公开(公告)号：US20230201883A1

公开(公告)日：2023-06-29

申请号：US18068869

申请日：2022-12-20

Applicant: SEMES CO., LTD.

Inventor： Yong Hyun Choi ,  Young Hun Lee ,  Yong Joon Im ,  Seung Hoon Oh ,  Tae Jong Choi ,  Yong Sun Ko ,  Sang Min Lee ,  Jin Woo Jung

IPC: B08B3/02 ,  H01L21/67 ,  H01L21/687 ,  B08B13/00 ,  B25J11/00 ,  F26B3/28

CPC classification number: B08B3/022 ,  H01L21/67173 ,  H01L21/68707 ,  B08B13/00 ,  B25J11/0095 ,  F26B3/283

Abstract: Disclosed is an apparatus for treating a substrate. The apparatus for treating the substrate includes a liquid treating chamber for liquid-treating the substrate by supplying a treatment liquid to the substrate, a drying chamber for drying the substrate by supplying a process fluid to the substrate, a transfer unit for transferring the substrate between the liquid treating chamber and the drying chamber, and a rear surface cleaning unit for cleaning a rear surface of the substrate, in which the rear surface cleaning unit may clean the rear surface of the substrate while transferring the substrate from the liquid treating chamber to the drying chamber.

公开(公告)号：US11020777B2

公开(公告)日：2021-06-01

申请号：US16700940

申请日：2019-12-02

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Jae Myoung Lee

IPC: B08B7/00 ,  H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  F26B5/00 ,  F26B3/04 ,  F26B11/18 ,  F26B21/14 ,  H01L21/02

Abstract: A substrate treating apparatus is disclosed. The apparatus may include a housing including an upper body and a lower body coupled to each other to define a treatment space, the lower body being provided below the upper body, a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space, a fluid supplying unit configured to supply fluid into the treatment space, a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space, and an isolation plate installed between the sealing member and the supporting unit. The isolation plate may be provided to face the sealing member.

公开(公告)号：US09978584B2

公开(公告)日：2018-05-22

申请号：US15251760

申请日：2016-08-30

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Min Jun Cho ,  Jae Myoung Lee

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/306 ,  B08B7/00 ,  F26B21/10 ,  F26B21/06

CPC classification number: H01L21/02101 ,  B08B7/0021 ,  F26B21/06 ,  F26B21/10 ,  H01L21/02046 ,  H01L21/30604 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67069

Abstract: A method for treating a substrate, in which a supercritical fluid is supplied into a chamber, in which the substrate is carried, to treat the substrate, the method including a supply step of supplying the supercritical fluid into the chamber until a pressure of the interior of the chamber reaches a preset pressure, and a substrate treating step of performing a supercritical process while repeating supply and exhaust of the supercritical fluid into and out of the interior of the chamber after the supply step, wherein a flow rate of the supercritical fluid supplied into the chamber in the supply step is variable.

公开(公告)号：US20180012755A1

公开(公告)日：2018-01-11

申请号：US15251760

申请日：2016-08-30

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Min Jun Cho ,  Jae Myoung Lee

IPC: H01L21/02 ,  B08B7/00 ,  F26B21/06 ,  H01L21/306 ,  H01L21/67 ,  F26B21/10

CPC classification number: H01L21/02101 ,  B08B7/0021 ,  F26B21/06 ,  F26B21/10 ,  H01L21/02046 ,  H01L21/30604 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67069

Abstract: A method for treating a substrate, in which a supercritical fluid is supplied into a chamber, in which the substrate is carried, to treat the substrate, the method including a supply step of supplying the supercritical fluid into the chamber until a pressure of the interior of the chamber reaches a preset pressure, and a substrate treating step of performing a supercritical process while repeating supply and exhaust of the supercritical fluid into and out of the interior of the chamber after the supply step, wherein a flow rate of the supercritical fluid supplied into the chamber in the supply step is variable.