公开(公告)号：US07605860B2

公开(公告)日：2009-10-20

申请号：US11738773

申请日：2007-04-23

申请人： Kenji Saitoh ,  Hiroshi Yoshikawa ,  Kenichi Saito

发明人： Kenji Saitoh ,  Hiroshi Yoshikawa ,  Kenichi Saito

IPC分类号： H04N5/232

CPC分类号： G03B5/06 ,  G02B27/0025

摘要： Provided is an image pickup optical system capable of performing focusing in a wide region without a large increase in tilt angle in the case where an image of an object is picked up from a low angle. The image pickup optical system includes a first optical system and a second optical system, for enlarging an image formed by the first optical system and forming the enlarged image. A principal plane of the first optical system is tilted relative to an image plane of the second optical system.

摘要翻译： 提供一种摄像光学系统，其能够在从低角度拾取物体的图像的情况下在宽的区域中进行聚焦，而不会大幅度地增加倾斜角度。 摄像光学系统包括第一光学系统和第二光学系统，用于放大由第一光学系统形成的图像并形成放大图像。 第一光学系统的主平面相对于第二光学系统的像平面倾斜。

公开(公告)号：US20070292100A1

公开(公告)日：2007-12-20

申请号：US11764555

申请日：2007-06-18

申请人： Hiroshi Yoshikawa ,  Kenji Saitoh

发明人： Hiroshi Yoshikawa ,  Kenji Saitoh

IPC分类号： G02B6/10

CPC分类号： G02B17/086 ,  G01N21/47

摘要： At least one exemplary embodiment is directed to an illuminating apparatus, configured to uniformly illuminate a surface of an object, and includes a light-guiding member configured to guide light emitted from a source to a surface to be illuminated, and a reflecting member disposed between the light-guiding member and the surface to be illuminated. The reflecting member includes a pair of reflection surfaces disposed so as to face each other in a long side direction of the surface to be illuminated, and reflects light emitted from the light-guiding member in directions having directional components parallel to a short side direction of the surface to be illuminated toward the surface to be illuminated.

摘要翻译： 至少一个示例性实施例涉及一种被配置为均匀地照射物体的表面的照明装置，并且包括导光构件，其被配置为将从源发射的光引导到待照亮的表面，以及反射构件， 导光构件和被照射的表面。 反射构件包括一对反射面，其被布置为在被照射表面的长边方向上彼此面对，并且将从导光构件发射的光沿具有平行于短边方向的方向分量的方向反射 要照亮的表面被照亮的表面。

公开(公告)号：US06828085B2

公开(公告)日：2004-12-07

申请号：US09391633

申请日：1999-09-07

申请人： Tetsunobu Kochi ,  Kenji Saitoh

发明人： Tetsunobu Kochi ,  Kenji Saitoh

IPC分类号： G03F700

CPC分类号： G03F7/2022 ,  G03F7/70466

摘要： A method of producing a semiconductor chip includes (1) a first exposure step for exposing a device range inside a chip on a substrate, to a repetition pattern including a line and a space, wherein an exposure region of the repetition pattern has a size greater than the device range inside the chip, and (2) a second exposure step for exposing the device range inside the chip on the substrate, to a pattern which includes (i) a first line being parallel to the line of the repetition pattern and having substantially the same linewidth as that of the line or a first space being parallel to the space of the repetition pattern and having substantially the same width, and (ii) a second line of a width larger than the line of the repetition pattern or a second space of a width larger than the space of the repetition pattern. The first line overlaps with a portion of lines of the repetition pattern, or the first space overlaps with a portion of spaces of the repetition pattern. Also, the first and second exposure steps are carried out without a developing step interposed therebetween.

摘要翻译： 一种制造半导体芯片的方法包括：（1）第一曝光步骤，用于将衬底上的芯片内的器件范围曝光到包括线和空间的重复图案，其中重复图案的曝光区域具有更大的尺寸 （2）第二曝光步骤，用于将衬底内的芯片内部的器件范围曝光到包括（i）第一线平行于重复图案的线并且具有 基本上与线的线宽相同或第一空间平行于重复图案的空间并且具有基本上相同的宽度，以及（ii）宽度大于重复图案的线的第二线或第二线 宽度大于重复图案的空间的空间。 第一行与重复图案的一部分线重叠，或者第一空间与重复图案的空间的一部分重叠。 此外，第一曝光步骤和第二曝光步骤不间断地进行显影步骤。

公开(公告)号：US06544721B1

公开(公告)日：2003-04-08

申请号：US09332108

申请日：1999-06-14

申请人： Kenji Saitoh

发明人： Kenji Saitoh

IPC分类号： G03C500

CPC分类号： G03F7/70283 ,  G03F7/70466

摘要： A method or an apparatus for exposing a resist or a substrate in manufacturing a semiconductor device or the like by using phase shifting masks is arranged to make a multiple exposure to obtain a desired circuit pattern on the substrate. For this purpose, first and second masks are arranged to have phase shift areas formed in the desired pattern in such a way as to give respective different phase shifting effects.

摘要翻译： 布置用于通过使用相移掩模制造半导体器件等来使抗蚀剂或基板曝光的方法或装置，以进行多次曝光以在基板上获得所需的电路图案。 为此，第一和第二掩模被布置成具有以期望的图案形成的相移区域，以便给出相应的不同的相移效应。

公开(公告)号：US06157452A

公开(公告)日：2000-12-05

申请号：US754474

申请日：1996-11-25

申请人： Masanobu Hasegawa ,  Kenji Saitoh

发明人： Masanobu Hasegawa ,  Kenji Saitoh

IPC分类号： G01B11/00 ,  G01D5/347 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G01D5/347 ,  G03F9/7049 ,  G03F9/7076

摘要： A position detecting system for detecting relative positional relationship between first and second objects disposed opposed to each other, includes a first mark formed on the first object and provided by a physical optic element, a second mark formed on the second object and provided by a physical optic element, a light projecting portion for projecting onto the first object a radiation beam having a predetermined light intensity distribution, a light detecting portion for detecting first light diffracted by the first mark and diffracted by the second mark, and second light diffracted by at least one of the first and second marks at a diffraction order different from that of the first light, an adjusting device for adjusting the position of incidence of the radiation beam upon the first object on the basis of first and second signals, of signals detected by the light detecting portion, corresponding to the first and second lights, respectively, and a determining portion for determining the relative positional relationship between the first and second objects on the basis of the detection of the first and second signals by the light detecting portions.

摘要翻译： 一种位置检测系统，用于检测彼此相对设置的第一和第二物体之间的相对位置关系，包括形成在第一物体上并由物理光学元件提供的第一标记，形成在第二物体上的第二标记并由物理 光学元件，用于向第一物体投射具有预定光强分布的辐射束的光投射部分，用于检测由第一标记衍射的第一光并被第二标记衍射的光检测部分，以及至少被衍射的第二光 在与第一光不同的衍射阶段的第一和第二标记之一，调整装置，用于根据第一和第二信号调整辐射束在第一物体上的入射位置，由第 光检测部分，分别对应于第一和第二光，以及用于确定的确定部分 基于光检测部分对第一和第二信号的检测，得到第一和第二物体之间的相对位置关系。

公开(公告)号：US5985720A

公开(公告)日：1999-11-16

申请号：US933844

申请日：1997-09-19

申请人： Kenji Saitoh

发明人： Kenji Saitoh

IPC分类号： H01L21/8247 ,  H01L27/115 ,  H01L29/423 ,  H01L29/788 ,  H01L29/792

CPC分类号： H01L27/11521 ,  H01L27/115 ,  H01L29/42324

摘要： A flash memory has diffused layers extending in a column direction to form channel regions between each two of the diffused layers, field oxide films extending in a row direction to divide the channel regions into separate channels arranged in a matrix, a floating gate disposed for each channel as a split gate, and a strip control gates extending in the row direction and overlying each row of the split floating gate. Each of the floating gates has a lower layer having a lower impurity concentration and an upper layer having a higher impurity concentration. The lower impurity concentration of the lower layer prevents fluctuations in device characteristics while the higher concentration of the upper layer enhances etch rates in two etching process for forming the floating gates of a matrix.

摘要翻译： 闪存具有沿列方向延伸的扩散层，以在每两个扩散层之间形成沟道区，在行方向上延伸的场氧化物膜将沟道区分成排列成矩阵的单独通道，每个 通道作为分离栅极，以及条形控制栅极，其在行方向上延伸并且覆盖分离浮动栅极的每一行。 每个浮置栅极具有杂质浓度较低的较低层和杂质浓度较高的上层。 下层的较低的杂质浓度防止了器件特性的波动，而较高浓度的上层提高了用于形成矩阵浮置栅极的两个蚀刻工艺中的蚀刻速率。

公开(公告)号：US5721721A

公开(公告)日：1998-02-24

申请号：US589473

申请日：1996-01-22

申请人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawase ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

发明人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawase ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

IPC分类号： G01B7/00 ,  G01D5/244 ,  G01D5/245 ,  G01Q10/00 ,  G01Q20/04 ,  G01Q60/00 ,  G01Q60/10 ,  G01Q70/06 ,  G11B9/00 ,  G11B7/00

CPC分类号： G01D5/244 ,  G01B7/003 ,  G01D5/2451 ,  G11B9/1418 ,  G11B9/1427 ,  G11B9/1481 ,  B82Y10/00 ,  G01Q10/06 ,  G01Q60/16 ,  G01Q80/00 ,  G11B9/1472 ,  Y10S977/851 ,  Y10S977/861 ,  Y10S977/947

摘要： An encoder includes an electrically conductive reference scale having surface steps formed at predetermined positions; an electrically conductive probe having a tip disposed opposed to the reference scale; wherein the reference scale and the probe are relatively movable in a direction different from the opposing direction of the tip of the probe and the reference scale; a portion for applying an electrical voltage to between the reference scale and the probe; a portion for detecting a change in a tunnel current between the reference scale and the probe, to between which the electric voltage is applied by the voltage applying portion at the time of the relative movement between the scale and the probe, the detecting portion detecting the change in the tunnel current when the probe passes a position opposed to a surface step of the reference scale; and portion for detecting the amount of the relative movement between the scale and probe, on the basis of the detection by the change detecting portion.

摘要翻译： 编码器包括具有形成在预定位置处的表面台阶的导电参考标尺; 导电探针，其具有与参考标尺相对设置的尖端; 其中所述参考标尺和所述探针在与所述探针的尖端和所述参考标尺的相反方向不同的方向上相对移动; 用于将电压施加到参考标尺和探针之间的部分; 用于检测参考标尺和探针之间的隧道电流变化的部分，在标尺和探头之间的相对移动时由电压施加部施加电压，检测部分检测 当探针经过与参考刻度的表面台阶相对的位置时隧道电流的变化; 以及用于根据变化检测部分的检测来检测标尺和探针之间的相对移动量的部分。

公开(公告)号：US5585923A

公开(公告)日：1996-12-17

申请号：US314444

申请日：1994-09-28

申请人： Noriyuki Nose ,  Takeshi Miyachi ,  Kenji Saitoh ,  Koichi Sentoku ,  Takahiro Matsumoto

发明人： Noriyuki Nose ,  Takeshi Miyachi ,  Kenji Saitoh ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F7/70633 ,  G03F9/70

摘要： A method and apparatus for measuring the relative positional deviation between first and second diffraction gratings formed on an object includes determining the relative positional deviation of the first and second diffraction gratings while detecting and correcting an error produced in relation to detection of the positional deviation of the first and second diffraction gratings.

摘要翻译： 用于测量形成在物体上的第一和第二衍射光栅之间的相对位置偏差的方法和装置包括确定第一和第二衍射光栅的相对位置偏差，同时检测和校正相对于检测到的位置偏差的检测产生的误差 第一和第二衍射光栅。

公开(公告)号：US5333050A

公开(公告)日：1994-07-26

申请号：US675277

申请日：1991-03-26

申请人： Noriyuki Nose ,  Kenji Saitoh ,  Koichi Sentoku ,  Minoru Yoshii

发明人： Noriyuki Nose ,  Kenji Saitoh ,  Koichi Sentoku ,  Minoru Yoshii

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/02

CPC分类号： G03F7/70633 ,  G03F9/7049

摘要： Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different moments, the measurement being based on detection of interference of diffraction lights from at least one of the first and second printed patterns.

摘要翻译： 公开了一种用于测量在不同时刻印刷在诸如半导体晶片的物品上的第一图案和第二图案之间的相对位置偏差的方法和装置，该测量是基于检测衍射光从至少一个 第一和第二印刷图案。

公开(公告)号：US5327221A

公开(公告)日：1994-07-05

申请号：US919380

申请日：1992-07-29

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.

摘要翻译： 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。