公开(公告)号：US06544721B1

公开(公告)日：2003-04-08

申请号：US09332108

申请日：1999-06-14

申请人： Kenji Saitoh

发明人： Kenji Saitoh

IPC分类号： G03C500

CPC分类号： G03F7/70283 ,  G03F7/70466

摘要： A method or an apparatus for exposing a resist or a substrate in manufacturing a semiconductor device or the like by using phase shifting masks is arranged to make a multiple exposure to obtain a desired circuit pattern on the substrate. For this purpose, first and second masks are arranged to have phase shift areas formed in the desired pattern in such a way as to give respective different phase shifting effects.

摘要翻译： 布置用于通过使用相移掩模制造半导体器件等来使抗蚀剂或基板曝光的方法或装置，以进行多次曝光以在基板上获得所需的电路图案。 为此，第一和第二掩模被布置成具有以期望的图案形成的相移区域，以便给出相应的不同的相移效应。

公开(公告)号：US06157452A

公开(公告)日：2000-12-05

申请号：US754474

申请日：1996-11-25

申请人： Masanobu Hasegawa ,  Kenji Saitoh

发明人： Masanobu Hasegawa ,  Kenji Saitoh

IPC分类号： G01B11/00 ,  G01D5/347 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G01D5/347 ,  G03F9/7049 ,  G03F9/7076

摘要： A position detecting system for detecting relative positional relationship between first and second objects disposed opposed to each other, includes a first mark formed on the first object and provided by a physical optic element, a second mark formed on the second object and provided by a physical optic element, a light projecting portion for projecting onto the first object a radiation beam having a predetermined light intensity distribution, a light detecting portion for detecting first light diffracted by the first mark and diffracted by the second mark, and second light diffracted by at least one of the first and second marks at a diffraction order different from that of the first light, an adjusting device for adjusting the position of incidence of the radiation beam upon the first object on the basis of first and second signals, of signals detected by the light detecting portion, corresponding to the first and second lights, respectively, and a determining portion for determining the relative positional relationship between the first and second objects on the basis of the detection of the first and second signals by the light detecting portions.

摘要翻译： 一种位置检测系统，用于检测彼此相对设置的第一和第二物体之间的相对位置关系，包括形成在第一物体上并由物理光学元件提供的第一标记，形成在第二物体上的第二标记并由物理 光学元件，用于向第一物体投射具有预定光强分布的辐射束的光投射部分，用于检测由第一标记衍射的第一光并被第二标记衍射的光检测部分，以及至少被衍射的第二光 在与第一光不同的衍射阶段的第一和第二标记之一，调整装置，用于根据第一和第二信号调整辐射束在第一物体上的入射位置，由第 光检测部分，分别对应于第一和第二光，以及用于确定的确定部分 基于光检测部分对第一和第二信号的检测，得到第一和第二物体之间的相对位置关系。

公开(公告)号：US5985720A

公开(公告)日：1999-11-16

申请号：US933844

申请日：1997-09-19

申请人： Kenji Saitoh

发明人： Kenji Saitoh

IPC分类号： H01L21/8247 ,  H01L27/115 ,  H01L29/423 ,  H01L29/788 ,  H01L29/792

CPC分类号： H01L27/11521 ,  H01L27/115 ,  H01L29/42324

摘要： A flash memory has diffused layers extending in a column direction to form channel regions between each two of the diffused layers, field oxide films extending in a row direction to divide the channel regions into separate channels arranged in a matrix, a floating gate disposed for each channel as a split gate, and a strip control gates extending in the row direction and overlying each row of the split floating gate. Each of the floating gates has a lower layer having a lower impurity concentration and an upper layer having a higher impurity concentration. The lower impurity concentration of the lower layer prevents fluctuations in device characteristics while the higher concentration of the upper layer enhances etch rates in two etching process for forming the floating gates of a matrix.

摘要翻译： 闪存具有沿列方向延伸的扩散层，以在每两个扩散层之间形成沟道区，在行方向上延伸的场氧化物膜将沟道区分成排列成矩阵的单独通道，每个 通道作为分离栅极，以及条形控制栅极，其在行方向上延伸并且覆盖分离浮动栅极的每一行。 每个浮置栅极具有杂质浓度较低的较低层和杂质浓度较高的上层。 下层的较低的杂质浓度防止了器件特性的波动，而较高浓度的上层提高了用于形成矩阵浮置栅极的两个蚀刻工艺中的蚀刻速率。

公开(公告)号：US5721721A

公开(公告)日：1998-02-24

申请号：US589473

申请日：1996-01-22

申请人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawase ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

发明人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawase ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

IPC分类号： G01B7/00 ,  G01D5/244 ,  G01D5/245 ,  G01Q10/00 ,  G01Q20/04 ,  G01Q60/00 ,  G01Q60/10 ,  G01Q70/06 ,  G11B9/00 ,  G11B7/00

CPC分类号： G01D5/244 ,  G01B7/003 ,  G01D5/2451 ,  G11B9/1418 ,  G11B9/1427 ,  G11B9/1481 ,  B82Y10/00 ,  G01Q10/06 ,  G01Q60/16 ,  G01Q80/00 ,  G11B9/1472 ,  Y10S977/851 ,  Y10S977/861 ,  Y10S977/947

摘要： An encoder includes an electrically conductive reference scale having surface steps formed at predetermined positions; an electrically conductive probe having a tip disposed opposed to the reference scale; wherein the reference scale and the probe are relatively movable in a direction different from the opposing direction of the tip of the probe and the reference scale; a portion for applying an electrical voltage to between the reference scale and the probe; a portion for detecting a change in a tunnel current between the reference scale and the probe, to between which the electric voltage is applied by the voltage applying portion at the time of the relative movement between the scale and the probe, the detecting portion detecting the change in the tunnel current when the probe passes a position opposed to a surface step of the reference scale; and portion for detecting the amount of the relative movement between the scale and probe, on the basis of the detection by the change detecting portion.

摘要翻译： 编码器包括具有形成在预定位置处的表面台阶的导电参考标尺; 导电探针，其具有与参考标尺相对设置的尖端; 其中所述参考标尺和所述探针在与所述探针的尖端和所述参考标尺的相反方向不同的方向上相对移动; 用于将电压施加到参考标尺和探针之间的部分; 用于检测参考标尺和探针之间的隧道电流变化的部分，在标尺和探头之间的相对移动时由电压施加部施加电压，检测部分检测 当探针经过与参考刻度的表面台阶相对的位置时隧道电流的变化; 以及用于根据变化检测部分的检测来检测标尺和探针之间的相对移动量的部分。

公开(公告)号：US5585923A

公开(公告)日：1996-12-17

申请号：US314444

申请日：1994-09-28

申请人： Noriyuki Nose ,  Takeshi Miyachi ,  Kenji Saitoh ,  Koichi Sentoku ,  Takahiro Matsumoto

发明人： Noriyuki Nose ,  Takeshi Miyachi ,  Kenji Saitoh ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F7/70633 ,  G03F9/70

摘要： A method and apparatus for measuring the relative positional deviation between first and second diffraction gratings formed on an object includes determining the relative positional deviation of the first and second diffraction gratings while detecting and correcting an error produced in relation to detection of the positional deviation of the first and second diffraction gratings.

摘要翻译： 用于测量形成在物体上的第一和第二衍射光栅之间的相对位置偏差的方法和装置包括确定第一和第二衍射光栅的相对位置偏差，同时检测和校正相对于检测到的位置偏差的检测产生的误差 第一和第二衍射光栅。

公开(公告)号：US5333050A

公开(公告)日：1994-07-26

申请号：US675277

申请日：1991-03-26

申请人： Noriyuki Nose ,  Kenji Saitoh ,  Koichi Sentoku ,  Minoru Yoshii

发明人： Noriyuki Nose ,  Kenji Saitoh ,  Koichi Sentoku ,  Minoru Yoshii

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/02

CPC分类号： G03F7/70633 ,  G03F9/7049

摘要： Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different moments, the measurement being based on detection of interference of diffraction lights from at least one of the first and second printed patterns.

摘要翻译： 公开了一种用于测量在不同时刻印刷在诸如半导体晶片的物品上的第一图案和第二图案之间的相对位置偏差的方法和装置，该测量是基于检测衍射光从至少一个 第一和第二印刷图案。

公开(公告)号：US5327221A

公开(公告)日：1994-07-05

申请号：US919380

申请日：1992-07-29

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.

摘要翻译： 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

公开(公告)号：US5200800A

公开(公告)日：1993-04-06

申请号：US892732

申请日：1992-05-29

申请人： Shigeyuki Suda ,  Kenji Saitoh ,  Minoru Yoshii ,  Noriyuki Nose

发明人： Shigeyuki Suda ,  Kenji Saitoh ,  Minoru Yoshii ,  Noriyuki Nose

IPC分类号： G03F9/00

CPC分类号： G03F9/7076

摘要： A method of detecting a position of a substrate having an alignment mark includes the steps of projecting a radiation beam from an optical head to the alignment mark such that the alignment mark produces a signal beam on the basis of which the position of the substrate is detected, forming a reference mark on the substrate at a position different from that of the alignment mark, projecting a radiation beam from the optical head to the reference mark, such that the reference mark produces a reference beam, detecting the relative positional deviation of the optical head relative to the reference mark on the basis of the produced reference beam, and adjusting the relative position of the optical head and the alignment mark on the basis of the detected relative positional deviation and, after the adjustment, detecting the position of the substrate on the basis of the produced signal beam.

摘要翻译： 检测具有对准标记的基板的位置的方法包括以下步骤：将来自光学头的辐射束投射到对准标记，使得对准标记产生信号光束，基于该信号光束检测基板的位置 在与所述对准标记不同的位置的基板上形成参考标记，将来自所述光学头的辐射束投射到所述基准标记，使得所述基准标记产生参考光束，检测所述光学器件的相对位置偏差 基于所生成的参考光束相对于参考标记的头部，并且基于检测到的相对位置偏差来调整光学头和对准标记的相对位置，并且在调整之后，检测基板的位置 产生信号光束的基础。

公开(公告)号：US08437003B2

公开(公告)日：2013-05-07

申请号：US12812008

申请日：2009-01-28

申请人： Hiroshi Yoshikawa ,  Yusuke Mitarai ,  Masafumi Takimoto ,  Kazuyuki Ota ,  Kenji Saitoh ,  Masakazu Matsugu

发明人： Hiroshi Yoshikawa ,  Yusuke Mitarai ,  Masafumi Takimoto ,  Kazuyuki Ota ,  Kenji Saitoh ,  Masakazu Matsugu

IPC分类号： G01N21/55

CPC分类号： G01N21/57 ,  G01N21/4738 ,  G01N2021/4735

摘要： An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.

摘要翻译： 一种信息处理设备，包括：获取单元，被配置为获得关于来自待测目标的反射光的分布的第一信息和关于反射光的几何光学分量的第二信息;计算单元，被配置为基于 所述第一信息和所述第二信息，所述第三信息指示反射光的分布的近似值;以及输出单元，被配置为基于所述第三信息输出关于所述反射光的波长成分的信息。

公开(公告)号：US07924418B2

公开(公告)日：2011-04-12

申请号：US12171642

申请日：2008-07-11

申请人： Hiroshi Yoshikawa ,  Kenji Saitoh

发明人： Hiroshi Yoshikawa ,  Kenji Saitoh

IPC分类号： G01N21/00

CPC分类号： G01N21/952 ,  G01N21/4738 ,  G06T7/0004

摘要： An inspection apparatus includes a captured image acquiring unit configured to acquire a captured image that is acquired by shooting an inspection target, an acquiring unit configured to acquire from the captured image a first image region and a second image region whose intensity distributions of reflected light with respect to an incident angle of illumination light emitted to the inspection target are different, and an image processing unit configured to perform image processing for performing different surface inspections on the first image region and the second image region respectively.

摘要翻译： 检查装置包括拍摄图像获取单元，被配置为获取通过拍摄检查对象获取的拍摄图像;获取单元，被配置为从拍摄图像获取第一图像区域和第二图像区域，其中反射光的强度分布与 相对于发射到检查对象物的照明光的入射角度是不同的，图像处理单元被配置为执行对第一图像区域和第二图像区域进行不同的表面检查的图像处理。