公开(公告)号：US08359067B2

公开(公告)日：2013-01-22

申请号：US13197684

申请日：2011-08-03

申请人： Akira Kuriyama ,  Taizo Yamawaki ,  Satoshi Tanaka

发明人： Akira Kuriyama ,  Taizo Yamawaki ,  Satoshi Tanaka

IPC分类号： H04M1/00

CPC分类号： H04B1/0483 ,  H04B1/0458

摘要： There is provided a radio frequency circuit device for multi-band and multi-mode which is low in a circuit loss, and a mobile communication terminal using the radio frequency circuit device. The radio frequency circuit device has a first path 110 that includes an amplifier 10a that amplifies signals of at least two modulation techniques in power, a matching network 20 that is connected to the amplifier and a duplexer 50 and allows the matching network to be coupled with an antenna, and a second path 111 that does not include the duplexer and allows the matching network to be coupled with the antenna. The first path is selected when the amplifier amplifies one of the signals of at least two modulation techniques, and the second path is selected when the amplifier amplifies another signal. An output impedance of the amplifier is matched with an impedance when viewing the antenna side from the amplifier in the first path and the second path.

摘要翻译： 提供了一种电路损耗低的用于多频和多模的射频电路装置，以及使用射频电路装置的移动通信终端。 射频电路装置具有第一路径110，其包括放大器10a，其放大至少两个功率调制技术的信号，连接到放大器的匹配网络20和双工器50，并允许匹配网络与 天线和第二路径111，其不包括双工器并且允许匹配网络与天线耦合。 当放大器放大至少两个调制技术的信号之一时，选择第一路径，并且当放大器放大另一信号时选择第二路径。 当从第一路径和第二路径中的放大器观看天线侧时，放大器的输出阻抗与阻抗匹配。

公开(公告)号：US20130016199A1

公开(公告)日：2013-01-17

申请号：US13547711

申请日：2012-07-12

申请人： Naruyasu Kobayashi ,  Kaoru Kotoda ,  Hisashi Nishimura ,  Motoo Azuma ,  Kazuhiro Takizawa ,  Takayuki Sato ,  Satoshi Tanaka

发明人： Naruyasu Kobayashi ,  Kaoru Kotoda ,  Hisashi Nishimura ,  Motoo Azuma ,  Kazuhiro Takizawa ,  Takayuki Sato ,  Satoshi Tanaka

IPC分类号： H04N7/18

CPC分类号： A61B1/00006 ,  A61B1/045 ,  G09G5/005 ,  G09G5/12 ,  G09G2340/0435 ,  G09G2380/08

摘要： An electronic endoscopic apparatus includes an endoscopic scope and an image processing processor. The endoscopic scope includes a slid-state imaging device, an imaging-side multiplying unit, and an imaging synchronization signal generating unit. The image processing processor includes a display clock generating unit, a monitor synchronization signal generating unit, a master imaging clock generating unit, a processor-side multiplying/dividing unit, a phase-comparison oscillation control unit, and a display timing adjustment unit.

摘要翻译： 电子内窥镜装置包括内窥镜镜片和图像处理处理器。 内窥镜检查范围包括滑动状态成像装置，成像侧乘法部和成像同步信号生成部。 图像处理处理器包括显示时钟生成单元，监视同步信号生成单元，主成像时钟生成单元，处理器侧乘法/分割单元，相位比较振荡控制单元和显示定时调整单元。

公开(公告)号：US20120320175A1

公开(公告)日：2012-12-20

申请号：US13527113

申请日：2012-06-19

申请人： Kazuhiro Takizawa ,  Motoo Azuma ,  Hisashi Nishimura ,  Kaoru Kotoda ,  Satoshi Tanaka ,  Takayuki Sato ,  Naruyasu Kobayashi

发明人： Kazuhiro Takizawa ,  Motoo Azuma ,  Hisashi Nishimura ,  Kaoru Kotoda ,  Satoshi Tanaka ,  Takayuki Sato ,  Naruyasu Kobayashi

IPC分类号： H04N5/06 ,  H04N7/18

CPC分类号： A61B1/00006 ,  A61B1/00009 ,  A61B1/00013 ,  A61B1/00016 ,  A61B1/00045 ,  A61B1/04 ,  H04N5/0675 ,  H04N5/123

摘要： A phase control unit compares a phase of a display synchronization signal with a phase of a clock signal generated from a clock signal generated by an imaging clock generating unit, and controls oscillation of the imaging clock generating unit based on a result of the comparison. A drive signal generating unit generates a drive signal that drives a CMOS sensor based on a multiplication clock signal synchronized to the clock signal.

摘要翻译： 相位控制单元将显示同步信号的相位与由成像时钟产生单元生成的时钟信号产生的时钟信号的相位进行比较，并且基于比较结果控制成像时钟生成单元的振荡。 驱动信号生成单元基于与时钟信号同步的乘法时钟信号生成驱动CMOS传感器的驱动信号。

公开(公告)号：US20120279016A1

公开(公告)日：2012-11-08

申请号：US13551174

申请日：2012-07-17

申请人： Wakato Hayashi ,  Yuuichi Oota ,  Satoshi Tanaka ,  Hirokazu Nagae ,  Yusuke Yamamoto ,  Nobuyoshi Ooba ,  Tetsuo Ito ,  Noriyuki Iwama

发明人： Wakato Hayashi ,  Yuuichi Oota ,  Satoshi Tanaka ,  Hirokazu Nagae ,  Yusuke Yamamoto ,  Nobuyoshi Ooba ,  Tetsuo Ito ,  Noriyuki Iwama

IPC分类号： E05D3/10

CPC分类号： H04M1/0222 ,  H04M1/0218 ,  H04M1/0264 ,  H04M1/66 ,  H04M2250/22 ,  H04M2250/52

摘要： A two-axis hinge unit is provided with a first rotating shaft that rotates so as to open in the vertical direction from a folded state with a first casing and a second casing overlapping and a second rotating shaft that rotates so as to open in the horizontal direction from a folded state with the first casing and the second casing overlapping, and is provided with a restriction member positioned between the first rotating shaft and the second rotating shaft that, when one of the rotating shafts is in a predetermined rotational position, is pressed by this one rotating shaft and engages with the other rotating shaft, thereby restricting rotation of that other rotating shaft.

摘要翻译： 双轴铰链单元设置有第一旋转轴，所述第一旋转轴从第一壳体和第二壳体重叠的折叠状态在垂直方向上旋转，并且第二旋转轴旋转以在水平方向上打开 在第一壳体和第二壳体重叠的状态下，设置有位于第一旋转轴和第二旋转轴之间的限制构件，当第一壳体和第二壳体中的一个旋转轴处于预定旋转位置时，被限制构件被按压 通过该一个旋转轴并与另一个旋转轴接合，从而限制该另一个旋转轴的旋转。

公开(公告)号：US08298371B2

公开(公告)日：2012-10-30

申请号：US12056665

申请日：2008-03-27

申请人： Chishio Koshimizu ,  Naoki Matsumoto ,  Satoshi Tanaka ,  Toru Ito

发明人： Chishio Koshimizu ,  Naoki Matsumoto ,  Satoshi Tanaka ,  Toru Ito

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC分类号： H01J37/21 ,  H01J37/32091 ,  H01J37/32155 ,  H01J37/32165 ,  H01J37/32348 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32642 ,  H01J2237/21 ,  H01J2237/334

摘要： A plasma processing apparatus includes a processing chamber, a first electrode and a second electrode disposed to face each other, a high frequency power supply unit for applying a high frequency power to either the first electrode or the second electrode, a processing gas supply unit for supplying a processing gas to a processing space, and a main dielectric member provided at a substrate mounting portion on a main surface of the first electrode. A focus ring is attached to the first electrode to cover a peripheral portion of the main surface of the first electrode and a peripheral dielectric member is provided in a peripheral portion on the main surface of the first electrode so that an electrostatic capacitance per unit area applied between the first electrode and the focus ring is smaller than that applied between the first electrode and the substrate by the main dielectric member.

摘要翻译： 等离子体处理装置包括处理室，第一电极和彼此相对配置的第二电极，用于向第一电极或第二电极施加高频电力的高频电源单元，用于 将处理气体供给到处理空间，以及设置在第一电极的主表面上的基板安装部的主电介质部件。 聚焦环安装在第一电极上以覆盖第一电极的主表面的周边部分，并且在第一电极的主表面的周边部分设置外围电介质构件，使得每单位面积的静电电容 在第一电极和聚焦环之间的距离小于通过主电介质构件施加在第一电极和衬底之间的位置。

公开(公告)号：US08230369B2

公开(公告)日：2012-07-24

申请号：US12395481

申请日：2009-02-27

申请人： Akiko Mimotogi ,  Satoshi Tanaka ,  Shoji Mimotogi ,  Takashi Sato

发明人： Akiko Mimotogi ,  Satoshi Tanaka ,  Shoji Mimotogi ,  Takashi Sato

IPC分类号： G06F17/50

CPC分类号： G03F7/705 ,  G03F1/36 ,  G03F1/70

摘要： A method of simulating an optical intensity distribution on a substrate when a mask pattern formed on the mask is transferred to the substrate through a projection optical system by irradiating an illumination light obliquely on a mask surface of the mask, which comprises setting a phase difference between a zero-order diffraction light and a first-order diffraction light determined according to at least one of a distance between the zero-order diffraction light and the first-order diffraction light on a pupil of the projection optical system, thickness of a light-shielding portion formed on the mask, angle defined by an optical axis direction of the illumination light and an incident direction on the mask, and a difference between a size of the mask pattern and a half cycle of the mask pattern, and carrying out a simulation of the optical intensity distribution on the substrate according to the set phase difference.

摘要翻译： 当掩模上形成的掩模图案通过投影光学系统通过将照明光倾斜地照射到掩模的掩模表面上时，模拟基板上的光强度分布的方法，该方法包括设置掩模的掩模表面之间的相位差 根据投影光学系统的光瞳上的零级衍射光与一级衍射光之间的距离中的至少一个所确定的零级衍射光和一级衍射光， 形成在掩模上的屏蔽部分，由照明光的光轴方向和掩模上的入射方向限定的角度以及掩模图案的尺寸与掩模图案的半周期之间的差异，并且进行模拟 根据设定的相位差在基板上的光强度分布。

公开(公告)号：US08142961B2

公开(公告)日：2012-03-27

申请号：US12717914

申请日：2010-03-04

申请人： Toshiya Kotani ,  Satoshi Tanaka ,  Shigeki Nojima ,  Koji Hashimoto ,  Soichi Inoue

发明人： Toshiya Kotani ,  Satoshi Tanaka ,  Shigeki Nojima ,  Koji Hashimoto ,  Soichi Inoue

IPC分类号： G03F1/00

CPC分类号： G06F17/5068 ,  G03F1/36

摘要： A pattern correcting method for correcting a design pattern to form a desired pattern on a wafer is disclosed, which comprises defining an allowable dimensional change quantity of each of design patterns, defining a pattern correction condition for the each design pattern based on the allowable dimensional change quantity defined for the each design pattern, and correcting the each design pattern based on the pattern correction condition defined for the each design pattern.

摘要翻译： 公开了一种用于校正在晶片上形成期望图案的设计图案的图案校正方法，其包括限定每个设计图案的允许尺寸变化量，基于允许的尺寸变化来定义每个设计图案的图案校正条件 并且基于为每个设计图案定义的图案校正条件来校正每个设计图案。

公开(公告)号：US08141335B2

公开(公告)日：2012-03-27

申请号：US12447382

申请日：2007-11-09

申请人： Satoshi Tanaka ,  Shoichi Harada ,  Kozo Toyama

发明人： Satoshi Tanaka ,  Shoichi Harada ,  Kozo Toyama

IPC分类号： F02C7/047 ,  F02C7/08

CPC分类号： F02C9/22 ,  F02C7/047 ,  F02C7/057 ,  F05D2270/705

摘要： Extremely cold (e.g., −20° C.) air A is heated by a heat exchanger 30, which is supplied with steam S via a control valve 32, and heated air A′ is taken into a gas turbine 10. The valve opening degree of the control valve 32 is feedback-controlled so that the deviation between the measured temperature t1 and the target temperature TO of the heated air A′ is eliminated. Further, when the number of revolutions, N, of the gas turbine 10 increases, or when an IGV opening degree OP increases, the valve opening degree of the control valve 32 is feedforward-controlled in accordance with the increase in the number N of revolutions or the increase in the IGV opening degree OP. By so doing, the temperature of air A′ can be maintained at a temperature enabling stable combustion without delay in control, and intake air can be heated without delay in control, even at the start of the gas turbine or during change in the opening degree of an inlet guide vane.

摘要翻译： 非常冷（例如-20℃），空气A被热交换器30加热，热交换器30经由控制阀32供给蒸汽S，加热空气A'被吸入燃气轮机10.阀开度 控制阀32被反馈控​​制，从而消除了加热空气A'的测量温度t1与目标温度TO之间的偏差。 此外，当燃气轮机10的转数N增加时，或当IGV开度OP增加时，控制阀32的阀开度根据转数N的增加进行前馈控制 或IGV开度OP的增加。 通过这样做，空气A'的温度可以保持在能够在不延迟控制的情况下稳定燃烧的温度，并且即使在燃气轮机的启动时或者在开度变化的情况下，也可以不延迟地加热进气 的入口导叶。

公开(公告)号：US20120070767A1

公开(公告)日：2012-03-22

申请号：US13289099

申请日：2011-11-04

申请人： Satoshi Tanaka ,  Koji Hashimoto

发明人： Satoshi Tanaka ,  Koji Hashimoto

IPC分类号： G03F1/36

CPC分类号： H01L21/0274 ,  G03F1/70 ,  G06F17/5068 ,  H01L21/31144 ,  H01L21/32139

摘要： A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconductor substrate; generating resized data by enlarging the design data by a resizing quantity; generating first mask data by filling a space area having a space width of a space quantity or less of the resized data; and generating second mask data, to be aligned with the first mask data, having a window portion for selectively exposing an area determined by enlarging the space area by the resizing quantity.

摘要翻译： 一种用于生成用于传送用于描绘半导体集成电路的电路图案的图案的掩模组的掩模数据的方法，包括：准备具有与要在半导体衬底上传送的图案相对应的设计图案的设计数据; 通过调整大小的数量扩大设计数据来生成调整大小的数据; 通过填充具有空间大小的空间宽度的空间区域来生成第一掩模数据; 以及生成与所述第一掩模数据对准的第二掩模数据，所述第二掩模数据具有窗口部分，用于通过所述调整大小量选择性地暴露由所述空间区域扩大所确定的区域。

公开(公告)号：US08096021B2

公开(公告)日：2012-01-17

申请号：US12326862

申请日：2008-12-02

申请人： Noriyuki Iwama ,  Yuuichi Oota ,  Satoshi Tanaka ,  Tomoaki Kawabata ,  Masatake Fuke ,  Nobuyoshi Ooba

发明人： Noriyuki Iwama ,  Yuuichi Oota ,  Satoshi Tanaka ,  Tomoaki Kawabata ,  Masatake Fuke ,  Nobuyoshi Ooba

IPC分类号： E05D3/10

CPC分类号： E05D3/10 ,  E05Y2900/606 ,  Y10T16/5472

摘要： A hinge apparatus of the present invention comprises a first rotational shaft which rotates a first casing and a second casing relative to each other from a state where the first and second casings are folded down, and opens the first and second casings in a vertical direction, a second rotational shaft which rotates the first casing and the second casing relative to each other in a horizontal direction, a coupling member which couples the first rotational shaft and the second rotational shaft together, with an end portion of the first rotational shaft being overlapped with an end portion of the second rotational shaft, and an engagement member which allows either one rotational shaft of the first rotational shaft and the second rotational shaft to engage with the other rotational shaft, thereby restricting a rotation of the other rotational shaft when the one rotational shaft rotates.

摘要翻译： 本发明的铰链装置包括：第一旋转轴，其从第一和第二壳体向下折叠的状态相对于彼此旋转第一壳体和第二壳体，并且在垂直方向上打开第一和第二壳体， 使第一壳体和第二壳体相对于水平方向旋转的第二旋转轴，将第一旋转轴和第二旋转轴联接在一起的联接构件，第一旋转轴的端部与第一旋转轴的端部重叠 第二旋转轴的端部和允许第一旋转轴的第一旋转轴和第二旋转轴的一个旋转轴与另一旋转轴接合的接合构件，从而在旋转的一个旋转轴时限制另一旋转轴的旋转 轴旋转。