Abstract:
A maintenance system and a cleaning system having the same, the maintenance system including a maintenance station provided at indoors to mount a robot cleaner having a first dust container thereon, a suction port to suck dust of the first dust container, and a dust removing apparatus connected to the suction port while being disposed at outdoors, so that the cleaning performance is maintained regardless of existence of dust in the dust container of the robot cleaner while enhancing the spatial efficiency at indoors.
Abstract:
Disclosed herein is an autonomous cleaning machine with a brush cleaning unit to clean a brush unit. The autonomous cleaning machine includes a main body, the brush unit rotatably provided on the main body, first brush cleaning members contacting the brush unit to move foreign substances wound on the brush unit in a lengthwise direction of the brush unit, and second brush cleaning members contacting the brush unit to remove the foreign substances wound on the brush unit from the brush unit.
Abstract:
A semiconductor device is provided, which includes a first and second multichannel active patterns spaced apart from one another and extending in a first direction. The semiconductor device also includes first and second gate structures on the first and second multichannel active patterns, extending in a second direction and including first and second gate insulating films, respectively. Sidewalls of the first multichannel active pattern include first portions in contact with the first gate insulating film, second portions not in contact with the first gate insulating film, third portions in contact with the second gate insulating film, and fourth portions not in contact with the second gate insulating film. Additionally, a height of the first portions of the first multichannel active pattern is greater than a height of the third portions of the first multichannel active pattern.
Abstract:
A semiconductor device includes a substrate, a fin structure protruding from the substrate in a direction perpendicular to an upper surface of the substrate, the fin structure including first fin regions extending in a first direction and second fin regions extending in a second direction different from the first direction, source/drain regions disposed on the fin structure, a gate structure intersecting the fin structure, a first contact connected to one of the source/drain regions, and a second contact connected to the gate structure and being between the second fin regions in plan view.
Abstract:
A sensor module and a robot cleaner including the sensor module may provide accurate sensing of an obstacle and prevent an erroneous sensing of an obstacle. The robot cleaner may include a body including a cleaning unit to remove foreign substances from a surface of a floor, a cover to cover an upper portion of the body, a sensor module including an obstacle sensor mounted to sense an obstacle, and a sensor window provided at one side of the sensor module. The sensor module may include a light emitting device to emit light through the sensor window, a light receiving reflector on which light reflected from the obstacle is incident, and a light shielding portion interposed between the light emitting device and the light receiving reflector to block the light emitted from the light emitting device from being incident upon the light receiving reflector.
Abstract:
A robot cleaner system is described including a docking station to form a docking area within a predetermined angle range of a front side thereof, to form docking guide areas which do not overlap each other on the left and right sides of the docking area, and to transmit a docking guide signal such that the docking guide areas are distinguished as a first docking guide area and a second docking guide area according to an arrival distance of the docking guide signal. The robot cleaner system also includes a robot cleaner to move to the docking area along a boundary between the first docking guide area and the second docking guide area when the docking guide signal is sensed and to move along the docking area so as to perform docking when reaching the docking area.
Abstract:
A cleaning apparatus including a main body, a dust collection unit detachably installed on the main body and provided with a plurality of inlets, through which foreign substances are introduced into the dust collection unit, and a connection hole, to which an external instrument is connected, a shutter to open and close one inlet, and a cap to open and close the connection hole. The shutter opens and closes the inlet in cooperation with one of whether or not the dust collection unit is attached to or detached from the main body and whether or not the connection hole is opened or closed.
Abstract:
A semiconductor device includes channel layers on a substrate, the channel layers being spaced apart from each other, and having first side surfaces and second side surfaces opposing each other in a first direction, a gate electrode surrounding the channel layers and having a first end portion and a second end portion, opposing each other in the first direction, and a source/drain layer on a first side of the gate electrode and in contact with the channel layers, a portion of the source/drain layer protruding further than the first end portion of the gate electrode in the first direction, wherein a first distance from the first end portion of the gate electrode to the first side surfaces of the channel layers is shorter than a second distance from the second end portion of the gate electrode to the second side surfaces of the channel layers.
Abstract:
Semiconductor devices include a first active pattern including a first lower pattern extending in a first direction and a first sheet pattern spaced apart from the first lower pattern; and a first gate electrode on the first lower pattern, the first gate electrode extending in a second direction different from the first direction and surrounding the first sheet pattern, wherein the first lower pattern includes a first sidewall and a second sidewall opposite to each other, each of the first sidewall of the first lower pattern and the second sidewall of the first lower pattern extends in the first direction, the first gate electrode overlaps the first sidewall of the first lower pattern in the second direction by a first depth, the first gate electrode overlaps the second sidewall of the first lower pattern in the second direction by a second depth, and the first depth is different from the second depth.
Abstract:
A semiconductor device including a substrate; first and second active patterns on the substrate, extending in a first direction and spaced apart in a second direction; gate electrodes on the first and second active patterns and extending in the second direction; a first gate separation structure between the first and second active patterns, extending in the first direction, and separating the gate electrodes; and a first element separation structure between the gate electrodes, extending in the second direction, and separating the second active pattern, wherein a distance to a first side of a first portion of the first gate separation structure is smaller than a distance to the first side of a second portion of the first gate separation structure, and a distance to the second side of the first portion is smaller than a distance from the second active pattern to the second side of the second portion.