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公开(公告)号：US10203247B2
公开(公告)日：2019-02-12
申请号：US15369560
申请日：2016-12-05
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick A. Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
IPC: H01J65/04 , G01J3/02 , G01J3/10 , F21V13/08 , F21V13/00 , F21V13/12 , G02B6/35 , G02B6/293 , G01J3/12
Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
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公开(公告)号：US09080971B2
公开(公告)日：2015-07-14
申请号：US14516540
申请日：2014-10-16
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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公开(公告)号：US08873054B2
公开(公告)日：2014-10-28
申请号：US13865104
申请日：2013-04-17
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01J4/00 , G01B11/14 , G01B11/04 , G01B11/00 , G01N21/47 , G01B11/02 , G03F7/20 , G01B11/06 , G01N21/21 , G01N21/956
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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Patent Agency Ranking
公开(公告)号：US20150036142A1
公开(公告)日：2015-02-05
申请号：US14516540
申请日：2014-10-16
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01N21/47 , G01N21/956 , G01N21/95 , G01B11/02
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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公开(公告)号：US20140240951A1
公开(公告)日：2014-08-28
申请号：US13774025
申请日：2013-02-22
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
CPC classification number: G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。
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公开(公告)号：US20170146399A1
公开(公告)日：2017-05-25
申请号：US15369560
申请日：2016-12-05
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick A. Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
CPC classification number: G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
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公开(公告)号：US09512985B2
公开(公告)日：2016-12-06
申请号：US13774025
申请日：2013-02-22
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
CPC classification number: G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。
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公开(公告)号：US20130229661A1
公开(公告)日：2013-09-05
申请号：US13865104
申请日：2013-04-17
Applicant: KLA-TENCOR CORPORATION
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01N21/47
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
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