the main controller computes a scanning image plane on which an image of a pattern formed on a reticle is formed by the projection optical system, based on the measurement result of the aerial image of each mark at each movement position. Based on the computation result, the main controller performs focus leveling control of a wafer during scanning exposure. Thus, highly accurate exposure is realized without using a sensor for reticle (mask) position measurement.

摘要翻译： 主控制器沿着扫描方向移动标线片台，照亮包含具有用照明光形成预定标记的标记区域的掩模版上的区域，经由投影光学形成存在于标记区域中的至少一个标记的空间图像 系统，并使用空中图像测量单元测量空中图像。 主控制器在沿着扫描方向移动标线片平台的同时重复执行这种空间图像测量。 然后，主控制器基于每个移动位置处的每个标记的空中图像的测量结果来计算由投影光学系统形成在掩模版上的图案的图像的扫描图像平面。 基于计算结果，主控制器在扫描曝光期间执行晶片的聚焦调平控制。 因此，在不使用用于掩模版（掩模）位置测量的传感器的情况下实现高度准确的曝光。

公开(公告)号：US20090047607A1

公开(公告)日：2009-02-19

申请号：US11910224

申请日：2006-03-30

申请人： Hiroyuki Nagasaka ,  Tsuneyuki Hagiwara

发明人： Hiroyuki Nagasaka ,  Tsuneyuki Hagiwara

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/706

摘要： A liquid immersion region (LR) is formed on a measuring member (65) by use of the liquid immersion mechanism (1), and measurement is performed by receiving measurement light through liquid (LQ) which forms the liquid immersion region (LR), in order to determine an exposure condition of a substrate (P). The substrate (P) is exposed by taking into account a difference between a pressure of the liquid (LQ) in the process of measurement and that in the process of exposure and a result of the measurement thus performed.

摘要翻译： 通过浸液机构（1）在测量部件（65）上形成液浸区域（LR），并且通过接收通过形成液浸区域（LR）的液体（LQ）的测量光进行测量， 以确定基板（P）的曝光条件。 通过考虑在测量过程中的液体（LQ）的压力与曝光过程中的压力之间的差异以及由此进行的测量结果而使基板（P）暴露。

公开(公告)号：US07365830B2

公开(公告)日：2008-04-29

申请号：US11710410

申请日：2007-02-26

申请人： Tadahito Fujisawa ,  Soichi Inoue ,  Makoto Kobayashi ,  Masashi Ichikawa ,  Tsuneyuki Hagiwara ,  Kenichi Kodama

发明人： Tadahito Fujisawa ,  Soichi Inoue ,  Makoto Kobayashi ,  Masashi Ichikawa ,  Tsuneyuki Hagiwara ,  Kenichi Kodama

IPC分类号： G03B27/58 ,  G03B27/32 ,  G03B27/52

CPC分类号： G01B21/30 ,  G01B11/306 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： There is disclosed a wafer flatness evaluation method includes measuring front and rear surface shapes of a wafer. The wafer front surface measured is divided into sites. Then, a flatness calculating method is selected according to a position of the site to be evaluated and flatness in the wafer surface is acquired.

摘要翻译： 公开了一种晶片平坦度评估方法，其包括测量晶片的前后表面形状。 测量的晶圆正面分为几个部位。 然后，根据要评估的位置的位置选择平坦度计算方法，并获得晶片表面的平坦度。