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公开(公告)号：US20140060148A1
公开(公告)日：2014-03-06
申请号：US13834915
申请日：2013-03-15
Applicant: KLA-TENCOR CORPORATION
Inventor： Eran Amit , Dana Klein , Guy Cohen , Amir Widmann , Nimrod Shuall , Amnon Manassen , Nuriel Amir
IPC: G01B21/04
CPC classification number: G01B21/042 , G03F7/70625 , G03F7/70633
Abstract: Aspects of the present disclosure describe systems and methods for calibrating a metrology tool by using proportionality factors. The proportionality factors may be obtained by measuring a substrate under different measurement conditions. Then calculating the measured metrology value and one or more quality merits. From this information, proportionality factors may be determined. Thereafter the proportionality factors may be used to quantify the inaccuracy in a metrology measurement. The proportionality factors may also be used to determine an optimize measurement recipe. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Abstract translation: 本公开的方面描述了通过使用比例因子来校准度量工具的系统和方法。 可以通过在不同测量条件下测量衬底来获得比例因子。 然后计算测量的度量值和一个或多个质量优点。 根据该信息，可以确定比例因子。 此后，可以使用比例因子来量化度量测量中的不精确度。 比例因子也可用于确定优化测量配方。 要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。
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公开(公告)号：US20130229661A1
公开(公告)日：2013-09-05
申请号：US13865104
申请日：2013-04-17
Applicant: KLA-TENCOR CORPORATION
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01N21/47
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
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23.发明申请公开(公告)号：US20210373445A1
公开(公告)日：2021-12-02
申请号：US17401750
申请日：2021-08-13
Applicant: KLA-TENCOR CORPORATION
Inventor： Amnon Manassen , Yuri Paskover , Eran Amit
Abstract: Scatterometry overlay (SCOL) measurement methods, systems and targets are provided to enable efficient SCOL metrology with in-die targets. Methods comprise generating a signal matrix by: illuminating a SCOL target at multiple values of at least one illumination parameter, and at multiple spot locations on the target, wherein the illumination is at a NA (numerical aperture) >⅓ yielding a spot diameter
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公开(公告)号：US11112704B2
公开(公告)日：2021-09-07
申请号：US15753187
申请日：2017-12-15
Applicant: KLA-TENCOR CORPORATION
Inventor： Ido Adam , Vladimir Levinski , Amnon Manassen , Yuval Lubashevsky
Abstract: Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity—to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures.
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公开(公告)号：US11085754B2
公开(公告)日：2021-08-10
申请号：US16132157
申请日：2018-09-14
Applicant: KLA-Tencor Corporation
Inventor： Eran Amit , Amnon Manassen , Nadav Gutman
Abstract: Metrology targets designs, design methods and measurement methods are provided, which reduce noise and enhance measurement accuracy. Disclosed targets comprise an additional periodic structure which is orthogonal to the measurement direction along which given target structures are periodic. For example, in addition to two or more periodic structures along each measurement direction in imaging or scatterometry targets, a third, orthogonal periodic structure may be introduced, which provides additional information in the orthogonal direction, can be used to reduce noise, enhances accuracy and enables the application of machine learning algorithms to further enhance accuracy. Signals may be analyzed slice-wise with respect to the orthogonal periodic structure, which can be integrated in a process compatible manner in both imaging and scatterometry targets.
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Patent Agency Ranking
公开(公告)号：US10579768B2
公开(公告)日：2020-03-03
申请号：US15502950
申请日：2016-11-04
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Eitan Hajaj , Tal Itzkovich , Sharon Aharon , Michael E. Adel , Yuri Paskover , Daria Negri , Yuval Lubashevsky , Amnon Manassen , Myungjun Lee , Mark D. Smith
IPC: G06F17/50 , H01L21/027 , G03F7/20
Abstract: Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.
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公开(公告)号：US10520832B2
公开(公告)日：2019-12-31
申请号：US15114175
申请日：2016-05-19
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Amnon Manassen , Yoni Shalibo
Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.
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公开(公告)号：US10422508B2
公开(公告)日：2019-09-24
申请号：US15339312
申请日：2016-10-31
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Ohad Bachar
Abstract: A tunable spectral filter includes a first tunable dispersive element, a first optical element, a spatial filtering element located at the focal plane, a second optical element, and a second dispersive element. The first tunable dispersive element introduces spectral dispersion to an illumination beam with an adjustable dispersion. The first optical element focuses the illumination beam at a focal plane in which a distribution of a spectrum of the spectrally-dispersed illumination beam at the focal plane is controllable by adjusting the dispersion of the first tunable dispersive element. The spatial filtering element filters the spectrum of the illumination beam based on the distribution of the spectrum of the illumination beam at the focal plane. The second optical element collects the spectrally-dispersed illumination beam transmitted from the spatial filtering element. The second tunable dispersive element removes the dispersion introduced by the first tunable dispersive element from the illumination beam.
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公开(公告)号：US10401228B2
公开(公告)日：2019-09-03
申请号：US16052044
申请日：2018-08-01
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Yuri Paskover , Yuval Lubashevsky
Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.
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30.发明授权公开(公告)号：US10197389B2
公开(公告)日：2019-02-05
申请号：US15305166
申请日：2016-08-18
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Yuval Lubashevsky , Amnon Manassen
Abstract: Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions.
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