Optical probe for detecting or irradiating light and near-field optical microscope having such probe and manufacturing method of such probe
    22.
    发明授权
    Optical probe for detecting or irradiating light and near-field optical microscope having such probe and manufacturing method of such probe 失效
    用于检测或照射光的光学探针和具有这种探针的近场光学显微镜及其制造方法

    公开(公告)号:US06215114B1

    公开(公告)日:2001-04-10

    申请号:US09158494

    申请日:1998-09-23

    IPC分类号: H01L2100

    CPC分类号: G01Q60/22 Y10S977/862

    摘要: An optical prove for detecting or irradiating evanescent light is manufactured by forming a film having a regulated film thickness on a substrate, then forming a recess from the rear surface of the substrate, and forming a through hole in the film from the side of the recess by etching. The obtained optical probe has a micro-aperture at the tip of the through hole and usually, a plurality of optical probes each having a micro-aperture of uniform profile are formed on a single substrate. In the recess, light-receiving or light-irradiating means may be provided.

    摘要翻译: 用于检测或照射ev逝光的光学证明是通过在基片上形成具有调节膜厚的膜,然后从基片的后表面形成一个凹槽,并从该凹部的一侧形成一个通孔 通过蚀刻。 获得的光学探针在通孔的尖端处具有微孔,并且通常在单个衬底上形成各自具有均匀轮廓的微孔的多个光学探针。 在凹部中,可以设置光接收或光照射装置。

    Silicon processing method and silicon substrate with etching mask
    24.
    发明授权
    Silicon processing method and silicon substrate with etching mask 失效
    硅处理方法和硅衬底与蚀刻掩模

    公开(公告)号:US08324113B2

    公开(公告)日:2012-12-04

    申请号:US12545235

    申请日:2009-08-21

    IPC分类号: H01L21/302

    摘要: A silicon processing method includes: forming a mask pattern on a principal plane of a single-crystal silicon substrate; and applying crystal anisotropic etching to the principal surface to form a structure including a (111) surface and a crystal surface equivalent thereto and having width W1 and length L1. The principal plane includes a (100) surface and a crystal surface equivalent thereto or a (110) surface and a crystal surface equivalent thereto. A determining section for determining the width W1 of the structure is formed in the mask pattern. The width of the determining section for the width W1 of the mask pattern is width W2. The width of the mask pattern other than the determining section is larger than the width W2 over a length direction of the mask pattern.

    摘要翻译: 硅处理方法包括:在单晶硅衬底的主平面上形成掩模图案; 并对主表面施加结晶各向异性蚀刻,形成包括(111)表面和与其等效的晶面的结构,并具有宽度W1和长度L1。 主平面包括(100)表面和与其等效的(110)表面和与其等效的(110)表面和晶体表面。 用于确定结构的宽度W1的确定部分形成在掩模图案中。 掩模图案的宽度W1的确定部的宽度为宽度W2。 除了确定部分之外的掩模图案的宽度大于在掩模图案的长度方向上的宽度W2。

    Optical deflector and optical instrument using the same
    25.
    发明授权
    Optical deflector and optical instrument using the same 失效
    光学偏转器和光学仪器使用相同

    公开(公告)号:US07656570B2

    公开(公告)日:2010-02-02

    申请号:US11753057

    申请日:2007-05-24

    IPC分类号: G02B26/08

    CPC分类号: G02B26/105

    摘要: An optical deflector includes a supporting member, a first movable element having a light deflecting element, at least one second movable element, at least one first torsion spring configured to support the first and second movable elements, for torsional oscillation about an oscillation axis, at least one second torsion spring configured to support the second movable element and the supporting member, for torsional oscillation about the oscillation axis, and a driving system configured to apply a driving force to at least one of the first and second movable elements, wherein a moment of inertia of the second movable element with respect to the oscillation axis is larger than a moment of inertia of the first movable element with respect to the oscillation axis, and wherein a length of the second movable element in a direction perpendicular to the oscillation axis is equal to or less than a length of the first movable element in a direction perpendicular to the oscillation axis.

    摘要翻译: 光学偏转器包括支撑件,具有光偏转元件的第一可移动元件,至少一个第二可移动元件,至少一个构造成支撑第一和第二可移动元件的第一扭转弹簧,用于围绕振荡轴线的扭转振动, 至少一个第二扭转弹簧,其构造成支撑所述第二可移动元件和所述支撑构件,用于围绕所述振荡轴线的扭转振动;以及驱动系统,构造成将驱动力施加到所述第一和第二可移动元件中的至少一个, 所述第二可动元件相对于所述振动轴的惯性大于所述第一可动元件相对于所述振动轴的惯性矩,并且所述第二可动元件在垂直于所述振荡轴的方向上的长度为 等于或小于第一可移动元件在垂直于振荡轴线的方向上的长度。

    OPTICAL DEFLECTOR AND OPTICAL INSTRUMENT USING THE SAME
    26.
    发明申请
    OPTICAL DEFLECTOR AND OPTICAL INSTRUMENT USING THE SAME 失效
    光学偏光仪和使用该光学仪器的光学仪器

    公开(公告)号:US20070279726A1

    公开(公告)日:2007-12-06

    申请号:US11753066

    申请日:2007-05-24

    IPC分类号: G02B26/08

    CPC分类号: G02B26/085 G02B26/127

    摘要: An optical deflector arranged to be relatively stably driven regardless of any environmental disturbance such as temperature, includes an oscillating system 160 having plural natural oscillation modes of different frequencies, a driving unit for driving the oscillating unit, and a drive control unit for supplying a driving signal to the driving unit, the oscillating system 160 including a first oscillator movable element 11 with a light deflecting element 22, a first torsion spring 12, a second oscillator movable element 13, a second torsion spring 12 and a supporting member 15, the optical deflector further including a distortion detecting element 25a and 25b for detecting mechanical deformation of the first and/or second torsion spring and a heat generating element 19, for stabilizing the frequencies of the natural oscillation modes and the state of scan to ensure stable sinusoidal-wave combined drive.

    摘要翻译: 包括具有多种不同频率的自然振荡模式的振荡系统160,用于驱动振荡单元的驱动单元和用于提供驱动的驱动控制单元的驱动控制单元 信号到驱动单元,振荡系统160包括具有光偏转元件22的第一振荡器可移动元件11,第一扭转弹簧12,第二振荡器可移动元件13,第二扭簧12和支撑构件15,光学 偏转器还包括用于检测第一和/或第二扭簧的机械变形的失真检测元件25a和25b以及用于稳定自然振荡模式的频率和扫描状态的发热元件19,以确保稳定的正弦曲线 波混合驱动。

    OPTICAL DEFLECTOR AND OPTICAL INSTRUMENT USING THE SAME
    27.
    发明申请
    OPTICAL DEFLECTOR AND OPTICAL INSTRUMENT USING THE SAME 失效
    光学偏光仪和使用该光学仪器的光学仪器

    公开(公告)号:US20070279725A1

    公开(公告)日:2007-12-06

    申请号:US11753062

    申请日:2007-05-24

    IPC分类号: G02B26/08

    CPC分类号: G02B26/105 G02B26/085

    摘要: An optical deflector includes an oscillating system and a driving system for driving the oscillating system, the oscillating system including a first oscillator, a first torsion spring, a second oscillator, a second torsion spring and a supporting member, the first oscillator including a first movable element having a light deflecting element configured to deflect light, the second oscillator including a second movable element having a mass adjusting member configured to adjust a mass, wherein the first movable element is resiliently supported by the second movable element through the first torsion spring, for torsional oscillation about an oscillation axis, wherein the second movable element is resiliently supported by the supporting member through the second torsional spring, for torsional oscillation about the oscillation axis, and wherein the oscillating system has at least two natural oscillation modes having different frequencies, about the oscillation axis.

    摘要翻译: 光偏转器包括振荡系统和用于驱动振荡系统的驱动系统,所述振荡系统包括第一振荡器,第一扭转弹簧,第二振荡器,第二扭转弹簧和支撑部件,所述第一振荡器包括第一可动 具有配置成使光偏转的光偏转元件的第二振荡器包括具有构造成调节质量的质量调节构件的第二可移动元件,其中第一可移动元件由第二可移动元件通过第一扭转弹簧弹性地支撑, 围绕振荡轴的扭转振荡,其中第二可移动元件由支撑构件通过第二扭转弹簧弹性地支撑,用于围绕振荡轴线的扭转振荡,并且其中振荡系统具有至少两个具有不同频率的固有振荡模式,约为 振荡轴。

    SILICON PROCESSING METHOD AND SILICON SUBSTRATE WITH ETCHING MASK
    28.
    发明申请
    SILICON PROCESSING METHOD AND SILICON SUBSTRATE WITH ETCHING MASK 失效
    硅加工方法和带有蚀刻掩模的硅基材

    公开(公告)号:US20100051944A1

    公开(公告)日:2010-03-04

    申请号:US12545235

    申请日:2009-08-21

    摘要: A silicon processing method includes: forming a mask pattern on a principal plane of a single-crystal silicon substrate; and applying crystal anisotropic etching to the principal surface to form a structure including a (111) surface and a crystal surface equivalent thereto and having width W1 and length L1. The principal plane includes a (100) surface and a crystal surface equivalent thereto or a (110) surface and a crystal surface equivalent thereto. A determining section for determining the width W1 of the structure is formed in the mask pattern. The width of the determining section for the width W1 of the mask pattern is width W2. The width of the mask pattern other than the determining section is larger than the width W2 over a length direction of the mask pattern.

    摘要翻译: 硅处理方法包括:在单晶硅衬底的主平面上形成掩模图案; 并对主表面施加结晶各向异性蚀刻,形成包括(111)表面和与其等效的晶面的结构,并具有宽度W1和长度L1。 主平面包括(100)表面和与其等效的(110)表面和与其等效的(110)表面和晶体表面。 用于确定结构的宽度W1的确定部分形成在掩模图案中。 掩模图案的宽度W1的确定部的宽度为宽度W2。 除了确定部分之外的掩模图案的宽度大于在掩模图案的长度方向上的宽度W2。

    Optical deflector and optical instrument using the same
    29.
    发明授权
    Optical deflector and optical instrument using the same 失效
    光学偏转器和光学仪器使用相同

    公开(公告)号:US07518774B2

    公开(公告)日:2009-04-14

    申请号:US12146561

    申请日:2008-06-26

    IPC分类号: G02B26/08

    CPC分类号: G02B26/105 G02B26/085

    摘要: An optical deflector includes an oscillating system and a driving system for driving the oscillating system, the oscillating system including a first oscillator, a first torsion spring, a second oscillator, a second torsion spring and a supporting member, the first oscillator including a first movable element having a light deflecting element configured to deflect light, the second oscillator including a second movable element having a mass adjusting member configured to adjust a mass, wherein the first movable element is resiliently supported by the second movable element through the first torsion spring, for torsional oscillation about an oscillation axis, wherein the second movable element is resiliently supported by the supporting member through the second torsional spring, for torsional oscillation about the oscillation axis, and wherein the oscillating system has at least two natural oscillation modes having different frequencies, about the oscillation axis.

    摘要翻译: 光偏转器包括振荡系统和用于驱动振荡系统的驱动系统,所述振荡系统包括第一振荡器,第一扭转弹簧,第二振荡器,第二扭转弹簧和支撑部件,所述第一振荡器包括第一可动 具有配置成使光偏转的光偏转元件的第二振荡器包括具有构造成调节质量的质量调节构件的第二可移动元件,其中第一可移动元件由第二可移动元件通过第一扭转弹簧弹性地支撑, 围绕振荡轴的扭转振荡,其中第二可移动元件由支撑构件通过第二扭转弹簧弹性地支撑,用于围绕振荡轴线的扭转振荡,并且其中振荡系统具有至少两个具有不同频率的固有振荡模式,约为 振荡轴。

    OPTICAL DEFLECTOR AND OPTICAL APPARATUS USING THE SAME
    30.
    发明申请
    OPTICAL DEFLECTOR AND OPTICAL APPARATUS USING THE SAME 失效
    光学偏光器和光学设备使用它

    公开(公告)号:US20070273946A1

    公开(公告)日:2007-11-29

    申请号:US11739968

    申请日:2007-04-25

    IPC分类号: G02B26/08

    CPC分类号: G02B26/0833

    摘要: An optical deflector comprises a vibration system and a driver. The vibration system includes a first oscillatory moving element having a reflecting surface, a second oscillatory moving element, and a support. The first and second oscillatory moving elements are resiliently supported respectively by first and second torsion springs to be able to torsionally vibrate about an oscillation axis with respect to the second oscillatory moving element and to the support. The vibration system has natural oscillation modes with different frequencies about the oscillation axis. The first and/or second torsion spring has torsion leaf portions torsionally deformed about torsion axes parallel to the oscillation axis. One end of each torsion leaf portion is coupled to an end of another through a connecting portion, and the other end is coupled to one of the first and the second oscillatory moving elements and the support directly or through a connecting portion.

    摘要翻译: 光学偏转器包括振动系统和驱动器。 振动系统包括具有反射表面的第一振荡运动元件,第二振荡运动元件和支撑件。 第一和第二振荡运动元件分别由第一和第二扭转弹簧弹性地支撑,以能够相对于第二振荡运动元件和支撑件围绕振荡轴线扭转振动。 振动系统具有与振荡轴不同频率的自然振荡模式。 第一扭转弹簧和/或第二扭转弹簧具有扭转叶片部分,该扭转叶片部分围绕平行于振动轴线的扭转轴线扭转变形。 每个扭转叶片部分的一端通过连接部分连接到另一端部的另一端,另一端直接或通过连接部分与第一和第二振荡运动元件和支撑件中的一个连接。