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    Method and device for processing semiconductor wafer
    23.
    发明授权
    Method and device for processing semiconductor wafer 失效
    用于处理半导体晶片的方法和装置

    公开(公告)号：US06999830B2

    公开(公告)日：2006-02-14

    申请号：US10496980

    申请日：2002-11-29

    Applicant: Shinji Arai ,  Takamasa Chikuma ,  Masahiro Mochizuki

    Inventor： Shinji Arai ,  Takamasa Chikuma ,  Masahiro Mochizuki

    IPC: G06F19/00

    CPC classification number: G05B19/41865 ,  G05B2219/32239 ,  G05B2219/32297 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20

    Abstract: A method of processing a semiconductor wafer including the steps of executing a permutation processing by using a plurality of processing containers while sequentially transferring the wafers into the containers or performing a parallel processing and a transfer mechanism used commonly for the containers while sequentially transferring the wafers. The wafer processing is performed after the completion of conditioning of the vessel, and a conditioning start time for a next container is adjusted so that the completion of conditioning occurs when processing in the previous container is completed.

    Abstract translation: 一种处理半导体晶片的方法，包括以下步骤：在顺序地转移晶片的同时顺序地将晶片转移到容器中或执行并行处理和通常用于容器的转印机构，通过使用多个处理容器执行置换处理。 晶圆处理在容器的调节完成之后进行，并且调节下一个容器的调节开始时间，使得当在前一容器中的处理完成时发生调节完成。

    Method and device for processing semicounductor wafer
    24.
    发明申请
    Method and device for processing semicounductor wafer 失效
    半导体晶圆处理方法及装置

    公开(公告)号：US20050015174A1

    公开(公告)日：2005-01-20

    申请号：US10496980

    申请日：2002-11-29

    Applicant: Shinji Arai ,  Takamasa Chikuma ,  Masahiro Mochizuki

    Inventor： Shinji Arai ,  Takamasa Chikuma ,  Masahiro Mochizuki

    IPC: H01L21/02 ,  G05B19/418 ,  H01L21/00 ,  G06F19/00

    CPC classification number: G05B19/41865 ,  G05B2219/32239 ,  G05B2219/32297 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20

    Abstract: A method of processing a semiconductor wafer, characterized by comprising the steps of executing a permutation processing for processing (Pi) the semiconductor wafers by using a plurality of processing containers (A, B, C, D) for performing the processings different from each other while sequentially transferring (Ci) the wafers into the processing containers or performing a parallel processing for processing the wafers in the processing containers by using the plurality of processing containers for performing the processings identical to each other and a transfer mechanism used commonly for the processing containers while sequentially transferring the wafers into the processing containers by the transfer mechanism, wherein the processings of the wafers in the processing vessels are performed after the completion of the conditioning (Si) of the processing vessels and, in a first processing, a conditioning start time for a next processing container is adjusted so that the conditioning of the next processing container can be completed when the processing of the previous processing container is completed and, in a second processing, the conditioning start time for the latter processing container is adjusted so that the conditioning of the processing container allowing the wafers to be next transferred therein can be completed when the transfer of the wafers into the processing container is completed.

    Abstract translation: 一种处理半导体晶片的方法，其特征在于包括以下步骤：通过使用用于执行彼此不同的处理的多个处理容器（A，B，C，D）来执行处理（Pi）半导体晶片的置换处理 同时将晶片顺序地转移（Ci）到处理容器中，或者通过使用用于执行彼此相同的处理的多个处理容器以及通常用于处理容器的传送机构来执行处理容器中的晶片的并行处理 同时通过传送机构顺序地将晶片转移到处理容器中，其中处理容器中的晶片的处理在处理容器的调节（Si）完成之后进行，并且在第一处理中，调节开始时间 对于下一个处理容器进行调整，以使调理 当完成前一处理容器的处理时，可以完成下一处理容器，并且在第二处理中调整用于后一处理容器的调节开始时间，使得允许晶片下一个处理容器的调节 当晶片转移到处理容器中时，可以完成其中的转移。

    Shadow mask assembly with three therman expansion coefficients
    25.
    发明授权
    Shadow mask assembly with three therman expansion coefficients 失效
    阴影面具组合具有三个热膨胀系数

    公开(公告)号：US06441546B1

    公开(公告)日：2002-08-27

    申请号：US09645409

    申请日：2000-08-25

    Applicant: Shinji Arai

    Inventor： Shinji Arai

    IPC: H01J2980

    CPC classification number: H01J29/073 ,  H01J2229/0722

    Abstract: A shadow mask assembly is provided, which reduces the necessary tensile force to be applied to the shadow mask and the weight and fabrication cost of the assembly itself. This assembly is comprised of (a) a pair of bars arranged in substantially parallel at a specific distance; the pair of bars being made of metal having a first thermal expansion coefficient; (b) a pair of arms fixed to the pair of bars in such a way that each of the pair of arms links the pair of arms together; the pair of arms applying a force that moves the pair of bars away from each other; the pair of arms being made of metal having a second thermal expansion coefficient; the pair of arms constituting a frame having an approximately rectangular opening along with the pair of bars; and (c) a shadow mask fixed to the pair of the bars so as to cover the opening of the frame; the shadow mask being applied with a tensile force in a direction approximately perpendicular to the pair of bars due to the force of the pair of arms that moves the pair of bars away from each other, thereby keeping the mask in its specific shape; the shadow mask being made of metal having a third thermal expansion coefficient that is low enough for suppressing the doming phenomenon; the third thermal expansion coefficient of the mask being less than the second thermal expansion coefficient of the pair of arms.

    Abstract translation: 提供了一种阴影掩模组件，其减少了施加到荫罩上的必要张力以及组件本身的重量和制造成本。 该组件包括（a）以特定距离大致平行布置的一对杆; 所述一对杆由具有第一热膨胀系数的金属制成; （b）一对臂，以一对臂中的每一个将所述一对臂连接在一起的方式固定在所述一对杆上; 所述一对臂施加使所述一对杆彼此远离的力; 所述一对臂由具有第二热膨胀系数的金属制成; 所述一对臂与所述一对杆一起构成具有近似矩形开口的框架; 以及（c）固定在所述一对所述杆上以遮盖所述框架的开口的荫罩; 荫罩由于一对臂的作用力使得该一对杆彼此离开而被施加在大致垂直于一对杆的方向上的拉力，从而将掩模保持在其特定形状; 荫罩由具有足够低的第三热膨胀系数的金属制成，以抑制穹隆现象; 掩模的第三热膨胀系数小于该对的第二热膨胀系数。

    Color cathode ray tube having a reduced diameter part in the neck
    26.
    发明授权
    Color cathode ray tube having a reduced diameter part in the neck 失效
    颈部直径减小的彩色阴极射线管

    公开(公告)号：US06404119B1

    公开(公告)日：2002-06-11

    申请号：US09163695

    申请日：1998-09-30

    Applicant: Tadachika Hidaka ,  Masahiro Ueda ,  Yoshiaki Yanai ,  Nobumitsu Aibara ,  Shinji Arai

    Inventor： Tadachika Hidaka ,  Masahiro Ueda ,  Yoshiaki Yanai ,  Nobumitsu Aibara ,  Shinji Arai

    IPC: H01J3100

    CPC classification number: H01J29/826 ,  H01J29/861 ,  H01J2229/8606

    Abstract: A color cathode ray tube apparatus is provided to reduce the amount of deflection power required, this apparatus having a panel part, on the inside surface of which is formed a phosphor film that emits three primary colors, a funnel part that has its expanded aperture joined to the panel part and a funnel-shaped part, a neck part in which is housed an electron gun structure, and which is joined to the reduced-diameter &phgr; a aperture of the funnel part, and a deflection yoke that is disposed between the funnel part and the neck part, the neck part being formed by a main part that houses the electron gun structure and a reduced-diameter part to which are attached the deflection yokes. The funnel part has a quadrangular pyramid shape at the end that is joined to the neck part, and this can also be used for attachment of the deflection yoke.

    Abstract translation: 提供一种彩色阴极射线管装置，以减少所需的偏转光量，该装置具有面板部分，其内表面上形成有发出三原色的荧光膜，具有扩展孔径的漏斗部分 面板部分和漏斗状部分，颈部容纳有电子枪结构，并且连接到直径小于漏斗部分的孔径的偏转线圈和设置在漏斗部分之间的偏转线圈 部分和颈部，颈部由容纳电子枪结构的主要部分和附接有偏转轭的直径减小的部分形成。 漏斗部分在连接到颈部的端部处具有四角锥形，并且也可以用于偏转线圈的附接。

    Electron gun fixer
    27.
    发明授权
    Electron gun fixer 失效
    电子枪定位器

    公开(公告)号：US06392335B1

    公开(公告)日：2002-05-21

    申请号：US09568967

    申请日：2000-05-11

    Applicant: Shinji Arai

    Inventor： Shinji Arai

    IPC: H01J2946

    CPC classification number: H01J29/82 ,  H01J1/96

    Abstract: An electron gun fixer comprising bulb spacers fixed to an electron gun to be inserted into a bulb neck. Each of the bulb spacers has a supporting portion to be put into press contact with the inner surface of the bulb neck. The expression “R1≧R2>R3” holds for the supporting portion, where R1 is the radius of curvature in the cross section along the direction of insertion of the electron gun into the bulb neck, R2 is the curvature of a peripheral part in the cross section perpendicular to the direction of insertion, and R3 is the radius of curvature for the remaining parts in the cross section perpendicular to the direction of insertion. R2 is substantially equal to the radius of curvature R0 of the bulb neck.

    Abstract translation: 一种电子枪固定器，其包括固定到电子枪上以插入灯泡颈部的灯泡间隔件。 每个灯泡间隔件具有与灯泡颈的内表面压接的支撑部分。 表示“R1> = R2> R3”表示支撑部分，其中R1是沿着电子枪插入灯泡颈部的方向的横截面中的曲率半径，R2是周边部分的曲率 垂直于插入方向的横截面，R3是垂直于插入方向的横截面中剩余部分的曲率半径。 R2基本上等于灯泡颈部的曲率半径R 0。

    Deodorizing material
    28.
    发明授权
    Deodorizing material 失效
    除臭材料

    公开(公告)号：US5997991A

    公开(公告)日：1999-12-07

    申请号：US916288

    申请日：1997-08-22

    Applicant: Taro Kato ,  Shinji Arai

    Inventor： Taro Kato ,  Shinji Arai

    IPC: A61L9/01 ,  B32B29/08 ,  D21H21/36 ,  D21H27/40 ,  B32B3/28 ,  B01D24/00

    CPC classification number: B32B29/08 ,  D21H27/40 ,  D21H21/36 ,  Y10T428/1303 ,  Y10T428/24612 ,  Y10T428/24669 ,  Y10T428/24694

    Abstract: The present invention proposes light-weight and easy-to-handled deodorizing material that has a large contact area with bad smell-causing gas as well as better deodorizing performance and also that enjoys a smooth circulation of that gas with a lower permeation resistance. A single-faced corrugated fiberboard made of a cellulose-based substance is allowed to contain ferrous sulfate, which is subsequently oxidized into basic ferric sulfate.

    Abstract translation: 本发明提出一种轻质易于处理的除臭材料，其具有与不良气味气体接触面积大，除臭性能好的特点，并且具有较低渗透阻力的气体的平滑循环。 允许由纤维素类物质制成的单面瓦楞纤维板含有硫酸亚铁，随后将其氧化为碱式硫酸铁。

    Reversible optical recording medium with an optothermally deformable recording layer
    30.
    发明授权
    Reversible optical recording medium with an optothermally deformable recording layer 失效
    具有光热变形记录层的可逆光记录介质

    公开(公告)号：US4855992A

    公开(公告)日：1989-08-08

    申请号：US136972

    申请日：1987-12-23

    Applicant: Sumio Ikegawa ,  Akio Hori ,  Shuichi Komatsu ,  Shinji Arai ,  Nobuaki Yasuda

    Inventor： Sumio Ikegawa ,  Akio Hori ,  Shuichi Komatsu ,  Shinji Arai ,  Nobuaki Yasuda

    IPC: B41M5/26 ,  G11B7/0045 ,  G11B7/24 ,  G11B7/243 ,  G11B7/244

    CPC classification number: G11B7/253 ,  G11B7/00452 ,  G11B7/24 ,  G11B7/243 ,  Y10S430/146

    Abstract: There is disclosed a bubble-mode data-rewritable optical disc, which has a transparent substrate and a recording layer, formed on the substrate, for storing data to be optically rewritable. The substrate is at least partially formed of an organic material, which releases a gas component when it is heated at a radiation region of a data recording light beam. The recording layer is deposited on the substrate by co-sputtering or co-vacuum evaporation. The recording layer is made of a specific amorphous material containing silicon and fine metal particles. When the gas component is released from the substrate, the recording layer is deformed to be locally peeled off out of the substrate by pressure of the gas component, thus forming a protuberance. In a data erasing mode, a data erasing light beam is radiated onto the recording layer, which is then deformed so as to cause the protuberance to disappear, and has a substantially flat surface, thereby erasing the stored information.

    Abstract translation: 公开了一种气泡模式数据可重写光盘，其具有形成在基板上的用于存储要被光学重写的数据的透明基板和记录层。 衬底至少部分地由有机材料形成，当在数据记录光束的辐射区域被加热时释放气体成分。 记录层通过共溅射或共真空蒸发沉积在基底上。 记录层由含有硅和细金属颗粒的特定无定形材料制成。 当气体组分从衬底上释放时，记录层变形，通过气体组分的压力局部地剥离出衬底，从而形成凸起。 在数据擦除模式中，将数据擦除光束照射到记录层上，然后变形，使得突起消失，并且具有基本上平坦的表面，从而擦除所存储的信息。

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