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80 条记录 (耗时 0.046 秒)

    Selectable capacitance circuit
    21.
    发明授权
    Selectable capacitance circuit 失效
    可选电容电路

    公开(公告)号：US07653371B2

    公开(公告)日：2010-01-26

    申请号：US11216955

    申请日：2005-08-30

    申请人： Philip D. Floyd

    发明人： Philip D. Floyd

    IPC分类号： H04B1/06

    CPC分类号： G02B26/001 ,  Y10T29/49124

    摘要： A voltage-controlled capacitor and methods for forming the same are described. A mechanical conductor membrane of the voltage-controlled capacitor is movable to and from a first position and a second position. An amount of capacitance can vary with the movement of the mechanical conductor membrane. A microelectromechanical systems (MEMS) voltage-controlled capacitor can be used in a variety of applications, such as, but not limited to, RF switches and RF attenuators.

    摘要翻译： 描述了压控电容器及其形成方法。 压控电容器的机械导体膜可移动到第一位置和第二位置。 电容量可随着机械导体膜的移动而变化。 微机电系统（MEMS）压控电容器可用于各种应用中，例如但不限于RF开关和RF衰减器。

    Method and system for sealing a substrate
    22.
    发明授权
    Method and system for sealing a substrate 有权
    密封基材的方法和系统

    公开(公告)号：US07629678B2

    公开(公告)日：2009-12-08

    申请号：US11842916

    申请日：2007-08-21

    申请人： Philip D. Floyd

    发明人： Philip D. Floyd

    IPC分类号： H01L23/02

    CPC分类号： B81C1/00269 ,  B81C2203/019 ,  G02B26/001

    摘要： A method of sealing a microelectromechanical system (MEMS) device from ambient conditions is described, where the MEMS device is formed on a substrate and a substantially hermetic seal is formed as part of the MEMS device manufacturing process. The method includes forming a metal seal on the substrate proximate a perimeter of the MEMS device using a method such as photolithography. The metal seal is formed on the substrate while the MEMS device retains a sacrificial layer between conductive members of MEMS elements, and the sacrificial layer is removed after formation of the seal and prior to attachment of a backplane.

    摘要翻译： 描述了一种从环境条件密封微机电系统（MEMS）器件的方法，其中MEMS器件形成在衬底上，并且基本上气密的密封件被形成为MEMS器件制造工艺的一部分。 该方法包括使用诸如光刻法的方法在MEMS器件的周边附近在基板上形成金属密封。 金属密封件形成在衬底上，而MEMS器件在MEMS元件的导电构件之间保留牺牲层，并且在形成密封件之后并且在附接背板之前移除牺牲层。

    DEVICE AND METHOD FOR MODIFYING ACTUATION VOLTAGE THRESHOLDS OF A DEFORMABLE MEMBRANE IN AN INTERFEROMETRIC MODULATOR
    23.
    发明申请
    DEVICE AND METHOD FOR MODIFYING ACTUATION VOLTAGE THRESHOLDS OF A DEFORMABLE MEMBRANE IN AN INTERFEROMETRIC MODULATOR 失效
    用于修改干涉式调制器中可变形膜的致动电压阈值的装置和方法

    公开(公告)号：US20080144163A1

    公开(公告)日：2008-06-19

    申请号：US12027862

    申请日：2008-02-07

    申请人： Philip D. Floyd

    发明人： Philip D. Floyd

    IPC分类号： G02B26/00

    CPC分类号： G02B26/001

    摘要： By varying the spacing between a partially-reflective, partially-transmissive surface and a highly reflective surface positioned behind the partially-reflective, partially-transmissive surface, an interferometric modulator selectively creates constructive and/or destructive interference between light waves reflecting off the two surfaces. The spacing can be varied by applying a voltage to create electrostatic attraction between the two surfaces, which causes one or both surfaces to deform and move closer together. In the absence of such attraction, the surfaces are in a relaxed position, where they are farther apart from one another. A actuation voltage is needed to create sufficient electrostatic attraction to cause a surface to deform. The actuation voltage can be modified by implanting ions in a dielectric layer attached to one or both surfaces. Upon the application of a voltage, the ions create a baseline level of repulsion or attraction between the two surfaces, which thus require more or less voltage, respectively, to cause a surface to deform. The degree of ion implantation can be chosen to set the actuation voltage as desired, or the surfaces can be made to deform at a given voltage by appropriately selecting the degree of ion implantation.

    摘要翻译： 通过改变位于部分反射部分透射表面之后的部分反射部分透射表面和高反射表面之间的间隔，干涉式调制器选择性地在从两个表面反射的光波之间产生建构性和/或相消干涉 。 可以通过施加电压以在两个表面之间产生静电吸引力来改变间隔，这导致一个或两个表面变形并且更靠近移动。 在没有这种吸引力的情况下，表面处于松弛的位置，它们彼此远离。 需要致动电压以产生足够的静电吸引力以使表面变形。 可以通过将离子注入连接到一个或两个表面的电介质层中来修改致动电压。 在施加电压时，离子产生两个表面之间的排斥或吸引的基线水平，因此分别需要更多或更少的电压以引起表面变形。 可以选择离子注入的程度来根据需要设定致动电压，或者通过适当地选择离子注入的程度使表面在给定的电压下变形。

    Ballistic aerosol marking apparatus with non-wetting coating
    25.
    发明授权
    Ballistic aerosol marking apparatus with non-wetting coating 有权
    具有非润湿涂层的弹道气溶胶标记装置

    公开(公告)号：US06416159B1

    公开(公告)日：2002-07-09

    申请号：US09410371

    申请日：1999-10-05

    申请人： Philip D. Floyd ,  Frederick J. Endicott ,  Gregory B. Anderson ,  Jurgen Daniel ,  Eric Peeters

    发明人： Philip D. Floyd ,  Frederick J. Endicott ,  Gregory B. Anderson ,  Jurgen Daniel ,  Eric Peeters

    IPC分类号： B41J2015

    CPC分类号： B41J2/01 ,  B41J2/14 ,  B41J2/211 ,  B41J2202/02

    摘要： In a ballistic aerosol marking device or the like, marking material flows from a material reservoir to a delivery channel via a port. The walls of the channel and or the port may be provided with a non-wetting coating to allow for control of the position of a meniscus formed in or at the port. By controlling the meniscus location, attributes of the system, such as the quantity of marking material delivered to the channel, the size of the marking material droplets delivered to the channel, the amount of foreign material (e.g., carrier liquid) delivered to the channel with the marking material, the field strength of gating electrodes, etc. may be controlled.

    摘要翻译： 在弹道气溶胶标记装置等中，标记材料经由端口从材料储存器流到输送通道。 通道和/或端口的壁可以设置有非润湿涂层，以允许控制在端口中形成的弯液面的位置。 通过控制弯液面位置，系统的属性，例如传送到通道的标记材料的数量，传送到通道的标记材料液滴的尺寸，传送到通道的异物（例如，载体液体）的量 使用标记材料，可以控制门电极的场强等。