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    Synthetic quartz glass member for use in ArF excimer laser lithography
    21.
    发明授权
    Synthetic quartz glass member for use in ArF excimer laser lithography 有权
    用于ArF准分子激光光刻的合成石英玻璃构件

    公开(公告)号：US06480518B1

    公开(公告)日：2002-11-12

    申请号：US09517888

    申请日：2000-03-03

    申请人： Akira Fujinoki ,  Takayuki Oshima ,  Hiroyuki Nishimura ,  Yasuyuki Yaginuma

    发明人： Akira Fujinoki ,  Takayuki Oshima ,  Hiroyuki Nishimura ,  Yasuyuki Yaginuma

    IPC分类号： H01S322

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/50 ,  C03C2203/42 ,  C03C2203/50

    摘要： A synthetic glass member for use in excimer laser lithography, having superior homogeneity, high transmittance for ArF excimer laser beams and an excellent resistance against lasers is made from high purity synthetic quartz glass, and it is characterized in that layered structures, striae in three directions and internal strains are thermally and mechanically removed, the distribution of refractive index (&Dgr;n) in a plane orthogonal to the optical axis is up to about 1×10−6, the distribution of refractive index (&Dgr;n) in a plane parallel to the optical axis is up to about 5×10−6, the birefringence is up to about 2 nm/cm, the hydrogen molecule concentration is at least about 2×1017 molecules/cm3, and the internal transmittance is at least about 99.8% at a wavelength of 193.4 nm.

    摘要翻译： 用于准分子激光光刻的合成玻璃构件，具有优异的均匀性，对ArF准分子激光束的高透射率和优异的抗激光性能由高纯度合成石英玻璃制成，其特征在于层状结构，沿三个方向 并且内部应变被热和机械去除，在与光轴正交的平面中折射率（DELTAn）的分布高达约1×10 -6，平行于光轴的平面中的折射率分布（DELTAn）为 高达约5×10 -6，双折射高达约2nm / cm，氢分子浓度为至少约2×10 17分子/ cm 3，内部透射率在193.4nm波长处为至少约99.8％。

    Optical member of synthetic quartz glass for excimer lasers and method for producing same
    23.
    发明授权
    Optical member of synthetic quartz glass for excimer lasers and method for producing same 失效
    用于准分子激光的合成石英玻璃的光学元件及其制造方法

    公开(公告)号：US5364433A

    公开(公告)日：1994-11-15

    申请号：US977397

    申请日：1993-05-15

    申请人： Hiroyuki Nishimura ,  Akira Fujinoki ,  Toshikatsu Matsuya ,  Kyoichi Inaki ,  Toshiyuki Kato ,  Atsushi Shimada

    发明人： Hiroyuki Nishimura ,  Akira Fujinoki ,  Toshikatsu Matsuya ,  Kyoichi Inaki ,  Toshiyuki Kato ,  Atsushi Shimada

    IPC分类号： C03B8/04 ,  C03B19/14 ,  C03B37/014 ,  C03C3/06 ,  G03F7/20

    CPC分类号： C03B37/014 ,  C03B19/1415 ,  C03B19/1453 ,  C03C3/06 ,  G03F7/70958 ,  C03B2201/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/32 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  Y02P40/57 ,  Y10S501/90 ,  Y10S65/08

    摘要： A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1.times.10.sup.-2 Torr or above to a temperature of 1,400 .degree. C. or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at last one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.

    摘要翻译： PCT No.PCT / JP92 / 00821 Sec。 371日期1993年3月15日 102（e）1993年3月15日PCT提交1992年6月29日PCT公布。 公开号WO93 / 00307 日期：1993年1月7日。一种用于紫外线激光的合成石英玻璃光学元件，适用于使用准分子激光束和其它光学部件的平版印刷机的步进透镜，其中石英玻璃的羟基含量为10〜100ppm ，氯含量为200ppm以下，氢含量为1×1016分/ cm 3以下，折射率均匀性为DELTA n为5×10 -6以下，双折射为5nm / cm以下。 光学构件可以通过使挥发性硅化合物用氢氧焰火焰水解，将形成的颗粒二氧化硅沉积在耐热载体上以制备多孔二氧化硅基质来制造，在高达1×10 -2乇的真空中加热基质 以上至1400℃以上的温度进行脱水脱气，将得到的透明石英玻璃均匀化成最后一个方向不含条纹的高度均匀的石英玻璃，成型高度均匀的石英玻璃，退火成型玻璃 。

    Process for producing silica glass product
    24.
    发明申请
    Process for producing silica glass product 审中-公开

    公开(公告)号：US20100251770A1

    公开(公告)日：2010-10-07

    申请号：US12802846

    申请日：2010-06-15

    申请人： Hiroyuki Watanabe ,  Akira Fujinoki ,  Takayuki Imaizumi ,  Kazuhisa Hayakawa ,  Shingo Niinobe

    发明人： Hiroyuki Watanabe ,  Akira Fujinoki ,  Takayuki Imaizumi ,  Kazuhisa Hayakawa ,  Shingo Niinobe

    IPC分类号： C03B8/00

    CPC分类号： C03B20/00 ,  C03B19/06 ,  C03B19/066

    摘要： A process for producing a transparent or opaque silica glass product including mixing a silica fine powder and a cellulose derivative and injection molding the mixture, followed by degreasing treatment and baking treatment, which is characterized in that the cellulose derivative is a cellulose derivative which causes reversible thermal gelation in an aqueous solution of at least one member selected from methyl cellulose, hydroxypropylmethyl cellulose and hydroxyethylmethyl cellulose; in producing a transparent silica glass product, the cellulose derivative is added in water heated at a gelation temperature thereof or higher, and after cooling, the formed aqueous solution is kneaded with the silica fine powder; and in producing an opaque silica glass product, the cellulose derivative is added in a silica slurry containing a silica powder and heated at a gelation temperature of the cellulose derivative or higher.

    Synthetic silica glass formed article for optical use
    26.
    发明授权
    Synthetic silica glass formed article for optical use 失效
    用于光学用途的合成石英玻璃成型制品

    公开(公告)号：US5790315A

    公开(公告)日：1998-08-04

    申请号：US396517

    申请日：1995-03-01

    申请人： Akira Fujinoki ,  Akihiko Sugama ,  Masaatsu Kataoka ,  Wolfgang Englisch

    发明人： Akira Fujinoki ,  Akihiko Sugama ,  Masaatsu Kataoka ,  Wolfgang Englisch

    IPC分类号： G02B1/02 ,  C03B20/00 ,  C03B23/00 ,  C03B23/047 ,  C03B23/049 ,  C03B32/00 ,  G03F7/20 ,  G02B3/00

    CPC分类号： G03F7/70241 ,  C03B23/0473 ,  C03B23/0493 ,  C03B32/00 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

    摘要： A high purity ball-shaped optical article formed of silica glass useful in optical systems employed in photolithography applications. The optical article is characterized by end faces and a side face positioned between the end faces. The side face is externally projected beyond the outline of the end faces and has a spherical configuration. The optical article is uniquely characterized by a smaller number of cords per unit area, viewed in a direction perpendicular to a line connecting the end faces, than the number of cords per unit area viewed in a direction along the line connecting the end faces. The article is also defined by optical homogeneity in a direction perpendicular to the line connecting the end faces.

    摘要翻译： 由用于光刻应用的光学系统中的石英玻璃形成的高纯度球形光学制品。 光学制品的特征在于端面和位于端面之间的侧面。 侧面外侧突出超过端面轮廓，并具有球形结构。 该光学制品的特征在于，沿着与连接端面的线垂直的方向，每单位面积的线数少于沿着连接端面的线的方向观察的每单位面积的线数。 该物品还通过垂直于连接端面的线的方向上的光学均匀性来限定。

    Production process of synthetic quartz glass
    27.
    发明授权
    Production process of synthetic quartz glass 有权
    人造石英玻璃的生产工艺

    公开(公告)号：US07841211B2

    公开(公告)日：2010-11-30

    申请号：US10535935

    申请日：2003-11-28

    申请人： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

    发明人： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

    IPC分类号： C03B20/00 ,  C03B19/14

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

    摘要： First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

    摘要翻译： 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是制造吸收系数在245nm为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，然后进行烧成，由此形成致密的玻璃 身体。

    Method for the Regeneration of a Worn Quartz Glass Jig
    29.
    发明申请
    Method for the Regeneration of a Worn Quartz Glass Jig 审中-公开
    磨损石英玻璃夹具的再生方法

    公开(公告)号：US20080216513A1

    公开(公告)日：2008-09-11

    申请号：US11919457

    申请日：2006-04-27

    申请人： Tatsuhiro Sato ,  Akira Fujinoki ,  Itsuo Araki

    发明人： Tatsuhiro Sato ,  Akira Fujinoki ,  Itsuo Araki

    IPC分类号： C03B19/00 ,  C03C3/06

    CPC分类号： C03B32/00 ,  C03B23/20 ,  C03C3/06 ,  C03C23/007 ,  C03C23/0075 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2201/54

    摘要： To provide a technique with which a quartz glass jig and a doped quartz glass jig are regenerated by completely removing the impurities which are attached to the surface and the impurities which have diffused into the interior from quartz glass jigs which have been used in semiconductor production processes and then carrying out working repair and removing the contamination from the working processes as well. After use, the impurities are removed from the aforementioned quartz glass jigs in the said purification treatment process which includes a purification treatment process in which the quartz glass jigs are subjected to a purification treatment in a gaseous atmosphere which includes a halogen element at a temperature within the region above a prescribed temperature.

    摘要翻译： 为了提供通过完全去除已经用于半导体制造工艺中的石英玻璃夹具将附着在表面上的杂质和已经扩散到内部的杂质完全除去石英玻璃夹具和掺杂石英玻璃夹具的技术 然后进行工作维修和清除工作过程中的污染物。 使用后，在上述纯化处理工序中，从上述石英玻璃夹具中除去杂质，其中包括净化处理工艺，其中石英玻璃夹具在包含卤素元素的气氛中在温度范围内进行纯化处理 该区域高于规定温度。