摘要:
A method of forming an integrated circuit configured to accommodate higher voltage and low voltage devices. In one embodiment, the method of forming the integrated circuit includes forming a transistor by forming a gate over a semiconductor substrate. The method of forming the transistor also includes forming a source/drain by forming a lightly doped region adjacent a channel region recessed into the semiconductor substrate and forming a heavily doped region adjacent the lightly doped region. The method of forming the transistor further includes forming an oppositely doped well under and within the channel region, and forming a doped region between the heavily doped region and the oppositely doped well. The doped region has a doping concentration profile less than a doping concentration profile of the heavily doped region. The method of forming the integrated circuit also includes forming a driver switch of a driver on the semiconductor substrate.
摘要:
An integrated circuit employable with a power converter. In one embodiment, the integrated circuit includes a power switch of a power train of the power converter formed on a semiconductor substrate. The integrated circuit also includes a driver switch of a driver configured to provide a drive signal to the power switch and embodied in a transistor including a gate located over a channel region recessed into the semiconductor substrate. The transistor also includes a source/drain including a lightly doped region located adjacent the channel region and a heavily doped region located adjacent the lightly doped region. The transistor further includes an oppositely doped well located under and within the channel region. The transistor still further includes a doped region, located between the heavily doped region and the oppositely doped well, having a doping concentration profile less than a doping concentration profile of the heavily doped region.
摘要:
A lateral metal-oxide semiconductor field effect transistor (MOSFET) formed over a substrate of a semiconductor wafer, a method of manufacturing the same and a semiconductor device incorporating the MOSFET or the method. In one embodiment, the MOSFET includes a silicon carbide layer located over or withing the substrate, a gate formed on the silicon carbide layer. The MOSFET further includes source and drain regions located in the silicon carbide layer and in contact with the gate, the silicon carbide layer increasing a breakdown voltage of the MOSFET.
摘要:
Methods and arrangements for task scheduling. At least one job is assimilated from at least one node, each job comprising at least a map phase and a reduce phase, each of the map and reduce phases comprising at least one task. Progress of a map phase of at least one job is compared with progress of a reduce phase of at least one job. Launching of a task of a reduce phase of at least one job is scheduled in response to progress of the reduce phase of at least one job being less than progress of the map phase of at least one job.
摘要:
Described herein are multi-purpose substrates composed of (1) a base coated with a calcium phosphate coating and (2) a fluorophore-labeled collagen adsorbed on the calcium phosphate coating. The multi-purpose substrates are useful in culturing and studying the activity of a variety of cells. The multi-purpose substrates described herein can be used for both solution- and image-based analysis of cultured cells. New methods for producing and using such coated substrates are also disclosed.
摘要:
Described herein are substrates composed of a base coated with a fluorophore-labeled calcium phosphate coating. The substrates are useful in culturing and studying the activity of a variety of cells. The substrates described herein can be used for both solution- and image-based analysis of cultured cells. New methods for producing and using such coated substrates are also disclosed.
摘要:
A method and apparatus to reduce the degradation in performance of semiconductor-based devices due to process, voltage, and temperature (PVT) and/or other causes of variation. Adaptive feedback mechanisms are employed to sense and correct performance degradation, while simultaneously facilitating configurability within integrated circuits (ICs) such as programmable logic devices (PLDs). A voltage-feedback mechanism is employed to detect PVT variation and mirrored current references are adaptively adjusted to track and substantially eliminate the PVT variation. More than one voltage-feedback mechanism may instead be utilized to detect PVT-based variations within a differential device, whereby a first voltage-feedback mechanism is utilized to detect common-mode voltage variation and a second voltage-feedback mechanism produces mirrored reference currents to substantially remove the common-mode voltage variation and facilitate symmetrical operation of the differential device.
摘要:
A system for signal level shifting in an IC can include a first inverter having a first pull-up device and a pull-down device, wherein the first inverter is operable to receive an input signal having a voltage potential at a logic high that does not disable the first pull-up device. The system can include a second inverter coupled in series to an output of the first inverter, and a control module coupled to the output of the first inverter and an output of the second inverter. Prior to the input signal transitioning to the logic high, the control module is operable to decouple the input signal from the first pull-up device, disable the first pull-up device, and close a feedback loop that latches an output state of the second inverter.
摘要:
A transistor advantageously embodied in a laterally diffused metal oxide semiconductor device having a gate located over a channel region recessed into a semiconductor substrate and a method of forming the same. In one embodiment, the laterally diffused metal oxide semiconductor device includes a source/drain having a lightly doped region located adjacent the channel region and a heavily doped region located adjacent the lightly doped region. The laterally diffused metal oxide semiconductor device further includes an oppositely doped well located under and within the channel region, and a doped region, located between the heavily doped region and the oppositely doped well, having a doping concentration profile less than a doping concentration profile of the heavily doped region.
摘要:
A method of forming an integrated circuit configured to accommodate higher voltage and low voltage devices. In one embodiment, the method of forming the integrated circuit includes forming a switch on a semiconductor substrate, and forming a driver switch of a driver embodied in a transistor. The method of forming the transistor includes forming a gate over the semiconductor substrate. The method of forming the transistor also includes forming a source/drain by forming a lightly doped region adjacent a channel region recessed into the semiconductor substrate, and forming a heavily doped region adjacent the lightly doped region. The method of forming the transistor further includes forming an oppositely doped well under and within the channel region. The method of forming the transistor still further includes forming a doped region with a doping concentration profile less than the heavily doped region between the heavily doped region and the oppositely doped well.